ATE519872T1 - Vorrichtung und verfahren zum elektrolytischen behandeln einer plattenförmigen ware - Google Patents
Vorrichtung und verfahren zum elektrolytischen behandeln einer plattenförmigen wareInfo
- Publication number
- ATE519872T1 ATE519872T1 AT08759143T AT08759143T ATE519872T1 AT E519872 T1 ATE519872 T1 AT E519872T1 AT 08759143 T AT08759143 T AT 08759143T AT 08759143 T AT08759143 T AT 08759143T AT E519872 T1 ATE519872 T1 AT E519872T1
- Authority
- AT
- Austria
- Prior art keywords
- product
- treatment
- plate
- shaped product
- electrolytically treating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/04—Electroplating with moving electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1509—Horizontally held PCB
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electrolytic Production Of Metals (AREA)
- Coating Apparatus (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007026633A DE102007026633B4 (de) | 2007-06-06 | 2007-06-06 | Vorrichtung und Verfahren zum elektrolytischen Behandeln von plattenförmiger Ware |
| PCT/EP2008/004616 WO2008148578A1 (en) | 2007-06-06 | 2008-06-03 | Apparatus and method for the electrolytic treatment of a plate-shaped product |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE519872T1 true ATE519872T1 (de) | 2011-08-15 |
Family
ID=39712035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08759143T ATE519872T1 (de) | 2007-06-06 | 2008-06-03 | Vorrichtung und verfahren zum elektrolytischen behandeln einer plattenförmigen ware |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US8545687B2 (de) |
| EP (1) | EP2176450B9 (de) |
| JP (2) | JP2010530029A (de) |
| KR (2) | KR20100019481A (de) |
| CN (1) | CN101730760B (de) |
| AT (1) | ATE519872T1 (de) |
| BR (1) | BRPI0812259A2 (de) |
| DE (1) | DE102007026633B4 (de) |
| PL (1) | PL2176450T3 (de) |
| TW (1) | TWI433965B (de) |
| WO (1) | WO2008148578A1 (de) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2457994C2 (ru) * | 2007-06-05 | 2012-08-10 | Нестек С.А. | Одноразовая капсула для приготовления пищевой жидкости с помощью центрифугирования |
| CN101686771B (zh) * | 2007-06-05 | 2012-05-30 | 雀巢产品技术援助有限公司 | 用于通过离心法来制备容器中容纳的食品液体的胶囊系统、设备和方法 |
| DE602008006068D1 (de) * | 2007-06-05 | 2011-05-19 | Nestec Sa | Verfahren zur herstellung eines getränks oder flüssigen nahrungsmittels |
| US8431175B2 (en) * | 2007-06-05 | 2013-04-30 | Nestec S.A. | Method for preparing a beverage or food liquid and system using brewing centrifugal force |
| ES2401918T3 (es) * | 2007-06-05 | 2013-04-25 | Nestec S.A. | Cápsula y procedimiento para la preparación de un líquido alimenticio por centrifugación |
| ES2550307T3 (es) * | 2008-09-02 | 2015-11-06 | Nestec S.A. | Dispositivo de producción controlada de bebidas usando fuerzas centrífugas |
| CA2734679C (en) | 2008-09-02 | 2016-08-16 | Nestec S.A. | Method for preparing a food liquid contained in a capsule by centrifugation and system adapted for such method |
| RU2511493C2 (ru) | 2008-12-09 | 2014-04-10 | Нестек С.А. | Система для приготовления жидкой пищи способом центрифугирования |
| JP5375596B2 (ja) * | 2009-02-19 | 2013-12-25 | 株式会社デンソー | 噴流式めっき方法および装置 |
| PL2592021T3 (pl) * | 2009-08-19 | 2015-08-31 | Nestec Sa | Kapsułka do wytwarzania ekstraktu kawowego posiadająca strukturę ułatwiającą perforację dla wtrysku wody |
| ES2434321T3 (es) | 2009-08-28 | 2013-12-16 | Nestec S.A. | Sistema de cápsula para la preparación de bebidas por centrifugación |
| US8658232B2 (en) * | 2009-08-28 | 2014-02-25 | Nestec S.A. | Capsule system for the preparation of beverages by centrifugation |
| DE102010033256A1 (de) | 2010-07-29 | 2012-02-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Methode zur Erzeugung gezielter Strömungs- und Stromdichtemuster bei der chemischen und elektrolytischen Oberflächenbehandlung |
| WO2012073501A1 (ja) * | 2010-12-01 | 2012-06-07 | マルイ鍍金工業株式会社 | 電解液、電解ケース、電解研磨システムおよび、それらを用いた電解研磨方法 |
| EP2518187A1 (de) | 2011-04-26 | 2012-10-31 | Atotech Deutschland GmbH | Wässriges Säurebad zur elektrolytischen Ablagerung von Kupfer |
| US20140083842A1 (en) * | 2012-09-25 | 2014-03-27 | Almex Pe Inc. | Serial plating system |
| EP2746432A1 (de) * | 2012-12-20 | 2014-06-25 | Atotech Deutschland GmbH | Vorrichtung zur vertikalen galvanischen Metallabscheidung auf einem Substrat |
| ITMI20130466A1 (it) * | 2013-03-27 | 2014-09-28 | Qualital Servizi S R L | Sistema di pretrattamento alla verniciatura dell'alluminio mediante una tecnica innovativa di ossidazione anodica. |
| EP2813601A1 (de) | 2013-06-14 | 2014-12-17 | ATOTECH Deutschland GmbH | Vorrichtung zum Bewegen eines Substrathalters während einer vertikalen galvanischen Metallabscheidung und Verfahren zur vertikalen galvanischen Metallabscheidung unter Verwendung solch einer Vorrichtung |
| EP3117028B1 (de) * | 2014-03-11 | 2019-11-20 | Qualital Servizi S.r.l. | Anlage und verfahren zur anodisierungsbehandlung von produkten aus aluminium oder seinen legierungen |
| CN105063709B (zh) * | 2015-09-18 | 2018-02-23 | 安捷利电子科技(苏州)有限公司 | 印刷电路板用电镀装置 |
| EP3176288A1 (de) * | 2015-12-03 | 2017-06-07 | ATOTECH Deutschland GmbH | Verfahren zur galvanischen metallabscheidung |
| WO2017213021A1 (ja) * | 2016-06-09 | 2017-12-14 | Jfeスチール株式会社 | 電気めっき鋼板の製造方法およびその製造装置 |
| PT3287550T (pt) * | 2016-08-23 | 2019-05-30 | Atotech Deutschland Gmbh | Dispositivo para deposição galvânica vertical de metal num substrato |
| JP6995544B2 (ja) * | 2017-09-20 | 2022-01-14 | 上村工業株式会社 | 表面処理装置および表面処理方法 |
| CN113943966A (zh) * | 2020-07-16 | 2022-01-18 | 南通深南电路有限公司 | 一种电路板的电镀装置和电镀方法 |
| CN112899743B (zh) * | 2021-01-19 | 2021-09-21 | 鑫巨(深圳)半导体科技有限公司 | 一种电镀装置及电镀方法 |
| CN114808057B (zh) * | 2021-01-29 | 2024-06-21 | 泰科电子(上海)有限公司 | 电镀装置和电镀系统 |
| CN117964183B (zh) * | 2024-04-02 | 2024-06-07 | 生态环境部华南环境科学研究所(生态环境部生态环境应急研究所) | 一种苯胺类事故废水应急处置方法及一体化装置 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3963588A (en) * | 1975-04-21 | 1976-06-15 | United States Steel Corporation | Coalescent-jet apparatus and method for high current density preferential electroplating |
| US4043891A (en) * | 1976-01-14 | 1977-08-23 | Bell Telephone Laboratories, Incorporated | Electrolytic cell with bipolar electrodes |
| JPS5836079B2 (ja) * | 1980-12-02 | 1983-08-06 | 日鉱エンジニアリング株式会社 | 金属表面処理装置 |
| JPS57210989A (en) * | 1981-02-10 | 1982-12-24 | Hiroshige Sawa | Electroplating method |
| CA1190514A (en) * | 1981-06-25 | 1985-07-16 | George R. Scanlon | High speed plating of flat planar workpieces |
| US4622917A (en) * | 1982-09-27 | 1986-11-18 | Etd Technology, Inc. | Apparatus and method for electroless plating |
| US4443304A (en) | 1982-10-01 | 1984-04-17 | Micro-Plate, Inc. | Plating system and method |
| JPS59181873U (ja) * | 1983-05-21 | 1984-12-04 | 株式会社 中央製作所 | 板状被表面処理物のメツキ処理装置 |
| DE3804070C3 (de) * | 1988-02-10 | 1994-02-24 | Siemens Nixdorf Inf Syst | Galvanisieranlage für Leiterplatten |
| JPH07113159B2 (ja) * | 1988-08-29 | 1995-12-06 | 日本電装株式会社 | めっき装置 |
| JPH0826480B2 (ja) * | 1989-03-28 | 1996-03-13 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | メッキ装置及びメッキ金属の補給方法 |
| DE4133561C2 (de) | 1991-10-10 | 1994-02-03 | Reinhard Kissler Gmbh | Verfahren und Vorrichtung zum Galvanisieren von Waren |
| DE4322378A1 (de) | 1993-07-06 | 1995-01-12 | Hans Henig | Verfahren und Einrichtung zur Oberflächenbehandlung vornehmlich plattenförmiger Werkstücke in horizontaler Betriebslage |
| US5421987A (en) * | 1993-08-30 | 1995-06-06 | Tzanavaras; George | Precision high rate electroplating cell and method |
| US5597469A (en) * | 1995-02-13 | 1997-01-28 | International Business Machines Corporation | Process for selective application of solder to circuit packages |
| JP3438387B2 (ja) * | 1995-03-16 | 2003-08-18 | 株式会社デンソー | めっき装置およびめっき方法 |
| JP3352352B2 (ja) | 1997-03-31 | 2002-12-03 | 新光電気工業株式会社 | めっき装置、めっき方法およびバンプの形成方法 |
| DE19717512C3 (de) * | 1997-04-25 | 2003-06-18 | Atotech Deutschland Gmbh | Vorrichtung zum Galvanisieren von Leiterplatten unter konstanten Bedingungen in Durchlaufanlagen |
| US5865984A (en) * | 1997-06-30 | 1999-02-02 | International Business Machines Corporation | Electrochemical etching apparatus and method for spirally etching a workpiece |
| US6103096A (en) * | 1997-11-12 | 2000-08-15 | International Business Machines Corporation | Apparatus and method for the electrochemical etching of a wafer |
| KR100474746B1 (ko) | 1998-02-12 | 2005-03-08 | 에이씨엠 리서치, 인코포레이티드 | 도금 장치 및 방법 |
| JPH11288893A (ja) * | 1998-04-03 | 1999-10-19 | Nec Corp | 半導体製造装置及び半導体装置の製造方法 |
| US6132586A (en) * | 1998-06-11 | 2000-10-17 | Integrated Process Equipment Corporation | Method and apparatus for non-contact metal plating of semiconductor wafers using a bipolar electrode assembly |
| US6610190B2 (en) * | 2000-11-03 | 2003-08-26 | Nutool, Inc. | Method and apparatus for electrodeposition of uniform film with minimal edge exclusion on substrate |
| US6984302B2 (en) * | 1998-12-30 | 2006-01-10 | Intel Corporation | Electroplating cell based upon rotational plating solution flow |
| JP4175528B2 (ja) * | 1999-02-25 | 2008-11-05 | 株式会社ナウケミカル | めっき装置 |
| JP3352081B2 (ja) | 2001-02-01 | 2002-12-03 | 株式会社アスカエンジニアリング | プリント基板の銅めっき装置 |
| US6989084B2 (en) * | 2001-11-02 | 2006-01-24 | Rockwell Scientific Licensing, Llc | Semiconductor wafer plating cell assembly |
| WO2003056609A2 (en) * | 2001-12-24 | 2003-07-10 | Koninklijke Philips Electronics N.V. | Apparatus and method for electroplating a wafer surface |
| JP4330380B2 (ja) * | 2003-05-29 | 2009-09-16 | 株式会社荏原製作所 | めっき装置及びめっき方法 |
| US7875158B2 (en) * | 2003-03-11 | 2011-01-25 | Ebara Corporation | Plating apparatus |
| US20040182715A1 (en) * | 2003-03-20 | 2004-09-23 | Jeffrey Bogart | Process and apparatus for air bubble removal during electrochemical processing |
| JP4624738B2 (ja) | 2003-08-21 | 2011-02-02 | 株式会社荏原製作所 | めっき装置 |
| EP1903129A1 (de) * | 2003-11-20 | 2008-03-26 | Process Automation International Limited | Flüssigkeitsliefersystem für ein Galvanisiergerät, ein Galvanisiergerät mit einem derartigen Flüssigkeitsliefersystem und ein Verfahren zum Betreiben eines Galvanisiergeräts |
-
2007
- 2007-06-06 DE DE102007026633A patent/DE102007026633B4/de not_active Expired - Fee Related
-
2008
- 2008-06-03 KR KR1020097025444A patent/KR20100019481A/ko not_active Ceased
- 2008-06-03 EP EP08759143A patent/EP2176450B9/de not_active Not-in-force
- 2008-06-03 PL PL08759143T patent/PL2176450T3/pl unknown
- 2008-06-03 BR BRPI0812259-8A2A patent/BRPI0812259A2/pt not_active IP Right Cessation
- 2008-06-03 US US12/602,703 patent/US8545687B2/en not_active Expired - Fee Related
- 2008-06-03 WO PCT/EP2008/004616 patent/WO2008148578A1/en not_active Ceased
- 2008-06-03 JP JP2010510699A patent/JP2010530029A/ja active Pending
- 2008-06-03 CN CN200880018855XA patent/CN101730760B/zh active Active
- 2008-06-03 AT AT08759143T patent/ATE519872T1/de active
- 2008-06-03 KR KR1020157013377A patent/KR101641475B1/ko not_active Expired - Fee Related
- 2008-06-05 TW TW097120909A patent/TWI433965B/zh not_active IP Right Cessation
-
2013
- 2013-06-12 JP JP2013123570A patent/JP5597751B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010530029A (ja) | 2010-09-02 |
| TW200918689A (en) | 2009-05-01 |
| DE102007026633A1 (de) | 2008-12-11 |
| KR20150071031A (ko) | 2015-06-25 |
| PL2176450T3 (pl) | 2011-12-30 |
| KR101641475B1 (ko) | 2016-07-20 |
| US8545687B2 (en) | 2013-10-01 |
| JP5597751B2 (ja) | 2014-10-01 |
| EP2176450B1 (de) | 2011-08-10 |
| WO2008148578A1 (en) | 2008-12-11 |
| US20100176004A1 (en) | 2010-07-15 |
| DE102007026633B4 (de) | 2009-04-02 |
| BRPI0812259A2 (pt) | 2014-12-23 |
| TWI433965B (zh) | 2014-04-11 |
| CN101730760A (zh) | 2010-06-09 |
| CN101730760B (zh) | 2011-09-28 |
| EP2176450A1 (de) | 2010-04-21 |
| KR20100019481A (ko) | 2010-02-18 |
| EP2176450B9 (de) | 2012-02-01 |
| JP2013224492A (ja) | 2013-10-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification |
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