ATE482299T1 - Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon - Google Patents
Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davonInfo
- Publication number
- ATE482299T1 ATE482299T1 AT08012109T AT08012109T ATE482299T1 AT E482299 T1 ATE482299 T1 AT E482299T1 AT 08012109 T AT08012109 T AT 08012109T AT 08012109 T AT08012109 T AT 08012109T AT E482299 T1 ATE482299 T1 AT E482299T1
- Authority
- AT
- Austria
- Prior art keywords
- sputtering
- particles
- base alloy
- producing
- less
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
- G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007223152A JP4694543B2 (ja) | 2007-08-29 | 2007-08-29 | Ag基合金スパッタリングターゲット、およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE482299T1 true ATE482299T1 (de) | 2010-10-15 |
Family
ID=39744967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT08012109T ATE482299T1 (de) | 2007-08-29 | 2008-07-04 | Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon |
Country Status (8)
Country | Link |
---|---|
US (1) | US20090057140A1 (de) |
EP (1) | EP2031086B1 (de) |
JP (1) | JP4694543B2 (de) |
CN (1) | CN101376962B (de) |
AT (1) | ATE482299T1 (de) |
AU (1) | AU2008203141B2 (de) |
DE (1) | DE602008002662D1 (de) |
TW (1) | TWI390066B (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040238356A1 (en) * | 2002-06-24 | 2004-12-02 | Hitoshi Matsuzaki | Silver alloy sputtering target and process for producing the same |
US7514037B2 (en) | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
JP2007335061A (ja) * | 2006-05-16 | 2007-12-27 | Sony Corp | 光情報記録媒体とそのBCA(BurstCuttingArea)マーキング方法 |
JP2008117470A (ja) * | 2006-11-02 | 2008-05-22 | Sony Corp | 光情報記録媒体および光情報記録媒体の製造方法、BCA(BurstCuttingArea)マーキング方法 |
JP4540687B2 (ja) * | 2007-04-13 | 2010-09-08 | 株式会社ソニー・ディスクアンドデジタルソリューションズ | 読み出し専用の光情報記録媒体 |
JP2009076129A (ja) * | 2007-09-19 | 2009-04-09 | Kobe Steel Ltd | 読み出し専用の光情報記録媒体 |
JP5331420B2 (ja) | 2008-09-11 | 2013-10-30 | 株式会社神戸製鋼所 | 読み出し専用の光情報記録媒体および該光情報記録媒体の半透過反射膜形成用スパッタリングターゲット |
JP2010225572A (ja) * | 2008-11-10 | 2010-10-07 | Kobe Steel Ltd | 有機elディスプレイ用の反射アノード電極および配線膜 |
JP4735734B2 (ja) | 2009-04-02 | 2011-07-27 | Tdk株式会社 | 光メディア用スパッタリングターゲット、その製造方法、ならびに、光メディア、およびその製造方法 |
TW201112244A (en) | 2009-04-14 | 2011-04-01 | Kobe Steel Ltd | Optical information recording medium and sputtering target |
US8450722B2 (en) * | 2011-07-15 | 2013-05-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Magnetoresistive random access memory and method of making the same |
CN104817277B (zh) * | 2015-04-21 | 2017-04-19 | 福建省诺希科技园发展有限公司 | 一种采用银复合靶材制备防辐射玻璃的方法及其制品 |
CN104827035B (zh) * | 2015-04-21 | 2017-03-08 | 福建省诺希科技园发展有限公司 | 一种银复合靶材制造方法及其制品 |
CN110004420A (zh) * | 2019-03-31 | 2019-07-12 | 柳州呈奥科技有限公司 | 一种靶材制备方法 |
CN112323029A (zh) * | 2020-11-17 | 2021-02-05 | 昆山全亚冠环保科技有限公司 | 一种玻璃基板薄膜溅射靶材的制备方法 |
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US5948497A (en) * | 1992-10-19 | 1999-09-07 | Eastman Kodak Company | High stability silver based alloy reflectors for use in a writable compact disk |
KR100308217B1 (ko) * | 1996-09-09 | 2001-11-02 | 모리시타 요이찌 | 광학적정보기록매체와그제조방법,광학적정보기록·재생방법및광학적정보기록·재생장치 |
WO1999043642A1 (en) * | 1998-02-26 | 1999-09-02 | Celltech Therapeutics Limited | Phenylalanine derivatives as inhibitors of alpha4 integrins |
US6852384B2 (en) * | 1998-06-22 | 2005-02-08 | Han H. Nee | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6790503B2 (en) * | 1998-06-22 | 2004-09-14 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6544616B2 (en) * | 2000-07-21 | 2003-04-08 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6905750B2 (en) * | 1998-06-22 | 2005-06-14 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6007889A (en) * | 1998-06-22 | 1999-12-28 | Target Technology, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US7045187B2 (en) * | 1998-06-22 | 2006-05-16 | Nee Han H | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6451402B1 (en) * | 1998-06-22 | 2002-09-17 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
US6764735B2 (en) * | 1998-06-22 | 2004-07-20 | Target Technology Company, Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
JP2000207725A (ja) | 1999-01-14 | 2000-07-28 | Hitachi Metals Ltd | 磁気記録媒体およびCoTa系合金タ―ゲット |
JP2000228032A (ja) * | 1999-02-08 | 2000-08-15 | Teijin Ltd | 光情報媒体 |
JP2000239835A (ja) | 1999-02-22 | 2000-09-05 | Japan Energy Corp | スパッタリングターゲット |
JP2001020065A (ja) | 1999-07-07 | 2001-01-23 | Hitachi Metals Ltd | スパッタリング用ターゲット及びその製造方法ならびに高融点金属粉末材料 |
JP3365762B2 (ja) | 2000-04-28 | 2003-01-14 | 株式会社神戸製鋼所 | 光情報記録媒体用の反射層または半透明反射層、光情報記録媒体及び光情報記録媒体用スパッタリングターゲット |
JP2002129314A (ja) | 2000-10-31 | 2002-05-09 | Furuya Kinzoku:Kk | スパッタリングターゲット及びその製造方法、反射型lcd用反射板、反射配線電極、薄膜及びその製造方法 |
SG116432A1 (en) * | 2000-12-26 | 2005-11-28 | Kobe Steel Ltd | Reflective layer or semi-transparent reflective layer for use in optical information recording media, optical information recording media and sputtering target for use in the optical information recording media. |
JP5242868B2 (ja) * | 2001-07-17 | 2013-07-24 | アイファイヤー アイピー コーポレイション | 耐熱性電極、耐熱性電極用ターゲット、耐熱性電極の製造方法、およびこれを用いた薄膜el素子 |
JP2004002929A (ja) * | 2001-08-03 | 2004-01-08 | Furuya Kinzoku:Kk | 銀合金、スパッタリングターゲット、反射型lcd用反射板、反射配線電極、薄膜、その製造方法、光学記録媒体、電磁波遮蔽体、電子部品用金属材料、配線材料、電子部品、電子機器、金属膜の加工方法、電子光学部品、積層体及び建材ガラス |
KR100491931B1 (ko) * | 2002-01-25 | 2005-05-30 | 가부시키가이샤 고베 세이코쇼 | 반사 필름, 반사형 액정 표시소자 및 상기 반사 필름을형성하기 위한 스퍼터링 타겟 |
JP4264302B2 (ja) | 2002-06-24 | 2009-05-13 | 株式会社コベルコ科研 | 銀合金スパッタリングターゲットとその製造方法 |
US20040238356A1 (en) * | 2002-06-24 | 2004-12-02 | Hitoshi Matsuzaki | Silver alloy sputtering target and process for producing the same |
JP4305809B2 (ja) | 2002-07-10 | 2009-07-29 | 日立金属株式会社 | Ag合金系スパッタリングターゲット材 |
JP4105956B2 (ja) | 2002-08-08 | 2008-06-25 | 株式会社神戸製鋼所 | 光反射膜およびこれを用いた液晶表示素子、ならびに光反射膜用スパッタリングターゲット |
US7514037B2 (en) * | 2002-08-08 | 2009-04-07 | Kobe Steel, Ltd. | AG base alloy thin film and sputtering target for forming AG base alloy thin film |
TWI368819B (en) * | 2003-04-18 | 2012-07-21 | Target Technology Co Llc | Metal alloys for the reflective or the semi-reflective layer of an optical storage medium |
JP3993530B2 (ja) * | 2003-05-16 | 2007-10-17 | 株式会社神戸製鋼所 | Ag−Bi系合金スパッタリングターゲットおよびその製造方法 |
JP4009564B2 (ja) * | 2003-06-27 | 2007-11-14 | 株式会社神戸製鋼所 | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜のAg合金薄膜の形成用のAg合金スパッタリングターゲット |
JP2005029849A (ja) * | 2003-07-07 | 2005-02-03 | Kobe Steel Ltd | リフレクター用Ag合金反射膜、及び、このAg合金反射膜を用いたリフレクター、並びに、このAg合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4384453B2 (ja) | 2003-07-16 | 2009-12-16 | 株式会社神戸製鋼所 | Ag系スパッタリングターゲット及びその製造方法 |
US20050112019A1 (en) * | 2003-10-30 | 2005-05-26 | Kabushiki Kaisha Kobe Seiko Sho(Kobe Steel, Ltd.) | Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording |
US20050153162A1 (en) * | 2003-12-04 | 2005-07-14 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Ag-base interconnecting film for flat panel display, Ag-base sputtering target and flat panel display |
TWI325134B (en) * | 2004-04-21 | 2010-05-21 | Kobe Steel Ltd | Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target |
JP4569863B2 (ja) | 2004-04-27 | 2010-10-27 | 日立金属株式会社 | Ag合金スパッタリングターゲット材およびAg合金膜 |
JP4605494B2 (ja) | 2004-05-20 | 2011-01-05 | 日立金属株式会社 | Ag合金スパッタリングターゲット材 |
ATE379836T1 (de) * | 2004-06-29 | 2007-12-15 | Kobe Steel Ltd | Halbreflektierende und reflektierende schicht für ein optisches informationsaufzeichnungsmedium, informationsaufzeichnungsmedium, und sputter target |
JP3907666B2 (ja) * | 2004-07-15 | 2007-04-18 | 株式会社神戸製鋼所 | レーザーマーキング用再生専用光情報記録媒体 |
JP2006166311A (ja) | 2004-12-10 | 2006-06-22 | Matsushita Electric Ind Co Ltd | 無線通信端末及び無線通信方法 |
JP2006240289A (ja) * | 2005-02-07 | 2006-09-14 | Kobe Steel Ltd | 光情報記録媒体用記録膜および光情報記録媒体ならびにスパッタリングターゲット |
JP2006294195A (ja) * | 2005-04-14 | 2006-10-26 | Kobe Steel Ltd | 光情報記録用Ag合金反射膜、光情報記録媒体および光情報記録用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4527624B2 (ja) * | 2005-07-22 | 2010-08-18 | 株式会社神戸製鋼所 | Ag合金反射膜を有する光情報媒体 |
JP4377861B2 (ja) * | 2005-07-22 | 2009-12-02 | 株式会社神戸製鋼所 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP2007035104A (ja) * | 2005-07-22 | 2007-02-08 | Kobe Steel Ltd | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
JP4377877B2 (ja) * | 2005-12-21 | 2009-12-02 | ソニー株式会社 | 光情報記録媒体用Ag合金反射膜、光情報記録媒体および光情報記録媒体用Ag合金反射膜の形成用のAg合金スパッタリングターゲット |
DE102006003279B4 (de) * | 2006-01-23 | 2010-03-25 | W.C. Heraeus Gmbh | Sputtertarget mit hochschmelzender Phase |
JP4262730B2 (ja) * | 2006-06-15 | 2009-05-13 | ソニー株式会社 | 追記記録可能な金属反射膜を有する光記録媒体 |
JP2008077792A (ja) * | 2006-09-22 | 2008-04-03 | Kobe Steel Ltd | 耐久性に優れた光情報記録媒体 |
US7833604B2 (en) * | 2006-12-01 | 2010-11-16 | Kobe Steel, Ltd. | Ag alloy reflective layer for optical information recording medium, optical information recording medium, and sputtering target for forming Ag alloy reflective layer for optical information recording medium |
JP4833942B2 (ja) * | 2007-08-29 | 2011-12-07 | 株式会社コベルコ科研 | Ag基合金スパッタリングターゲット |
-
2007
- 2007-08-29 JP JP2007223152A patent/JP4694543B2/ja not_active Expired - Fee Related
-
2008
- 2008-07-03 US US12/167,597 patent/US20090057140A1/en not_active Abandoned
- 2008-07-04 DE DE602008002662T patent/DE602008002662D1/de active Active
- 2008-07-04 AT AT08012109T patent/ATE482299T1/de active
- 2008-07-04 EP EP08012109A patent/EP2031086B1/de not_active Not-in-force
- 2008-07-15 AU AU2008203141A patent/AU2008203141B2/en not_active Ceased
- 2008-08-05 CN CN2008101454326A patent/CN101376962B/zh not_active Expired - Fee Related
- 2008-08-08 TW TW097130396A patent/TWI390066B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101376962A (zh) | 2009-03-04 |
DE602008002662D1 (de) | 2010-11-04 |
AU2008203141B2 (en) | 2010-03-04 |
CN101376962B (zh) | 2011-07-13 |
US20090057140A1 (en) | 2009-03-05 |
EP2031086B1 (de) | 2010-09-22 |
TWI390066B (zh) | 2013-03-21 |
JP4694543B2 (ja) | 2011-06-08 |
TW200925305A (en) | 2009-06-16 |
EP2031086A1 (de) | 2009-03-04 |
AU2008203141A1 (en) | 2009-03-19 |
JP2009057580A (ja) | 2009-03-19 |
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