BR9501830A - Mistura sensivel á radiação que trabalha positibamente e material de desenho com um veiculo e uma camada sensivel á radiação - Google Patents

Mistura sensivel á radiação que trabalha positibamente e material de desenho com um veiculo e uma camada sensivel á radiação

Info

Publication number
BR9501830A
BR9501830A BR9501830A BR9501830A BR9501830A BR 9501830 A BR9501830 A BR 9501830A BR 9501830 A BR9501830 A BR 9501830A BR 9501830 A BR9501830 A BR 9501830A BR 9501830 A BR9501830 A BR 9501830A
Authority
BR
Brazil
Prior art keywords
radiation
sensitive
vehicle
substd
opt
Prior art date
Application number
BR9501830A
Other languages
English (en)
Inventor
Mathias Eichhorn
Gerhard Buhr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR9501830A publication Critical patent/BR9501830A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Paints Or Removers (AREA)
BR9501830A 1994-04-28 1995-04-27 Mistura sensivel á radiação que trabalha positibamente e material de desenho com um veiculo e uma camada sensivel á radiação BR9501830A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4414896A DE4414896A1 (de) 1994-04-28 1994-04-28 Positiv arbeitendes strahlungempfindliches Gemisch

Publications (1)

Publication Number Publication Date
BR9501830A true BR9501830A (pt) 1996-03-05

Family

ID=6516711

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9501830A BR9501830A (pt) 1994-04-28 1995-04-27 Mistura sensivel á radiação que trabalha positibamente e material de desenho com um veiculo e uma camada sensivel á radiação

Country Status (7)

Country Link
US (2) US5654121A (pt)
EP (1) EP0683435B1 (pt)
JP (1) JPH0844064A (pt)
KR (1) KR950033679A (pt)
AT (1) ATE154144T1 (pt)
BR (1) BR9501830A (pt)
DE (2) DE4414896A1 (pt)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5645977A (en) * 1995-09-22 1997-07-08 Industrial Technology Research Institute Method of making molds for manufacturing multiple-lead microstructures
TW477913B (en) * 1995-11-02 2002-03-01 Shinetsu Chemical Co Sulfonium salts and chemically amplified positive resist compositions
US6214517B1 (en) * 1997-02-17 2001-04-10 Fuji Photo Film Co., Ltd. Positive photoresist composition
DE19729067A1 (de) * 1997-07-08 1999-01-14 Agfa Gevaert Ag Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
JP3731328B2 (ja) * 1997-12-03 2006-01-05 Ｊｓｒ株式会社 感放射線性樹脂組成物
DE69918754T2 (de) * 1998-08-24 2005-07-21 Fuji Photo Film Co., Ltd., Minami-Ashigara Bildaufzeichnungsmaterial und Flachdruckplatte, die dieses verwendet
DE10008841A1 (de) * 2000-02-25 2001-09-06 Beiersdorf Ag Thermisch vernetzte Acrylat-Hotmelts
US6812564B1 (en) * 2000-09-05 2004-11-02 Hewlett-Packard Development Company, L.P. Monolithic common carrier
KR20030020044A (ko) * 2001-08-29 2003-03-08 삼성전기주식회사 이동 촬영수단의 손잡이부
TWI317365B (en) * 2002-07-31 2009-11-21 Jsr Corp Acenaphthylene derivative, polymer, and antireflection film-forming composition
JP2006251464A (ja) * 2005-03-11 2006-09-21 Tokyo Ohka Kogyo Co Ltd レンズ形成用感光性樹脂組成物
US7834209B2 (en) * 2005-06-07 2010-11-16 E.I. Du Pont De Nemours And Company Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
US11482408B2 (en) 2020-06-23 2022-10-25 Disco Corporation Method of processing wafer

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779778A (en) * 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
CH621416A5 (pt) * 1975-03-27 1981-01-30 Hoechst Ag
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
DE2829511A1 (de) * 1978-07-05 1980-01-24 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2829512A1 (de) * 1978-07-05 1980-01-17 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4912018A (en) * 1986-02-24 1990-03-27 Hoechst Celanese Corporation High resolution photoresist based on imide containing polymers
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
EP0264908B1 (en) * 1986-10-23 1996-03-20 International Business Machines Corporation High sensitivity resists having autodecomposition temperatures greater than about 160 C
DE68926019T2 (de) * 1988-10-28 1996-10-02 Ibm Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
DE3902115A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche polymere
DE69125634T2 (de) * 1990-01-30 1998-01-02 Wako Pure Chem Ind Ltd Chemisch verstärktes Photolack-Material
DE4124029A1 (de) * 1991-07-19 1993-01-21 Hoechst Ag Verfahren zur herstellung von tert.-butyloxycarbonyl-gruppen tragenden organischen verbindungen
KR0159808B1 (ko) * 1993-01-19 1999-02-18 가나가와 지히로 레지스트 조성물
US5558971A (en) * 1994-09-02 1996-09-24 Wako Pure Chemical Industries, Ltd. Resist material

Also Published As

Publication number Publication date
JPH0844064A (ja) 1996-02-16
US5879852A (en) 1999-03-09
EP0683435A1 (de) 1995-11-22
KR950033679A (ko) 1995-12-26
ATE154144T1 (de) 1997-06-15
DE4414896A1 (de) 1995-11-02
US5654121A (en) 1997-08-05
EP0683435B1 (de) 1997-06-04
DE59500283D1 (de) 1997-07-10

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Legal Events

Date Code Title Description
PC Transfer

Free format text: AGFA-GEVAERT AG (DE)

FB36 Technical and formal requirements: requirement - article 36 of industrial property law
FA8 Dismissal: dismissal - article 36, par. 1 of industrial property law