ATE367274T1 - Lichtempfindliche flachdruckplatte - Google Patents
Lichtempfindliche flachdruckplatteInfo
- Publication number
- ATE367274T1 ATE367274T1 AT04002431T AT04002431T ATE367274T1 AT E367274 T1 ATE367274 T1 AT E367274T1 AT 04002431 T AT04002431 T AT 04002431T AT 04002431 T AT04002431 T AT 04002431T AT E367274 T1 ATE367274 T1 AT E367274T1
- Authority
- AT
- Austria
- Prior art keywords
- printing plate
- light sensitive
- flat printing
- good
- sensitive flat
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/04—Etching of light metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/12—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by non-macromolecular organic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optics & Photonics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003029879 | 2003-02-06 | ||
JP2003029881 | 2003-02-06 | ||
JP2003029880 | 2003-02-06 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE367274T1 true ATE367274T1 (de) | 2007-08-15 |
Family
ID=32659809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04002431T ATE367274T1 (de) | 2003-02-06 | 2004-02-04 | Lichtempfindliche flachdruckplatte |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1445120B1 (de) |
CN (1) | CN100545751C (de) |
AT (1) | ATE367274T1 (de) |
DE (1) | DE602004007559T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4570857B2 (ja) | 2003-03-31 | 2010-10-27 | 富士フイルム株式会社 | 感光性組成物及び平版印刷版原版 |
JP2005227554A (ja) | 2004-02-13 | 2005-08-25 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JP4452572B2 (ja) * | 2004-07-06 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物およびそれを用いた画像記録方法 |
JP4452575B2 (ja) * | 2004-07-29 | 2010-04-21 | 富士フイルム株式会社 | 感光性組成物 |
JP4499507B2 (ja) | 2004-08-23 | 2010-07-07 | コダック株式会社 | 平版印刷版原版 |
JP4368323B2 (ja) * | 2005-03-25 | 2009-11-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP5059303B2 (ja) * | 2005-07-11 | 2012-10-24 | イーストマン コダック カンパニー | 平版印刷版原版及びそれを用いた画像形成方法 |
US10025183B2 (en) * | 2014-01-22 | 2018-07-17 | Macdermid Graphics Solutions, Llc | Photosensitive resin composition |
CN110719847B (zh) * | 2017-05-31 | 2021-08-31 | 富士胶片株式会社 | 平版印刷版原版及平版印刷版的制作方法 |
CN109932403A (zh) * | 2017-12-19 | 2019-06-25 | 天津工业大学 | 一种用于宽幅被测物的电容传感器检测装置 |
EP3983340B1 (de) * | 2019-06-12 | 2023-08-02 | Nouryon Chemicals International B.V. | Verfahren zur isolierung von carbonsäure aus einem wässrigen seitenstrom |
HUE063796T2 (hu) | 2019-06-12 | 2024-01-28 | Nouryon Chemicals Int Bv | Eljárás diacil-peroxidok elõállítására |
EP3983368B1 (de) | 2019-06-12 | 2023-08-02 | Nouryon Chemicals International B.V. | Verfahren zur herstellung von diacylperoxiden |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2064080C3 (de) | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
DE2363806B2 (de) | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
JPS5946643A (ja) | 1982-09-09 | 1984-03-16 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS60159743A (ja) | 1984-01-30 | 1985-08-21 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPH0614185B2 (ja) | 1984-04-02 | 1994-02-23 | 日立化成工業株式会社 | 感光性樹脂組成物及びこれを用いた積層体 |
DE59007807D1 (de) | 1989-06-01 | 1995-01-12 | Ciba Geigy Ag | Neue sauerstoffhaltige Titanocene und deren Verwendung. |
JP3275439B2 (ja) | 1993-04-09 | 2002-04-15 | 三菱化学株式会社 | 光重合性組成物 |
JP3567402B2 (ja) * | 1996-06-12 | 2004-09-22 | コニカミノルタホールディングス株式会社 | 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版 |
JP3622170B2 (ja) * | 1997-09-26 | 2005-02-23 | コニカミノルタホールディングス株式会社 | 平版印刷版用支持体の製造方法及び感光性平版印刷版 |
JP3770436B2 (ja) * | 1997-12-15 | 2006-04-26 | 富士写真フイルム株式会社 | 光重合性組成物 |
-
2004
- 2004-02-04 AT AT04002431T patent/ATE367274T1/de not_active IP Right Cessation
- 2004-02-04 EP EP04002431A patent/EP1445120B1/de not_active Expired - Lifetime
- 2004-02-04 DE DE602004007559T patent/DE602004007559T2/de not_active Expired - Lifetime
- 2004-02-06 CN CN200410004860.9A patent/CN100545751C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1445120A3 (de) | 2006-08-09 |
EP1445120B1 (de) | 2007-07-18 |
CN1519649A (zh) | 2004-08-11 |
DE602004007559T2 (de) | 2008-04-17 |
CN100545751C (zh) | 2009-09-30 |
EP1445120A2 (de) | 2004-08-11 |
DE602004007559D1 (de) | 2007-08-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE367274T1 (de) | Lichtempfindliche flachdruckplatte | |
DE60231886D1 (de) | Zusammensetzung zur bildung eines antireflexfilms zur verwendung bei der lithographie | |
ATE385906T1 (de) | Lithographischer druckplattenvorläufer | |
ATE495479T1 (de) | Lichtempfindliche flachdruckplatte | |
WO2003014831A3 (de) | Fotoempfindliches flexodruckelement und verfahren zur herstellung von zeitungsflexodruckplatten | |
DE60123692D1 (de) | Toner und Entwickler mit Offset-Lithographie-Druckqualität | |
WO2005096098A3 (en) | Projection objective, projection exposure apparatus and reflective reticle for microlithography | |
SG131766A1 (en) | Lithographic apparatus and device manufacturing method | |
ATE420766T1 (de) | Lithographisches druckverfahren | |
TW200507065A (en) | Marker structure for alignment or overlay to correct pattern induced displacement, mask pattern for defining such a marker structure and lithographic projection apparatus using such a mask pattern | |
DE60127089D1 (de) | Negativ arbeitende licht- oder wärmeempfindliche lithographische Druckplatte | |
DE602004029370D1 (de) | Negativ-lichtempfindliche zusammensetzung und negativ-lichtempfindliche lithographische druckplatte | |
TW200627088A (en) | Lithographic apparatus and device manufacturing method | |
ATE445861T1 (de) | Photopolymer druckplattenvorläufer | |
SG138552A1 (en) | Wave front sensor with grey filter and lithographic apparatus comprising same | |
ATE444852T1 (de) | Lichtempfindliche zusammensetzung und lichtempfindliche flachdruckplatte | |
EP1630604A3 (de) | Lichtempfindliche Flachdruckplatte | |
DE60321526D1 (de) | Flachdruckplattenvorläufer | |
WO2006041544A3 (en) | Solid immersion lens lithography | |
DE602004019981D1 (de) | Negativ-lichtempfindliche zusammensetzung und negativ-lichtempfindliche lithographische druckplatte | |
DE60302591D1 (de) | Modellauge für ein Messinstrument von Augeneigenschaften und Kalibrierungsmethode | |
EP1447718A3 (de) | Belichtungsgerät und -verfahren | |
DE602004009846D1 (de) | Flachdruckplattenvorläufer | |
ATE263680T1 (de) | Ir- und uv-strahlungsempfindliche zusammensetzung und offsetdruckplatte | |
ATE391022T1 (de) | Infrarotempfindlicher lithographischer druckplattenvorläufer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |