AU2001295881A1 - Porous getter devices with reduced particle loss and method for their manufacture - Google Patents

Porous getter devices with reduced particle loss and method for their manufacture

Info

Publication number
AU2001295881A1
AU2001295881A1 AU2001295881A AU9588101A AU2001295881A1 AU 2001295881 A1 AU2001295881 A1 AU 2001295881A1 AU 2001295881 A AU2001295881 A AU 2001295881A AU 9588101 A AU9588101 A AU 9588101A AU 2001295881 A1 AU2001295881 A1 AU 2001295881A1
Authority
AU
Australia
Prior art keywords
deposition
getter
manufacture
particle loss
porous getter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001295881A
Other languages
English (en)
Inventor
Andrea Conte
Marco Moraja
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SAES Getters SpA
Original Assignee
SAES Getters SpA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SAES Getters SpA filed Critical SAES Getters SpA
Publication of AU2001295881A1 publication Critical patent/AU2001295881A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/11—Making porous workpieces or articles
    • B22F3/1146—After-treatment maintaining the porosity
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/045—Alloys based on refractory metals
    • C22C1/0458—Alloys based on titanium, zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12021—All metal or with adjacent metals having metal particles having composition or density gradient or differential porosity
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
    • Y10T428/24298—Noncircular aperture [e.g., slit, diamond, rectangular, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AU2001295881A 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture Abandoned AU2001295881A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
ITMI2000A002099 2000-09-22
IT2000MI002099A IT1318937B1 (it) 2000-09-27 2000-09-27 Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti
PCT/IT2001/000488 WO2002027058A1 (en) 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture

Publications (1)

Publication Number Publication Date
AU2001295881A1 true AU2001295881A1 (en) 2002-04-08

Family

ID=11445869

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001295881A Abandoned AU2001295881A1 (en) 2000-09-27 2001-09-25 Porous getter devices with reduced particle loss and method for their manufacture

Country Status (13)

Country Link
US (3) US6620297B2 (de)
EP (1) EP1322795B1 (de)
JP (1) JP2004509757A (de)
KR (1) KR100784584B1 (de)
CN (1) CN1318642C (de)
AT (1) ATE370261T1 (de)
AU (1) AU2001295881A1 (de)
DE (1) DE60130001T2 (de)
HK (1) HK1073337A1 (de)
IT (1) IT1318937B1 (de)
RU (1) RU2253695C2 (de)
TW (1) TWI278523B (de)
WO (1) WO2002027058A1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6475725B1 (en) * 1997-06-20 2002-11-05 Baxter Aktiengesellschaft Recombinant cell clones having increased stability and methods of making and using the same
IT1312248B1 (it) * 1999-04-12 2002-04-09 Getters Spa Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
US20020052025A1 (en) * 2000-06-08 2002-05-02 Thompson Timothy C. RTVP based compositions and methods for the treatment of prostate cancer
IT1318937B1 (it) * 2000-09-27 2003-09-19 Getters Spa Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti
CN100550277C (zh) 2001-05-01 2009-10-14 萨伊斯吉提斯公司 放电灯
US20050187153A1 (en) * 2001-06-08 2005-08-25 Baylor College Of Medicine RTVP based compositions and methods for the treatment of prostate cancer, autoimmunity and infectious disease
JP3740479B2 (ja) * 2002-07-23 2006-02-01 キヤノン株式会社 画像表示装置とその製造方法
US6911065B2 (en) * 2002-12-26 2005-06-28 Matheson Tri-Gas, Inc. Method and system for supplying high purity fluid
JP2004265776A (ja) * 2003-03-03 2004-09-24 Hitachi Ltd 有機ｅｌディスプレイ装置
US7135141B2 (en) * 2003-03-31 2006-11-14 Hitachi Metals, Ltd. Method of manufacturing a sintered body
ITMI20031178A1 (it) 2003-06-11 2004-12-12 Getters Spa Depositi multistrato getter non evaporabili ottenuti per
US7871660B2 (en) * 2003-11-14 2011-01-18 Saes Getters, S.P.A. Preparation of getter surfaces using caustic chemicals
US7824685B2 (en) * 2004-01-26 2010-11-02 Baylor College Of Medicine RTVP based compositions and methods for the treatment of prostate cancer
KR20070033354A (ko) * 2004-06-18 2007-03-26 가부시끼가이샤 도시바 화상 표시 장치 및 화상 표시 장치의 제조 방법
KR100641301B1 (ko) * 2004-09-15 2006-11-02 주식회사 세종소재 겟터 겸용 수은 보충재
ITMI20042271A1 (it) * 2004-11-23 2005-02-23 Getters Spa Leghe getter non evaporabili per assorbimento di idrogeno
US20060240276A1 (en) * 2005-04-20 2006-10-26 Technic, Inc. Underlayer for reducing surface oxidation of plated deposits
EP1821328A1 (de) 2006-02-10 2007-08-22 Nanoshell Materials Research & Development GmbH Metallisches und dendritisches Getter und sein Herstellungsverfahren
EP2032735A4 (de) * 2006-06-21 2011-12-21 Proteus Biomedical Inc Implantierbare medizinische geräte mit durch kathodenbogen hergestellten strukturen
FR2903678B1 (fr) * 2006-07-13 2008-10-24 Commissariat Energie Atomique Microcomposant encapsule equipe d'au moins un getter
WO2008071906A1 (en) 2006-12-15 2008-06-19 Bae Systems Plc Improvements relating to thin film getter devices
ITMI20090410A1 (it) * 2009-03-18 2010-09-19 Getters Spa Leghe getter non evaporabili adatte particolarmente per l'assorbimento di idrogeno
DE102009029495A1 (de) * 2009-09-16 2011-03-24 Endress + Hauser Conducta Gesellschaft für Mess- und Regeltechnik mbH + Co. KG Messumformer für ein Multisensorsystem, insbesondere als Feldgerät für die Prozessautomatisierungstechnik und Verfahren zum Betreiben des Messumformers
CN102534489A (zh) * 2010-12-30 2012-07-04 鸿富锦精密工业（深圳）有限公司 镀膜件及其制造方法
RU2474912C1 (ru) * 2011-08-23 2013-02-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Способ получения газопоглощающей структуры
RU2513563C2 (ru) * 2012-08-17 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Спеченный неиспаряющийся геттер
RU2523718C2 (ru) * 2012-11-20 2014-07-20 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский университет "МИЭТ" (МИЭТ) Нанокомпозитная газопоглощающая структура и способ ее получения
JP5731085B2 (ja) * 2013-02-05 2015-06-10 キヤノンアネルバ株式会社 成膜装置
FR3003647B1 (fr) * 2013-03-25 2015-12-25 IFP Energies Nouvelles Procede et systeme d'analyse d'un fluide gazeux comprenant au moins un gaz rare au moyen d'un substrat de getterisation
RU2532788C1 (ru) * 2013-06-20 2014-11-10 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский технологический университет "МИСиС" Способ получения объемно-пористых структур сплавов-накопителей водорода, способных выдерживать многократные циклы гидрирования-дегидрирования без разрушения
US9764946B2 (en) 2013-10-24 2017-09-19 Analog Devices, Inc. MEMs device with outgassing shield
ITMI20131921A1 (it) * 2013-11-20 2015-05-21 Getters Spa Leghe getter non evaporabili particolarmente adatte per l'assorbimento di idrogeno e monossido di carbonio
US10421059B2 (en) 2014-10-24 2019-09-24 Samsung Electronics Co., Ltd. Gas-adsorbing material and vacuum insulation material including the same
US10801097B2 (en) * 2015-12-23 2020-10-13 Praxair S.T. Technology, Inc. Thermal spray coatings onto non-smooth surfaces
CN106591790B (zh) * 2016-12-28 2019-12-13 杭州大立微电子有限公司 靶材制备方法和吸气剂薄膜形成方法
WO2019097421A1 (en) 2017-11-17 2019-05-23 Rockwool International A/S Suspension system
CN110820031A (zh) * 2019-11-19 2020-02-21 有研工程技术研究院有限公司 一种微型吸气剂的制备方法
CN111001545A (zh) * 2019-11-25 2020-04-14 烟台艾睿光电科技有限公司 防止吸气剂掉落颗粒的方法及吸气剂与加固涂层组件

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2491284A (en) * 1946-12-13 1949-12-13 Bell Telephone Labor Inc Electrode for electron discharge devices and method of making the same
DE1064646B (de) * 1955-06-07 1959-09-03 Ernesto Gabbrielli Verfahren zum Herstellen von Gettern
NL236452A (de) * 1958-02-24 1900-01-01
IT963874B (it) * 1972-08-10 1974-01-21 Getters Spa Dispositivo getter perfezionato contenente materiale non evapora bile
US4428856A (en) 1982-09-30 1984-01-31 Boyarina Maya F Non-evaporable getter
IT1173866B (it) 1984-03-16 1987-06-24 Getters Spa Metodo perfezionato per fabbricare dispositivi getter non evarobili porosi e dispositivi getter cosi' prodotti
US5456740A (en) * 1994-06-22 1995-10-10 Millipore Corporation High-efficiency metal membrane getter element and process for making
US5908579A (en) 1994-12-02 1999-06-01 Saes Getters, S.P.A. Process for producing high-porosity non-evaporable getter materials and materials thus obtained
IT1283484B1 (it) 1996-07-23 1998-04-21 Getters Spa Metodo per la produzione di strati sottili supportati di materiale getter non-evaporabile e dispositivi getter cosi' prodotti
CN1187684A (zh) * 1997-01-10 1998-07-15 工程吸气公司 具有较短激发时间的可蒸发的吸气装置
FR2760089B1 (fr) * 1997-02-26 1999-04-30 Org Europeene De Rech Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse
IT1290451B1 (it) 1997-04-03 1998-12-03 Getters Spa Leghe getter non evaporabili
IT1301948B1 (it) * 1998-07-28 2000-07-20 Getters Spa Processo per la produzione di dispositivi getter evaporabili conridotta perdita di particelle
EP1032456A1 (de) 1998-08-21 2000-09-06 Medtronic Ave, Inc. Kathodestruktur mit getter-material und diamantfilm und methoden zu deren herstellung
JP3518855B2 (ja) * 1999-02-26 2004-04-12 キヤノン株式会社 ゲッター、ゲッターを有する気密容器および画像形成装置、ゲッターの製造方法
DE60013228T3 (de) * 1999-06-02 2018-02-22 Saes Getters S.P.A. Sorptionsfähige verbundwerkstoffe die unabhängig sind von aktivierungsbehandlungen und verfahren zur herstellung
IT1318937B1 (it) 2000-09-27 2003-09-19 Getters Spa Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti

Also Published As

Publication number Publication date
DE60130001T2 (de) 2008-05-08
WO2002027058A8 (en) 2003-04-10
ITMI20002099A1 (it) 2002-03-27
DE60130001D1 (de) 2007-09-27
CN1318642C (zh) 2007-05-30
US6620297B2 (en) 2003-09-16
KR20030038765A (ko) 2003-05-16
US20050023134A1 (en) 2005-02-03
KR100784584B1 (ko) 2007-12-10
WO2002027058A1 (en) 2002-04-04
CN1596323A (zh) 2005-03-16
ITMI20002099A0 (it) 2000-09-27
US20030165707A1 (en) 2003-09-04
TWI278523B (en) 2007-04-11
US6783696B2 (en) 2004-08-31
IT1318937B1 (it) 2003-09-19
EP1322795A1 (de) 2003-07-02
JP2004509757A (ja) 2004-04-02
ATE370261T1 (de) 2007-09-15
HK1073337A1 (en) 2005-09-30
EP1322795B1 (de) 2007-08-15
RU2253695C2 (ru) 2005-06-10
US7122100B2 (en) 2006-10-17
US20020093003A1 (en) 2002-07-18

Similar Documents

Publication Publication Date Title
AU2001295881A1 (en) Porous getter devices with reduced particle loss and method for their manufacture
TW200605194A (en) Method and apparatus of distributed plasma processing system for conformal ion stimulated nanoscale deposition process
WO2004059027A3 (en) Ionic plasma deposition of anti-microbial surfaces and the anti-microbial surfaces resulting therefrom
WO2001036704A3 (en) Method and apparatus for forming carbonaceous film
AU3792397A (en) Production of nanometer particles by directed vapor deposition of electron beam evaporant
EP0947603A3 (de) Verfahren und Vorrichtung zur Filmabscheidung
TR199901222A3 (tr) Sürtünme yatagi gövdesi ve üretim islemi.
AU2003291638A1 (en) Enhanced field emission from carbon nanotubes mixed with particles
EP0838831A3 (de) Elektronenemittierende Beschichtung und Verfahren
AU2003238418A1 (en) Open-pored metal coating for joint replacement implants and method for production thereof
WO2005000758A3 (fr) Substrat revetu d’une couche dielectrique et procede et installation pour sa fabrication
CA2518955A1 (en) Coated article including titanium oxycarbide and method of making same
EP1650324A3 (de) Vorrichtung und Verfahren zur Sputterbeschichtung
WO2002092866A3 (de) Mit einer diamantschicht überzogener verbundwirkstoff und verfahren zu dessen herstellung
CA2273235A1 (en) Method for capping mine waste and tailing deposits
AU3340497A (en) Pumping device by non-vaporisable getter and method for using this getter
CA2285982A1 (en) Method for producing a coating containing titanium boride
WO2001042522A3 (en) Sputtering target and methods of making same
EP0686708A4 (de) Verfahren und vorrichtung zur herstellung eines filmes
DE69904826D1 (de) Ionenergiedämpfung
EP1325167B8 (de) Zerstäubungstarget
Liu et al. MEVVA ion source development and its industrial applications at Beijing Normal University
WO1999028520A3 (de) Einrichtung zur behandlung von werkstücken in einem niederdruck-plasma
WO2002027057A3 (en) Sputtering target and method of making same
Gabovich et al. Effect of trampoline sputtering on surface morphology and coatings properties