ATE408236T1 - System zur plasmabehandlung von gasen in einer vakuumpumpe - Google Patents
System zur plasmabehandlung von gasen in einer vakuumpumpeInfo
- Publication number
- ATE408236T1 ATE408236T1 AT04292798T AT04292798T ATE408236T1 AT E408236 T1 ATE408236 T1 AT E408236T1 AT 04292798 T AT04292798 T AT 04292798T AT 04292798 T AT04292798 T AT 04292798T AT E408236 T1 ATE408236 T1 AT E408236T1
- Authority
- AT
- Austria
- Prior art keywords
- vacuum pump
- gases
- plasma treatment
- pumping assembly
- pump body
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3491—Manufacturing of targets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/38—Removing components of undefined structure
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S422/00—Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
- Y10S422/90—Decreasing pollution or environmental impact
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S422/00—Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
- Y10S422/906—Plasma or ion generation means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Analytical Chemistry (AREA)
- Organic Chemistry (AREA)
- Biomedical Technology (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Drying Of Semiconductors (AREA)
- Treating Waste Gases (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0314176A FR2863103B1 (fr) | 2003-12-01 | 2003-12-01 | Systeme de traitement des gaz par plasma integre dans une pompe a vide |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE408236T1 true ATE408236T1 (de) | 2008-09-15 |
Family
ID=34451713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04292798T ATE408236T1 (de) | 2003-12-01 | 2004-11-26 | System zur plasmabehandlung von gasen in einer vakuumpumpe |
Country Status (6)
Country | Link |
---|---|
US (1) | US7998426B2 (de) |
EP (1) | EP1538656B1 (de) |
JP (1) | JP5102433B2 (de) |
AT (1) | ATE408236T1 (de) |
DE (1) | DE602004016445D1 (de) |
FR (1) | FR2863103B1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006039529A1 (de) * | 2006-08-23 | 2008-03-06 | Oerlikon Leybold Vacuum Gmbh | Verfahren zur Abreaktion selbstentzündlicher Stäube in einer Vakuumpumpvorrichtung |
FR2981705B1 (fr) * | 2011-10-19 | 2013-11-22 | Adixen Vacuum Products | Dispositif de pompage et de traitement des gaz |
JP6472653B2 (ja) * | 2014-03-17 | 2019-02-20 | 株式会社荏原製作所 | 除害機能付真空ポンプ |
JP6441660B2 (ja) * | 2014-03-17 | 2018-12-19 | 株式会社荏原製作所 | 除害機能付真空ポンプ |
FR3019471B1 (fr) * | 2014-04-04 | 2016-05-06 | Thales Sa | Dispositif de conversion d'un effluent gazeux par plasma multi-source |
GB2540754A (en) * | 2015-07-22 | 2017-02-01 | Edwards Ltd | Abatement system |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0448750B1 (de) * | 1990-03-27 | 1996-05-01 | Leybold Aktiengesellschaft | Mehrstufige trockenverdichtende Vakuumpumpe und Verfahren zu ihrem Betrieb |
NL9200076A (nl) * | 1992-01-16 | 1993-08-16 | Leybold B V | Werkwijze, droge meertrapspomp en plasmascrubber voor het omvormen van reactieve gassen. |
US6187072B1 (en) * | 1995-09-25 | 2001-02-13 | Applied Materials, Inc. | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
JPH1176740A (ja) * | 1997-09-05 | 1999-03-23 | Mitsui Chem Inc | 有機フッ素系排ガスの分解処理方法及び分解処理装置 |
AU9501998A (en) * | 1997-09-23 | 1999-04-12 | On-Line Technologies, Inc. | Method and apparatus for fault detection and control |
JP3709432B2 (ja) * | 1999-04-30 | 2005-10-26 | アプライド マテリアルズ インコーポレイテッド | 排ガス処理装置及び基板処理装置 |
JP2000323466A (ja) * | 1999-04-30 | 2000-11-24 | Applied Materials Inc | 基板処理装置 |
JP2001079335A (ja) * | 1999-09-14 | 2001-03-27 | Univ Chuo | 排ガス処理方法及び装置 |
US6621227B1 (en) * | 2000-02-08 | 2003-09-16 | Canon Kabushiki Kaisha | Discharge generating apparatus and discharge generating method |
JP2001252527A (ja) * | 2000-03-13 | 2001-09-18 | Seiko Epson Corp | Pfcの処理方法および処理装置 |
JP2001314752A (ja) * | 2000-05-12 | 2001-11-13 | Hokushin Ind Inc | プラズマ反応容器及びガスプラズマ分解方法 |
FR2825295B1 (fr) * | 2001-05-31 | 2004-05-28 | Air Liquide | Application des plasmas denses crees a pression atmospherique au traitement d'effluents gazeux |
US6685803B2 (en) * | 2001-06-22 | 2004-02-03 | Applied Materials, Inc. | Plasma treatment of processing gases |
JP3758550B2 (ja) * | 2001-10-24 | 2006-03-22 | アイシン精機株式会社 | 多段真空ポンプ |
FR2925205B1 (fr) | 2007-12-12 | 2011-04-29 | Bernard Abel Andre Leuvrey | Insert d'identification et de tracabilite des arbres |
-
2003
- 2003-12-01 FR FR0314176A patent/FR2863103B1/fr not_active Expired - Fee Related
-
2004
- 2004-11-26 AT AT04292798T patent/ATE408236T1/de not_active IP Right Cessation
- 2004-11-26 DE DE602004016445T patent/DE602004016445D1/de active Active
- 2004-11-26 EP EP04292798A patent/EP1538656B1/de not_active Not-in-force
- 2004-11-30 US US10/998,915 patent/US7998426B2/en not_active Expired - Fee Related
- 2004-11-30 JP JP2004345489A patent/JP5102433B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2863103A1 (fr) | 2005-06-03 |
JP5102433B2 (ja) | 2012-12-19 |
DE602004016445D1 (de) | 2008-10-23 |
US20050142000A1 (en) | 2005-06-30 |
EP1538656B1 (de) | 2008-09-10 |
FR2863103B1 (fr) | 2006-07-14 |
US7998426B2 (en) | 2011-08-16 |
EP1538656A1 (de) | 2005-06-08 |
JP2005205399A (ja) | 2005-08-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |