ATE555231T1 - Heizvorrichtung vom partitionstyp - Google Patents
Heizvorrichtung vom partitionstypInfo
- Publication number
- ATE555231T1 ATE555231T1 AT06799164T AT06799164T ATE555231T1 AT E555231 T1 ATE555231 T1 AT E555231T1 AT 06799164 T AT06799164 T AT 06799164T AT 06799164 T AT06799164 T AT 06799164T AT E555231 T1 ATE555231 T1 AT E555231T1
- Authority
- AT
- Austria
- Prior art keywords
- heated
- reaction gas
- type heating
- heating device
- partition type
- Prior art date
Links
- 238000010438 heat treatment Methods 0.000 title abstract 4
- 238000005192 partition Methods 0.000 title abstract 2
- 239000012495 reaction gas Substances 0.000 abstract 4
- 238000005229 chemical vapour deposition Methods 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Control Of Resistance Heating (AREA)
- Electric Stoves And Ranges (AREA)
- Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050095655A KR100792396B1 (ko) | 2005-10-11 | 2005-10-11 | 파티션 구조형 가열유닛과 이를 이용한 히팅장치 |
PCT/KR2006/004084 WO2007043801A1 (en) | 2005-10-11 | 2006-10-11 | Partition-type heating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE555231T1 true ATE555231T1 (de) | 2012-05-15 |
Family
ID=37942996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06799164T ATE555231T1 (de) | 2005-10-11 | 2006-10-11 | Heizvorrichtung vom partitionstyp |
Country Status (6)
Country | Link |
---|---|
US (1) | US8030597B2 (de) |
EP (1) | EP1945831B1 (de) |
JP (1) | JP4943444B2 (de) |
KR (1) | KR100792396B1 (de) |
AT (1) | ATE555231T1 (de) |
WO (1) | WO2007043801A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100792396B1 (ko) * | 2005-10-11 | 2008-01-08 | 주식회사 유진테크 | 파티션 구조형 가열유닛과 이를 이용한 히팅장치 |
KR20120139387A (ko) * | 2011-06-17 | 2012-12-27 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 이를 이용한 박막 증착 방법 |
KR101998262B1 (ko) * | 2013-12-17 | 2019-10-01 | 한온시스템 주식회사 | 냉각수 가열식 히터 |
KR101959266B1 (ko) * | 2018-05-31 | 2019-03-18 | 주식회사 에이치엔씨 | 반도체 제조장치 배출라인의 고정용 지그 장치 |
CN114438474A (zh) * | 2022-02-23 | 2022-05-06 | 山东省科学院海洋仪器仪表研究所 | 一种连续批量大面积均匀镀膜热丝化学气相沉积设备及方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3939798A (en) * | 1974-12-19 | 1976-02-24 | Texas Instruments Incorporated | Optical thin film coater |
JPH0818902B2 (ja) * | 1989-11-02 | 1996-02-28 | シャープ株式会社 | 気相成長装置 |
US5362228A (en) * | 1991-11-04 | 1994-11-08 | Societe Europeenne De Propulsion | Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus |
JPH0766139A (ja) * | 1993-08-30 | 1995-03-10 | Ryoden Semiconductor Syst Eng Kk | 化学気相成長装置 |
US5480678A (en) * | 1994-11-16 | 1996-01-02 | The B. F. Goodrich Company | Apparatus for use with CVI/CVD processes |
US5786565A (en) * | 1997-01-27 | 1998-07-28 | Saint-Gobain/Norton Industrial Ceramics Corporation | Match head ceramic igniter and method of using same |
JPH11335845A (ja) * | 1998-05-20 | 1999-12-07 | Ebara Corp | 液体原料気化装置 |
JP2000119858A (ja) * | 1998-10-09 | 2000-04-25 | Mitsubishi Materials Corp | Cvd装置用気化器 |
KR100375569B1 (ko) * | 2000-05-29 | 2003-03-15 | 주식회사 영엔지니어링 | 고분자 폐기물을 위한 열분해 장치 |
JP2002008835A (ja) * | 2000-06-21 | 2002-01-11 | Square:Kk | 加熱線および加熱体 |
JP2002089801A (ja) * | 2000-09-18 | 2002-03-27 | Toshio Yoshida | 保有水を必要としない蒸気発生方法とこれに用いる装置 |
EP1211333A3 (de) * | 2000-12-01 | 2003-07-30 | Japan Pionics Co., Ltd. | Verdampfer für CVD-Anlage |
JP2002217181A (ja) * | 2001-01-19 | 2002-08-02 | Japan Steel Works Ltd:The | 半導体原料供給用気化器 |
KR100457451B1 (ko) * | 2001-12-06 | 2004-11-17 | 주성엔지니어링(주) | 소스 및 반응가스 전처리 장치 |
US6572371B1 (en) * | 2002-05-06 | 2003-06-03 | Messier-Bugatti | Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates |
JP2004081166A (ja) * | 2002-08-28 | 2004-03-18 | Ten:Kk | 飛翔性害虫駆除装置 |
TW589396B (en) * | 2003-01-07 | 2004-06-01 | Arima Optoelectronics Corp | Chemical vapor deposition reactor |
JP2004278957A (ja) * | 2003-03-17 | 2004-10-07 | Chofu Seisakusho Co Ltd | バッフルプレート |
JP4185015B2 (ja) * | 2003-05-12 | 2008-11-19 | 東京エレクトロン株式会社 | 気化原料の供給構造、原料気化器及び反応処理装置 |
JP2005175249A (ja) * | 2003-12-12 | 2005-06-30 | Japan Pionics Co Ltd | 液体材料の気化器及び気化方法 |
KR100792396B1 (ko) * | 2005-10-11 | 2008-01-08 | 주식회사 유진테크 | 파티션 구조형 가열유닛과 이를 이용한 히팅장치 |
CN101911828B (zh) * | 2007-11-16 | 2014-02-26 | 沃特洛电气制造公司 | 具有防水层的套筒加热器及其制造方法 |
-
2005
- 2005-10-11 KR KR1020050095655A patent/KR100792396B1/ko active IP Right Grant
-
2006
- 2006-10-11 WO PCT/KR2006/004084 patent/WO2007043801A1/en active Application Filing
- 2006-10-11 EP EP06799164A patent/EP1945831B1/de not_active Not-in-force
- 2006-10-11 JP JP2008535448A patent/JP4943444B2/ja not_active Expired - Fee Related
- 2006-10-11 US US12/089,912 patent/US8030597B2/en not_active Expired - Fee Related
- 2006-10-11 AT AT06799164T patent/ATE555231T1/de active
Also Published As
Publication number | Publication date |
---|---|
US20090218331A1 (en) | 2009-09-03 |
KR100792396B1 (ko) | 2008-01-08 |
EP1945831A1 (de) | 2008-07-23 |
US8030597B2 (en) | 2011-10-04 |
JP2009511745A (ja) | 2009-03-19 |
WO2007043801A1 (en) | 2007-04-19 |
EP1945831A4 (de) | 2010-12-29 |
EP1945831B1 (de) | 2012-04-25 |
KR20070040207A (ko) | 2007-04-16 |
JP4943444B2 (ja) | 2012-05-30 |
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