CS167686B1 - Method of thin layers forming on base material - Google Patents

Method of thin layers forming on base material

Info

Publication number
CS167686B1
CS167686B1 CS842773A CS842773A CS167686B1 CS 167686 B1 CS167686 B1 CS 167686B1 CS 842773 A CS842773 A CS 842773A CS 842773 A CS842773 A CS 842773A CS 167686 B1 CS167686 B1 CS 167686B1
Authority
CS
Czechoslovakia
Prior art keywords
base material
thin layers
layers forming
forming
thin
Prior art date
Application number
CS842773A
Other languages
Czech (cs)
Inventor
Rainer Moeller
Horst Stelzer
Michael Kleinert
Lutz Fabian
Original Assignee
Rainer Moeller
Horst Stelzer
Michael Kleinert
Lutz Fabian
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rainer Moeller, Horst Stelzer, Michael Kleinert, Lutz Fabian filed Critical Rainer Moeller
Publication of CS167686B1 publication Critical patent/CS167686B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45519—Inert gas curtains
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CS842773A 1973-03-08 1973-12-06 Method of thin layers forming on base material CS167686B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16948573A DD107313A1 (en) 1973-03-08 1973-03-08

Publications (1)

Publication Number Publication Date
CS167686B1 true CS167686B1 (en) 1976-04-29

Family

ID=5490450

Family Applications (1)

Application Number Title Priority Date Filing Date
CS842773A CS167686B1 (en) 1973-03-08 1973-12-06 Method of thin layers forming on base material

Country Status (5)

Country Link
CS (1) CS167686B1 (en)
DD (1) DD107313A1 (en)
DE (1) DE2354435A1 (en)
FR (1) FR2220596B3 (en)
GB (1) GB1406020A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4435445A (en) * 1982-05-13 1984-03-06 Energy Conversion Devices, Inc. Photo-assisted CVD
US6124427A (en) * 1997-03-31 2000-09-26 North Dakota State University Organometallic single source precursors for inorganic films coatings and powders
DE19830842C1 (en) 1998-07-09 1999-10-07 Siemens Ag Deposition apparatus, e.g., for CVD of metal oxide ceramics in the semiconductor industry

Also Published As

Publication number Publication date
DE2354435A1 (en) 1974-09-12
DD107313A1 (en) 1974-07-20
FR2220596B3 (en) 1976-12-03
FR2220596A1 (en) 1974-10-04
GB1406020A (en) 1975-09-10

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