ATE549743T1 - Ein lithographiesystem mit einem halterungssystem - Google Patents

Ein lithographiesystem mit einem halterungssystem

Info

Publication number
ATE549743T1
ATE549743T1 AT10183090T AT10183090T ATE549743T1 AT E549743 T1 ATE549743 T1 AT E549743T1 AT 10183090 T AT10183090 T AT 10183090T AT 10183090 T AT10183090 T AT 10183090T AT E549743 T1 ATE549743 T1 AT E549743T1
Authority
AT
Austria
Prior art keywords
chuck body
recess
recesses
support region
extending
Prior art date
Application number
AT10183090T
Other languages
English (en)
Inventor
Byung Choi
Ronald Voisin
Sidlgata Sreenivasan
Michael Watts
Daniel Babbs
Mario J Meissl
Hillman Bailey
Norman Schumaker
Original Assignee
Molecular Imprints Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/293,224 external-priority patent/US7019819B2/en
Priority claimed from US10/316,963 external-priority patent/US6980282B2/en
Application filed by Molecular Imprints Inc filed Critical Molecular Imprints Inc
Application granted granted Critical
Publication of ATE549743T1 publication Critical patent/ATE549743T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/62—Holders for the original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Mathematical Physics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
AT10183090T 2002-11-13 2003-11-12 Ein lithographiesystem mit einem halterungssystem ATE549743T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/293,224 US7019819B2 (en) 2002-11-13 2002-11-13 Chucking system for modulating shapes of substrates
US10/316,963 US6980282B2 (en) 2002-12-11 2002-12-11 Method for modulating shapes of substrates

Publications (1)

Publication Number Publication Date
ATE549743T1 true ATE549743T1 (de) 2012-03-15

Family

ID=32314388

Family Applications (3)

Application Number Title Priority Date Filing Date
AT10183090T ATE549743T1 (de) 2002-11-13 2003-11-12 Ein lithographiesystem mit einem halterungssystem
AT03768879T ATE438197T1 (de) 2002-11-13 2003-11-12 Ein halterungssystem und ein verfahren zum modulieren von substratformen
AT09163924T ATE540427T1 (de) 2002-11-13 2003-11-12 Ein verfahren um formen von substraten zu modulieren

Family Applications After (2)

Application Number Title Priority Date Filing Date
AT03768879T ATE438197T1 (de) 2002-11-13 2003-11-12 Ein halterungssystem und ein verfahren zum modulieren von substratformen
AT09163924T ATE540427T1 (de) 2002-11-13 2003-11-12 Ein verfahren um formen von substraten zu modulieren

Country Status (9)

Country Link
EP (3) EP2261966B1 (de)
JP (1) JP4391420B2 (de)
KR (1) KR101056505B1 (de)
AT (3) ATE549743T1 (de)
AU (1) AU2003291477A1 (de)
DE (2) DE60328626D1 (de)
MY (1) MY133312A (de)
TW (1) TWI302228B (de)
WO (1) WO2004044651A1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
EP2177951A1 (de) * 2003-05-14 2010-04-21 Molecular Imprints, Inc. Verfahren, System, Halter und Anordnung zur Übertragung von Vorlagen bei Drucklithografieverfahren
US7019835B2 (en) * 2004-02-19 2006-03-28 Molecular Imprints, Inc. Method and system to measure characteristics of a film disposed on a substrate
US20050275311A1 (en) * 2004-06-01 2005-12-15 Molecular Imprints, Inc. Compliant device for nano-scale manufacturing
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
JP4574240B2 (ja) 2004-06-11 2010-11-04 キヤノン株式会社 加工装置、加工方法、デバイス製造方法
US7635263B2 (en) 2005-01-31 2009-12-22 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
JP3958344B2 (ja) 2005-06-07 2007-08-15 キヤノン株式会社 インプリント装置、インプリント方法及びチップの製造方法
US7927089B2 (en) 2005-06-08 2011-04-19 Canon Kabushiki Kaisha Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
KR101293059B1 (ko) * 2005-12-08 2013-08-05 몰레큘러 임프린츠 인코퍼레이티드 기판과 몰드 사이에 위치되는 기체를 축출하기 위한 방법
EP2007566A4 (de) * 2006-04-03 2010-10-13 Molecular Imprints Inc Aufspannsystem mit einer anordnung aus druckkästen
US8215946B2 (en) * 2006-05-18 2012-07-10 Molecular Imprints, Inc. Imprint lithography system and method
EP2366801B1 (de) 2006-06-14 2016-10-19 Verinata Health, Inc Verfahren zur Diagnose fötaler Missbildungen
NL2003380A (en) 2008-10-17 2010-04-20 Asml Netherlands Bv Imprint lithography apparatus and method.
US8652393B2 (en) 2008-10-24 2014-02-18 Molecular Imprints, Inc. Strain and kinetics control during separation phase of imprint process
US8309008B2 (en) * 2008-10-30 2012-11-13 Molecular Imprints, Inc. Separation in an imprint lithography process
KR101319353B1 (ko) * 2009-12-23 2013-10-16 엘지디스플레이 주식회사 평판 표시 소자의 제조 장치 및 방법
WO2011139782A1 (en) * 2010-04-27 2011-11-10 Molecular Imprints, Inc. Separation control substrate/template for nanoimprint lithography
JP6004738B2 (ja) * 2011-09-07 2016-10-12 キヤノン株式会社 インプリント装置、それを用いた物品の製造方法
JP5938218B2 (ja) * 2012-01-16 2016-06-22 キヤノン株式会社 インプリント装置、物品の製造方法およびインプリント方法
JP6252098B2 (ja) 2012-11-01 2017-12-27 信越化学工業株式会社 角形金型用基板
WO2015070054A1 (en) * 2013-11-08 2015-05-14 Canon Nanotechnologies, Inc. Low contact imprint lithography template chuck system for improved overlay correction
JP6333031B2 (ja) * 2014-04-09 2018-05-30 キヤノン株式会社 インプリント装置および物品の製造方法
US10118381B2 (en) 2014-04-22 2018-11-06 Ev Group E. Thallner Gmbh Method and device for embossing of a nanostructure
WO2016135565A1 (en) * 2015-02-23 2016-09-01 M Cubed Technologies, Inc. Film electrode for electrostatic chuck
US11454883B2 (en) * 2016-11-14 2022-09-27 Canon Kabushiki Kaisha Template replication
US10996560B2 (en) * 2017-07-31 2021-05-04 Canon Kabushiki Kaisha Real-time correction of template deformation in nanoimprint lithography
JP7134717B2 (ja) * 2018-05-31 2022-09-12 キヤノン株式会社 インプリント装置、インプリント方法および物品製造方法
CN109895235B (zh) * 2019-03-01 2023-09-15 佛山三劦智能科技有限公司 一种陶瓷自动注浆成型的模具夹具
CN116056865A (zh) 2020-09-08 2023-05-02 佳能株式会社 成型装置及物品制造方法
CN113370078A (zh) * 2021-06-28 2021-09-10 徐州超杰电动车配件有限公司 一种电动车配件用的加工操作台

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JPH06244269A (ja) * 1992-09-07 1994-09-02 Mitsubishi Electric Corp 半導体製造装置並びに半導体製造装置におけるウエハ真空チャック装置及びガスクリーニング方法及び窒化膜形成方法
US5515167A (en) * 1994-09-13 1996-05-07 Hughes Aircraft Company Transparent optical chuck incorporating optical monitoring
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US20030179354A1 (en) * 1996-03-22 2003-09-25 Nikon Corporation Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method
JPH10172897A (ja) * 1996-12-05 1998-06-26 Nikon Corp 基板アダプタ，基板保持装置及び基板保持方法
JPH11111819A (ja) 1997-09-30 1999-04-23 Asahi Kasei Micro Syst Co Ltd ウェハーの固定方法及び露光装置
US6032997A (en) * 1998-04-16 2000-03-07 Excimer Laser Systems Vacuum chuck
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
JP2000340510A (ja) * 1999-05-31 2000-12-08 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法
US20020039728A1 (en) * 2000-02-10 2002-04-04 Robert Kain Alternative substrates and formats for bead-based array of arrays
EP1405336A2 (de) * 2000-12-04 2004-04-07 Ebara Corporation Substratverarbeitungsverfahren

Also Published As

Publication number Publication date
EP2261966B1 (de) 2012-03-14
WO2004044651A1 (en) 2004-05-27
EP2261966A2 (de) 2010-12-15
KR20050086591A (ko) 2005-08-30
AU2003291477A1 (en) 2004-06-03
WO2004044651B1 (en) 2004-08-05
KR101056505B1 (ko) 2011-08-11
ATE540427T1 (de) 2012-01-15
EP1567913A4 (de) 2008-08-13
DE60328626D1 (de) 2009-09-10
TWI302228B (en) 2008-10-21
EP2099066B1 (de) 2012-01-04
EP1567913B1 (de) 2009-07-29
JP4391420B2 (ja) 2009-12-24
MY133312A (en) 2007-11-30
JP2006506814A (ja) 2006-02-23
AU2003291477A8 (en) 2004-06-03
DE20320446U1 (de) 2005-01-27
EP2099066A1 (de) 2009-09-09
TW200411340A (en) 2004-07-01
EP2261966A3 (de) 2010-12-29
EP1567913A1 (de) 2005-08-31
ATE438197T1 (de) 2009-08-15

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