DE602005027551D1 - Sowohl durch radikalische photohärtung als auch durch kationische photohärtung härtbare zusammensetzung - Google Patents

Sowohl durch radikalische photohärtung als auch durch kationische photohärtung härtbare zusammensetzung

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Publication number
DE602005027551D1
DE602005027551D1 DE602005027551T DE602005027551T DE602005027551D1 DE 602005027551 D1 DE602005027551 D1 DE 602005027551D1 DE 602005027551 T DE602005027551 T DE 602005027551T DE 602005027551 T DE602005027551 T DE 602005027551T DE 602005027551 D1 DE602005027551 D1 DE 602005027551D1
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Prior art keywords
painting
photo
cationic
radical
composition
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English (en)
Inventor
Kenji Okada
Yoshiki Nakagawa
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Kaneka Corp
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Kaneka Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/061—Polyesters; Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/26—Removing halogen atoms or halogen-containing groups from the molecule
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C08J3/243—Two or more independent types of crosslinking for one or more polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/003—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/003—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10—Copolymer characterised by the proportions of the comonomers expressed as molar percentages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/30—Chemical modification of a polymer leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00—Chemical modification of a polymer
    • C08F2810/40—Chemical modification of a polymer taking place solely at one end or both ends of the polymer backbone, i.e. not in the side or lateral chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyethers (AREA)
  • Paints Or Removers (AREA)
DE602005027551T 2004-03-26 2005-03-25 Sowohl durch radikalische photohärtung als auch durch kationische photohärtung härtbare zusammensetzung Active DE602005027551D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004092556 2004-03-26
PCT/JP2005/005510 WO2005092981A1 (ja) 2004-03-26 2005-03-25 光ラジカル硬化／光カチオン硬化併用硬化性組成物

Publications (1)

Publication Number Publication Date
DE602005027551D1 true DE602005027551D1 (de) 2011-06-01

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005027551T Active DE602005027551D1 (de) 2004-03-26 2005-03-25 Sowohl durch radikalische photohärtung als auch durch kationische photohärtung härtbare zusammensetzung

Country Status (8)

Country Link
US (1) US7781495B2 (de)
EP (1) EP1728826B1 (de)
JP (1) JP5002261B2 (de)
CN (1) CN1938377B (de)
AT (1) ATE506414T1 (de)
CA (1) CA2561169A1 (de)
DE (1) DE602005027551D1 (de)
WO (1) WO2005092981A1 (de)

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JP4865246B2 (ja) * 2005-03-25 2012-02-01 株式会社カネカ 熱ラジカル硬化／熱カチオン硬化併用硬化性組成物
WO2006135054A1 (ja) * 2005-06-16 2006-12-21 Dsm Ip Assets B.V. 光学的立体造形用放射線硬化性液状樹脂組成物及びそれを硬化させて得られる光造形物
ES2411882T3 (es) * 2005-06-21 2013-07-09 Henkel Corporation Composición de elastómero fotorreticulable
US20100222520A1 (en) * 2005-12-28 2010-09-02 Kaneka Corporation Curable composition for both thermal radical curing and latent thermal curing with epoxy
JP4990006B2 (ja) * 2007-04-03 2012-08-01 株式会社カネカ 樹脂混和物およびその硬化物
KR20100052948A (ko) * 2008-11-11 2010-05-20 삼성전자주식회사 라디칼 중합용 조성물 및 이를 이용한 패턴 형성 방법
JP5228882B2 (ja) * 2008-12-19 2013-07-03 東亞合成株式会社 シーリング材組成物
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
JP2013241479A (ja) * 2010-09-10 2013-12-05 Kaneka Corp 硬化性樹脂組成物
JP5013029B2 (ja) * 2010-11-30 2012-08-29 Ｄｉｃ株式会社 カチオン重合性樹脂組成物、それを用いて得られる光学用材料、積層体
JP5477268B2 (ja) * 2010-12-02 2014-04-23 東洋インキＳｃホールディングス株式会社 感光性樹脂組成物およびタッチパネル用絶縁膜
WO2013035206A1 (ja) * 2011-09-09 2013-03-14 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン 電子装置用シール剤組成物
JP5964590B2 (ja) * 2012-01-10 2016-08-03 株式会社カネカ 光学材料用活性エネルギー線硬化性組成物、硬化物、および製造方法
KR101574840B1 (ko) 2012-09-13 2015-12-07 제일모직주식회사 광경화 조성물, 이를 포함하는 장벽층 및 이를 포함하는 봉지화된 장치
WO2014042328A1 (ko) * 2012-09-13 2014-03-20 제일모직 주식회사 광경화 조성물, 이를 포함하는 장벽층 및 이를 포함하는 봉지화된 장치
WO2014099300A1 (en) * 2012-12-19 2014-06-26 3M Innovative Properties Company Pressure-sensitive adhesives prepared from degradable monomers and polymers
JP6158560B2 (ja) * 2013-03-29 2017-07-05 株式会社カネカ 紫外線硬化型成形体および成型方法
EP2915822A1 (de) * 2014-03-06 2015-09-09 Université de Haute Alsace Lichtinduziertes freiradikalisches und/oder kationisches Photopolymerisationsverfahren
WO2015165753A1 (de) * 2014-04-29 2015-11-05 Basf Se Nicht-wässrige antidröhnmasse mit nicht-pulverförmigem polyacrylatbindemittel und radikalisch polymerisierbarer verbindung
WO2017170881A1 (ja) * 2016-03-30 2017-10-05 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
JP6949458B2 (ja) * 2016-03-30 2021-10-13 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
CN108699320B (zh) * 2016-03-30 2020-11-06 株式会社Adeka 固化性组合物、固化物的制造方法、及其固化物
KR102265025B1 (ko) * 2016-03-31 2021-06-14 가부시키가이샤 아데카 경화성 조성물, 경화물의 제조 방법, 및 그 경화물
EP3252088B1 (de) 2016-05-31 2018-07-04 Henkel AG & Co. KGaA Durch mitteldruck-quecksilberglühlampen uv-gehärteter, kationischer druckempfindlicher haftkleber
WO2018037517A1 (ja) * 2016-08-24 2018-03-01 日立化成株式会社 硬化性樹脂組成物、画像表示装置及び画像表示装置の製造方法
WO2019064385A1 (ja) * 2017-09-27 2019-04-04 日立化成株式会社 硬化性樹脂組成物、画像表示装置及び画像表示装置の製造方法
JP7213660B2 (ja) * 2018-11-07 2023-01-27 ナガセケムテックス株式会社 硬化性樹脂組成物および硬化物
EP3677612A1 (de) * 2019-01-07 2020-07-08 Université de Haute Alsace Hochleistungsfähige photoinitiierungssysteme für polymer-/opake füllstoffverbundstoffe
CN113025167A (zh) * 2021-04-22 2021-06-25 安徽陶博士环保科技有限公司 一种双固化导静电陶瓷复合材料及其制备方法
WO2024038761A1 (ja) * 2022-08-16 2024-02-22 株式会社カネカ 硬化物、硬化物を備える物品および硬化物の内部応力を緩和する方法
CN115746186A (zh) * 2022-11-24 2023-03-07 湖北固润科技股份有限公司 含有氧杂环丁烷官能团的丙烯酸系预聚物及其制备和应用

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JPH08277385A (ja) 1995-04-05 1996-10-22 Toagosei Co Ltd 活性エネルギー線硬化型粘着剤組成物
JPH09309944A (ja) * 1996-05-22 1997-12-02 Ajinomoto Co Inc 感光性樹脂組成物
JP4215898B2 (ja) 1998-08-27 2009-01-28 株式会社カネカ 粘着剤組成物
WO2000046315A1 (fr) * 1999-02-08 2000-08-10 Hitachi Chemical Co., Ltd. Adhesif, structure de connexion d'electrodes, et procede de connexion d'electrodes
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JP4081212B2 (ja) * 1999-09-16 2008-04-23 三菱電機株式会社 液晶表示装置用シール剤組成物およびこのシール剤を用いた液晶表示装置
DE10230674B4 (de) * 2002-07-04 2006-11-23 IHP GmbH - Innovations for High Performance Microelectronics/Institut für innovative Mikroelektronik Halbleiterkondensator und damit aufgebauter MOSFET
JP2003213204A (ja) * 2003-02-04 2003-07-30 Toagosei Co Ltd 缶外面用塗料

Also Published As

Publication number Publication date
CA2561169A1 (en) 2005-10-06
JPWO2005092981A1 (ja) 2008-02-14
WO2005092981A1 (ja) 2005-10-06
CN1938377A (zh) 2007-03-28
JP5002261B2 (ja) 2012-08-15
EP1728826B1 (de) 2011-04-20
CN1938377B (zh) 2010-12-08
US20070208098A1 (en) 2007-09-06
EP1728826A4 (de) 2008-07-30
US7781495B2 (en) 2010-08-24
ATE506414T1 (de) 2011-05-15
EP1728826A1 (de) 2006-12-06

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