DE60235801D1 - Bebilderbares element mit pfropfpolymer - Google Patents

Bebilderbares element mit pfropfpolymer

Info

Publication number
DE60235801D1
DE60235801D1 DE60235801T DE60235801T DE60235801D1 DE 60235801 D1 DE60235801 D1 DE 60235801D1 DE 60235801 T DE60235801 T DE 60235801T DE 60235801 T DE60235801 T DE 60235801T DE 60235801 D1 DE60235801 D1 DE 60235801D1
Authority
DE
Germany
Prior art keywords
graft copolymer
powder polymer
present
illustrative element
illustrative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60235801T
Other languages
German (de)
English (en)
Inventor
Peter S Pappas
Shashikant Saraiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of DE60235801D1 publication Critical patent/DE60235801D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498—Photothermographic systems, e.g. dry silver
    • G03C1/49836—Additives
    • G03C1/49863—Inert additives, e.g. surfactants, binders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/145—Infrared
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Conductive Materials (AREA)
  • Graft Or Block Polymers (AREA)
  • Materials For Photolithography (AREA)
DE60235801T 2001-04-04 2002-01-23 Bebilderbares element mit pfropfpolymer Expired - Lifetime DE60235801D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/826,300 US6582882B2 (en) 2001-04-04 2001-04-04 Imageable element comprising graft polymer
PCT/US2002/001929 WO2002082180A1 (en) 2001-04-04 2002-01-23 Imageable element comprising graft polymer

Publications (1)

Publication Number Publication Date
DE60235801D1 true DE60235801D1 (de) 2010-05-12

Family

ID=25246180

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60235801T Expired - Lifetime DE60235801D1 (de) 2001-04-04 2002-01-23 Bebilderbares element mit pfropfpolymer

Country Status (8)

Country Link
US (1) US6582882B2 (enExample)
EP (1) EP1379918B1 (enExample)
JP (1) JP4053888B2 (enExample)
AT (1) ATE462990T1 (enExample)
DE (1) DE60235801D1 (enExample)
DK (1) DK1379918T3 (enExample)
ES (1) ES2343783T3 (enExample)
WO (1) WO2002082180A1 (enExample)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1216831B1 (en) * 2000-12-13 2003-10-29 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP4266077B2 (ja) * 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US7049046B2 (en) * 2004-03-30 2006-05-23 Eastman Kodak Company Infrared absorbing compounds and their use in imageable elements
US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US7261998B2 (en) * 2001-04-04 2007-08-28 Eastman Kodak Company Imageable element with solvent-resistant polymeric binder
US6899994B2 (en) * 2001-04-04 2005-05-31 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
US7045271B2 (en) * 2004-05-10 2006-05-16 Eastman Kodak Company On press developable imageable element
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
US7172850B2 (en) 2002-04-10 2007-02-06 Eastman Kodak Company Preparation of solvent-resistant binder for an imageable element
US7217502B2 (en) * 2003-03-27 2007-05-15 Eastman Kodak Company Nanopastes for use as patterning compositions
US7368215B2 (en) * 2003-05-12 2008-05-06 Eastman Kodak Company On-press developable IR sensitive printing plates containing an onium salt initiator system
EP1531042B1 (en) * 2003-11-17 2009-07-08 Agfa Graphics N.V. Heat-sensitive lithographic printing plate precursor.
US7297462B2 (en) * 2003-11-17 2007-11-20 Agfa Graphics Nv Heat-sensitive lithographic printing plate precursor
US7214469B2 (en) * 2003-12-26 2007-05-08 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method
WO2005067593A2 (en) * 2004-01-05 2005-07-28 Citiplate, Inc. Photothermally sensitive compositions and system for ctp imaging processes
US20060144270A1 (en) * 2005-01-04 2006-07-06 Prakash Seth Photothermally sensitive compositions and system for CTP imaging processes
US7462440B2 (en) * 2004-03-29 2008-12-09 Fujifilm Corporation Lithographic printing plate precursor and lithographic printing method using the same
US7083895B2 (en) * 2004-09-01 2006-08-01 Kodak Polychrome Graphics Llc Adhesion promoting ingredients for on-press developable lithographic printing plate precursors
EP1685957B1 (en) 2005-01-26 2013-12-11 FUJIFILM Corporation Packaged body of lithographic printing plate precursors
US7189494B2 (en) * 2005-05-26 2007-03-13 Eastman Kodak Company On-press developable imageable element comprising a tetraarylborate salt
US7153632B1 (en) 2005-08-03 2006-12-26 Eastman Kodak Company Radiation-sensitive compositions and imageable materials
BRPI0707574B1 (pt) 2006-05-17 2017-06-06 American Dye Source Inc novos materiais para revestimentos de placas litográficas, placas litográficas e revestimentos contendo as mesmas, métodos de preparação e uso
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
CA2661147C (en) * 2006-08-24 2013-02-05 American Dye Source Inc. Reactive near infrared absorbing polymeric particles, methods of preparation and uses thereof
US20080145789A1 (en) * 2006-10-13 2008-06-19 Elizabeth Knight Method of making lithographic printing plates
EP2098367A1 (en) 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
US8084182B2 (en) * 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8318405B2 (en) 2009-03-13 2012-11-27 Eastman Kodak Company Negative-working imageable elements with overcoat
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
WO2010148520A2 (en) 2009-09-15 2010-12-29 Mylan Group Copolymers, polymeric particles comprising said copolymers and copolymeric binders for radiation-sensitive coating compositions for negative-working radiation-sensitive lithographic printing plates
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
EP2451821B1 (en) 2009-10-29 2016-07-20 Mylan Group Gallotannic compounds for lithographic printing plate coating compositions
US8329383B2 (en) 2009-11-05 2012-12-11 Eastman Kodak Company Negative-working lithographic printing plate precursors
RU2559050C2 (ru) 2010-09-14 2015-08-10 Майлан Груп Сополимеры для чувствительных в ближней инфракрасной области излучения композиций для покрытия позитивных термических литографических печатных форм
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US8900798B2 (en) 2010-10-18 2014-12-02 Eastman Kodak Company On-press developable lithographic printing plate precursors
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
US9029063B2 (en) 2011-09-22 2015-05-12 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8632941B2 (en) 2011-09-22 2014-01-21 Eastman Kodak Company Negative-working lithographic printing plate precursors with IR dyes
CN102504137B (zh) * 2011-11-11 2015-05-06 乐凯华光印刷科技有限公司 一种热塑性纳微米颗粒
CN102582312B (zh) * 2011-12-23 2016-06-29 乐凯华光印刷科技有限公司 一种低化学处理紫激光光聚合型平版印刷版
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
US8927197B2 (en) 2012-11-16 2015-01-06 Eastman Kodak Company Negative-working lithographic printing plate precursors
CN103881034B (zh) * 2012-12-21 2016-03-09 乐凯华光印刷科技有限公司 一种激光热塑性纳微米颗粒及其合成方法与用其制作的平印版
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
JP2015202586A (ja) 2014-04-11 2015-11-16 イーストマン コダック カンパニー 平版印刷版原版
US20160259243A1 (en) 2015-03-03 2016-09-08 Eastman Kodak Company Negative-working lithographic printing plate precursor
US9417524B1 (en) 2015-03-10 2016-08-16 Eastman Kodak Company Infrared radiation-sensitive lithographic printing plate precursors
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
CN110678335B (zh) 2017-05-31 2021-11-16 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法、聚合物粒子及组合物
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
TWI887304B (zh) 2019-11-26 2025-06-21 德商馬克專利公司 非硫醇類基於氮之疏水性高分子刷材料及其用於基板表面修飾之用途
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068992A (ja) 1983-09-27 1985-04-19 Mitsui Toatsu Chem Inc 画像形成方法
JPH02277695A (ja) * 1989-04-20 1990-11-14 Fuji Photo Film Co Ltd 熱転写受像材料
DE4108496A1 (de) 1990-03-16 1991-10-31 Fuji Photo Film Co Ltd Vorsensibilisierte platte zur verwendung in der herstellung von lithographischen druckplatten, die kein anfeuchtwasser erfordern
EP0563251A1 (en) 1990-12-20 1993-10-06 Exxon Chemical Patents Inc. Uv/eb curable butyl copolymers for lithographic and corrosion-resistant coating applications
JP2739387B2 (ja) 1991-04-25 1998-04-15 富士写真フイルム株式会社 水無し平版印刷版及びその製版方法
GB9110417D0 (en) 1991-05-14 1991-07-03 Du Pont Howson Ltd Improvements in or relating to the formation of images
GB2273366B (en) 1992-11-18 1996-03-27 Du Pont Forming images on radiation-sensitive plates
EP0816070B1 (en) 1996-06-24 2000-10-18 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
EP0839647B2 (en) 1996-10-29 2014-01-22 Agfa Graphics N.V. Method for making a lithographic printing plate with improved ink-uptake
US6071369A (en) 1996-10-29 2000-06-06 Agfa-Gevaert, N.V. Method for making an lithographic printing plate with improved ink-uptake
US6022667A (en) 1997-05-27 2000-02-08 Agfa-Gevaert, N.V. Heat sensitive imaging element and a method for producing lithographic plates therewith
EP0881096B1 (en) 1997-05-27 2001-10-17 Agfa-Gevaert N.V. A heat sensitive imaging element and a method for producing lithographic plates therewith
US6352812B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6558872B1 (en) * 2000-09-09 2003-05-06 Kodak Polychrome Graphics Llc Relation to the manufacture of masks and electronic parts

Also Published As

Publication number Publication date
EP1379918A4 (en) 2006-09-27
US20020155375A1 (en) 2002-10-24
JP4053888B2 (ja) 2008-02-27
ATE462990T1 (de) 2010-04-15
WO2002082180A1 (en) 2002-10-17
ES2343783T3 (es) 2010-08-10
EP1379918A1 (en) 2004-01-14
EP1379918B1 (en) 2010-03-31
US6582882B2 (en) 2003-06-24
DK1379918T3 (da) 2010-07-19
JP2004525420A (ja) 2004-08-19

Similar Documents

Publication Publication Date Title
DE60235801D1 (de) Bebilderbares element mit pfropfpolymer
JP2010503016A5 (enExample)
TW200520046A (en) Exposure method and exposure management system
ATE301846T1 (de) Prägeform-lithographie
WO2006124279A3 (en) Making relief image using removable film
WO2007007176A3 (en) Photoresist composition for imaging thick films
EP1630612A3 (en) Method for manufacturing a microstructure, exposure device, and electronic apparatus
EP1067593A3 (en) Semiconductor thin film forming system
WO2003010600A3 (en) Method and system for direct-to-press imaging
EP0883163A3 (en) Method of forming micropatterns
ATE349725T1 (de) Chemisch verstärkte negativphotoresistzusammensetzung
AU2003209895A1 (en) Sensitivity enhancement of radiation-sensitive elements
EP1553445A3 (en) Composition for blocking light and method of forming an image using the composition
KR910019132A (ko) 영상 노출 시스템 및 방법
JP2003270791A5 (enExample)
TW200615701A (en) Determination method of exposure conditions, exposure method, exposure device and manufacturing method of the device
TWI263860B (en) Resist pattern formation method
JP3281612B2 (ja) パターン形成方法
ATE520058T1 (de) Flachdruckplatte and lichtempfindliche bilderzeugungszusammensetzung enthaltend ein novolak-harz mit wiederkehrenden einheiten von xylenol.
WO2004044652A3 (en) Positive tone lithography with carbon dioxide development systems
KR100680426B1 (ko) 포토레지스트 패턴 코팅용 수용성 조성물 및 이를 이용한미세패턴 형성 방법
KR970003415A (ko) 반도체 기판상에 감광막 패턴을 형성하는 방법
JP3129266B2 (ja) レジスト材料
JP2002023353A5 (enExample)
ATE322031T1 (de) Strahlformungselement für optische strahlung sowie verfahren zur herstellung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition