BR0307800B1 - método e dispositivo para o revestimento de um substrato. - Google Patents

método e dispositivo para o revestimento de um substrato.

Info

Publication number
BR0307800B1
BR0307800B1 BR0307800A BR0307800A BR0307800B1 BR 0307800 B1 BR0307800 B1 BR 0307800B1 BR 0307800 A BR0307800 A BR 0307800A BR 0307800 A BR0307800 A BR 0307800A BR 0307800 B1 BR0307800 B1 BR 0307800B1
Authority
BR
Brazil
Prior art keywords
substrate
vaporized
coating
space
electromagnetic field
Prior art date
Application number
BR0307800A
Other languages
English (en)
Other versions
BR0307800A (pt
Inventor
Westrum Johannes Alphonsus Franciscus S N Van
Gerardus Gleijm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BR0307800A publication Critical patent/BR0307800A/pt
Publication of BR0307800B1 publication Critical patent/BR0307800B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Electric Cables (AREA)
BR0307800A 2002-02-21 2003-02-21 método e dispositivo para o revestimento de um substrato. BR0307800B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1020059A NL1020059C2 (nl) 2002-02-21 2002-02-21 Werkwijze en inrichting voor het bekleden van een substraat.
PCT/NL2003/000139 WO2003071000A1 (en) 2002-02-21 2003-02-21 Method and device for coating a substrate

Publications (2)

Publication Number Publication Date
BR0307800A BR0307800A (pt) 2004-12-14
BR0307800B1 true BR0307800B1 (pt) 2012-09-04

Family

ID=27752086

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0307800A BR0307800B1 (pt) 2002-02-21 2003-02-21 método e dispositivo para o revestimento de um substrato.

Country Status (15)

Country Link
US (1) US7323229B2 (pt)
EP (1) EP1483425B1 (pt)
JP (1) JP4522709B2 (pt)
KR (1) KR100956491B1 (pt)
CN (1) CN100545299C (pt)
AT (1) ATE399889T1 (pt)
AU (1) AU2003221458A1 (pt)
BR (1) BR0307800B1 (pt)
CA (1) CA2476855C (pt)
DE (1) DE60321893D1 (pt)
ES (1) ES2309305T3 (pt)
HK (1) HK1078616A1 (pt)
NL (1) NL1020059C2 (pt)
RU (1) RU2316611C2 (pt)
WO (1) WO2003071000A1 (pt)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004080640A1 (en) * 2003-03-14 2004-09-23 Hille & Müller GMBH Aluminium layered brazing product and method of its manufacture
US7973267B2 (en) 2004-08-23 2011-07-05 Tata Steel Nederland Technology Bv Apparatus and method for levitation of an amount of conductive material
KR101143067B1 (ko) * 2004-08-23 2012-05-08 타타 스틸 네덜란드 테크날러지 베.뷔. 전도성 재료의 공중부양 방법 및 장치
KR101235457B1 (ko) * 2005-05-31 2013-02-20 타타 스틸 네덜란드 테크날러지 베.뷔. 기판 코팅장치 및 방법
US7524385B2 (en) * 2006-10-03 2009-04-28 Elemetric, Llc Controlled phase transition of metals
KR100961371B1 (ko) 2007-12-28 2010-06-07 주식회사 포스코 실러 접착성 및 내식성이 우수한 아연계 합금도금강판과 그제조방법
KR101639813B1 (ko) * 2009-10-08 2016-07-15 주식회사 포스코 연속 코팅 장치
CN103249860B (zh) * 2010-12-13 2016-03-16 Posco公司 连续涂布设备
KR101207719B1 (ko) 2010-12-27 2012-12-03 주식회사 포스코 건식 코팅 장치
RU2522666C2 (ru) * 2012-06-27 2014-07-20 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) Устройство для левитации некоторого количества материала
KR101355817B1 (ko) * 2012-07-09 2014-02-05 한국표준과학연구원 전자기 부양 금속 박막 증착 장치
RU2693852C2 (ru) * 2017-11-07 2019-07-05 Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) Устройство для левитации некоторого количества материала
KR102098455B1 (ko) * 2017-12-26 2020-04-07 주식회사 포스코 연속 증착 장치 및 연속 증착 방법
CN109518133A (zh) * 2018-10-23 2019-03-26 集美大学 一种电磁加热的pvd设备及其生产工艺
CN112760608A (zh) * 2020-12-14 2021-05-07 兰州空间技术物理研究所 碳纤维复合材料表面薄膜沉积过程防止层间放气的方法

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
US2664852A (en) * 1950-04-27 1954-01-05 Nat Res Corp Vapor coating apparatus
US2957064A (en) * 1958-09-30 1960-10-18 Westinghouse Electric Corp Stabilizing of levitation melting
GB1206586A (en) * 1966-09-07 1970-09-23 Mini Of Technology Vacuum deposition process of forming alloys
BE713308A (pt) 1968-04-05 1968-10-07
DE2934011A1 (de) * 1979-08-22 1981-03-26 André Etienne de Dr. Lausanne Rudnay Vorrichtung zum aufdampfen von elektrisch leitenden stoffen (metallen) im hochvakuum
JPS621863A (ja) * 1985-06-28 1987-01-07 Ishikawajima Harima Heavy Ind Co Ltd 金属蒸発装置
JP3563083B2 (ja) * 1992-09-11 2004-09-08 真空冶金株式会社 超微粒子のガスデポジション方法及び装置
JPH07252639A (ja) * 1994-03-15 1995-10-03 Kao Corp 金属薄膜体の製造方法
US5534314A (en) * 1994-08-31 1996-07-09 University Of Virginia Patent Foundation Directed vapor deposition of electron beam evaporant
JPH08104981A (ja) * 1994-10-05 1996-04-23 Sumitomo Electric Ind Ltd Ｐｖｄ装置
JP2783193B2 (ja) 1995-06-26 1998-08-06 大同特殊鋼株式会社 レビテーション溶解法及びレビテーション溶解・鋳造装置
US5736073A (en) * 1996-07-08 1998-04-07 University Of Virginia Patent Foundation Production of nanometer particles by directed vapor deposition of electron beam evaporant
DE19811816A1 (de) * 1997-03-24 1998-10-01 Fuji Electric Co Ltd Verfahren zur Herstellung eines Elektrodenmaterials für Vakuum-Leistungsschalter
AU736457B2 (en) * 1997-08-27 2001-07-26 Sphelar Power Corporation Spherical semiconductor device and the manufacture method for the same and spherical semiconductor device material
JPH1171605A (ja) * 1997-08-29 1999-03-16 Ishikawajima Harima Heavy Ind Co Ltd 微粒子製造方法及び装置
EP1321545A1 (en) * 2001-12-20 2003-06-25 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Method for producing particles with diamond structure

Also Published As

Publication number Publication date
US20050064110A1 (en) 2005-03-24
RU2004128083A (ru) 2005-06-10
NL1020059C2 (nl) 2003-08-25
RU2316611C2 (ru) 2008-02-10
KR100956491B1 (ko) 2010-05-07
US7323229B2 (en) 2008-01-29
BR0307800A (pt) 2004-12-14
EP1483425A1 (en) 2004-12-08
AU2003221458A1 (en) 2003-09-09
CA2476855A1 (en) 2003-08-28
ES2309305T3 (es) 2008-12-16
JP4522709B2 (ja) 2010-08-11
WO2003071000A1 (en) 2003-08-28
CA2476855C (en) 2009-12-22
JP2005523381A (ja) 2005-08-04
KR20040085192A (ko) 2004-10-07
ATE399889T1 (de) 2008-07-15
HK1078616A1 (en) 2006-03-17
CN1636077A (zh) 2005-07-06
DE60321893D1 (de) 2008-08-14
EP1483425B1 (en) 2008-07-02
CN100545299C (zh) 2009-09-30

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B25D Requested change of name of applicant approved

Owner name: TATA STEEL NEDERLAND TECHNOLOGY B.V. (NL)

Free format text: NOME ALTERADO DE: CORUS TECHNOLOGY BV

B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 21/02/2003, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 13A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2364 DE 26-04-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.