BR112012013341A2 - processo de estruturação de superfície por abrasão iônica, superfície estruturada e utilizações - Google Patents

processo de estruturação de superfície por abrasão iônica, superfície estruturada e utilizações

Info

Publication number
BR112012013341A2
BR112012013341A2 BR112012013341A BR112012013341A BR112012013341A2 BR 112012013341 A2 BR112012013341 A2 BR 112012013341A2 BR 112012013341 A BR112012013341 A BR 112012013341A BR 112012013341 A BR112012013341 A BR 112012013341A BR 112012013341 A2 BR112012013341 A2 BR 112012013341A2
Authority
BR
Brazil
Prior art keywords
abrasion
notably
oxide
species
structuring
Prior art date
Application number
BR112012013341A
Other languages
English (en)
Inventor
Alban Letailleur
Constance Magne
Elin Sondergard
Etienne Barthel
Sébastien Le Roy
Original Assignee
Saint Gobain
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain filed Critical Saint Gobain
Publication of BR112012013341A2 publication Critical patent/BR112012013341A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C03C14/004—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix the non-glass component being in the form of particles or flakes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C14/00—Glass compositions containing a non-glass component, e.g. compositions containing fibres, filaments, whiskers, platelets, or the like, dispersed in a glass matrix
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/005—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to introduce in the glass such metals or metallic ions as Ag, Cu
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0236—Special surface textures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2214/00—Nature of the non-vitreous component
    • C03C2214/08—Metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/77—Coatings having a rough surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

processo de estruturação de superfície por abrasão iônica, superfície estruturada e utilizações a invenção refere-se a um processo de estrutura de superfície isto é, de formação de pelo menos um conjunto de irregularidades ou motivos (2) com uma altura h submicrônica e pelo menos dimensão caracterísitca lateral w dita largura micrônica ou submicrônica, sobre uma superfície de um material (1), notadamente um vidro por abrasão iônica com um feixe de íons eventualemente neutralizado, caracterizado pelo fato de que comporta as etapas seguintes; o fornecimento do referido material de espessura pelo menos igual a 100 nm, material sólido hibrído e compreendendo: um óxido simples ouo misto de elemento (s), a percentagem molar de óxido no material sendo menos 40%, notadamente entre 40% e 94%, e pelo menos uma espécie, de natureza distinta do ou dos elementos de óxido, que é notadamente um metal, a percentagem molar em espécie (s) no material indo de 6% molar até 50% e inferior à percentagem do referido óxido, com pelo menos a maioria da espécie tendo uma maior dimensão característica inferior a 50 nm, notadamente o referido material hidrído sendo metaestável antes da referida abrasão; o aquecimento eventual do referido material híbrido antes de referida abrasão; a estruturação da superfície do referido material híbrido com uma duração de abrasão inferior a uma hora spbre uma superfície de abrasão superior a 1cm^ 2^, até formar o referido conjunto de motivos, a estruturação sendo eventualmente acompanhada de um aquecimento do material híbrido.
BR112012013341A 2009-12-01 2010-11-24 processo de estruturação de superfície por abrasão iônica, superfície estruturada e utilizações BR112012013341A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0905805A FR2953213B1 (fr) 2009-12-01 2009-12-01 Procede de structuration de surface par abrasion ionique,surface structuree et utilisations
PCT/FR2010/052507 WO2011067511A1 (fr) 2009-12-01 2010-11-24 Procede de structuration de surface par abrasion ionique, surface structuree et utilisations

Publications (1)

Publication Number Publication Date
BR112012013341A2 true BR112012013341A2 (pt) 2016-03-01

Family

ID=42309579

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112012013341A BR112012013341A2 (pt) 2009-12-01 2010-11-24 processo de estruturação de superfície por abrasão iônica, superfície estruturada e utilizações

Country Status (9)

Country Link
US (1) US9371250B2 (pt)
EP (1) EP2507183A1 (pt)
JP (1) JP6050118B2 (pt)
KR (1) KR101874127B1 (pt)
CN (1) CN102712527B (pt)
BR (1) BR112012013341A2 (pt)
EA (1) EA201290412A1 (pt)
FR (1) FR2953213B1 (pt)
WO (1) WO2011067511A1 (pt)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2953212B1 (fr) * 2009-12-01 2013-07-05 Saint Gobain Procede de structuration de surface par gravure ionique reactive,surface structuree et utilisations.
US9154138B2 (en) 2013-10-11 2015-10-06 Palo Alto Research Center Incorporated Stressed substrates for transient electronic systems
US11039621B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US9622483B2 (en) 2014-02-19 2017-04-18 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
US11039620B2 (en) 2014-02-19 2021-06-22 Corning Incorporated Antimicrobial glass compositions, glasses and polymeric articles incorporating the same
JP6383976B2 (ja) * 2014-05-30 2018-09-05 Ａｇｃ株式会社 反射防止構造体およびその製造方法
KR101528776B1 (ko) * 2014-08-27 2015-06-15 서울시립대학교 산학협력단 전극체 제조방법
US9780044B2 (en) 2015-04-23 2017-10-03 Palo Alto Research Center Incorporated Transient electronic device with ion-exchanged glass treated interposer
CN107735371B (zh) * 2015-07-15 2021-03-02 贺利氏石英美国有限责任公司 用于将不透明的熔凝石英与透明的熔凝石英连接的工艺
US10012250B2 (en) 2016-04-06 2018-07-03 Palo Alto Research Center Incorporated Stress-engineered frangible structures
US10224297B2 (en) 2016-07-26 2019-03-05 Palo Alto Research Center Incorporated Sensor and heater for stimulus-initiated fracture of a substrate
US10026579B2 (en) 2016-07-26 2018-07-17 Palo Alto Research Center Incorporated Self-limiting electrical triggering for initiating fracture of frangible glass
US10903173B2 (en) 2016-10-20 2021-01-26 Palo Alto Research Center Incorporated Pre-conditioned substrate
US11084722B2 (en) * 2017-02-24 2021-08-10 California Institute Of Technology Method for splitting carbon dioxide into molecular oxygen and carbon
US11208344B2 (en) * 2017-03-28 2021-12-28 Corning Incorporated Textured glass articles and methods of making the same
US10026651B1 (en) * 2017-06-21 2018-07-17 Palo Alto Research Center Incorporated Singulation of ion-exchanged substrates
CN107611226B (zh) * 2017-10-09 2019-04-16 浙江晶科能源有限公司 一种晶体硅绒面制作方法、太阳能电池及其制作方法
US10626048B2 (en) 2017-12-18 2020-04-21 Palo Alto Research Center Incorporated Dissolvable sealant for masking glass in high temperature ion exchange baths
WO2019151262A1 (ja) * 2018-01-31 2019-08-08 凸版印刷株式会社 積層体及び積層体の製造方法
JP7119417B2 (ja) * 2018-02-22 2022-08-17 Ａｇｃ株式会社 透光性構造体
US10717669B2 (en) 2018-05-16 2020-07-21 Palo Alto Research Center Incorporated Apparatus and method for creating crack initiation sites in a self-fracturing frangible member
US11107645B2 (en) 2018-11-29 2021-08-31 Palo Alto Research Center Incorporated Functionality change based on stress-engineered components
US10947150B2 (en) 2018-12-03 2021-03-16 Palo Alto Research Center Incorporated Decoy security based on stress-engineered substrates
US10969205B2 (en) 2019-05-03 2021-04-06 Palo Alto Research Center Incorporated Electrically-activated pressure vessels for fracturing frangible structures
US12013043B2 (en) 2020-12-21 2024-06-18 Xerox Corporation Triggerable mechanisms and fragment containment arrangements for self-destructing frangible structures and sealed vessels
US11904986B2 (en) 2020-12-21 2024-02-20 Xerox Corporation Mechanical triggers and triggering methods for self-destructing frangible structures and sealed vessels
CN112960910A (zh) * 2021-01-29 2021-06-15 深圳市宏海福新材料有限公司 一种长效易洁防雾玻璃镜片及其制作方法
CN112979172B (zh) * 2021-02-05 2022-12-27 业成科技（成都）有限公司 基板表面结构的制造方法
CN115724591A (zh) * 2021-08-31 2023-03-03 广东艾檬电子科技有限公司 基于电场控制的微孔加工方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2917480B2 (ja) 1990-09-29 1999-07-12 日本板硝子株式会社 磁気記録媒体用ガラス基板表面に凹凸を形成する方法
US6524773B1 (en) * 1996-03-28 2003-02-25 Corning Incorporated Polarizing glasses having integral non-polarizing regions
US6191053B1 (en) 1997-06-16 2001-02-20 Silicon Valley Group, Inc. High efficiency photoresist coating
DE19829970C2 (de) * 1998-07-04 2000-07-13 F O B Gmbh Verfahren zur Herstellung von UV-Polarisatoren
FR2792628B1 (fr) 1999-04-22 2001-06-15 Saint Gobain Vitrage Substrat texture susceptible de constituer un vitrage, procede pour son obtention
FR2811316B1 (fr) * 2000-07-06 2003-01-10 Saint Gobain Substrat texture transparent et procedes pour l'obtenir
JP2002267842A (ja) 2001-03-12 2002-09-18 Nippon Sheet Glass Co Ltd 偏光素子及びその製造方法
JP2006509999A (ja) * 2002-08-02 2006-03-23 イー エイ フィシオネ インストルメンツ インコーポレーテッド 顕微鏡の試料調製方法及び装置
FR2844364B1 (fr) 2002-09-11 2004-12-17 Saint Gobain Substrat diffusant
JP4739729B2 (ja) * 2004-11-08 2011-08-03 パナソニック株式会社 反射防止構造体を備えた部材の製造方法
JP2006199542A (ja) * 2005-01-21 2006-08-03 Victor Co Of Japan Ltd 光学素子の表面加工方法
US20090231714A1 (en) 2005-09-19 2009-09-17 Yang Zhao Transparent anti-reflective article and method of fabricating same
FR2893610B1 (fr) * 2005-11-23 2008-07-18 Saint Gobain Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations
US8771532B2 (en) 2009-03-31 2014-07-08 Corning Incorporated Glass having anti-glare surface and method of making
US8598771B2 (en) * 2009-09-15 2013-12-03 Corning Incorporated Glass and display having anti-glare properties
FR2953212B1 (fr) * 2009-12-01 2013-07-05 Saint Gobain Procede de structuration de surface par gravure ionique reactive,surface structuree et utilisations.

Also Published As

Publication number Publication date
WO2011067511A1 (fr) 2011-06-09
CN102712527B (zh) 2015-10-07
US20120288676A1 (en) 2012-11-15
US9371250B2 (en) 2016-06-21
KR20120117997A (ko) 2012-10-25
CN102712527A (zh) 2012-10-03
JP2013512178A (ja) 2013-04-11
EA201290412A1 (ru) 2012-12-28
FR2953213B1 (fr) 2013-03-29
EP2507183A1 (fr) 2012-10-10
FR2953213A1 (fr) 2011-06-03
KR101874127B1 (ko) 2018-07-03
JP6050118B2 (ja) 2016-12-21

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Legal Events

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B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B11E Dismissal acc. art. 34 of ipl - requirements for examination incomplete
B11T Dismissal: dismissal of application maintained
B350 Update of information on the portal [chapter 15.35 patent gazette]