ATE462990T1 - Bebilderbares element mit pfropfpolymer - Google Patents

Bebilderbares element mit pfropfpolymer

Info

Publication number
ATE462990T1
ATE462990T1 AT02702061T AT02702061T ATE462990T1 AT E462990 T1 ATE462990 T1 AT E462990T1 AT 02702061 T AT02702061 T AT 02702061T AT 02702061 T AT02702061 T AT 02702061T AT E462990 T1 ATE462990 T1 AT E462990T1
Authority
AT
Austria
Prior art keywords
graft copolymer
graft polymer
present
imagable element
imagable
Prior art date
Application number
AT02702061T
Other languages
German (de)
English (en)
Inventor
S Pappas
Shashikant Saraiya
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of ATE462990T1 publication Critical patent/ATE462990T1/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • B41C1/10Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/494Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498Photothermographic systems, e.g. dry silver
    • G03C1/49836Additives
    • G03C1/49863Inert additives, e.g. surfactants, binders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02Positive working, i.e. the exposed (imaged) areas are removed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06Developable by an alkaline solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10Developable by an acidic solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/005Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/107Polyamide or polyurethane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/108Polyolefin or halogen containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145Infrared
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Graft Or Block Polymers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Conductive Materials (AREA)
  • Materials For Photolithography (AREA)
AT02702061T 2001-04-04 2002-01-23 Bebilderbares element mit pfropfpolymer ATE462990T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/826,300 US6582882B2 (en) 2001-04-04 2001-04-04 Imageable element comprising graft polymer
PCT/US2002/001929 WO2002082180A1 (en) 2001-04-04 2002-01-23 Imageable element comprising graft polymer

Publications (1)

Publication Number Publication Date
ATE462990T1 true ATE462990T1 (de) 2010-04-15

Family

ID=25246180

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02702061T ATE462990T1 (de) 2001-04-04 2002-01-23 Bebilderbares element mit pfropfpolymer

Country Status (8)

Country Link
US (1) US6582882B2 (enExample)
EP (1) EP1379918B1 (enExample)
JP (1) JP4053888B2 (enExample)
AT (1) ATE462990T1 (enExample)
DE (1) DE60235801D1 (enExample)
DK (1) DK1379918T3 (enExample)
ES (1) ES2343783T3 (enExample)
WO (1) WO2002082180A1 (enExample)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6566029B2 (en) * 2000-12-13 2003-05-20 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4266077B2 (ja) * 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7049046B2 (en) * 2004-03-30 2006-05-23 Eastman Kodak Company Infrared absorbing compounds and their use in imageable elements
US6899994B2 (en) * 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US7045271B2 (en) * 2004-05-10 2006-05-16 Eastman Kodak Company On press developable imageable element
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7172850B2 (en) 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
US7297462B2 (en) * 2003-11-17 2007-11-20 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
EP1531042B1 (en) * 2003-11-17 2009-07-08 Agfa Graphics N.V. Heat-sensitive lithographic printing plate precursor.
US7214469B2 (en) * 2003-12-26 2007-05-08 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
WO2005067593A2 (en) * 2004-01-05 2005-07-28 Citiplate, Inc. Photothermally sensitive compositions and system for ctp imaging processes
US20060144270A1 (en) * 2005-01-04 2006-07-06 Prakash Seth Photothermally sensitive compositions and system for CTP imaging processes
ATE383946T1 (de) * 2004-03-29 2008-02-15 Fujifilm Corp Lithographischer druckplattenvorläufer und einen solchen verwendendes lithographisches druckverfahren
US7083895B2 (en) * 2004-09-01 2006-08-01 Kodak Polychrome Graphics Llc Adhesion promoting ingredients for on-press developable lithographic printing plate precursors
EP1798031A3 (en) 2005-01-26 2007-07-04 FUJIFILM Corporation Lithographic printing plate precursor and lithographic printing method
US7189494B2 (en) * 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
US7153632B1 (en) 2005-08-03 2006-12-26 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
EP2018365B1 (en) 2006-05-17 2014-11-19 American Dye Source, Inc. New materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
CA2661147C (en) * 2006-08-24 2013-02-05 American Dye Source Inc. Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof
US20080145789A1 (en) * 2006-10-13 2008-06-19 Elizabeth Knight Method of making lithographic printing plates
EP2098367A1 (en) 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
BR112012001663B1 (pt) 2009-09-15 2020-02-11 Mylan Group Copolímeros, partículas poliméricas compreendendo ditos copolímeros, e aglutinantes copolímeros para composições de revestimento sensíveis à radiação para placas de impressão litográficas sensíveis à radiação de trabalho negativo
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
MX2011013975A (es) 2009-10-29 2012-04-30 Mylan Group Compuestos gallotanicos para composiciones de revestimiento de placas de impresión litografica.
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
AU2010273146B2 (en) 2010-09-14 2014-06-19 Mylan Group Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
CN102504137B (zh) * 2011-11-11 2015-05-06 乐凯华光印刷科技有限公司 一种热塑性纳微米颗粒
CN102582312B (zh) * 2011-12-23 2016-06-29 乐凯华光印刷科技有限公司 一种低化学处理紫激光光聚合型平版印刷版
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
CN103881034B (zh) * 2012-12-21 2016-03-09 乐凯华光印刷科技有限公司 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
JP2015202586A (ja) 2014-04-11 2015-11-16 イーストマン コダック カンパニー 平版印刷版原版
US20160259243A1 (en) 2015-03-03 2016-09-08 Eastman Kodak Company Negative-working lithographic printing plate precursor
US9417524B1 (en) 2015-03-10 2016-08-16 Eastman Kodak Company Infrared radiation-sensitive lithographic printing plate precursors
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
JP6934939B2 (ja) 2017-05-31 2021-09-15 富士フイルム株式会社 平版印刷版原版、及び平版印刷版の作製方法
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
CN114729076B (zh) 2019-11-26 2024-09-20 默克专利股份有限公司 非硫醇类基于氮的疏水性聚合物刷材料及其用于基板表面修饰的用途
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068992A (ja) 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
JPH02277695A (ja) * 1989-04-20 1990-11-14 Fuji Photo Film Co Ltd 熱転写受像材料
DE4108496A1 (de) 1990-03-16 1991-10-31 Fuji Photo Film Co Ltd Vorsensibilisierte platte zur verwendung in der herstellung von lithographischen druckplatten, die kein anfeuchtwasser erfordern
EP0563251A1 (en) 1990-12-20 1993-10-06 Exxon Chemical Patents Inc. Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications
JP2739387B2 (ja) 1991-04-25 1998-04-15 富士写真フイルム株式会社 水無し平版印刷版及びその製版方法
GB9110417D0 (en) 1991-05-14 1991-07-03 Du Pont Howson Ltd Improvements in or relating to the formation of images
GB2273366B (en) 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
EP0816070B1 (en) 1996-06-24 2000-10-18 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
EP0839647B2 (en) 1996-10-29 2014-01-22 Agfa Graphics N.V. Method for making a lithographic printing plate with improved ink-uptake
US6071369A (en) 1996-10-29 2000-06-06 Agfa-Gevaert, N.V. Method for making an lithographic printing plate with improved ink-uptake
EP0881096B1 (en) 1997-05-27 2001-10-17 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
US6022667A (en) 1997-05-27 2000-02-08 Agfa-Gevaert, N.V. Heat sensitive imaging element and a method for producing lithographic plates therewith
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6558872B1 (en) 2000-09-09 2003-05-06 Kodak Polychrome Graphics Llc Relation to the manufacture of masks and electronic parts

Also Published As

Publication number Publication date
EP1379918A4 (en) 2006-09-27
ES2343783T3 (es) 2010-08-10
WO2002082180A1 (en) 2002-10-17
EP1379918B1 (en) 2010-03-31
US20020155375A1 (en) 2002-10-24
JP4053888B2 (ja) 2008-02-27
DE60235801D1 (de) 2010-05-12
US6582882B2 (en) 2003-06-24
EP1379918A1 (en) 2004-01-14
DK1379918T3 (da) 2010-07-19
JP2004525420A (ja) 2004-08-19

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