ATE360598T1 - System und verfahren für vergrabene elektrische durchführungen in einem glas-silizium-mems- prozess - Google Patents

System und verfahren für vergrabene elektrische durchführungen in einem glas-silizium-mems- prozess

Info

Publication number
ATE360598T1
ATE360598T1 AT04719227T AT04719227T ATE360598T1 AT E360598 T1 ATE360598 T1 AT E360598T1 AT 04719227 T AT04719227 T AT 04719227T AT 04719227 T AT04719227 T AT 04719227T AT E360598 T1 ATE360598 T1 AT E360598T1
Authority
AT
Austria
Prior art keywords
glass
silicon
sealed cavity
recesses
burned
Prior art date
Application number
AT04719227T
Other languages
English (en)
Inventor
Robert D Horning
Jeffrey A Ridley
Original Assignee
Honeywell Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell Int Inc filed Critical Honeywell Int Inc
Application granted granted Critical
Publication of ATE360598T1 publication Critical patent/ATE360598T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00301Connecting electric signal lines from the MEMS device with external electrical signal lines, e.g. through vias
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/02Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2207/00Microstructural systems or auxiliary parts thereof
    • B81B2207/09Packages
    • B81B2207/091Arrangements for connecting external electrical signals to mechanical structures inside the package
    • B81B2207/097Interconnects arranged on the substrate or the lid, and covered by the package seal

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Micromachines (AREA)
  • Gyroscopes (AREA)
  • Glass Compositions (AREA)
  • Pressure Sensors (AREA)
AT04719227T 2003-03-10 2004-03-10 System und verfahren für vergrabene elektrische durchführungen in einem glas-silizium-mems- prozess ATE360598T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/385,181 US6888233B2 (en) 2003-03-10 2003-03-10 Systems for buried electrical feedthroughs in a glass-silicon MEMS process

Publications (1)

Publication Number Publication Date
ATE360598T1 true ATE360598T1 (de) 2007-05-15

Family

ID=32961451

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04719227T ATE360598T1 (de) 2003-03-10 2004-03-10 System und verfahren für vergrabene elektrische durchführungen in einem glas-silizium-mems- prozess

Country Status (8)

Country Link
US (2) US6888233B2 (de)
EP (1) EP1601611B1 (de)
JP (1) JP2006519707A (de)
KR (1) KR20050109551A (de)
AT (1) ATE360598T1 (de)
AU (1) AU2004220026A1 (de)
DE (1) DE602004006094T2 (de)
WO (1) WO2004080888A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10202788A1 (de) * 2002-01-25 2003-07-31 Rieter Ag Maschf Texturieranlage und Texturierdüse hierfür
DE10361521A1 (de) 2003-12-03 2005-07-07 Pac Tech - Packaging Technologies Gmbh Verfahren und Vorrichtung zur wechselseitigen Kontaktierung von zwei Wafern
EP1697966B1 (de) * 2003-12-03 2013-02-13 Pac Tech - Packaging Technologies GmbH Verfahren zur wechselseitigen kontaktierung von zwei wafern
KR100622372B1 (ko) * 2004-06-01 2006-09-19 삼성전자주식회사 복수개의 구성유닛을 포함하는 자이로센서 및 그 제조방법
US7336654B2 (en) * 2004-10-20 2008-02-26 I2Telecom International, Inc. Portable VoIP service access module
US7816745B2 (en) * 2005-02-25 2010-10-19 Medtronic, Inc. Wafer level hermetically sealed MEMS device
US7569926B2 (en) * 2005-08-26 2009-08-04 Innovative Micro Technology Wafer level hermetic bond using metal alloy with raised feature
US7541209B2 (en) * 2005-10-14 2009-06-02 Hewlett-Packard Development Company, L.P. Method of forming a device package having edge interconnect pad
US20070170528A1 (en) 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
KR100804759B1 (ko) * 2006-07-20 2008-02-19 주식회사 엠에스솔루션 멤스 가속도 센서 제조 방법 및 그 센서
US8288654B2 (en) * 2006-11-30 2012-10-16 Medtronic, Inc. Feedthrough assembly including a ferrule, an insulating structure and a glass
US8129622B2 (en) * 2006-11-30 2012-03-06 Medtronic, Inc. Insulator for feedthrough
WO2008067519A2 (en) * 2006-11-30 2008-06-05 Medtronic, Inc Miniaturized feedthrough
DE102007044806A1 (de) * 2007-09-20 2009-04-02 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zur Herstellung eines mikromechanischen Bauelements
CN101279713B (zh) * 2008-03-31 2011-09-14 清华大学 一种制备悬浮式微硅静电陀螺/加速度计敏感结构的方法
US8187902B2 (en) 2008-07-09 2012-05-29 The Charles Stark Draper Laboratory, Inc. High performance sensors and methods for forming the same
US7977786B2 (en) * 2008-07-25 2011-07-12 Honeywell International Inc. Saw debris reduction in MEMS devices
US8331077B2 (en) 2009-01-12 2012-12-11 Medtronic, Inc. Capacitor for filtered feedthrough with annular member
US20100177458A1 (en) * 2009-01-12 2010-07-15 Medtronic, Inc. Capacitor for filtered feedthrough with conductive pad
US8373965B2 (en) 2009-02-10 2013-02-12 Medtronic, Inc. Filtered feedthrough assembly and associated method
US9009935B2 (en) * 2009-05-06 2015-04-21 Medtronic, Inc. Methods to prevent high voltage arcing under capacitors used in filtered feedthroughs
US20110032658A1 (en) * 2009-08-07 2011-02-10 Medtronic, Inc. Capacitor assembly and associated method
US8707734B2 (en) * 2009-10-19 2014-04-29 The Regents Of The University Of Michigan Method of embedding material in a glass substrate
CN102134053B (zh) * 2010-01-21 2013-04-03 深迪半导体(上海)有限公司 双轴mems陀螺仪的制造方法
DE102010029709B4 (de) 2010-06-04 2020-08-06 Robert Bosch Gmbh Mikromechanisches Bauelement und Verfahren zum Herstellen eines mikromechanischen Bauelements
US8569090B2 (en) * 2010-12-03 2013-10-29 Babak Taheri Wafer level structures and methods for fabricating and packaging MEMS
CN103460336A (zh) * 2011-03-30 2013-12-18 高萨姆·维斯瓦纳达姆 玻璃上的微器件
DE102011051441B4 (de) 2011-06-29 2018-10-25 CiS Forschungsinstitut für Mikrosensorik und Photovoltaik GmbH Druckwandlungsbasierter Sensor zur Bestimmung einer Messgröße in einem Medium
US8824706B2 (en) 2011-08-30 2014-09-02 Qualcomm Mems Technologies, Inc. Piezoelectric microphone fabricated on glass
US8724832B2 (en) 2011-08-30 2014-05-13 Qualcomm Mems Technologies, Inc. Piezoelectric microphone fabricated on glass
US8593816B2 (en) 2011-09-21 2013-11-26 Medtronic, Inc. Compact connector assembly for implantable medical device
US8811636B2 (en) 2011-11-29 2014-08-19 Qualcomm Mems Technologies, Inc. Microspeaker with piezoelectric, metal and dielectric membrane
CN103043604B (zh) * 2012-12-06 2015-09-02 中国电子科技集团公司第五十五研究所 硅-玻璃键合界面金属导线与悬空可动结构间电荷释放法
US10464836B2 (en) * 2013-10-10 2019-11-05 Medtronic, Inc. Hermetic conductive feedthroughs for a semiconductor wafer
JP2016048176A (ja) * 2014-08-27 2016-04-07 セイコーエプソン株式会社 物理量センサー、電子機器および移動体
CN108692740B (zh) * 2018-03-28 2020-07-10 中北大学 基于高深宽比深硅刻蚀法的硅微杯形谐振陀螺加工方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0786693A (ja) * 1993-09-16 1995-03-31 Toshiba Corp 光半導体モジュール
US5338416A (en) * 1993-02-05 1994-08-16 Massachusetts Institute Of Technology Electrochemical etching process
US5492596A (en) * 1994-02-04 1996-02-20 The Charles Stark Draper Laboratory, Inc. Method of making a micromechanical silicon-on-glass tuning fork gyroscope
US5437739A (en) * 1994-04-19 1995-08-01 Rockwell International Corporation Etch control seal for dissolved wafer micromachining process
US5511428A (en) * 1994-06-10 1996-04-30 Massachusetts Institute Of Technology Backside contact of sensor microstructures
JPH0878556A (ja) * 1994-09-09 1996-03-22 Nissan Motor Co Ltd 封止構造体
US5843832A (en) * 1995-03-01 1998-12-01 Virginia Semiconductor, Inc. Method of formation of thin bonded ultra-thin wafers
US5837562A (en) * 1995-07-07 1998-11-17 The Charles Stark Draper Laboratory, Inc. Process for bonding a shell to a substrate for packaging a semiconductor
JPH09196682A (ja) * 1996-01-19 1997-07-31 Matsushita Electric Ind Co Ltd 角速度センサと加速度センサ
US5866469A (en) * 1996-06-13 1999-02-02 Boeing North American, Inc. Method of anodic wafer bonding
US5637189A (en) * 1996-06-25 1997-06-10 Xerox Corporation Dry etch process control using electrically biased stop junctions
DE19636914A1 (de) * 1996-09-11 1998-03-12 Siemens Ag Verfahren zum Auffüllen eines Grabens mit Hilfe eines anisotropen Ätzprozesses
US5919548A (en) * 1996-10-11 1999-07-06 Sandia Corporation Chemical-mechanical polishing of recessed microelectromechanical devices
US5854122A (en) * 1997-03-13 1998-12-29 The Boeing Company Epitaxial layer for dissolved wafer micromachining process
US6013563A (en) * 1997-05-12 2000-01-11 Silicon Genesis Corporation Controlled cleaning process
DE69736630D1 (de) * 1997-06-19 2006-10-19 St Microelectronics Srl Hermetisch abgeschlossener Sensor mit beweglicher Mikrostruktur
US6143583A (en) * 1998-06-08 2000-11-07 Honeywell, Inc. Dissolved wafer fabrication process and associated microelectromechanical device having a support substrate with spacing mesas
US6271101B1 (en) * 1998-07-29 2001-08-07 Semiconductor Energy Laboratory Co., Ltd. Process for production of SOI substrate and process for production of semiconductor device
WO2000042231A2 (en) * 1999-01-15 2000-07-20 The Regents Of The University Of California Polycrystalline silicon germanium films for forming micro-electromechanical systems
US6433401B1 (en) * 1999-04-06 2002-08-13 Analog Devices Imi, Inc. Microfabricated structures with trench-isolation using bonded-substrates and cavities
US6287941B1 (en) * 1999-04-21 2001-09-11 Silicon Genesis Corporation Surface finishing of SOI substrates using an EPI process
US6444138B1 (en) * 1999-06-16 2002-09-03 James E. Moon Method of fabricating microelectromechanical and microfluidic devices
US6277666B1 (en) * 1999-06-24 2001-08-21 Honeywell Inc. Precisely defined microelectromechanical structures and associated fabrication methods
US6337027B1 (en) * 1999-09-30 2002-01-08 Rockwell Science Center, Llc Microelectromechanical device manufacturing process
US6428713B1 (en) * 1999-10-01 2002-08-06 Delphi Technologies, Inc. MEMS sensor structure and microfabrication process therefor
US6452238B1 (en) * 1999-10-04 2002-09-17 Texas Instruments Incorporated MEMS wafer level package
US6440766B1 (en) * 2000-02-16 2002-08-27 Analog Devices Imi, Inc. Microfabrication using germanium-based release masks
KR100370398B1 (ko) * 2000-06-22 2003-01-30 삼성전자 주식회사 전자 및 mems 소자의 표면실장형 칩 규모 패키징 방법
JP4145005B2 (ja) * 2000-08-04 2008-09-03 株式会社リコー 光走査装置
KR100396551B1 (ko) * 2001-02-03 2003-09-03 삼성전자주식회사 웨이퍼 레벨 허메틱 실링 방법
US6717254B2 (en) 2001-02-22 2004-04-06 Tru-Si Technologies, Inc. Devices having substrates with opening passing through the substrates and conductors in the openings, and methods of manufacture
US6834154B2 (en) * 2001-07-24 2004-12-21 3M Innovative Properties Co. Tooling fixture for packaged optical micro-mechanical devices
US6929974B2 (en) * 2002-10-18 2005-08-16 Motorola, Inc. Feedthrough design and method for a hermetically sealed microdevice

Also Published As

Publication number Publication date
US6924165B2 (en) 2005-08-02
EP1601611B1 (de) 2007-04-25
US20040180464A1 (en) 2004-09-16
WO2004080888A1 (en) 2004-09-23
AU2004220026A1 (en) 2004-09-23
KR20050109551A (ko) 2005-11-21
JP2006519707A (ja) 2006-08-31
US6888233B2 (en) 2005-05-03
EP1601611A1 (de) 2005-12-07
DE602004006094D1 (de) 2007-06-06
DE602004006094T2 (de) 2008-01-10
US20040244484A1 (en) 2004-12-09

Similar Documents

Publication Publication Date Title
ATE360598T1 (de) System und verfahren für vergrabene elektrische durchführungen in einem glas-silizium-mems- prozess
CA2663918C (en) Micromechanical component and method for fabricating a micromechanical component
RU2424972C1 (ru) Элемент и способ его изготовления
JP2006116694A (ja) ゲッターシールドを有する密閉マイクロデバイス
CN100579892C (zh) 微型机电系统元件及其制造方法
US8021906B2 (en) Hermetic sealing and electrical contacting of a microelectromechanical structure, and microsystem (MEMS) produced therewith
JP2008132587A (ja) ウェハレベル真空パッケージデバイスの製造方法
TW200742011A (en) Electronic parts packaging structure and method of manufacturing the same
RU2568947C2 (ru) Способ изготовления герметизированной конструкции
JP2003530234A (ja) マイクロメカニック構造素子および相当する製造方法
JP6580997B2 (ja) 小型化された部品および製造方法
JP2007201260A (ja) 封止構造体及び封止構造体の製造方法及び半導体装置及び半導体装置の製造方法
US7528000B2 (en) Method of fabricating optical device caps
CN102730623A (zh) 微机电感测装置及其制作方法
US6926592B2 (en) Surface treatment of mechanically abraded glass
CN105417488A (zh) 压力传感器以及其制造方法
CN105486445A (zh) 压力传感器以及其制造方法
RU2662061C1 (ru) Способ герметизации мэмс устройств
US11018029B2 (en) Method for producing an at least partly packaged semiconductor wafer
CN100536098C (zh) 晶片级封装与制作上盖结构的方法
CN107986229B (zh) 一种微机电器件的开孔装置及其制备的复用方法
CA2937361C (en) Method for producing a component
JP4977850B2 (ja) 微小電気機械システムおよび微小電気機械システム製造方法
JP2013062373A (ja) 複合基板の製造方法
KR20030083912A (ko) Mems 밀폐구조 일괄제조방법

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties