ATE510332T1 - Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers - Google Patents

Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers

Info

Publication number
ATE510332T1
ATE510332T1 AT08744395T AT08744395T ATE510332T1 AT E510332 T1 ATE510332 T1 AT E510332T1 AT 08744395 T AT08744395 T AT 08744395T AT 08744395 T AT08744395 T AT 08744395T AT E510332 T1 ATE510332 T1 AT E510332T1
Authority
AT
Austria
Prior art keywords
laser
pressure
gases
excimer laser
gas discharge
Prior art date
Application number
AT08744395T
Other languages
English (en)
Inventor
Jeffrey I Levatter
James Morris
David Brooks
Original Assignee
Photomedex Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Photomedex Inc filed Critical Photomedex Inc
Application granted granted Critical
Publication of ATE510332T1 publication Critical patent/ATE510332T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2253—XeCl, i.e. xenon chloride is comprised for lasing around 308 nm

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
AT08744395T 2007-03-27 2008-03-26 Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers ATE510332T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US92027207P 2007-03-27 2007-03-27
PCT/US2008/058293 WO2008118975A2 (en) 2007-03-27 2008-03-26 Method and apparatus for efficiently operating a gas discharge excimer laser

Publications (1)

Publication Number Publication Date
ATE510332T1 true ATE510332T1 (de) 2011-06-15

Family

ID=39789265

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08744395T ATE510332T1 (de) 2007-03-27 2008-03-26 Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers

Country Status (6)

Country Link
US (2) US20080240197A1 (de)
EP (1) EP2140529B1 (de)
KR (1) KR20100015929A (de)
AT (1) ATE510332T1 (de)
TW (1) TW200903935A (de)
WO (1) WO2008118975A2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2002245163A1 (en) * 2000-10-20 2002-07-24 Photomedex Controlled dose delivery of ultraviolet light for treating skin disorders
US7144248B2 (en) * 2001-10-18 2006-12-05 Irwin Dean S Device for oral UV photo-therapy
US20070032844A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Targeted UV phototherapy light block
US20070030876A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Apparatus and method for purging and recharging excimer laser gases
ATE510332T1 (de) * 2007-03-27 2011-06-15 Photomedex Inc Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers
JP6310390B2 (ja) * 2012-06-26 2018-04-11 ギガフォトン株式会社 レーザ装置の制御方法及びレーザ装置
US9116445B2 (en) 2012-11-29 2015-08-25 Kla-Tencor Corporation Resonant cavity conditioning for improved nonlinear crystal performance
SG11201600458RA (en) * 2013-07-23 2016-02-26 Entegris Inc Remote delivery of chemical reagents
US8929419B1 (en) * 2013-08-13 2015-01-06 Lightmachinery Inc. Excimer laser with gas purification
US9634455B1 (en) * 2016-02-16 2017-04-25 Cymer, Llc Gas optimization in a gas discharge light source
US11581692B2 (en) 2019-06-18 2023-02-14 KLA Corp. Controlling pressure in a cavity of a light source

Family Cites Families (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US627258A (en) * 1899-06-20 Machine for manufacturing ropes or cables
US3404349A (en) * 1964-04-28 1968-10-01 Bell Telephone Labor Inc Optical maser for higher order modes
US3437955A (en) * 1964-12-29 1969-04-08 Bell Telephone Labor Inc Phase locked laser oscillator
US3471803A (en) * 1967-04-28 1969-10-07 Hughes Aircraft Co Laser having a stabilized output spectrum
FR1552030A (de) * 1967-10-31 1969-01-03
US3596201A (en) * 1970-06-08 1971-07-27 Hughes Aircraft Co Frequency stabilized laser
FR2180573B1 (de) * 1972-04-21 1977-01-14 Anvar
US4099143A (en) * 1977-01-14 1978-07-04 Universal Laser Corp. Gas recirculating stabilized laser
US4230995A (en) * 1978-10-24 1980-10-28 The United States Of America As Represented By The Secretary Of The Navy Electrically excited mercury halide laser
US4380079A (en) * 1980-09-12 1983-04-12 Northrop Corp. Gas laser preionization device
DE3245655A1 (de) * 1982-09-01 1984-06-14 Johann Josef 8918 Diessen Kerschgens Uv-bestrahlungsvorrichtung vorzugsweise als vorsatzeinrichtung fuer einen foen
US4567597A (en) * 1982-10-15 1986-01-28 Mandella Michael J High power laser system
JPH06101596B2 (ja) * 1983-02-21 1994-12-12 株式会社小松製作所 クロスフロ−型レ−ザ装置
US4611327A (en) * 1983-11-25 1986-09-09 Amoco Corporation Gas transport laser system
IT1197768B (it) * 1983-12-29 1988-12-06 Selenia Ind Elettroniche Preionizzatore ad effetto corona per laser a gas
US4719641A (en) * 1985-11-08 1988-01-12 Summit Technology, Inc. Multiple chamber laser containment system
US4817096A (en) * 1986-03-26 1989-03-28 United Technologies Corporation Multiple wavelength excimer laser
US4891818A (en) * 1987-08-31 1990-01-02 Acculase, Inc. Rare gas-halogen excimer laser
US5015067A (en) * 1988-01-15 1991-05-14 Acculase, Inc. Optical fiber power output measuring means
US5018162A (en) * 1988-01-15 1991-05-21 Cymer Laser Technologies Compact excimer laser
US4927231A (en) * 1988-01-21 1990-05-22 Acculase Inc. Liquid filled flexible distal tip light guide
US4977573A (en) * 1989-03-09 1990-12-11 Questek, Inc. Excimer laser output control device
US5044717A (en) * 1990-01-18 1991-09-03 Acculase, Inc. Method and apparatus for coupling high energy laser to fiberoptic waveguide
JP3467268B2 (ja) * 1990-08-06 2003-11-17 アキュレイズ，インコーポレイテッド ファイバー光学によるレーザーカテーテル
JPH0756902B2 (ja) * 1990-09-12 1995-06-14 株式会社日立製作所 ハロゲンガス注入型エキシマレーザ装置のハロゲンガス注入方法
US5389096A (en) * 1990-12-18 1995-02-14 Advanced Cardiovascular Systems System and method for percutaneous myocardial revascularization
US5380316A (en) * 1990-12-18 1995-01-10 Advanced Cardiovascular Systems, Inc. Method for intra-operative myocardial device revascularization
JPH0521868A (ja) * 1991-07-17 1993-01-29 Matsushita Electric Ind Co Ltd エキシマレーザ発振装置
US5463650A (en) * 1992-07-17 1995-10-31 Kabushiki Kaisha Komatsu Seisakusho Apparatus for controlling output of an excimer laser device
US5450436A (en) * 1992-11-20 1995-09-12 Kabushiki Kaisha Komatsu Seisakusho Laser gas replenishing apparatus and method in excimer laser system
JP3297108B2 (ja) * 1992-12-04 2002-07-02 株式会社小松製作所 エキシマレーザ装置の制御方法
US5450207A (en) * 1993-07-16 1995-09-12 Cymer Laser Technologies Method and apparatus for calibrating a laser wavelength control mechanism
US5440578B1 (en) * 1993-07-16 2000-10-24 Cymer Inc Gas replenishment method ad apparatus for excimer lasers
JP2816813B2 (ja) * 1994-04-12 1998-10-27 株式会社小松製作所 エキシマレーザ装置
JPH08204274A (ja) * 1995-01-20 1996-08-09 Nissin Electric Co Ltd エキシマレーザ装置
US5748656A (en) * 1996-01-05 1998-05-05 Cymer, Inc. Laser having improved beam quality and reduced operating cost
US5657334A (en) * 1996-02-15 1997-08-12 Cymer, Inc. External high voltage control for a laser system
JP3874123B2 (ja) * 1996-03-07 2007-01-31 キヤノン株式会社 放電電極並びにエキシマレーザー発振装置及びステッパー
JPH09260749A (ja) * 1996-03-22 1997-10-03 Komatsu Ltd ガスレーザ装置
JP4102457B2 (ja) * 1997-05-09 2008-06-18 株式会社小松製作所 狭帯域化レーザ装置
US6151349A (en) * 1998-03-04 2000-11-21 Cymer, Inc. Automatic fluorine control system
JPH11307864A (ja) * 1998-04-23 1999-11-05 Ando Electric Co Ltd 外部共振器型波長可変光源
US6160832A (en) * 1998-06-01 2000-12-12 Lambda Physik Gmbh Method and apparatus for wavelength calibration
US20020186741A1 (en) * 1998-06-04 2002-12-12 Lambda Physik Ag Very narrow band excimer or molecular fluorine laser
US20010046247A1 (en) * 1998-07-28 2001-11-29 Raymond A. Hartman Excimer laser system
US6526071B1 (en) * 1998-10-16 2003-02-25 New Focus, Inc. Tunable laser transmitter with internal wavelength grid generators
TW456082B (en) * 1998-11-30 2001-09-21 Ebara Corp Discharge excited excimer laser device
US6421365B1 (en) * 1999-11-18 2002-07-16 Lambda Physik Ag Narrow band excimer or molecular fluorine laser having an output coupling interferometer
US6965624B2 (en) * 1999-03-17 2005-11-15 Lambda Physik Ag Laser gas replenishment method
US6389052B2 (en) * 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
JP3296430B2 (ja) * 1999-10-08 2002-07-02 株式会社ウシオ総合技術研究所 露光用ＡｒＦエキシマレーザ装置
US6644324B1 (en) * 2000-03-06 2003-11-11 Cymer, Inc. Laser discharge chamber passivation by plasma
JP3976981B2 (ja) * 2000-03-30 2007-09-19 キヤノン株式会社 露光装置、ガス置換方法、デバイス製造方法
US6738406B2 (en) * 2000-06-19 2004-05-18 Lambda Physik Ag Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm
US6274797B1 (en) * 2000-10-12 2001-08-14 Tsun-Chi Liao Coupling device for clamping more cymbals
US6747741B1 (en) * 2000-10-12 2004-06-08 Lambda Physik Ag Multiple-pass interferometric device
AU2002245163A1 (en) * 2000-10-20 2002-07-24 Photomedex Controlled dose delivery of ultraviolet light for treating skin disorders
JP3794552B2 (ja) * 2001-03-09 2006-07-05 古河電気工業株式会社 光モジュール、光送信器及び光モジュールの製造方法
DE20110048U1 (de) * 2001-06-18 2001-08-16 Lambda Physik AG, 37079 Göttingen Gasentladungslaser mit Mitteln zur Entfernung von Gasverunreinigungen
JP2003008119A (ja) * 2001-06-26 2003-01-10 Komatsu Ltd 注入同期式又はｍｏｐａ方式のレーザ装置
US7144248B2 (en) * 2001-10-18 2006-12-05 Irwin Dean S Device for oral UV photo-therapy
US20030161374A1 (en) * 2001-11-21 2003-08-28 Lambda Physik Ag High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
JP3888673B2 (ja) * 2001-12-28 2007-03-07 ウシオ電機株式会社 露光用フッ素分子レーザシステム
US6999492B2 (en) * 2002-11-20 2006-02-14 Lambda Physik Ag Reduced-maintenance excimer laser with oil-free solid state pulser
US6661815B1 (en) * 2002-12-31 2003-12-09 Intel Corporation Servo technique for concurrent wavelength locking and stimulated brillouin scattering suppression
US6973112B2 (en) * 2003-07-31 2005-12-06 Visx, Incorporated Passive gas flow management and filtration device for use in an excimer or transverse discharge laser
US7257144B2 (en) * 2004-02-11 2007-08-14 Photomedex Rare gas-halogen excimer lasers with baffles
JP4656058B2 (ja) * 2004-04-21 2011-03-23 三菱電機株式会社 ガスレーザ発振器およびガスレーザ加工機
JP4650881B2 (ja) * 2005-04-20 2011-03-16 株式会社小松製作所 エキシマレーザ装置とレーザガス交換方法と部分ガス交換量演算方法
US20060268946A1 (en) * 2005-04-26 2006-11-30 Levatter Jeffrey I Wavelength conversion of excimer-generated UV light
US7848378B2 (en) * 2005-08-05 2010-12-07 Photomedex, Inc. Apparatus and method for monitoring power of a UV laser
US20070030876A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Apparatus and method for purging and recharging excimer laser gases
US20070032844A1 (en) * 2005-08-05 2007-02-08 Levatter Jeffrey I Targeted UV phototherapy light block
US20080130701A1 (en) * 2006-12-05 2008-06-05 Asml Netherlands B.V. Gas laser apparatus and method
ATE510332T1 (de) * 2007-03-27 2011-06-15 Photomedex Inc Verfahren und vorrichtung für den effizienten betrieb eines gasentladungsexcimerlasers

Also Published As

Publication number Publication date
EP2140529B1 (de) 2011-05-18
EP2140529A2 (de) 2010-01-06
KR20100015929A (ko) 2010-02-12
US20100232469A1 (en) 2010-09-16
TW200903935A (en) 2009-01-16
WO2008118975A3 (en) 2009-04-16
WO2008118975A2 (en) 2008-10-02
US20080240197A1 (en) 2008-10-02

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