ATE88680T1 - Verfahren zur herstellung von metalloxiden. - Google Patents

Verfahren zur herstellung von metalloxiden.

Info

Publication number
ATE88680T1
ATE88680T1 AT88908256T AT88908256T ATE88680T1 AT E88680 T1 ATE88680 T1 AT E88680T1 AT 88908256 T AT88908256 T AT 88908256T AT 88908256 T AT88908256 T AT 88908256T AT E88680 T1 ATE88680 T1 AT E88680T1
Authority
AT
Austria
Prior art keywords
pct
sec
date
production
hydrolysis
Prior art date
Application number
AT88908256T
Other languages
English (en)
Inventor
Louis Cot
Jacques Claude Rouviere
Christian Gilbert Guizard
Andre Larbot
Original Assignee
Centre Nat Rech Scient
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre Nat Rech Scient filed Critical Centre Nat Rech Scient
Application granted granted Critical
Publication of ATE88680T1 publication Critical patent/ATE88680T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F7/00—Compounds of aluminium
    • C01F7/02—Aluminium oxide; Aluminium hydroxide; Aluminates
    • C01F7/34—Preparation of aluminium hydroxide by precipitation from solutions containing aluminium salts
    • C01F7/36—Preparation of aluminium hydroxide by precipitation from solutions containing aluminium salts from organic aluminium salts
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/14—Methods for preparing oxides or hydroxides in general
    • C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
    • C01B13/328—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process by processes making use of emulsions, e.g. the kerosine process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/16—Preparation of silica xerogels
    • C01B33/163—Preparation of silica xerogels by hydrolysis of organosilicon compounds, e.g. ethyl orthosilicate
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/218—Yttrium oxides or hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/30—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6
    • C01F17/32—Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6 oxide or hydroxide being the only anion, e.g. NaCeO2 or MgxCayEuO
    • C01F17/34—Aluminates, e.g. YAlO3 or Y3-xGdxAl5O12
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C01G23/053—Producing by wet processes, e.g. hydrolysing titanium salts
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00—Compounds of zirconium
    • C01G25/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G31/00—Compounds of vanadium
    • C01G31/02—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Ceramic Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
AT88908256T 1987-09-29 1988-09-27 Verfahren zur herstellung von metalloxiden. ATE88680T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR8713411A FR2621030B1 (fr) 1987-09-29 1987-09-29 Procede de preparation d'oxydes metalliques
PCT/FR1988/000471 WO1989002869A1 (fr) 1987-09-29 1988-09-27 Procede de preparation d'oxydes metalliques
EP88908256A EP0332686B1 (de) 1987-09-29 1988-09-27 Verfahren zur herstellung von metalloxiden

Publications (1)

Publication Number Publication Date
ATE88680T1 true ATE88680T1 (de) 1993-05-15

Family

ID=9355306

Family Applications (1)

Application Number Title Priority Date Filing Date
AT88908256T ATE88680T1 (de) 1987-09-29 1988-09-27 Verfahren zur herstellung von metalloxiden.

Country Status (7)

Country Link
US (1) US5112676A (de)
EP (1) EP0332686B1 (de)
JP (1) JPH02501383A (de)
AT (1) ATE88680T1 (de)
DE (1) DE3880664T2 (de)
FR (1) FR2621030B1 (de)
WO (1) WO1989002869A1 (de)

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CA1273647A (en) * 1987-08-19 1990-09-04 Jean V. Sang Production of ceramic powders by emulsion precipitation processes and the products thereof
CA1326122C (en) * 1988-10-05 1994-01-18 Fawzy Gamaleldin Sherif Process for forming metal oxide powders from the metal alkoxide
IT1227185B (it) * 1988-10-19 1991-03-21 Eniricerche Spa Procedimento per la preparazione di un precursore del biossido di zirconio
IT1230630B (it) * 1988-11-11 1991-10-28 Eniricerche Spa Procedimento per la preparazione di un precursore di zirconio biossido
WO1991010239A1 (en) * 1989-12-28 1991-07-11 Sumitomo Electric Industries, Ltd. Method of manufacturing inorganic insulator
US5747727A (en) * 1990-08-09 1998-05-05 Sumitomo Electric Industries, Ltd. Method of making a thermocouple
CA2053985A1 (en) * 1990-10-25 1992-04-26 Sumio Hoshino Process for producing thin glass film by sol-gel method
US5468514A (en) * 1990-11-30 1995-11-21 Horiba, Ltd. Method of producing a pH-responsive membrane
JP2716302B2 (ja) * 1991-11-29 1998-02-18 セントラル硝子株式会社 マイクロピット状表層を有する酸化物薄膜および該薄膜を用いた多層膜、ならびにその形成法
US5250096A (en) * 1992-04-07 1993-10-05 At&T Bell Laboratories Sol-gel method of making multicomponent glass
US5352481A (en) * 1992-05-29 1994-10-04 Hughes Aircraft Company Process for forming particles having a uniform size distribution
US5820923A (en) * 1992-11-02 1998-10-13 Dow Corning Corporation Curing silica precursors by exposure to nitrous oxide
CA2114913C (en) * 1993-02-05 2003-12-09 Takafumi Atarashi Powder having at least one layer and process for preparing the same
JP3724592B2 (ja) * 1993-07-26 2005-12-07 ハイニックス セミコンダクター アメリカ インコーポレイテッド 半導体基板の平坦化方法
JP3444655B2 (ja) * 1994-06-14 2003-09-08 三井金属鉱業株式会社 複合導電性粉末及び導電膜
US5516458A (en) * 1994-08-30 1996-05-14 Eastman Kodak Company Coating composition used to prepare an electrically-conductive layer formed by a glow discharge process containing tin carboxylate, antimony alkoxide and film-forming binder
KR100327271B1 (ko) * 1994-11-21 2002-07-03 추후제출 코팅된 입자의 제조방법
FR2727103B1 (fr) * 1994-11-23 1996-12-27 Kodak Pathe Procede de preparation des halogenures metalliques par voie sol-gel
US7078859B2 (en) 1995-03-31 2006-07-18 Dai Nippon Printing Co., Ltd. Coating composition and use thereof
JP3812751B2 (ja) 1995-03-31 2006-08-23 大日本印刷株式会社 コーティング組成物及びその製造方法、並びに機能性膜及びその製造方法
US6319551B1 (en) * 1995-12-19 2001-11-20 William M. Risen, Jr. Methods and compositions for forming silica, germanosilicate and metal silicate films, patterns and multilayers
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JP3456396B2 (ja) 1997-12-25 2003-10-14 日本板硝子株式会社 透光性着色膜付きガラス基板の製造方法
US6641939B1 (en) 1998-07-01 2003-11-04 The Morgan Crucible Company Plc Transition metal oxide doped alumina and methods of making and using
US5958363A (en) * 1998-10-29 1999-09-28 The Regents Of The University Of California Method for making monolithic metal oxide aerogels
FR2787350B1 (fr) * 1998-12-21 2002-01-04 Saint Gobain Vitrage Vitrage a revetement mesoporeux fonctionnel, notamment hydrophobe
AUPQ573300A0 (en) * 2000-02-21 2000-03-16 Australian Nuclear Science & Technology Organisation Controlled release ceramic particles, compositions thereof, processes of preparation and methods of use
US7265062B2 (en) 2000-04-04 2007-09-04 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations
US6576568B2 (en) * 2000-04-04 2003-06-10 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations
DE10051724A1 (de) * 2000-10-18 2002-05-02 Flabeg Gmbh & Co Kg Thermisch vorgespanntes Glas mit einer abriebfesten, porösen SiO¶2¶-Antireflexschicht
DE10164636A1 (de) * 2001-11-02 2003-05-22 Guido Weber Mischung und Verfahren zur Erstellung einer Beschichtung
CN100427405C (zh) * 2003-04-15 2008-10-22 清华大学 用双液相水解法制备二氧化锆纳米粉的方法
JP4345524B2 (ja) * 2004-03-04 2009-10-14 株式会社村田製作所 金属酸化物超微粒子分散溶液の製造方法
US8974855B2 (en) * 2005-08-05 2015-03-10 The United States Department Of Energy Manganite perovskite ceramics, their precursors and methods for forming
US8318128B2 (en) * 2006-01-18 2012-11-27 Vanderbilt University Method of preparing vanadium oxide nanoparticles
US7750056B1 (en) 2006-10-03 2010-07-06 Sami Daoud Low-density, high r-value translucent nanocrystallites
JP5192752B2 (ja) * 2007-08-15 2013-05-08 古河電気工業株式会社 逆ミセル分散系を用いてなるシリカナノ粒子の製造方法、該方法により得られたシリカナノ粒子、及びそれを用いた標識試薬
KR20090041947A (ko) * 2007-10-25 2009-04-29 삼성전기주식회사 바나듐 산화물 나노입자 제조방법
WO2019036594A1 (en) 2017-08-17 2019-02-21 The Trustees Of Princeton University INTERFACIAL LAYER ULTRAMINED ON A HYDROGEL TO CONTROL ITS SURFACE PROPERTIES AND CELL ADHESION
US11623211B2 (en) * 2019-04-26 2023-04-11 The Regents Of The University Of California Template-free tuned light driven photocatalyst and method

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JPS61204033A (ja) * 1985-03-05 1986-09-10 Ngk Spark Plug Co Ltd 無機質原料粉末の造粒法
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Also Published As

Publication number Publication date
FR2621030B1 (fr) 1990-11-16
DE3880664T2 (de) 1993-09-23
EP0332686A1 (de) 1989-09-20
JPH02501383A (ja) 1990-05-17
DE3880664D1 (de) 1993-06-03
FR2621030A1 (fr) 1989-03-31
US5112676A (en) 1992-05-12
WO1989002869A1 (fr) 1989-04-06
EP0332686B1 (de) 1993-04-28

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