ATE533611T1 - Strahlungsaushärtbare harzzusammensetzung mit verringerbarer viskosität - Google Patents

Strahlungsaushärtbare harzzusammensetzung mit verringerbarer viskosität

Info

Publication number
ATE533611T1
ATE533611T1 AT04774825T AT04774825T ATE533611T1 AT E533611 T1 ATE533611 T1 AT E533611T1 AT 04774825 T AT04774825 T AT 04774825T AT 04774825 T AT04774825 T AT 04774825T AT E533611 T1 ATE533611 T1 AT E533611T1
Authority
AT
Austria
Prior art keywords
resin composition
viscosity
reducable
cured resin
radiation cured
Prior art date
Application number
AT04774825T
Other languages
English (en)
Inventor
Xiaorong You
Original Assignee
Dsm Ip Assets Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dsm Ip Assets Bv filed Critical Dsm Ip Assets Bv
Application granted granted Critical
Publication of ATE533611T1 publication Critical patent/ATE533611T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/003—Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor characterised by the choice of material
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
    • C08L51/085—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds on to polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D151/085—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds on to polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
AT04774825T 2003-07-23 2004-07-16 Strahlungsaushärtbare harzzusammensetzung mit verringerbarer viskosität ATE533611T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US48912103P 2003-07-23 2003-07-23
PCT/NL2004/000517 WO2005007759A2 (en) 2003-07-23 2004-07-16 Viscosity reducible radiation curable resin composition

Publications (1)

Publication Number Publication Date
ATE533611T1 true ATE533611T1 (de) 2011-12-15

Family

ID=34079472

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04774825T ATE533611T1 (de) 2003-07-23 2004-07-16 Strahlungsaushärtbare harzzusammensetzung mit verringerbarer viskosität

Country Status (6)

Country Link
US (1) US20060231982A1 (de)
EP (2) EP2301742B1 (de)
KR (1) KR101109977B1 (de)
CN (2) CN101775197B (de)
AT (1) ATE533611T1 (de)
WO (1) WO2005007759A2 (de)

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FR2888255B1 (fr) * 2005-07-06 2007-11-16 Saint Gobain Vetrotex Fils de renforcement et composites ayant une tenue au feu amelioree
US8961858B2 (en) * 2008-04-14 2015-02-24 Rolls-Royce Corporation Manufacture of field activated components by stereolithography
EP2513722B1 (de) * 2009-12-17 2017-01-25 DSM IP Assets B.V. Led-härtbare flüssige harzzusammensetzungen für additive fabrication sowie verfahren damit
CN102134449B (zh) * 2010-12-27 2014-01-22 东莞市阿比亚能源科技有限公司 一种用于lcd板的uv胶
EP2868692B2 (de) * 2013-11-05 2025-07-16 Stratasys, Inc. Stabilisierte matrixgefüllte flüssige strahlungshärtbare Harzzusammensetzungen zur Additivherstellung
KR101551255B1 (ko) * 2013-12-30 2015-09-09 전자부품연구원 3d 프린팅용 저점도 세라믹 슬러리 조성물
CN107405829A (zh) * 2014-11-27 2017-11-28 佐治亚-太平洋化工品有限公司 用于添加制造中的材料挤出工艺中的触变性热固性树脂
US10683381B2 (en) 2014-12-23 2020-06-16 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
ES2879637T3 (es) * 2015-03-23 2021-11-22 Dow Global Technologies Llc Composiciones fotocurables para impresión tridimensional
CN105153935A (zh) * 2015-09-14 2015-12-16 安徽华润涂料有限公司 一种微型汽车的轮毂内侧的耐磨涂料
EP3390006B1 (de) 2015-12-17 2021-01-27 Bridgestone Americas Tire Operations, LLC Kartuschen zur generativen fertigung und verfahren zur herstellung gehärteter polymerprodukte durch generative fertigung
EP3532267B1 (de) 2016-10-27 2023-03-01 Bridgestone Americas Tire Operations, LLC Verfahren zur herstellung gehärteter polymerprodukte durch generative fertigung
WO2018119067A1 (en) * 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion
WO2018119049A1 (en) * 2016-12-20 2018-06-28 Basf Se Photopolymer ceramic dispersion for additive fabrication
JP6615849B2 (ja) * 2017-11-22 2019-12-04 マクセルホールディングス株式会社 モデル材用組成物
JP7480056B2 (ja) * 2018-03-28 2024-05-09 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェン 光硬化性組成物および光硬化性組成物を用いてメンブレン表面に局所的フィーチャーを形成する方法
GB201808384D0 (en) * 2018-05-22 2018-07-11 Photocentric Ltd Methods for making a metal, sand or ceramic object by additive manufacture and formulations for use in said methods
EP3738771B1 (de) * 2019-05-13 2023-08-16 Henkel AG & Co. KGaA Zweifach härtende epoxidformulierungen für anwendungen zum 3d-drucken
US12173168B2 (en) * 2019-07-24 2024-12-24 Hewlett-Packard Development Company, L.P. Labels
EP3919943A1 (de) * 2020-06-03 2021-12-08 Essilor International Härtbare beschichtungszusammensetzung
CN114099769A (zh) * 2020-09-01 2022-03-01 苏州中瑞智创三维科技股份有限公司 一种采用粘弹膏体3d打印牙科全瓷修复体的材料及方法

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US3708296A (en) 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US4065624A (en) * 1976-01-27 1977-12-27 Ppg Industries, Inc. Radiation curable coating composition
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Also Published As

Publication number Publication date
CN1826216B (zh) 2010-04-21
EP1646493B1 (de) 2011-11-16
HK1145695A1 (en) 2011-04-29
WO2005007759A2 (en) 2005-01-27
EP2301742A1 (de) 2011-03-30
KR20060040705A (ko) 2006-05-10
HK1094651A1 (zh) 2007-04-04
EP1646493A2 (de) 2006-04-19
WO2005007759A3 (en) 2005-03-03
CN1826216A (zh) 2006-08-30
US20060231982A1 (en) 2006-10-19
CN101775197A (zh) 2010-07-14
CN101775197B (zh) 2012-09-26
KR101109977B1 (ko) 2012-03-13
EP2301742B1 (de) 2014-01-15

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