AU2001296006A1 - Composite structure and method and apparatus for manufacture thereof - Google Patents

Composite structure and method and apparatus for manufacture thereof

Info

Publication number
AU2001296006A1
AU2001296006A1 AU2001296006A AU9600601A AU2001296006A1 AU 2001296006 A1 AU2001296006 A1 AU 2001296006A1 AU 2001296006 A AU2001296006 A AU 2001296006A AU 9600601 A AU9600601 A AU 9600601A AU 2001296006 A1 AU2001296006 A1 AU 2001296006A1
Authority
AU
Australia
Prior art keywords
manufacture
composite structure
composite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296006A
Other languages
English (en)
Inventor
Hironori Hatono
Tomokazu Ito
Masakatsu Kiyohara
Katsuhiko Mori
Tatsuro Yokoyama
Atsushi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Toto Ltd
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd, National Institute of Advanced Industrial Science and Technology AIST filed Critical Toto Ltd
Publication of AU2001296006A1 publication Critical patent/AU2001296006A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
AU2001296006A 2000-10-23 2001-10-23 Composite structure and method and apparatus for manufacture thereof Abandoned AU2001296006A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000322843 2000-10-23
JP2000-322843 2000-10-23
PCT/JP2001/009305 WO2002034966A1 (fr) 2000-10-23 2001-10-23 Structure composite et procede et appareil destines a sa fabrication

Publications (1)

Publication Number Publication Date
AU2001296006A1 true AU2001296006A1 (en) 2002-05-06

Family

ID=18800643

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296006A Abandoned AU2001296006A1 (en) 2000-10-23 2001-10-23 Composite structure and method and apparatus for manufacture thereof

Country Status (5)

Country Link
US (5) US7255934B2 (fr)
JP (1) JP3554735B2 (fr)
CN (1) CN1225570C (fr)
AU (1) AU2001296006A1 (fr)
WO (1) WO2002034966A1 (fr)

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AU7684900A (en) * 1999-10-12 2001-04-23 Japan As Represented By Secretary Of Agency Of Industrial Science And Technology, Ministry Of International Trade And Industry Composite structured material and method for preparation thereof and apparatus for preparation thereof
JP2003112975A (ja) * 2001-09-28 2003-04-18 National Institute Of Advanced Industrial & Technology 構造物およびその製造方法、構造物形成用粒子並びにその製造方法
JP4103470B2 (ja) * 2002-06-28 2008-06-18 Ｔｏｔｏ株式会社 多孔質複合構造物の作製方法
US7067965B2 (en) * 2002-09-18 2006-06-27 Tdk Corporation Piezoelectric porcelain composition, piezoelectric device, and methods of making thereof
JP4139891B2 (ja) * 2003-03-20 2008-08-27 独立行政法人産業技術総合研究所 Ｒｆモジュールの作製方法
US7579251B2 (en) 2003-05-15 2009-08-25 Fujitsu Limited Aerosol deposition process
US7226510B2 (en) * 2003-10-27 2007-06-05 Fujifilm Corporation Film forming apparatus
JP2005147941A (ja) * 2003-11-18 2005-06-09 Seiko Epson Corp 機械部品の製造方法、機械部品、およびこの機械部品を備えた時計
JP2005274260A (ja) * 2004-03-24 2005-10-06 Fuji Photo Film Co Ltd 放射線撮像パネルを構成する光導電層の製造方法
EP1583163B1 (fr) * 2004-03-30 2012-02-15 Brother Kogyo Kabushiki Kaisha Méthode pour produire un film ou un film piézoélectrique
JP2005344171A (ja) * 2004-06-03 2005-12-15 Fuji Photo Film Co Ltd 成膜用原料粉、及び、それを用いた成膜方法
JP2006097087A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 成膜方法及び成膜装置
JP2006179856A (ja) * 2004-11-25 2006-07-06 Fuji Electric Holdings Co Ltd 絶縁基板および半導体装置
DE102004059716B3 (de) * 2004-12-08 2006-04-06 Siemens Ag Verfahren zum Kaltgasspritzen
JP4664054B2 (ja) * 2004-12-09 2011-04-06 富士フイルム株式会社 成膜装置
JP4949668B2 (ja) * 2004-12-09 2012-06-13 富士フイルム株式会社 セラミックス膜の製造方法及びセラミックス膜を含む構造物
EP1937872B1 (fr) * 2005-09-30 2010-11-24 FUJIFILM Corporation Strucure composite et son procede de fabrication
US20070158446A1 (en) * 2006-01-05 2007-07-12 Howmedica Osteonics Corp. Method for fabricating a medical implant component and such component
US8187660B2 (en) * 2006-01-05 2012-05-29 Howmedica Osteonics Corp. Method for fabricating a medical implant component and such component
US20070156249A1 (en) * 2006-01-05 2007-07-05 Howmedica Osteonics Corp. High velocity spray technique for medical implant components
JP4930120B2 (ja) * 2006-03-28 2012-05-16 ブラザー工業株式会社 成膜装置、及び成膜方法
US7878143B2 (en) * 2006-03-28 2011-02-01 Brother Kogyo Kabushiki Kaisha Film-forming apparatus, film-forming method and particle-supplying apparatus
US8020508B2 (en) * 2006-09-19 2011-09-20 The Board Of Regents Of The University Of Oklahoma Methods and apparatus for depositing nanoparticles on a substrate
US7615385B2 (en) 2006-09-20 2009-11-10 Hypres, Inc Double-masking technique for increasing fabrication yield in superconducting electronics
US7479464B2 (en) * 2006-10-23 2009-01-20 Applied Materials, Inc. Low temperature aerosol deposition of a plasma resistive layer
US8114473B2 (en) * 2007-04-27 2012-02-14 Toto Ltd. Composite structure and production method thereof
JP4626829B2 (ja) * 2007-11-15 2011-02-09 Ｔｏｔｏ株式会社 多孔質複合構造物の作製方法及びその作製に用いる多孔質微粒子
WO2009113463A1 (fr) * 2008-03-10 2009-09-17 Toto株式会社 Procédé de formation de structure composite, particules préparées et système de formation de structure composite
DE102008024504A1 (de) 2008-05-21 2009-11-26 Linde Ag Verfahren und Vorrichtung zum Kaltgasspritzen
US8163335B2 (en) * 2008-05-23 2012-04-24 Toto Ltd. Particle cluster, composite structure formation method, and formation system
US8349398B2 (en) * 2008-06-02 2013-01-08 Samsung Electro-Mechanics Co., Ltd. Normal pressure aerosol spray apparatus and method of forming a film using the same
JP4510116B2 (ja) * 2008-06-20 2010-07-21 富士通株式会社 キャパシタの製造方法、構造体、及びキャパシタ
CA2729819C (fr) * 2008-07-03 2014-08-26 University Of Virginia Patent Foundation Unite de prise d'apadenoson
CN102300806B (zh) * 2008-12-08 2013-11-06 赫斯提亚Tec有限公司 多组分纳米粒子材料及其方法和设备
KR101097173B1 (ko) 2009-09-04 2011-12-22 신한다이아몬드공업 주식회사 절삭/연마 공구 및 그 제조방법
DE102009053987A1 (de) 2009-11-23 2011-06-01 Linde Aktiengesellschaft Verfahren und Vorrichtung zum Herstellen einer mehrlagigen Spule
EP2333133B1 (fr) 2009-11-23 2013-03-06 Linde Aktiengesellschaft Procédé de fabrication d'une bobine multicouche
US8679246B2 (en) 2010-01-21 2014-03-25 The University Of Connecticut Preparation of amorphous mixed metal oxides and their use as feedstocks in thermal spray coating
US8563448B2 (en) 2010-01-29 2013-10-22 Eaton Corporation Friction member and friction material thereof
JP5429019B2 (ja) 2010-04-16 2014-02-26 富士通株式会社 キャパシタ及びその製造方法
US8461064B2 (en) 2010-07-29 2013-06-11 Eaton Corporation Friction member and friction material thereof
WO2012056808A1 (fr) 2010-10-25 2012-05-03 日本碍子株式会社 Matériau céramique, élément pour dispositif de fabrication de semiconducteur, élément cible de pulvérisation et procédé de fabrication de matériau céramique
WO2012056807A1 (fr) 2010-10-25 2012-05-03 日本碍子株式会社 Matériau céramique, corps stratifié, élément pour dispositif de fabrication de semiconducteur, et élément cible de pulvérisation
WO2012108704A2 (fr) * 2011-02-10 2012-08-16 고려대학교 산학협력단 Appareil de fabrication de cellule solaire à film fin minéral et procédé de commande
CN104220638B (zh) * 2011-10-12 2017-03-22 1366科技公司 用于在衬底上沉积抗蚀剂薄层的设备和工艺
US9675640B2 (en) 2012-08-07 2017-06-13 Southwest Research Institute Magnetic calcium phosphate nanoparticles, applications and methods of preparation thereof
JP6134106B2 (ja) * 2012-08-20 2017-05-24 積水化学工業株式会社 多孔質膜の製造方法
US9708713B2 (en) 2013-05-24 2017-07-18 Applied Materials, Inc. Aerosol deposition coating for semiconductor chamber components
US9566216B2 (en) 2013-11-18 2017-02-14 Southwest Research Institute Bone cements containing magnetic calcium phosphate nanoparticles
CN108495719A (zh) * 2016-02-26 2018-09-04 倍耐克有限公司 改进的气溶胶涂布装置和方法
KR101952504B1 (ko) 2017-04-14 2019-02-28 인하대학교 산학협력단 강유전체 세라믹 복합체의 제조방법
JP7272653B2 (ja) * 2017-07-26 2023-05-12 国立研究開発法人産業技術総合研究所 構造体、積層構造体、積層構造体の製造方法及び積層構造体の製造装置
KR102649715B1 (ko) * 2020-10-30 2024-03-21 세메스 주식회사 표면 처리 장치 및 표면 처리 방법
CN112718289B (zh) * 2020-12-15 2022-04-15 中国人民解放军空军工程大学 激光辅助真空电扫超音速沉积喷枪
CN113289789A (zh) * 2021-04-13 2021-08-24 广东丰展涂装科技有限公司 一种高绝缘性自动供热油漆设备

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Also Published As

Publication number Publication date
US20070122610A1 (en) 2007-05-31
JP3554735B2 (ja) 2004-08-18
CN1225570C (zh) 2005-11-02
JPWO2002034966A1 (ja) 2004-03-04
CN1481450A (zh) 2004-03-10
US7318967B2 (en) 2008-01-15
US20080096007A1 (en) 2008-04-24
US7255934B2 (en) 2007-08-14
WO2002034966A1 (fr) 2002-05-02
US7632353B2 (en) 2009-12-15
US20060102074A1 (en) 2006-05-18
US20060099336A1 (en) 2006-05-11
US20040026030A1 (en) 2004-02-12

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