BR112015027295A2 - método de fabricação de um filme cristalino de grafeno parcialmente independente e dispositivo - Google Patents

método de fabricação de um filme cristalino de grafeno parcialmente independente e dispositivo

Info

Publication number
BR112015027295A2
BR112015027295A2 BR112015027295A BR112015027295A BR112015027295A2 BR 112015027295 A2 BR112015027295 A2 BR 112015027295A2 BR 112015027295 A BR112015027295 A BR 112015027295A BR 112015027295 A BR112015027295 A BR 112015027295A BR 112015027295 A2 BR112015027295 A2 BR 112015027295A2
Authority
BR
Brazil
Prior art keywords
manufacturing
crystalline graphene
graphene film
partially independent
cavity
Prior art date
Application number
BR112015027295A
Other languages
English (en)
Inventor
Hendrik Klootwijk Johan
Asadi Kamal
Original Assignee
Koninklijke Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Nv filed Critical Koninklijke Philips Nv
Publication of BR112015027295A2 publication Critical patent/BR112015027295A2/pt

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • B01D71/0211—Graphene or derivates thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/12—Composite membranes; Ultra-thin membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0044—Inorganic membrane manufacture by chemical reaction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0051—Inorganic membrane manufacture by controlled crystallisation, e,.g. hydrothermal growth
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0053—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes
    • B01D67/006—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods
    • B01D67/0062—Inorganic membrane manufacture by inducing porosity into non porous precursor membranes by elimination of segments of the precursor, e.g. nucleation-track membranes, lithography or laser methods by micromachining techniques, e.g. using masking and etching steps, photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0067—Inorganic membrane manufacture by carbonisation or pyrolysis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/021—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0213—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0215—Silicon carbide; Silicon nitride; Silicon oxycarbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/028—Molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/00468—Releasing structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Catalysts (AREA)

Abstract

resumo método de fabricação de um filme cristalino de grafeno parcialmente independente e dispositivo trata-se de um método de fabricação de um filme cristalino de grafeno parcialmente independente (16, 16’), sendo que o método compreende fornecer um substrato (10) que suporta uma camada de catalisador (14) para formar a camada cristalina de grafeno sobre uma primeira superfície; formar o filme cristalino de grafeno sobre a camada de catalisador; cobrir ao menos o filme cristalino de grafeno com uma camada protetora (18); atacar quimicamente uma cavidade (24) em uma segunda superfície do substrato, sendo que a segunda superfície é oposta à primeira superfície, e que a dita cavidade termina na camada de catalisador; atacar quimicamente a parte exposta da camada de catalisador a partir da cavidade; e remover a camada protetora, obtendo, assim, um filme cristalino de grafeno que é independente em relação à dita cavidade. também é descrito um dispositivo fabricado dessa forma. 1/1
BR112015027295A 2013-05-01 2014-04-21 método de fabricação de um filme cristalino de grafeno parcialmente independente e dispositivo BR112015027295A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP13166096 2013-05-01
PCT/EP2014/058034 WO2014177408A1 (en) 2013-05-01 2014-04-21 Method of manufacturing a partially freestanding two-dimensional crystal film and device comprising such a film

Publications (1)

Publication Number Publication Date
BR112015027295A2 true BR112015027295A2 (pt) 2017-07-25

Family

ID=48227019

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015027295A BR112015027295A2 (pt) 2013-05-01 2014-04-21 método de fabricação de um filme cristalino de grafeno parcialmente independente e dispositivo

Country Status (10)

Country Link
US (1) US11033862B2 (pt)
EP (1) EP2991754B1 (pt)
JP (1) JP6441901B2 (pt)
KR (1) KR102268992B1 (pt)
CN (1) CN105188894B (pt)
BR (1) BR112015027295A2 (pt)
RU (1) RU2015151341A (pt)
SG (1) SG11201510807VA (pt)
TW (1) TWI655327B (pt)
WO (1) WO2014177408A1 (pt)

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US9157159B2 (en) * 2013-11-17 2015-10-13 Don Lee Hansen System and method for generating hydrogen and oxygen gases
CN106999863B (zh) * 2014-12-04 2020-06-16 国立大学法人信州大学 过滤器成型体的制造方法
US11164809B2 (en) * 2018-12-17 2021-11-02 Intel Corporation Integrated circuits and methods for forming integrated circuits
US11289582B2 (en) * 2019-05-23 2022-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Single-crystal hexagonal boron nitride layer and method forming same
WO2023102606A1 (en) * 2021-12-07 2023-06-15 Australian National University Method of fabricating membranes

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JPS61159654A (ja) * 1985-01-07 1986-07-19 Canon Inc リソグラフイ−法及びリソグラフイ−用マスク保持体
JPS61198722A (ja) * 1985-02-28 1986-09-03 Nec Corp Ｘ線露光マスク及びその製造方法
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Also Published As

Publication number Publication date
TW201504489A (zh) 2015-02-01
US11033862B2 (en) 2021-06-15
EP2991754A1 (en) 2016-03-09
WO2014177408A1 (en) 2014-11-06
KR20160003213A (ko) 2016-01-08
EP2991754B1 (en) 2019-10-16
JP2016525995A (ja) 2016-09-01
TWI655327B (zh) 2019-04-01
CN105188894B (zh) 2018-02-13
CN105188894A (zh) 2015-12-23
JP6441901B2 (ja) 2018-12-19
RU2015151341A (ru) 2017-06-02
SG11201510807VA (en) 2016-02-26
US20160136583A1 (en) 2016-05-19
KR102268992B1 (ko) 2021-06-28

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]
B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]
B350 Update of information on the portal [chapter 15.35 patent gazette]