BR112013008586A2 - produção de silicone policristalino nos processos e sistemas de circuito substancialmente fechados - Google Patents
produção de silicone policristalino nos processos e sistemas de circuito substancialmente fechadosInfo
- Publication number
- BR112013008586A2 BR112013008586A2 BR112013008586A BR112013008586A BR112013008586A2 BR 112013008586 A2 BR112013008586 A2 BR 112013008586A2 BR 112013008586 A BR112013008586 A BR 112013008586A BR 112013008586 A BR112013008586 A BR 112013008586A BR 112013008586 A2 BR112013008586 A2 BR 112013008586A2
- Authority
- BR
- Brazil
- Prior art keywords
- substantially closed
- systems
- closed circuit
- polycrystalline silicon
- circuit processes
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title 1
- 229920001296 polysiloxane Polymers 0.000 abstract 3
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical group Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 abstract 1
- 239000005052 trichlorosilane Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
- C01B33/039—Purification by conversion of the silicon into a compound, optional purification of the compound, and reconversion into silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/910,553 US8449848B2 (en) | 2010-10-22 | 2010-10-22 | Production of polycrystalline silicon in substantially closed-loop systems |
| US12/910,540 US20120100061A1 (en) | 2010-10-22 | 2010-10-22 | Production of Polycrystalline Silicon in Substantially Closed-loop Processes |
| PCT/US2011/052691 WO2012054170A1 (en) | 2010-10-22 | 2011-09-22 | Production of polycrystalline silicon in substantially closed-loop processes and systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR112013008586A2 true BR112013008586A2 (pt) | 2017-07-25 |
Family
ID=45975555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112013008586A BR112013008586A2 (pt) | 2010-10-22 | 2011-09-22 | produção de silicone policristalino nos processos e sistemas de circuito substancialmente fechados |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP2630081B1 (https=) |
| JP (1) | JP5946835B2 (https=) |
| KR (1) | KR101948332B1 (https=) |
| CN (2) | CN103153855A (https=) |
| BR (1) | BR112013008586A2 (https=) |
| TW (2) | TW201329280A (https=) |
| WO (1) | WO2012054170A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015111886A1 (ko) * | 2014-01-24 | 2015-07-30 | 한화케미칼 주식회사 | 폐가스의 정제방법 및 정제장치 |
| KR101515117B1 (ko) * | 2014-01-24 | 2015-04-24 | 한화케미칼 주식회사 | 폐가스의 정제방법 및 정제장치 |
| KR101452354B1 (ko) * | 2014-01-24 | 2014-10-22 | 한화케미칼 주식회사 | 폐가스의 정제방법 및 정제장치 |
| CN104003402B (zh) * | 2014-05-30 | 2016-08-24 | 中国恩菲工程技术有限公司 | 三氯氢硅的提纯方法 |
| KR102009929B1 (ko) * | 2015-09-15 | 2019-08-12 | 주식회사 엘지화학 | 트리클로로실란 제조방법 |
| EP3447028A4 (en) * | 2016-04-21 | 2019-11-06 | Tokuyama Corporation | METHOD FOR PRODUCING METAL POWDER |
| DE102017125232A1 (de) * | 2017-10-27 | 2019-05-02 | Nexwafe Gmbh | Verfahren und Vorrichtung zur kontinuierlichen Gasphasenabscheidung von Silizium auf Substraten |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4092446A (en) * | 1974-07-31 | 1978-05-30 | Texas Instruments Incorporated | Process of refining impure silicon to produce purified electronic grade silicon |
| GB2028289B (en) * | 1978-08-18 | 1982-09-02 | Schumacher Co J C | Producing silicon |
| US4676967A (en) | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| DE3024319C2 (de) * | 1980-06-27 | 1983-07-21 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Kontinuierliches Verfahren zur Herstellung von Trichlorsilan |
| US4526769A (en) | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
| US5871705A (en) | 1996-09-19 | 1999-02-16 | Tokuyama Corporation | Process for producing trichlorosilane |
| JPH1149508A (ja) * | 1997-06-03 | 1999-02-23 | Tokuyama Corp | 多結晶シリコンの廃棄物の少ない製造方法 |
| US6277194B1 (en) * | 1999-10-21 | 2001-08-21 | Applied Materials, Inc. | Method for in-situ cleaning of surfaces in a substrate processing chamber |
| NO20033207D0 (no) * | 2002-07-31 | 2003-07-15 | Per Kristian Egeberg | Fremgangsmåte og reaktor for fremstilling av höyrent silisium, samt anvendelse av fremgangsmåten og reaktoren ved fremstilling av höyrentsilisium fra uraffinert silisium |
| CN101460398B (zh) * | 2006-04-13 | 2012-08-29 | 卡伯特公司 | 通过闭合环路方法生产硅 |
| US7935327B2 (en) * | 2006-08-30 | 2011-05-03 | Hemlock Semiconductor Corporation | Silicon production with a fluidized bed reactor integrated into a siemens-type process |
| JP5435188B2 (ja) * | 2006-11-14 | 2014-03-05 | 三菱マテリアル株式会社 | 多結晶シリコンの製造方法および多結晶シリコン製造設備 |
| CN101497442B (zh) * | 2008-01-31 | 2012-07-04 | 桑中生 | 一种多晶硅的制备方法 |
| WO2010002815A2 (en) * | 2008-06-30 | 2010-01-07 | Memc Electronic Materials, Inc. | Fluidized bed reactor systems and methods for reducing the deposition of silicon on reactor walls |
| US8187361B2 (en) * | 2009-07-02 | 2012-05-29 | America Air Liquide, Inc. | Effluent gas recovery system in polysilicon and silane plants |
| CN102030329B (zh) * | 2009-09-29 | 2012-10-03 | 重庆大全新能源有限公司 | 一种多晶硅生产装置及工艺 |
| DE102010000981A1 (de) * | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
| CN102180467B (zh) * | 2010-12-24 | 2012-12-26 | 江苏中能硅业科技发展有限公司 | Gcl法多晶硅生产方法 |
-
2011
- 2011-09-22 BR BR112013008586A patent/BR112013008586A2/pt not_active IP Right Cessation
- 2011-09-22 EP EP11761811.6A patent/EP2630081B1/en active Active
- 2011-09-22 CN CN201180049322XA patent/CN103153855A/zh active Pending
- 2011-09-22 JP JP2013534917A patent/JP5946835B2/ja active Active
- 2011-09-22 KR KR1020137010094A patent/KR101948332B1/ko active Active
- 2011-09-22 CN CN201710761183.2A patent/CN107555438A/zh active Pending
- 2011-09-22 WO PCT/US2011/052691 patent/WO2012054170A1/en not_active Ceased
- 2011-10-04 TW TW102107553A patent/TW201329280A/zh unknown
- 2011-10-04 TW TW100135943A patent/TWI403610B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| TWI403610B (zh) | 2013-08-01 |
| EP2630081B1 (en) | 2016-04-20 |
| JP5946835B2 (ja) | 2016-07-06 |
| WO2012054170A1 (en) | 2012-04-26 |
| KR101948332B1 (ko) | 2019-02-14 |
| TW201221685A (en) | 2012-06-01 |
| CN107555438A (zh) | 2018-01-09 |
| KR20130138357A (ko) | 2013-12-18 |
| EP2630081A1 (en) | 2013-08-28 |
| TW201329280A (zh) | 2013-07-16 |
| JP2013540095A (ja) | 2013-10-31 |
| CN103153855A (zh) | 2013-06-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
| B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] | ||
| B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2480 DE 17-07-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |
|
| B350 | Update of information on the portal [chapter 15.35 patent gazette] |