AU622350B2 - Thin film forming apparatus - Google Patents

Thin film forming apparatus Download PDF

Info

Publication number
AU622350B2
AU622350B2 AU61291/90A AU6129190A AU622350B2 AU 622350 B2 AU622350 B2 AU 622350B2 AU 61291/90 A AU61291/90 A AU 61291/90A AU 6129190 A AU6129190 A AU 6129190A AU 622350 B2 AU622350 B2 AU 622350B2
Authority
AU
Australia
Prior art keywords
film forming
thin film
forming chamber
mist
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU61291/90A
Other languages
English (en)
Other versions
AU6129190A (en
Inventor
Hideyo Iida
Mizuho Imai
Mikio Sekiguchi
Nobuyasu Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Publication of AU6129190A publication Critical patent/AU6129190A/en
Application granted granted Critical
Publication of AU622350B2 publication Critical patent/AU622350B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemically Coating (AREA)
  • Photovoltaic Devices (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Electrodes Of Semiconductors (AREA)
AU61291/90A 1989-08-31 1990-08-23 Thin film forming apparatus Ceased AU622350B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1224981A JPH0390579A (ja) 1989-08-31 1989-08-31 薄膜形成装置
JP1-224981 1989-08-31

Publications (2)

Publication Number Publication Date
AU6129190A AU6129190A (en) 1991-03-07
AU622350B2 true AU622350B2 (en) 1992-04-02

Family

ID=16822233

Family Applications (1)

Application Number Title Priority Date Filing Date
AU61291/90A Ceased AU622350B2 (en) 1989-08-31 1990-08-23 Thin film forming apparatus

Country Status (5)

Country Link
US (1) US5069157A (OSRAM)
EP (1) EP0415253B1 (OSRAM)
JP (1) JPH0390579A (OSRAM)
AU (1) AU622350B2 (OSRAM)
DE (1) DE69013444T2 (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5456945A (en) * 1988-12-27 1995-10-10 Symetrix Corporation Method and apparatus for material deposition
US5614252A (en) * 1988-12-27 1997-03-25 Symetrix Corporation Method of fabricating barium strontium titanate
AU2013992A (en) * 1991-02-25 1992-09-15 Symetrix Corporation Methods and apparatus for material deposition
FR2776673B1 (fr) * 1998-03-26 2000-06-02 Thomson Plasma Procede de depot d'une couche a base de magnesie sur la surface dielectrique d'une dalle d'un panneau de visualisation et four pour la mise en oeuvre du procede
EP2123793A1 (en) * 2008-05-20 2009-11-25 Helianthos B.V. Vapour deposition process
US20100212591A1 (en) * 2008-05-30 2010-08-26 Alta Devices, Inc. Reactor lid assembly for vapor deposition
US20100206229A1 (en) * 2008-05-30 2010-08-19 Alta Devices, Inc. Vapor deposition reactor system
FI20080675A0 (fi) * 2008-12-23 2008-12-23 Beneq Oy Lasinpinnoitusmenetelmä ja -laite
FI9160U1 (fi) * 2010-01-04 2011-04-14 Beneq Oy Pinnoituslaite
TWI503433B (zh) * 2013-10-08 2015-10-11 不二越股份有限公司 成膜裝置及成膜方法
CN106232867B (zh) * 2014-04-18 2019-01-08 株式会社尼康 膜形成设备、基板处理设备和装置制造方法
WO2019234917A1 (ja) * 2018-06-08 2019-12-12 東芝三菱電機産業システム株式会社 成膜装置
TWM636275U (zh) * 2021-03-12 2023-01-11 日商信越化學工業股份有限公司 成膜系統及成膜裝置
CN117328040B (zh) * 2023-11-14 2024-07-09 无锡松煜科技有限公司 一种钙钛矿薄膜太阳能电池的制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU572345B2 (en) * 1984-09-13 1988-05-05 Kogyo Gijutuin Thin film forming device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3679386A (en) * 1969-06-30 1972-07-25 Nippon Sheet Glass Co Ltd Process and apparatus for forming a metal oxide coating on flat glass
GB2068935B (en) * 1980-01-31 1983-11-30 Bfg Glassgroup Coating hot glass with metals or metal compounds especially oxides
JPS57143227U (OSRAM) * 1981-02-26 1982-09-08
JPS58125613A (ja) * 1982-01-18 1983-07-26 Nippon Sheet Glass Co Ltd 酸化錫膜の形成方法
JPS6169962A (ja) * 1984-09-13 1986-04-10 Agency Of Ind Science & Technol 霧化薄膜作製装置
US4750412A (en) * 1986-04-24 1988-06-14 Toyota Jidosha Kabushiki Kaisha Painting apparatus
JPS6316068A (ja) * 1986-07-09 1988-01-23 Res Dev Corp Of Japan 薄膜形成用噴霧装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU572345B2 (en) * 1984-09-13 1988-05-05 Kogyo Gijutuin Thin film forming device

Also Published As

Publication number Publication date
AU6129190A (en) 1991-03-07
EP0415253B1 (en) 1994-10-19
EP0415253A3 (en) 1991-09-25
DE69013444T2 (de) 1995-02-23
EP0415253A2 (en) 1991-03-06
DE69013444D1 (de) 1994-11-24
JPH0545674B2 (OSRAM) 1993-07-09
US5069157A (en) 1991-12-03
JPH0390579A (ja) 1991-04-16

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