JPS5021681A - - Google Patents
Info
- Publication number
- JPS5021681A JPS5021681A JP49053494A JP5349474A JPS5021681A JP S5021681 A JPS5021681 A JP S5021681A JP 49053494 A JP49053494 A JP 49053494A JP 5349474 A JP5349474 A JP 5349474A JP S5021681 A JPS5021681 A JP S5021681A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
- H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2326447A DE2326447C2 (de) | 1973-05-24 | 1973-05-24 | Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5021681A true JPS5021681A (https=) | 1975-03-07 |
| JPS5231712B2 JPS5231712B2 (https=) | 1977-08-16 |
Family
ID=5881998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49053494A Expired JPS5231712B2 (https=) | 1973-05-24 | 1974-05-15 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5231712B2 (https=) |
| CA (1) | CA1026220A (https=) |
| DE (1) | DE2326447C2 (https=) |
| FR (1) | FR2231110B1 (https=) |
| GB (1) | GB1427482A (https=) |
| IT (1) | IT1006475B (https=) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186330A (en) * | 1981-05-12 | 1982-11-16 | Matsushita Electronics Corp | Removing method for photoresist |
| JPS6053954A (ja) * | 1983-09-05 | 1985-03-28 | Oki Electric Ind Co Ltd | フォトマスク洗浄方法 |
| JPS6344660A (ja) * | 1986-08-09 | 1988-02-25 | マイクロ―イメッジ・テクノロジー・リミテッド | ホトレジストストリッピング溶液及びその製法及びホトレジストの除去方法 |
| JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4872919A (en) * | 1988-01-28 | 1989-10-10 | The Procter & Gamble Company | Method for removing precipitated calcium citrate from juice pasteurization or sterilization equipment |
| JP3152430B2 (ja) * | 1990-10-09 | 2001-04-03 | クロリンエンジニアズ株式会社 | 有機物被膜の除去方法 |
-
1973
- 1973-05-24 DE DE2326447A patent/DE2326447C2/de not_active Expired
-
1974
- 1974-03-29 FR FR7411895A patent/FR2231110B1/fr not_active Expired
- 1974-04-03 GB GB1469774A patent/GB1427482A/en not_active Expired
- 1974-04-17 IT IT21505/74A patent/IT1006475B/it active
- 1974-05-08 CA CA199,318A patent/CA1026220A/en not_active Expired
- 1974-05-15 JP JP49053494A patent/JPS5231712B2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186330A (en) * | 1981-05-12 | 1982-11-16 | Matsushita Electronics Corp | Removing method for photoresist |
| JPS6053954A (ja) * | 1983-09-05 | 1985-03-28 | Oki Electric Ind Co Ltd | フォトマスク洗浄方法 |
| JPS6344660A (ja) * | 1986-08-09 | 1988-02-25 | マイクロ―イメッジ・テクノロジー・リミテッド | ホトレジストストリッピング溶液及びその製法及びホトレジストの除去方法 |
| JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CA1026220A (en) | 1978-02-14 |
| FR2231110B1 (https=) | 1979-02-16 |
| DE2326447A1 (de) | 1974-12-12 |
| DE2326447C2 (de) | 1986-02-06 |
| IT1006475B (it) | 1976-09-30 |
| GB1427482A (en) | 1976-03-10 |
| FR2231110A1 (https=) | 1974-12-20 |
| JPS5231712B2 (https=) | 1977-08-16 |