ATE510194T1 - Vorrichtung und verfahren zur metrologie von halbleiterwafern - Google Patents

Vorrichtung und verfahren zur metrologie von halbleiterwafern

Info

Publication number
ATE510194T1
ATE510194T1 AT08806451T AT08806451T ATE510194T1 AT E510194 T1 ATE510194 T1 AT E510194T1 AT 08806451 T AT08806451 T AT 08806451T AT 08806451 T AT08806451 T AT 08806451T AT E510194 T1 ATE510194 T1 AT E510194T1
Authority
AT
Austria
Prior art keywords
wafer
weight
electrostatic
measurement
measured
Prior art date
Application number
AT08806451T
Other languages
German (de)
English (en)
Inventor
Robert John Wilby
Original Assignee
Metryx Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metryx Ltd filed Critical Metryx Ltd
Application granted granted Critical
Publication of ATE510194T1 publication Critical patent/ATE510194T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G23/00—Auxiliary devices for weighing apparatus
    • G01G23/14—Devices for determining tare weight or for cancelling out the tare by zeroising, e.g. mechanically operated
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G9/00—Methods of, or apparatus for, the determination of weight, not provided for in groups G01G1/00 - G01G7/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G21/00—Details of weighing apparatus
    • G01G21/22—Weigh pans or other weighing receptacles; Weighing platforms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G23/00—Auxiliary devices for weighing apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0604—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT08806451T 2007-10-04 2008-09-30 Vorrichtung und verfahren zur metrologie von halbleiterwafern ATE510194T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0719469.9A GB0719469D0 (en) 2007-10-04 2007-10-04 Measurement apparatus and method
PCT/GB2008/003301 WO2009044121A1 (en) 2007-10-04 2008-09-30 Semiconductor wafer metrology apparatus and method

Publications (1)

Publication Number Publication Date
ATE510194T1 true ATE510194T1 (de) 2011-06-15

Family

ID=38739182

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08806451T ATE510194T1 (de) 2007-10-04 2008-09-30 Vorrichtung und verfahren zur metrologie von halbleiterwafern

Country Status (7)

Country Link
US (2) US8683880B2 (https=)
EP (1) EP2201340B1 (https=)
JP (1) JP5414124B2 (https=)
AT (1) ATE510194T1 (https=)
GB (1) GB0719469D0 (https=)
TW (1) TWI424149B (https=)
WO (1) WO2009044121A1 (https=)

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GB0719460D0 (en) * 2007-10-04 2007-11-14 Metryx Ltd Measurement apparatus and method
EP2426468B1 (de) * 2010-09-02 2018-05-23 Mettler-Toledo GmbH Verfahren zur Bereitstellung von Proben
DE102011001354B4 (de) * 2011-03-17 2014-06-26 Sartorius Lab Instruments Gmbh & Co. Kg Windschutz für eine Präzisionswaage
US9709327B2 (en) * 2011-03-17 2017-07-18 Dry Ventures, Inc. Rapid rescue of inundated cellphones
US10240867B2 (en) 2012-02-01 2019-03-26 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US11713924B2 (en) 2012-02-01 2023-08-01 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
PL2757354T3 (pl) * 2013-01-22 2016-03-31 Mettler Toledo Gmbh Detekcja sił elektrostatycznych
CN103292934B (zh) * 2013-05-15 2015-04-08 北京京东方光电科技有限公司 一种承载物检测系统
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer
DE102014101563A1 (de) * 2013-11-08 2015-05-13 Sartorius Lab Instruments Gmbh & Co. Kg Präzisionswaage oder Massekomparator mit Modul zur Messunsicherheitsbestimmung
GB201321423D0 (en) * 2013-12-04 2014-01-15 Metryx Ltd Semiconductor wafer processing methods and apparatus
GB201405926D0 (en) * 2014-04-02 2014-05-14 Metryx Ltd Semiconductor wafer weighing apparatus and methods
US9478408B2 (en) 2014-06-06 2016-10-25 Lam Research Corporation Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging
US10047438B2 (en) 2014-06-10 2018-08-14 Lam Research Corporation Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas
US10081869B2 (en) 2014-06-10 2018-09-25 Lam Research Corporation Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates
JP6288026B2 (ja) * 2015-09-28 2018-03-07 株式会社タツノ 校正装置
JP6288027B2 (ja) * 2015-09-28 2018-03-07 株式会社タツノ 校正装置及び校正方法
CN205909927U (zh) * 2016-07-06 2017-01-25 中山市永衡日用制品有限公司 一种旋钮式发电的电子秤
CN108627226B (zh) * 2017-05-10 2024-06-07 新疆畜牧科学院畜牧业质量标准研究所 电场同性静电荷互斥式毛绒称重器
GB201806377D0 (en) 2018-04-19 2018-06-06 Metryx Ltd Semiconductor wafer mass metrology apparatus and semiconductor wafer mass metrology method
GB201815815D0 (en) 2018-09-28 2018-11-14 Metryx Ltd Method and apparatus for controlling the temperature of a semiconductor wafer
CN111336914B (zh) * 2020-03-25 2021-12-10 长江存储科技有限责任公司 晶圆翘曲度测量装置及方法
CN113819985A (zh) * 2020-06-18 2021-12-21 拓荆科技股份有限公司 晶圆防干扰称重装置及其应用
DE102021104307B4 (de) * 2021-02-23 2025-03-13 Sartorius Lab Instruments Gmbh & Co. Kg Verfahren zum Betrieb einer Waage mit Ionisator
US20250102349A1 (en) 2022-01-14 2025-03-27 Metryx Ltd. Weighing device
GB202218260D0 (en) * 2022-12-05 2023-01-18 Metryx Ltd Apparatus for measuring the weight or mass of an object
GB202303542D0 (en) * 2023-03-10 2023-04-26 Metryx Ltd Apparatus for measuring the mass and/or the change in mass of an object
GB202410338D0 (en) 2024-07-16 2024-08-28 Metryx Ltd Apparatus for determining information relating to the weight or mass of a wafer

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TWI438736B (zh) 2008-07-29 2014-05-21 Advanced Optoelectronic Tech 燈箱裝置

Also Published As

Publication number Publication date
TW200938815A (en) 2009-09-16
EP2201340B1 (en) 2011-05-18
JP2010540952A (ja) 2010-12-24
US20100206098A1 (en) 2010-08-19
EP2201340A1 (en) 2010-06-30
JP5414124B2 (ja) 2014-02-12
WO2009044121A1 (en) 2009-04-09
US9310244B2 (en) 2016-04-12
US8683880B2 (en) 2014-04-01
TWI424149B (zh) 2014-01-21
US20140231152A1 (en) 2014-08-21
GB0719469D0 (en) 2007-11-14

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