JPS5231712B2 - - Google Patents
Info
- Publication number
- JPS5231712B2 JPS5231712B2 JP49053494A JP5349474A JPS5231712B2 JP S5231712 B2 JPS5231712 B2 JP S5231712B2 JP 49053494 A JP49053494 A JP 49053494A JP 5349474 A JP5349474 A JP 5349474A JP S5231712 B2 JPS5231712 B2 JP S5231712B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/286—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials
- H10P50/287—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of organic materials by chemical means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2326447A DE2326447C2 (de) | 1973-05-24 | 1973-05-24 | Verfahren zum Entfernen von Schichten aus organischem Material und seine Verwendung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5021681A JPS5021681A (https=) | 1975-03-07 |
| JPS5231712B2 true JPS5231712B2 (https=) | 1977-08-16 |
Family
ID=5881998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49053494A Expired JPS5231712B2 (https=) | 1973-05-24 | 1974-05-15 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5231712B2 (https=) |
| CA (1) | CA1026220A (https=) |
| DE (1) | DE2326447C2 (https=) |
| FR (1) | FR2231110B1 (https=) |
| GB (1) | GB1427482A (https=) |
| IT (1) | IT1006475B (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57186330A (en) * | 1981-05-12 | 1982-11-16 | Matsushita Electronics Corp | Removing method for photoresist |
| JPS6053954A (ja) * | 1983-09-05 | 1985-03-28 | Oki Electric Ind Co Ltd | フォトマスク洗浄方法 |
| EP0256284B1 (en) * | 1986-08-09 | 1991-03-27 | Micro-Image Technology Limited | Composition for use in the production of integrated circuits and method for its preparation and use |
| US4872919A (en) * | 1988-01-28 | 1989-10-10 | The Procter & Gamble Company | Method for removing precipitated calcium citrate from juice pasteurization or sterilization equipment |
| JPH0294911A (ja) * | 1988-09-30 | 1990-04-05 | Toshiba Corp | 弾性表面波素子の製造方法 |
| JP3152430B2 (ja) * | 1990-10-09 | 2001-04-03 | クロリンエンジニアズ株式会社 | 有機物被膜の除去方法 |
-
1973
- 1973-05-24 DE DE2326447A patent/DE2326447C2/de not_active Expired
-
1974
- 1974-03-29 FR FR7411895A patent/FR2231110B1/fr not_active Expired
- 1974-04-03 GB GB1469774A patent/GB1427482A/en not_active Expired
- 1974-04-17 IT IT21505/74A patent/IT1006475B/it active
- 1974-05-08 CA CA199,318A patent/CA1026220A/en not_active Expired
- 1974-05-15 JP JP49053494A patent/JPS5231712B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| CA1026220A (en) | 1978-02-14 |
| FR2231110B1 (https=) | 1979-02-16 |
| DE2326447A1 (de) | 1974-12-12 |
| JPS5021681A (https=) | 1975-03-07 |
| DE2326447C2 (de) | 1986-02-06 |
| IT1006475B (it) | 1976-09-30 |
| GB1427482A (en) | 1976-03-10 |
| FR2231110A1 (https=) | 1974-12-20 |