ATE480593T1 - Uv-härtbare harzzusammensetzung - Google Patents
Uv-härtbare harzzusammensetzungInfo
- Publication number
- ATE480593T1 ATE480593T1 AT06716979T AT06716979T ATE480593T1 AT E480593 T1 ATE480593 T1 AT E480593T1 AT 06716979 T AT06716979 T AT 06716979T AT 06716979 T AT06716979 T AT 06716979T AT E480593 T1 ATE480593 T1 AT E480593T1
- Authority
- AT
- Austria
- Prior art keywords
- weight
- resin composition
- cured resin
- mixture
- photoinitiator
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 abstract 2
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical compound ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 abstract 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 abstract 1
- 239000012952 cationic photoinitiator Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 abstract 1
- 150000002009 diols Chemical class 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 239000012949 free radical photoinitiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 abstract 1
- 229920000515 polycarbonate Polymers 0.000 abstract 1
- 239000004417 polycarbonate Substances 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- 229920005862 polyol Polymers 0.000 abstract 1
- 150000003077 polyols Chemical class 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
- C08J3/243—Two or more independent types of crosslinking for one or more polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Polyethers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE0500621A SE529306C2 (sv) | 2005-03-18 | 2005-03-18 | Ultravioletthärdande hartskomposition |
| PCT/SE2006/000293 WO2006098676A1 (en) | 2005-03-18 | 2006-03-08 | Ultraviolet curing resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE480593T1 true ATE480593T1 (de) | 2010-09-15 |
Family
ID=36991964
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06716979T ATE480593T1 (de) | 2005-03-18 | 2006-03-08 | Uv-härtbare harzzusammensetzung |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1866371B1 (de) |
| JP (1) | JP5156620B2 (de) |
| AT (1) | ATE480593T1 (de) |
| DE (1) | DE602006016753D1 (de) |
| SE (1) | SE529306C2 (de) |
| WO (1) | WO2006098676A1 (de) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4967378B2 (ja) | 2005-03-29 | 2012-07-04 | セイコーエプソン株式会社 | インク組成物 |
| JP4812364B2 (ja) * | 2005-08-18 | 2011-11-09 | ダイセル化学工業株式会社 | 硬化性樹脂組成物及び光導波路 |
| WO2007031505A1 (en) | 2005-09-13 | 2007-03-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Photocurable compositions for preparing abs-like articles |
| JP5539605B2 (ja) * | 2006-04-19 | 2014-07-02 | 株式会社ダイセル | 活性エネルギー線硬化性コーティング剤およびその用途 |
| EP2067810B1 (de) * | 2006-09-29 | 2013-10-09 | DIC Corporation | Kationenpolymerisierbare harzzusammensetzung mit einem mehrfach verzweigten polyether-polyol, haftmittel mit der zusammensetzung sowie beschichtung und polarisierungsplatte mit dem haftmittel |
| JP2008111105A (ja) * | 2006-10-06 | 2008-05-15 | Dainippon Ink & Chem Inc | プラスチック基材用カチオン重合性接着剤、それを用いた積層体及び偏光板 |
| EP1914279A3 (de) | 2006-10-19 | 2008-05-07 | Seiko Epson Corporation | Set mit einer lichthärtbaren Tintenzusammensetzung sowie Aufzeichnungsverfahren und Aufzeichnungen unter Verwendung des Sets mit der Tintenzusammensetzung |
| US20080103226A1 (en) | 2006-10-31 | 2008-05-01 | Dsm Ip Assets B.V. | Photo-curable resin composition |
| US20080132599A1 (en) | 2006-11-30 | 2008-06-05 | Seiko Epson Corporation. | Ink composition, two-pack curing ink composition set, and recording method and recorded matter using these |
| US7906214B2 (en) * | 2007-01-26 | 2011-03-15 | Transitions Optical, Inc. | Optical elements comprising compatiblizing coatings and methods of making the same |
| JP5472670B2 (ja) | 2007-01-29 | 2014-04-16 | セイコーエプソン株式会社 | インクセット、インクジェット記録方法及び記録物 |
| US8894197B2 (en) | 2007-03-01 | 2014-11-25 | Seiko Epson Corporation | Ink set, ink-jet recording method, and recorded material |
| CN101631832A (zh) * | 2007-03-14 | 2010-01-20 | 亨斯迈先进材料(瑞士)有限公司 | 用于制备类似abs的制品的可光固化组合物 |
| GB2449124A (en) * | 2007-05-11 | 2008-11-12 | Sun Chemical Ltd | Sensitiser for cationic photoinitiators |
| JP4766281B2 (ja) | 2007-09-18 | 2011-09-07 | セイコーエプソン株式会社 | インクジェット記録用非水系インク組成物、インクジェット記録方法および記録物 |
| JP2009269397A (ja) | 2008-02-29 | 2009-11-19 | Seiko Epson Corp | 不透明層の形成方法、記録方法、インクセット、インクカートリッジ、記録装置 |
| DE102008023499A1 (de) | 2008-05-14 | 2009-11-19 | Bayer Materialscience Ag | Druckfarbe oder Drucklack, damit beschichteter Schichtstoff und Verfahren zur Herstellung eines Schichtstoffs |
| JP2010059283A (ja) * | 2008-09-02 | 2010-03-18 | Three M Innovative Properties Co | 接着剤組成物 |
| WO2010071956A1 (en) * | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| EP2230283B1 (de) * | 2009-03-18 | 2014-07-02 | Konica Minolta IJ Technologies, Inc. | Mit aktinischer Energiestrahlung härtbare Tintenstrahltinte und Tintenstrahlaufzeichnungsverfahren |
| EP2440601A2 (de) * | 2009-06-12 | 2012-04-18 | Digitaloptics Corporation East | Härtbare harze und daraus hergestellte artikel |
| JP2011152747A (ja) | 2010-01-28 | 2011-08-11 | Seiko Epson Corp | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| JP5692490B2 (ja) | 2010-01-28 | 2015-04-01 | セイコーエプソン株式会社 | 水性インク組成物、およびインクジェット記録方法ならびに記録物 |
| JP5700759B2 (ja) * | 2010-05-25 | 2015-04-15 | 日本化薬株式会社 | 硬化性樹脂組成物、及びその硬化物 |
| CN101955625B (zh) * | 2010-09-06 | 2012-06-20 | 西安交通大学 | 一种激光快速成型中熔模铸造用光固化树脂 |
| CN102492330B (zh) * | 2011-12-02 | 2014-05-14 | 中山大学 | 一种用于玻璃基材的uv光固化喷墨墨水及其制备方法 |
| CN103627331B (zh) * | 2013-10-22 | 2015-04-22 | 江苏博思源防火材料科技有限公司 | 一种耐水的水性胶黏剂及其制备方法 |
| US9944800B2 (en) | 2014-10-24 | 2018-04-17 | Empire Technology Development Llc | UV curable hydrophilic coatings |
| US11634606B2 (en) | 2015-09-15 | 2023-04-25 | G3 Enterprises, Inc. | Apparatus and methods for alternative coatings applicable to metal |
| JP7385983B2 (ja) * | 2016-10-06 | 2023-11-24 | 株式会社ダイセル | 硬化性樹脂組成物及びその硬化物、プリプレグ、並びに繊維強化複合材料 |
| SE541288C2 (en) | 2017-12-19 | 2019-06-11 | Perstorp Ab | A hybrid photopolymer composition for additive manufacturing |
| CN110028410A (zh) * | 2018-01-11 | 2019-07-19 | 宜昌天鼎新材料科技有限公司 | 碳酸酯化多元醇及其丙烯酸酯型化合物 |
| JP7185252B2 (ja) * | 2018-01-31 | 2022-12-07 | 三国電子有限会社 | 接続構造体の作製方法 |
| EP3883975A4 (de) * | 2018-11-20 | 2022-08-24 | G3 Enterprises, Inc. | Vorrichtung und verfahren unter verwendung von beschichtungen für metallanwendungen |
| SE545292C2 (en) * | 2020-07-08 | 2023-06-20 | Perstorp Ab | A radiation curable composition comprising a biobased reactive diluent |
| JP7277690B1 (ja) | 2022-11-01 | 2023-05-19 | 東洋インキScホールディングス株式会社 | 光硬化性コート剤およびそれを用いてなるコート層を備える積層体 |
| WO2025169923A1 (ja) * | 2024-02-05 | 2025-08-14 | Ube株式会社 | 樹脂組成物 |
| WO2025169924A1 (ja) * | 2024-02-05 | 2025-08-14 | Ube株式会社 | 樹脂組成物 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3708296A (en) | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
| US4339567A (en) | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
| US4383025A (en) | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
| US4398014A (en) | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
| DE3369398D1 (en) | 1982-05-19 | 1987-02-26 | Ciba Geigy Ag | Curable compositions containing metallocen complexes, activated primers obtained therefrom and their use |
| EP0094914B1 (de) | 1982-05-19 | 1986-09-24 | Ciba-Geigy Ag | Photopolymerisation mittels organometallischer Salze |
| ATE37242T1 (de) | 1984-02-10 | 1988-09-15 | Ciba Geigy Ag | Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung. |
| GB8414525D0 (en) | 1984-06-07 | 1984-07-11 | Ciba Geigy Ag | Sulphoxonium salts |
| US5002856A (en) | 1989-08-02 | 1991-03-26 | E. I. Du Pont De Nemours And Company | Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid |
| JP2781104B2 (ja) * | 1992-08-26 | 1998-07-30 | 日本ペイント株式会社 | ポリカーボネートポリオール |
| FR2757530A1 (fr) | 1996-12-24 | 1998-06-26 | Rhodia Chimie Sa | Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques |
| DE19827084A1 (de) | 1998-06-18 | 1999-12-23 | Basf Ag | Strahlenhärtbare, witterungsstabile Massen, enthaltend Carbonat(meth)acrylate |
| US6379866B2 (en) * | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
| GB9921779D0 (en) * | 1999-09-16 | 1999-11-17 | Ciba Sc Holding Ag | UV-Curable compositions |
| JP4198877B2 (ja) * | 2000-12-25 | 2008-12-17 | 株式会社ルネサステクノロジ | 半導体デバイスの製造方法 |
| JP4038608B2 (ja) | 2002-02-25 | 2008-01-30 | 大日本インキ化学工業株式会社 | 耐久性に優れた無溶剤型湿気硬化性ホットメルトウレタン樹脂組成物、発泡体、及びそれを用いたシート構造体 |
| KR20120086737A (ko) * | 2002-05-03 | 2012-08-03 | 디에스엠 아이피 어셋츠 비.브이. | 방사선 경화성 수지 조성물 및 이를 이용한 급속 성형법 |
| GB0212062D0 (en) * | 2002-05-24 | 2002-07-03 | Vantico Ag | Jetable compositions |
| US20040077745A1 (en) * | 2002-10-18 | 2004-04-22 | Jigeng Xu | Curable compositions and rapid prototyping process using the same |
| GB2396153A (en) | 2002-12-12 | 2004-06-16 | Sun Chemical Bv | Sulfonium salts useful as cationic photoinitiators in energy-curable compositions and processes of preparing cured polymeric compositions |
-
2005
- 2005-03-18 SE SE0500621A patent/SE529306C2/sv not_active IP Right Cessation
-
2006
- 2006-03-08 EP EP06716979A patent/EP1866371B1/de not_active Not-in-force
- 2006-03-08 DE DE602006016753T patent/DE602006016753D1/de active Active
- 2006-03-08 WO PCT/SE2006/000293 patent/WO2006098676A1/en not_active Ceased
- 2006-03-08 JP JP2008501838A patent/JP5156620B2/ja not_active Expired - Fee Related
- 2006-03-08 AT AT06716979T patent/ATE480593T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE602006016753D1 (de) | 2010-10-21 |
| EP1866371A1 (de) | 2007-12-19 |
| JP5156620B2 (ja) | 2013-03-06 |
| WO2006098676A1 (en) | 2006-09-21 |
| EP1866371B1 (de) | 2010-09-08 |
| JP2008533273A (ja) | 2008-08-21 |
| SE0500621L (sv) | 2006-09-19 |
| SE529306C2 (sv) | 2007-06-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |