ATE553495T1 - Verbesserte sputter-target-nutzung - Google Patents
Verbesserte sputter-target-nutzungInfo
- Publication number
- ATE553495T1 ATE553495T1 AT06817742T AT06817742T ATE553495T1 AT E553495 T1 ATE553495 T1 AT E553495T1 AT 06817742 T AT06817742 T AT 06817742T AT 06817742 T AT06817742 T AT 06817742T AT E553495 T1 ATE553495 T1 AT E553495T1
- Authority
- AT
- Austria
- Prior art keywords
- target
- sputter target
- target usage
- end regions
- improved sputter
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3455—Movable magnets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
- H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74978905P | 2005-12-13 | 2005-12-13 | |
PCT/CH2006/000690 WO2007068133A1 (en) | 2005-12-13 | 2006-12-12 | Improved sputter target utilization |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE553495T1 true ATE553495T1 (de) | 2012-04-15 |
Family
ID=37814182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06817742T ATE553495T1 (de) | 2005-12-13 | 2006-12-12 | Verbesserte sputter-target-nutzung |
Country Status (7)
Country | Link |
---|---|
US (1) | US8273221B2 (de) |
EP (1) | EP1964150B1 (de) |
JP (1) | JP5171636B2 (de) |
KR (1) | KR20080080365A (de) |
CN (1) | CN101375366B (de) |
AT (1) | ATE553495T1 (de) |
WO (1) | WO2007068133A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9812302B2 (en) * | 2007-03-16 | 2017-11-07 | National University Corporation Tohoku University | Magnetron sputtering apparatus |
WO2008126811A1 (ja) * | 2007-04-06 | 2008-10-23 | National University Corporation Tohoku University | マグネトロンスパッタ装置 |
WO2011068263A1 (ko) * | 2009-12-03 | 2011-06-09 | (주)에스엔텍 | 원통형 스퍼터링 캐소드 |
KR101187977B1 (ko) | 2009-12-08 | 2012-10-05 | 삼성전기주식회사 | 패키지 기판 및 그의 제조방법 |
CN103459658B (zh) * | 2011-01-13 | 2015-09-23 | 明尼苏达大学董事会 | 纳米颗粒沉积系统 |
US20160133445A9 (en) * | 2011-11-04 | 2016-05-12 | Intevac, Inc. | Sputtering system and method for highly magnetic materials |
CN102595764A (zh) * | 2012-03-13 | 2012-07-18 | 苏州爱因智能设备有限公司 | 用于电子直线加速器的自动频率控制驱动装置 |
US9249987B2 (en) | 2013-01-30 | 2016-02-02 | Honeywell International Inc. | Mounting bracket for use with a water heater |
KR20150119188A (ko) | 2013-02-15 | 2015-10-23 | 리젠츠 오브 더 유니버시티 오브 미네소타 | 입자 기능화 |
JP6403269B2 (ja) * | 2014-07-30 | 2018-10-10 | 株式会社神戸製鋼所 | アーク蒸発源 |
EP3091101B1 (de) | 2015-05-06 | 2018-10-17 | safematic GmbH | Beschichtungseinheit |
EP3091561B1 (de) | 2015-05-06 | 2019-09-04 | safematic GmbH | Sputtereinheit |
US10151023B2 (en) | 2016-06-27 | 2018-12-11 | Cardinal Cg Company | Laterally adjustable return path magnet assembly and methods |
US10056238B2 (en) | 2016-06-27 | 2018-08-21 | Cardinal Cg Company | Adjustable return path magnet assembly and methods |
US10790127B2 (en) | 2017-05-04 | 2020-09-29 | Cardinal Cg Company | Flexible adjustable return path magnet assembly and methods |
TWI740098B (zh) * | 2019-01-29 | 2021-09-21 | 友威科技股份有限公司 | 具異磁性强度分布的磁性靶材 |
CN110592542A (zh) * | 2019-08-03 | 2019-12-20 | 山东司莱美克新材料科技有限公司 | 一种磁控溅射镀膜系统及其控制方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4166018A (en) | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
US3956093A (en) | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
DE2707144A1 (de) | 1976-02-19 | 1977-08-25 | Sloan Technology Corp | Kathodenzerstaeubungsvorrichtung |
JPS5747870A (en) * | 1980-09-04 | 1982-03-18 | Fujitsu Ltd | Magnetron sputtering method for ferromagnetic material |
US4356073A (en) | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
JPS57190320A (en) | 1981-05-20 | 1982-11-22 | Toshiba Corp | Dry etching method |
US4466877A (en) | 1983-10-11 | 1984-08-21 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
JPS6134177A (ja) | 1984-07-25 | 1986-02-18 | Tokuda Seisakusho Ltd | マグネツト駆動装置 |
JPS61295369A (ja) | 1985-06-25 | 1986-12-26 | Nec Corp | スパツタリング装置 |
JPS61295368A (ja) * | 1985-06-25 | 1986-12-26 | Shinku Kikai Kogyo Kk | マグネトロンスパツタ用カソ−ド |
DE4017111C2 (de) * | 1990-05-28 | 1998-01-29 | Hauzer Holding | Lichtbogen-Magnetron-Vorrichtung |
JPH0230757A (ja) | 1988-07-19 | 1990-02-01 | Tokyo Electron Ltd | マグネトロンスパッタリング方法 |
DE3929695C2 (de) * | 1989-09-07 | 1996-12-19 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats |
JPH04276069A (ja) | 1991-03-04 | 1992-10-01 | Ube Ind Ltd | スパッタリング方法およびその装置 |
DE4107505A1 (de) | 1991-03-08 | 1992-09-10 | Leybold Ag | Verfahren zum betrieb einer sputteranlage und vorrichtung zur durchfuehrung des verfahrens |
US5399253A (en) * | 1992-12-23 | 1995-03-21 | Balzers Aktiengesellschaft | Plasma generating device |
JPH1143766A (ja) * | 1997-07-23 | 1999-02-16 | Matsushita Electric Ind Co Ltd | 薄膜形成方法及び装置 |
EP0918351A1 (de) * | 1997-11-19 | 1999-05-26 | Sinvaco N.V. | Flaches magnetron mit bewegbarer Magnetsanlage |
EP1063679B1 (de) | 1999-06-21 | 2008-01-09 | Bekaert Advanced Coatings NV. | Magnetron mit beweglicher Magnetanordnung zur Kompensation des Erosionsprofils |
US7101466B2 (en) * | 2003-09-19 | 2006-09-05 | Kdf Electronic + Vacuum Services Inc | Linear sweeping magnetron sputtering cathode and scanning in-line system for arc-free reactive deposition and high target utilization |
-
2006
- 2006-12-12 WO PCT/CH2006/000690 patent/WO2007068133A1/en active Application Filing
- 2006-12-12 CN CN2006800524693A patent/CN101375366B/zh not_active Expired - Fee Related
- 2006-12-12 EP EP06817742A patent/EP1964150B1/de not_active Not-in-force
- 2006-12-12 JP JP2008544730A patent/JP5171636B2/ja not_active Expired - Fee Related
- 2006-12-12 AT AT06817742T patent/ATE553495T1/de active
- 2006-12-12 KR KR1020087017014A patent/KR20080080365A/ko not_active Application Discontinuation
- 2006-12-13 US US11/638,176 patent/US8273221B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP5171636B2 (ja) | 2013-03-27 |
KR20080080365A (ko) | 2008-09-03 |
US20070175749A1 (en) | 2007-08-02 |
WO2007068133A1 (en) | 2007-06-21 |
US8273221B2 (en) | 2012-09-25 |
EP1964150A1 (de) | 2008-09-03 |
CN101375366B (zh) | 2011-04-27 |
EP1964150B1 (de) | 2012-04-11 |
CN101375366A (zh) | 2009-02-25 |
JP2009519375A (ja) | 2009-05-14 |
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