ATE384042T1 - Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte - Google Patents
Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukteInfo
- Publication number
- ATE384042T1 ATE384042T1 AT04746440T AT04746440T ATE384042T1 AT E384042 T1 ATE384042 T1 AT E384042T1 AT 04746440 T AT04746440 T AT 04746440T AT 04746440 T AT04746440 T AT 04746440T AT E384042 T1 ATE384042 T1 AT E384042T1
- Authority
- AT
- Austria
- Prior art keywords
- cross
- producing
- polymerization initiators
- cationic polymerization
- linking products
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003180712 | 2003-06-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE384042T1 true ATE384042T1 (de) | 2008-02-15 |
Family
ID=33549508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04746440T ATE384042T1 (de) | 2003-06-25 | 2004-06-25 | Verfahren zur herstellung von monosulfoniumsalzen,kationische polymerisierungsinitiatoren, vernetzbare zusammensetzungen und vernetzungsprodukte |
Country Status (6)
Country | Link |
---|---|
US (3) | US20060247401A1 (de) |
EP (1) | EP1640363B1 (de) |
JP (1) | JP4602252B2 (de) |
AT (1) | ATE384042T1 (de) |
DE (1) | DE602004011341T2 (de) |
WO (1) | WO2005000801A1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060172230A1 (en) * | 2005-02-02 | 2006-08-03 | Dsm Ip Assets B.V. | Method and composition for reducing waste in photo-imaging applications |
GB0516515D0 (en) * | 2005-08-11 | 2005-09-21 | Sun Chemical Bv | A jet ink and ink jet printing process |
JP4934306B2 (ja) * | 2005-09-28 | 2012-05-16 | サンアプロ株式会社 | スルホニウム塩の製造方法 |
US20090163723A1 (en) * | 2005-11-25 | 2009-06-25 | Hideki Kimura | Method for producing sulfonium fluorinated alkylfluorophosphate |
JP5208573B2 (ja) * | 2008-05-06 | 2013-06-12 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、光硬化性組成物及びこの硬化体 |
US9363469B2 (en) * | 2008-07-17 | 2016-06-07 | Ppc Broadband, Inc. | Passive-active terminal adapter and method having automatic return loss control |
JP5828715B2 (ja) * | 2011-08-25 | 2015-12-09 | サンアプロ株式会社 | スルホニウム塩、光酸発生剤、硬化性組成物およびレジスト組成物 |
CN114402260A (zh) | 2020-08-05 | 2022-04-26 | 三亚普罗股份有限公司 | 光产酸剂 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61100587A (ja) * | 1984-10-22 | 1986-05-19 | Chisso Corp | 有機珪素化合物 |
CA2034400A1 (en) * | 1990-04-30 | 1991-10-31 | James Vincent Crivello | Method for making triarylsulfonium hexafluorometal or metalloid salts |
US5274148A (en) * | 1992-08-10 | 1993-12-28 | Isp Investments, Inc. | Dialky alkoxy phenyl sulfonium salt cationic initiators |
WO1994029271A1 (fr) * | 1993-06-15 | 1994-12-22 | Nippon Soda Co., Ltd. | Nouveau compose de sel de sulfonium et initiateur de polymerisation |
JPH06345726A (ja) | 1993-06-15 | 1994-12-20 | Nippon Soda Co Ltd | 新規スルホニウム塩化合物および重合開始剤 |
US5502083A (en) * | 1993-06-18 | 1996-03-26 | Nippon Kayaku Kabushiki Kaisha | Onium salt, photopolymerization initiator, energy ray-curing composition containing the initiator, and cured product |
JPH0782244A (ja) * | 1993-09-13 | 1995-03-28 | Nippon Kayaku Co Ltd | スルホニウム塩の製造方法 |
JPH0782245A (ja) * | 1993-09-13 | 1995-03-28 | Nippon Kayaku Co Ltd | スルホニウム塩の製造方法 |
US5798396A (en) * | 1994-03-09 | 1998-08-25 | Nippon Soda Co., Ltd. | Sulfonium salt-containing compounds and initiators of polymerization |
TW418215B (en) | 1995-03-13 | 2001-01-11 | Ciba Sc Holding Ag | A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition |
JP3741387B2 (ja) | 1995-05-26 | 2006-02-01 | 日本曹達株式会社 | 新規スルホニウム塩化合物および重合開始剤およびそれらを含有する硬化性組成物 |
JPH0912615A (ja) | 1995-06-29 | 1997-01-14 | Nippon Kayaku Co Ltd | エネルギー線硬化性組成物及びその硬化物 |
DE846681T1 (de) * | 1995-08-22 | 1998-11-19 | Nippon Soda Co | Neue sulfoniumsalzverbindungen, polymerisierungsinitiator, härtbare zusammensetzung und stärkungsverfahren |
JPH107649A (ja) * | 1996-06-18 | 1998-01-13 | Nippon Kayaku Co Ltd | 光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH10287643A (ja) * | 1997-04-10 | 1998-10-27 | Nippon Kayaku Co Ltd | 新規オニウム塩、光重合開始剤、これを含有するエネルギー線硬化性組成物及びその硬化物 |
JPH1180118A (ja) * | 1997-09-05 | 1999-03-26 | Nippon Kayaku Co Ltd | 新規スルホニウム塩、カチオン重合性組成物及びその硬化物 |
TWI250379B (en) * | 1998-08-07 | 2006-03-01 | Az Electronic Materials Japan | Chemical amplified radiation-sensitive composition which contains onium salt and generator |
JP2002241474A (ja) * | 2000-12-12 | 2002-08-28 | Nippon Kayaku Co Ltd | 芳香族スルホニウム化合物を含有する光硬化性樹脂組成物 |
JP3837066B2 (ja) * | 2000-12-15 | 2006-10-25 | サンアプロ株式会社 | スルホニウム塩の製造方法 |
US7060858B2 (en) * | 2000-12-15 | 2006-06-13 | San-Apro Limited | Method for manufacturing sulfonium salts |
CN100475803C (zh) * | 2002-03-04 | 2009-04-08 | 和光纯药工业株式会社 | 含杂环鎓盐 |
JP2004091698A (ja) * | 2002-09-02 | 2004-03-25 | Konica Minolta Holdings Inc | 活性光線硬化型組成物、活性光線硬化型インクとそれを用いた画像形成方法及びインクジェット記録装置 |
-
2004
- 2004-06-24 US US10/562,444 patent/US20060247401A1/en not_active Abandoned
- 2004-06-25 AT AT04746440T patent/ATE384042T1/de not_active IP Right Cessation
- 2004-06-25 WO PCT/JP2004/008971 patent/WO2005000801A1/ja active IP Right Grant
- 2004-06-25 JP JP2005511039A patent/JP4602252B2/ja active Active
- 2004-06-25 DE DE602004011341T patent/DE602004011341T2/de active Active
- 2004-06-25 EP EP04746440A patent/EP1640363B1/de active Active
-
2007
- 2007-12-17 US US12/000,728 patent/US7709548B2/en active Active
-
2008
- 2008-05-23 US US12/153,774 patent/US20080249270A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20060247401A1 (en) | 2006-11-02 |
US20080108720A1 (en) | 2008-05-08 |
EP1640363B1 (de) | 2008-01-16 |
JP4602252B2 (ja) | 2010-12-22 |
US20080249270A1 (en) | 2008-10-09 |
JPWO2005000801A1 (ja) | 2006-08-03 |
DE602004011341D1 (de) | 2008-03-06 |
EP1640363A1 (de) | 2006-03-29 |
DE602004011341T2 (de) | 2009-01-08 |
EP1640363A4 (de) | 2006-11-22 |
US7709548B2 (en) | 2010-05-04 |
WO2005000801A1 (ja) | 2005-01-06 |
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Legal Events
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RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |