ATE482299T1 - Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon - Google Patents

Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon

Info

Publication number
ATE482299T1
ATE482299T1 AT08012109T AT08012109T ATE482299T1 AT E482299 T1 ATE482299 T1 AT E482299T1 AT 08012109 T AT08012109 T AT 08012109T AT 08012109 T AT08012109 T AT 08012109T AT E482299 T1 ATE482299 T1 AT E482299T1
Authority
AT
Austria
Prior art keywords
sputtering
particles
base alloy
producing
less
Prior art date
Application number
AT08012109T
Other languages
English (en)
Inventor
Katsutoshi Takagi
Hidekazu Morimoto
Hitoshi Matsuzaki
Yuki Tauchi
Original Assignee
Kobelco Res Inst Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobelco Res Inst Inc filed Critical Kobelco Res Inst Inc
Application granted granted Critical
Publication of ATE482299T1 publication Critical patent/ATE482299T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/06—Alloys based on silver
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Optical Record Carriers (AREA)
AT08012109T 2007-08-29 2008-07-04 Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon ATE482299T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007223152A JP4694543B2 (ja) 2007-08-29 2007-08-29 Ａｇ基合金スパッタリングターゲット、およびその製造方法

Publications (1)

Publication Number Publication Date
ATE482299T1 true ATE482299T1 (de) 2010-10-15

Family

ID=39744967

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08012109T ATE482299T1 (de) 2007-08-29 2008-07-04 Sputtern von ag-basislegierungszielmaterial und verfahren zur herstellung davon

Country Status (8)

Country Link
US (1) US20090057140A1 (de)
EP (1) EP2031086B1 (de)
JP (1) JP4694543B2 (de)
CN (1) CN101376962B (de)
AT (1) ATE482299T1 (de)
AU (1) AU2008203141B2 (de)
DE (1) DE602008002662D1 (de)
TW (1) TWI390066B (de)

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US8450722B2 (en) * 2011-07-15 2013-05-28 Taiwan Semiconductor Manufacturing Company, Ltd. Magnetoresistive random access memory and method of making the same
CN104827035B (zh) * 2015-04-21 2017-03-08 福建省诺希科技园发展有限公司 一种银复合靶材制造方法及其制品
CN104817277B (zh) * 2015-04-21 2017-04-19 福建省诺希科技园发展有限公司 一种采用银复合靶材制备防辐射玻璃的方法及其制品
CN110004420A (zh) * 2019-03-31 2019-07-12 柳州呈奥科技有限公司 一种靶材制备方法
CN112323029A (zh) * 2020-11-17 2021-02-05 昆山全亚冠环保科技有限公司 一种玻璃基板薄膜溅射靶材的制备方法

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Also Published As

Publication number Publication date
CN101376962B (zh) 2011-07-13
EP2031086B1 (de) 2010-09-22
TW200925305A (en) 2009-06-16
DE602008002662D1 (de) 2010-11-04
TWI390066B (zh) 2013-03-21
AU2008203141A1 (en) 2009-03-19
JP4694543B2 (ja) 2011-06-08
EP2031086A1 (de) 2009-03-04
AU2008203141B2 (en) 2010-03-04
CN101376962A (zh) 2009-03-04
JP2009057580A (ja) 2009-03-19
US20090057140A1 (en) 2009-03-05

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