ATE555231T1 - Heizvorrichtung vom partitionstyp - Google Patents

Heizvorrichtung vom partitionstyp

Info

Publication number
ATE555231T1
ATE555231T1 AT06799164T AT06799164T ATE555231T1 AT E555231 T1 ATE555231 T1 AT E555231T1 AT 06799164 T AT06799164 T AT 06799164T AT 06799164 T AT06799164 T AT 06799164T AT E555231 T1 ATE555231 T1 AT E555231T1
Authority
AT
Austria
Prior art keywords
heated
reaction gas
type heating
heating device
partition type
Prior art date
Application number
AT06799164T
Other languages
English (en)
Inventor
Pyung-Yong Um
Original Assignee
Eugene Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eugene Technology Co Ltd filed Critical Eugene Technology Co Ltd
Application granted granted Critical
Publication of ATE555231T1 publication Critical patent/ATE555231T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electric Stoves And Ranges (AREA)
  • Instantaneous Water Boilers, Portable Hot-Water Supply Apparatuses, And Control Of Portable Hot-Water Supply Apparatuses (AREA)
  • Control Of Resistance Heating (AREA)
AT06799164T 2005-10-11 2006-10-11 Heizvorrichtung vom partitionstyp ATE555231T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020050095655A KR100792396B1 (ko) 2005-10-11 2005-10-11 파티션 구조형 가열유닛과 이를 이용한 히팅장치
PCT/KR2006/004084 WO2007043801A1 (en) 2005-10-11 2006-10-11 Partition-type heating apparatus

Publications (1)

Publication Number Publication Date
ATE555231T1 true ATE555231T1 (de) 2012-05-15

Family

ID=37942996

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06799164T ATE555231T1 (de) 2005-10-11 2006-10-11 Heizvorrichtung vom partitionstyp

Country Status (6)

Country Link
US (1) US8030597B2 (de)
EP (1) EP1945831B1 (de)
JP (1) JP4943444B2 (de)
KR (1) KR100792396B1 (de)
AT (1) ATE555231T1 (de)
WO (1) WO2007043801A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100792396B1 (ko) * 2005-10-11 2008-01-08 주식회사 유진테크 파티션 구조형 가열유닛과 이를 이용한 히팅장치
KR20120139387A (ko) * 2011-06-17 2012-12-27 삼성디스플레이 주식회사 박막 증착 장치 및 이를 이용한 박막 증착 방법
KR101998262B1 (ko) * 2013-12-17 2019-10-01 한온시스템 주식회사 냉각수 가열식 히터
KR101959266B1 (ko) * 2018-05-31 2019-03-18 주식회사 에이치엔씨 반도체 제조장치 배출라인의 고정용 지그 장치

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939798A (en) * 1974-12-19 1976-02-24 Texas Instruments Incorporated Optical thin film coater
JPH0818902B2 (ja) * 1989-11-02 1996-02-28 シャープ株式会社 気相成長装置
US5362228A (en) * 1991-11-04 1994-11-08 Societe Europeenne De Propulsion Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus
JPH0766139A (ja) * 1993-08-30 1995-03-10 Ryoden Semiconductor Syst Eng Kk 化学気相成長装置
US5480678A (en) * 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes
US5786565A (en) * 1997-01-27 1998-07-28 Saint-Gobain/Norton Industrial Ceramics Corporation Match head ceramic igniter and method of using same
JPH11335845A (ja) * 1998-05-20 1999-12-07 Ebara Corp 液体原料気化装置
JP2000119858A (ja) * 1998-10-09 2000-04-25 Mitsubishi Materials Corp Ｃｖｄ装置用気化器
KR100375569B1 (ko) * 2000-05-29 2003-03-15 주식회사 영엔지니어링 고분자 폐기물을 위한 열분해 장치
JP2002008835A (ja) * 2000-06-21 2002-01-11 Square:Kk 加熱線および加熱体
JP2002089801A (ja) * 2000-09-18 2002-03-27 Toshio Yoshida 保有水を必要としない蒸気発生方法とこれに用いる装置
EP1211333A3 (de) * 2000-12-01 2003-07-30 Japan Pionics Co., Ltd. Verdampfer für CVD-Anlage
JP2002217181A (ja) * 2001-01-19 2002-08-02 Japan Steel Works Ltd:The 半導体原料供給用気化器
KR100457451B1 (ko) * 2001-12-06 2004-11-17 주성엔지니어링(주) 소스 및 반응가스 전처리 장치
US6572371B1 (en) * 2002-05-06 2003-06-03 Messier-Bugatti Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates
JP2004081166A (ja) * 2002-08-28 2004-03-18 Ten:Kk 飛翔性害虫駆除装置
TW589396B (en) * 2003-01-07 2004-06-01 Arima Optoelectronics Corp Chemical vapor deposition reactor
JP2004278957A (ja) * 2003-03-17 2004-10-07 Chofu Seisakusho Co Ltd バッフルプレート
JP4185015B2 (ja) * 2003-05-12 2008-11-19 東京エレクトロン株式会社 気化原料の供給構造、原料気化器及び反応処理装置
JP2005175249A (ja) * 2003-12-12 2005-06-30 Japan Pionics Co Ltd 液体材料の気化器及び気化方法
KR100792396B1 (ko) * 2005-10-11 2008-01-08 주식회사 유진테크 파티션 구조형 가열유닛과 이를 이용한 히팅장치
US8395092B2 (en) * 2007-11-16 2013-03-12 Watlow Electric Manufacturing Company Moisture resistant layered sleeve heater and method of manufacturing thereof

Also Published As

Publication number Publication date
WO2007043801A1 (en) 2007-04-19
JP4943444B2 (ja) 2012-05-30
EP1945831B1 (de) 2012-04-25
KR20070040207A (ko) 2007-04-16
US20090218331A1 (en) 2009-09-03
US8030597B2 (en) 2011-10-04
EP1945831A1 (de) 2008-07-23
JP2009511745A (ja) 2009-03-19
KR100792396B1 (ko) 2008-01-08
EP1945831A4 (de) 2010-12-29

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