BRPI0817924A8 - depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalino nanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substrato - Google Patents
depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalino nanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substratoInfo
- Publication number
- BRPI0817924A8 BRPI0817924A8 BRPI0817924A BRPI0817924A BRPI0817924A8 BR PI0817924 A8 BRPI0817924 A8 BR PI0817924A8 BR PI0817924 A BRPI0817924 A BR PI0817924A BR PI0817924 A BRPI0817924 A BR PI0817924A BR PI0817924 A8 BRPI0817924 A8 BR PI0817924A8
- Authority
- BR
- Brazil
- Prior art keywords
- crystalline
- electroplating
- deposit
- functional
- nanogranular
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Powder Metallurgy (AREA)
Abstract
depósito de liga de cromo cristalino a presente invenção refere-se a um depósito de cromo funcional cristalino eletrodepositado que é nanogranular quando depositado, e o depósito pode ser tem e xrd cristalinas ou pode ser tem cristalina e xrd amorfa. em várias modalidades, o depósito inclui uma ou qualquer combinação de dois ou mais dentre uma liga de cromo, carbono, nitrogênio, oxigênio e enxofre; uma orientação preferida {111}; uma área transversal de grão de cristal média menor que cerca de 500 nm2 ; e um parâmetro de treliça de 2,8895 +/- 0,0025 a. um processo e um banho de eletrodeposição para eletrodepositar o depósito de cromo funcional cristalino nanogranular em um substrato, incluindo fornecer o banho de eletrodeposição que inclui cromo trivalente, uma fonte de enxofre divalente, um ácido carboxílico, uma fonte de nitrogênio e estando substancialmente livre de cromo hexavalente; submergir um substrato no banho; e aplicar uma corrente elétrica para eletrodepositar o depósito no substrato.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97680507P | 2007-10-02 | 2007-10-02 | |
US60/976,805 | 2007-10-02 | ||
PCT/US2008/078561 WO2009046181A1 (en) | 2007-10-02 | 2008-10-02 | Crystalline chromium alloy deposit |
Publications (3)
Publication Number | Publication Date |
---|---|
BRPI0817924A2 BRPI0817924A2 (pt) | 2015-04-07 |
BRPI0817924A8 true BRPI0817924A8 (pt) | 2019-01-29 |
BRPI0817924B1 BRPI0817924B1 (pt) | 2019-02-12 |
Family
ID=40084454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0817924-7A BRPI0817924B1 (pt) | 2007-10-02 | 2008-10-02 | Depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalinonanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substrato |
Country Status (11)
Country | Link |
---|---|
US (1) | US8187448B2 (pt) |
EP (1) | EP2217745B1 (pt) |
JP (1) | JP5570423B2 (pt) |
KR (1) | KR101557481B1 (pt) |
CN (1) | CN101849041B (pt) |
BR (1) | BRPI0817924B1 (pt) |
CA (1) | CA2700147C (pt) |
ES (1) | ES2491517T3 (pt) |
MX (1) | MX2010003543A (pt) |
PL (1) | PL2217745T3 (pt) |
WO (1) | WO2009046181A1 (pt) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7723262B2 (en) | 2005-11-21 | 2010-05-25 | Energ2, Llc | Activated carbon cryogels and related methods |
WO2007115030A1 (en) * | 2006-03-31 | 2007-10-11 | Atotech Deutschland Gmbh | Crystalline chromium deposit |
EP2100317B1 (en) | 2006-11-15 | 2016-01-27 | Energ2, Inc. | Electric double layer capacitance device |
RU2440591C2 (ru) | 2008-04-10 | 2012-01-20 | Шлюмбергер Текнолоджи Б.В. | Способ получения характеристик геологической формации, пересекаемой скважиной |
US8725477B2 (en) | 2008-04-10 | 2014-05-13 | Schlumberger Technology Corporation | Method to generate numerical pseudocores using borehole images, digital rock samples, and multi-point statistics |
WO2011002536A2 (en) | 2009-04-08 | 2011-01-06 | Energ2, Inc. | Manufacturing methods for the production of carbon materials |
US8311788B2 (en) | 2009-07-01 | 2012-11-13 | Schlumberger Technology Corporation | Method to quantify discrete pore shapes, volumes, and surface areas using confocal profilometry |
BRPI1011793B1 (pt) | 2009-07-01 | 2020-11-17 | Basf Se | material de carbono amorfo sintético ultrapuro, gel de polímero ultrapuro, dispositivo, eletrodo e método para a fabricação do material de carbono |
WO2011072256A1 (en) * | 2009-12-11 | 2011-06-16 | Energ2, Inc. | Carbon materials comprising an electrochemical modifier |
WO2011112992A1 (en) | 2010-03-12 | 2011-09-15 | Energ2, Inc. | Mesoporous carbon materials comprising bifunctional catalysts |
CN101928914B (zh) * | 2010-09-02 | 2011-12-21 | 南京大学 | 一种大面积二维超构材料的制备方法 |
US8654507B2 (en) | 2010-09-30 | 2014-02-18 | Energ2 Technologies, Inc. | Enhanced packing of energy storage particles |
DE102010055968A1 (de) | 2010-12-23 | 2012-06-28 | Coventya Spa | Substrat mit korrosionsbeständigem Überzug und Verfahren zu dessen Herstellung |
KR102048196B1 (ko) | 2010-12-28 | 2019-11-25 | 바스프 에스이 | 향상된 전기화학적 특성을 포함하는 탄소 물질 |
US20120262127A1 (en) | 2011-04-15 | 2012-10-18 | Energ2 Technologies, Inc. | Flow ultracapacitor |
PT2705176T (pt) * | 2011-05-03 | 2016-07-08 | Atotech Deutschland Gmbh | Banho e método de galvanoplastia para produzir camadas de crómio escuro |
EP2715840B1 (en) | 2011-06-03 | 2015-05-27 | Basf Se | Carbon-lead blends for use in hybrid energy storage devices |
US9771661B2 (en) * | 2012-02-06 | 2017-09-26 | Honeywell International Inc. | Methods for producing a high temperature oxidation resistant MCrAlX coating on superalloy substrates |
US9409777B2 (en) | 2012-02-09 | 2016-08-09 | Basf Se | Preparation of polymeric resins and carbon materials |
CN102965696B (zh) * | 2012-11-28 | 2015-05-20 | 郑州市大有制版有限公司 | 高效凹版镀铬添加剂 |
WO2014143213A1 (en) | 2013-03-14 | 2014-09-18 | Energ2 Technologies, Inc. | Composite carbon materials comprising lithium alloying electrochemical modifiers |
US10195583B2 (en) | 2013-11-05 | 2019-02-05 | Group 14 Technologies, Inc. | Carbon-based compositions with highly efficient volumetric gas sorption |
EP2899299A1 (en) | 2014-01-24 | 2015-07-29 | COVENTYA S.p.A. | Electroplating bath containing trivalent chromium and process for depositing chromium |
JP6665121B2 (ja) | 2014-03-14 | 2020-03-13 | グループ14・テクノロジーズ・インコーポレイテッドGroup14 Technologies, Inc. | 無溶媒中におけるゾル−ゲル重合のための新規方法、及びゾル−ゲル重合由来の可変炭素構造の作製 |
TWI551435B (zh) | 2014-05-05 | 2016-10-01 | 國立臺灣大學 | 鋼材及其製造方法 |
DE102014116717A1 (de) * | 2014-11-14 | 2016-05-19 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Elektrolyt und Verfahren zur Herstellung von Chromschichten |
US10087540B2 (en) | 2015-02-17 | 2018-10-02 | Honeywell International Inc. | Surface modifiers for ionic liquid aluminum electroplating solutions, processes for electroplating aluminum therefrom, and methods for producing an aluminum coating using the same |
CN104789996A (zh) * | 2015-04-15 | 2015-07-22 | 吉林莱德化学科技有限公司 | 三价铬镀铬电镀液 |
WO2017031006A1 (en) | 2015-08-14 | 2017-02-23 | Energ2 Technologies, Inc. | Composites of porous nano-featured silicon materials and carbon materials |
JP7115976B2 (ja) | 2015-08-28 | 2022-08-09 | グループ14・テクノロジーズ・インコーポレイテッド | リチウムの非常に耐久性のある挿入を有する新規な材料およびその製造方法 |
FR3043939B1 (fr) * | 2015-11-19 | 2019-12-20 | Safran | Piece de moteur d'aeronef comportant un revetement de protection contre l'erosion et procede de fabrication d'une telle piece |
TWI612184B (zh) * | 2016-10-18 | 2018-01-21 | 德創奈米科技股份有限公司 | 披覆複合金屬碳化物陶瓷電鍍層之織紗導向元件及其製作方法 |
JP7376360B2 (ja) | 2017-03-09 | 2023-11-08 | グループ14・テクノロジーズ・インコーポレイテッド | 多孔質足場材料の上のケイ素含有前駆体の分解 |
PL3502320T3 (pl) * | 2017-12-22 | 2021-03-08 | Atotech Deutschland Gmbh | Sposób zwiększania odporności na korozję podłoża zawierającego najbardziej zewnętrzną warstwę ze stopu chromu |
DE102018133532A1 (de) * | 2018-12-21 | 2020-06-25 | Maschinenfabrik Kaspar Walter Gmbh & Co Kg | Elektrolyt und Verfahren zur Herstellung von Chromschichten |
US11807929B2 (en) | 2019-03-14 | 2023-11-07 | Unison Industries, Llc | Thermally stabilized nickel-cobalt materials and methods of thermally stabilizing the same |
JP2020158872A (ja) * | 2019-03-28 | 2020-10-01 | 株式会社豊田中央研究所 | 摺動システム |
FI129420B (en) * | 2020-04-23 | 2022-02-15 | Savroc Ltd | AQUATIC ELECTRIC COATING BATH |
US11639292B2 (en) | 2020-08-18 | 2023-05-02 | Group14 Technologies, Inc. | Particulate composite materials |
US11335903B2 (en) | 2020-08-18 | 2022-05-17 | Group14 Technologies, Inc. | Highly efficient manufacturing of silicon-carbon composites materials comprising ultra low z |
US11174167B1 (en) | 2020-08-18 | 2021-11-16 | Group14 Technologies, Inc. | Silicon carbon composites comprising ultra low Z |
JP7409998B2 (ja) | 2020-08-27 | 2024-01-09 | 日立Astemo株式会社 | 緩衝器および緩衝器の製造方法 |
CN113403650A (zh) * | 2021-06-21 | 2021-09-17 | 集美大学 | 一种利用离散晶核提高脱模剂涂覆均匀性的方法 |
CN113388868A (zh) * | 2021-06-21 | 2021-09-14 | 集美大学 | 一种利用离散铬晶核制备自剥离超薄铜箔的方法 |
JP2023018744A (ja) * | 2021-07-28 | 2023-02-09 | 株式会社Jcu | 白色3価クロムめっき浴およびこれを利用した被めっき物への白色3価クロムめっき方法 |
CN113774438A (zh) * | 2021-08-24 | 2021-12-10 | 上原汽车铭牌(惠州)有限公司 | 汽车标识生产用三价铬电镀液配方及三价铬电镀工艺 |
CN117568878B (zh) * | 2024-01-15 | 2024-05-03 | 甘肃海亮新能源材料有限公司 | 钛阳极和电解铜箔的生产设备 |
Family Cites Families (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US900597A (en) | 1908-01-16 | 1908-10-06 | Franz Salzer | Process for producing an electrolytic deposit of metallic chromium. |
US1496845A (en) | 1923-04-13 | 1924-06-10 | Metal & Thermit Corp | Process of producing pure chromium by electrolysis |
US2470378A (en) | 1944-06-07 | 1949-05-17 | M M Warner | Production of chromium ammonium chloride complexes |
US2927066A (en) | 1955-12-30 | 1960-03-01 | Glenn R Schaer | Chromium alloy plating |
US2962428A (en) | 1959-01-15 | 1960-11-29 | Metal & Thermit Corp | Process for chromium plating |
DE1098066B (de) | 1959-01-31 | 1961-01-26 | Merten Geb | Elektrische Steckvorrichtung |
FR1563847A (pt) | 1968-01-30 | 1969-04-18 | ||
GB1378883A (en) | 1971-02-23 | 1974-12-27 | Albright & Wilson | Electroplating |
GB1368749A (en) | 1971-09-30 | 1974-10-02 | British Non Ferrous Metals Res | Electrodeposition of chromium |
US4054494A (en) | 1973-12-13 | 1977-10-18 | Albright & Wilson Ltd. | Compositions for use in chromium plating |
GB1455580A (en) | 1973-12-13 | 1976-11-17 | Albright & Wilson | Electrodeposition of chromium |
US4062737A (en) | 1974-12-11 | 1977-12-13 | International Business Machines Corporation | Electrodeposition of chromium |
GB1558169A (en) | 1975-07-03 | 1979-12-19 | Albright & Wilson | Chromium electroplating |
US4161432A (en) | 1975-12-03 | 1979-07-17 | International Business Machines Corporation | Electroplating chromium and its alloys |
US4093521A (en) | 1975-12-18 | 1978-06-06 | Stanley Renton | Chromium electroplating |
DE2606852C2 (de) | 1976-02-20 | 1977-09-15 | Bauer, Wilhelm, Bauer, Hans, Dipl Chem, 3000 Hannover | Bad zur galvanischen Direktverchromung von Kalanderwalzen |
NO145235C (no) | 1976-08-06 | 1982-02-10 | Montedison Spa | Oxafluoralkansyrer eller sulfonsyrederivater for anvendelse som reaktanter ved dannelse av ionebytterharpikser |
JPS53108041A (en) | 1977-02-28 | 1978-09-20 | Toyo Soda Mfg Co Ltd | Chromium electroplating bath |
JPS53106348A (en) * | 1977-02-28 | 1978-09-16 | Toyo Soda Mfg Co Ltd | Electrolytic bath for chromium plating |
GB1552263A (en) | 1977-03-04 | 1979-09-12 | Bnf Metals Tech Centre | Trivalent chromium plating baths |
US4167460A (en) | 1978-04-03 | 1979-09-11 | Oxy Metal Industries Corporation | Trivalent chromium plating bath composition and process |
GB2051861B (en) | 1979-06-29 | 1983-03-09 | Ibm | Deposition of thick chromium films from trivalent chromium plating solutions |
US4477318A (en) | 1980-11-10 | 1984-10-16 | Omi International Corporation | Trivalent chromium electrolyte and process employing metal ion reducing agents |
US4392922A (en) * | 1980-11-10 | 1983-07-12 | Occidental Chemical Corporation | Trivalent chromium electrolyte and process employing vanadium reducing agent |
GB2093861B (en) * | 1981-02-09 | 1984-08-22 | Canning Materials W Ltd | Bath for electrodeposition of chromium |
EP0073221B1 (en) | 1981-03-09 | 1986-01-29 | Battelle Development Corporation | High-rate chromium alloy plating |
GB2109817B (en) | 1981-11-18 | 1985-07-03 | Ibm | Electrodeposition of chromium |
GB2110242B (en) | 1981-11-18 | 1985-06-12 | Ibm | Electroplating chromium |
GB2109815B (en) | 1981-11-18 | 1985-09-04 | Ibm | Electrodepositing chromium |
GB2109816B (en) | 1981-11-18 | 1985-01-23 | Ibm | Electrodeposition of chromium |
EP0085771B1 (en) | 1982-02-09 | 1988-04-20 | International Business Machines Corporation | Electrodeposition of chromium and its alloys |
US4543167A (en) | 1982-03-05 | 1985-09-24 | M&T Chemicals Inc. | Control of anode gas evolution in trivalent chromium plating bath |
FR2529581A1 (fr) | 1982-06-30 | 1984-01-06 | Armines | Bain d'electrolyse a base de chrome trivalent |
US4450052A (en) | 1982-07-28 | 1984-05-22 | M&T Chemicals Inc. | Zinc and nickel tolerant trivalent chromium plating baths |
US4432843A (en) | 1982-07-29 | 1984-02-21 | Omi International Corporation | Trivalent chromium electroplating baths and processes using thiazole addition agents |
CA1244376A (en) | 1983-05-12 | 1988-11-08 | Thaddeus W. Tomaszewski | Trivalent chromium electrolyte and process |
US4461680A (en) | 1983-12-30 | 1984-07-24 | The United States Of America As Represented By The Secretary Of Commerce | Process and bath for electroplating nickel-chromium alloys |
GB8409073D0 (en) | 1984-04-07 | 1984-05-16 | Inter Metals & Minerals Sa | Electrodeposition of chromium &c |
JPS6156294A (ja) | 1984-08-27 | 1986-03-20 | Nippon Kokan Kk <Nkk> | クロム合金メツキ浴 |
GB2171114A (en) | 1985-02-06 | 1986-08-20 | Canning W Materials Ltd | Trivalent chromium electroplating baths and rejuvenation thereof |
US4690735A (en) | 1986-02-04 | 1987-09-01 | University Of Florida | Electrolytic bath compositions and method for electrodeposition of amorphous chromium |
US4804446A (en) | 1986-09-19 | 1989-02-14 | The United States Of America As Represented By The Secretary Of Commerce | Electrodeposition of chromium from a trivalent electrolyte |
EP0285931B1 (en) | 1987-03-31 | 1993-08-04 | Nippon Steel Corporation | Corrosion resistant plated steel strip and method for producing same |
US4960735A (en) | 1988-11-03 | 1990-10-02 | Kennametal Inc. | Alumina-zirconia-silicon carbide-magnesia ceramics |
US5770090A (en) | 1989-07-28 | 1998-06-23 | Lewis, Iii; Tom | Method for recovery of heavy metal from waste water |
JPH03255270A (ja) | 1990-03-06 | 1991-11-14 | Teikoku Piston Ring Co Ltd | ピストンリング |
JPH03255271A (ja) * | 1990-03-06 | 1991-11-14 | Teikoku Piston Ring Co Ltd | ピストンリング |
US5269905A (en) | 1990-04-30 | 1993-12-14 | Elf Atochem North America, Inc. | Apparatus and process to regenerate a trivalent chromium bath |
US5196109A (en) | 1991-08-01 | 1993-03-23 | Geoffrey Scott | Trivalent chromium electrolytes and plating processes employing same |
US5294326A (en) | 1991-12-30 | 1994-03-15 | Elf Atochem North America, Inc. | Functional plating from solutions containing trivalent chromium ion |
JPH05292300A (ja) | 1992-04-16 | 1993-11-05 | Canon Inc | 画像形成装置 |
US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
US5433797A (en) | 1992-11-30 | 1995-07-18 | Queen's University | Nanocrystalline metals |
US5338433A (en) | 1993-06-17 | 1994-08-16 | Mcdonnell Douglas Corporation | Chromium alloy electrodeposition and surface fixation of calcium phosphate ceramics |
US5415763A (en) | 1993-08-18 | 1995-05-16 | The United States Of America As Represented By The Secretary Of Commerce | Methods and electrolyte compositions for electrodepositing chromium coatings |
FR2726289B1 (fr) | 1994-10-28 | 1997-03-28 | Floquet Monopole | Procede d'electrodeposition d'un revetement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procede |
US5578167A (en) | 1996-01-31 | 1996-11-26 | Motorola, Inc. | Substrate holder and method of use |
US20010054557A1 (en) * | 1997-06-09 | 2001-12-27 | E. Jennings Taylor | Electroplating of metals using pulsed reverse current for control of hydrogen evolution |
JP3918142B2 (ja) | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | クロムめっき部品、クロムめっき方法およびクロムめっき部品の製造方法 |
US6736954B2 (en) | 2001-10-02 | 2004-05-18 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US6652731B2 (en) | 2001-10-02 | 2003-11-25 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US6773573B2 (en) | 2001-10-02 | 2004-08-10 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
US6911068B2 (en) | 2001-10-02 | 2005-06-28 | Shipley Company, L.L.C. | Plating bath and method for depositing a metal layer on a substrate |
JP3332374B1 (ja) | 2001-11-30 | 2002-10-07 | ディップソール株式会社 | 亜鉛及び亜鉛合金めっき上に六価クロムフリー防錆皮膜を形成するための処理溶液、六価クロムフリー防錆皮膜及びその形成方法。 |
JP3332373B1 (ja) | 2001-11-30 | 2002-10-07 | ディップソール株式会社 | 亜鉛及び亜鉛合金めっき上に六価クロムフリー防錆皮膜を形成するための処理溶液、六価クロムフリー防錆皮膜及びその形成方法。 |
US6979392B2 (en) * | 2002-01-18 | 2005-12-27 | Japan Science And Technology Agency | Method for forming Re—Cr alloy film or Re-based film through electroplating process |
US7052592B2 (en) | 2004-06-24 | 2006-05-30 | Gueguine Yedigarian | Chromium plating method |
WO2007115030A1 (en) * | 2006-03-31 | 2007-10-11 | Atotech Deutschland Gmbh | Crystalline chromium deposit |
WO2008057123A1 (en) | 2006-11-09 | 2008-05-15 | Massachusetts Institute Of Technology | Preparation and properties of cr-c-p hard coatings annealed at high temperature for high temperature applications |
US20080169199A1 (en) * | 2007-01-17 | 2008-07-17 | Chang Gung University | Trivalent chromium electroplating solution and an electroplating process with the solution |
-
2008
- 2008-10-02 MX MX2010003543A patent/MX2010003543A/es active IP Right Grant
- 2008-10-02 CN CN2008801102128A patent/CN101849041B/zh active Active
- 2008-10-02 EP EP08835384.2A patent/EP2217745B1/en active Active
- 2008-10-02 ES ES08835384.2T patent/ES2491517T3/es active Active
- 2008-10-02 PL PL08835384T patent/PL2217745T3/pl unknown
- 2008-10-02 US US12/244,327 patent/US8187448B2/en active Active
- 2008-10-02 BR BRPI0817924-7A patent/BRPI0817924B1/pt active IP Right Grant
- 2008-10-02 WO PCT/US2008/078561 patent/WO2009046181A1/en active Application Filing
- 2008-10-02 CA CA2700147A patent/CA2700147C/en active Active
- 2008-10-02 JP JP2010528121A patent/JP5570423B2/ja active Active
- 2008-10-02 KR KR1020107007356A patent/KR101557481B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20100075888A (ko) | 2010-07-05 |
BRPI0817924B1 (pt) | 2019-02-12 |
US20090114544A1 (en) | 2009-05-07 |
JP5570423B2 (ja) | 2014-08-13 |
KR101557481B1 (ko) | 2015-10-02 |
JP2010540781A (ja) | 2010-12-24 |
EP2217745A1 (en) | 2010-08-18 |
EP2217745B1 (en) | 2014-06-11 |
BRPI0817924A2 (pt) | 2015-04-07 |
CN101849041B (zh) | 2013-01-23 |
US8187448B2 (en) | 2012-05-29 |
CN101849041A (zh) | 2010-09-29 |
MX2010003543A (es) | 2010-05-17 |
PL2217745T3 (pl) | 2014-11-28 |
CA2700147A1 (en) | 2009-04-09 |
ES2491517T3 (es) | 2014-09-08 |
WO2009046181A1 (en) | 2009-04-09 |
CA2700147C (en) | 2015-12-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
BRPI0817924A8 (pt) | depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalino nanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substrato | |
Protsenko et al. | Electrodeposition of hard nanocrystalline chrome from aqueous sulfate trivalent chromium bath | |
Vamsi et al. | Influence of heat treatment on microstructure and mechanical properties of pulse electrodeposited Ni-W alloy coatings | |
CN103221584B (zh) | 表面处理铜箔 | |
Hu et al. | Deposition process and properties of electroless Ni-P-Al 2 O 3 composite coatings on magnesium alloy | |
TW201035388A (en) | Chromium alloy coating with enhanced resistance to corrosion in calcium chloride environments | |
Jin et al. | Thermal stability of titania films prepared on titanium by micro-arc oxidation | |
BR112015030771B1 (pt) | Produto estampado a quente, e método para produção de produto estampado a quente | |
Huang et al. | Wear properties of Ni–Mo coatings produced by pulse electroforming | |
BR112015011465A2 (pt) | revestimentos de óxido de cromo-cromo aplicados a substratos de aço para aplicações de embalagem e um método para produzir os ditos revestimentos | |
BR9915256A (pt) | Material composto estratificado para elementos de deslizamento e processo para sua preparação | |
BRPI0512577A (pt) | método de cromagem | |
Sheikholeslam et al. | Characterization of nanocrystalline and amorphous cobalt–phosphorous electrodeposits | |
BRPI0514210A2 (pt) | mÉtodo de eletrodeposiÇço com uma liga de estanho-zinco | |
Rekha et al. | Electrochemical behaviour of SnZn-graphene oxide composite coatings | |
Bera et al. | XRD, FESEM and XPS studies on heat treated Co–W electrodeposits | |
Ma et al. | Effects of additives on microstructure and properties of electrodeposited nanocrystalline Ni–Co alloy coatings of high cobalt content | |
Portela et al. | Two-stages electrodeposition for the synthesis of anticorrosive Ni–W-Co coating from a deactivated nickel bath | |
Dilek et al. | Pulse electro co-deposition of submicron-sized TiC reinforced Ni–W coatings: Tribological and corrosion properties | |
Kosta et al. | Nanocrystalline CoP coatings prepared by different electrodeposition techniques | |
Jiang et al. | Corrosion behavior of pulse-plated Zn–Ni alloy coatings on AZ91 magnesium alloy in alkaline solutions | |
Eidivandi et al. | The effect of surface mechanical attrition treatment (SMAT) time on the crystal structure and electrochemical behavior of phosphate coatings | |
BR112018072363A2 (pt) | revestimento de peças funcionais de metal | |
Chouchane et al. | Microstructural analysis of low Ni content Zn alloy electrodeposited under applied magnetic field | |
Kale et al. | Influence of nickel strike as adhesive layer on electrodeposited Zn-Co-Ni alloy and their performance in metal-finishing |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06T | Formal requirements before examination [chapter 6.20 patent gazette] |
Free format text: O DEPOSITANTE DEVE RESPONDER A EXIGENCIA FORMULADA NESTE PARECER EM ATE 60 (SESSENTA) DIAS, A PARTIR DA DATA DE PUBLICACAO NA RPI, SOB PENA DO ARQUIVAMENTO DO PEDIDO, DE ACORDO COM O ARTIGO 34, INCISO II, DA LPI, POR MEIO DO SERVICO DE CODIGO 206.PUBLIQUE-SE A EXIGENCIA (6.20). |
|
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 12/02/2019, OBSERVADAS AS CONDICOES LEGAIS. (CO) 10 (DEZ) ANOS CONTADOS A PARTIR DE 12/02/2019, OBSERVADAS AS CONDICOES LEGAIS |