ATE350335T1 - Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride - Google Patents

Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride

Info

Publication number
ATE350335T1
ATE350335T1 AT04027072T AT04027072T ATE350335T1 AT E350335 T1 ATE350335 T1 AT E350335T1 AT 04027072 T AT04027072 T AT 04027072T AT 04027072 T AT04027072 T AT 04027072T AT E350335 T1 ATE350335 T1 AT E350335T1
Authority
AT
Austria
Prior art keywords
volatile metal
sulfur
removal
metal hydrides
containing sulfur
Prior art date
Application number
AT04027072T
Other languages
English (en)
Inventor
Rajiv K Agarwal
George L Ryals
Wei Cao
John Frederick Cirucci
Robert W Apollo
Daniel Mcnesby
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Application granted granted Critical
Publication of ATE350335T1 publication Critical patent/ATE350335T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C01B6/065—Hydrides of arsenic or antimony
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B25/00—Phosphorus; Compounds thereof
    • C01B25/06—Hydrogen phosphides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/34—Purification; Stabilisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biomedical Technology (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Gas Separation By Absorption (AREA)
  • Separation Of Gases By Adsorption (AREA)
AT04027072T 2003-11-19 2004-11-15 Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride ATE350335T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/717,050 US7250072B2 (en) 2003-11-19 2003-11-19 Removal of sulfur-containing impurities from volatile metal hydrides

Publications (1)

Publication Number Publication Date
ATE350335T1 true ATE350335T1 (de) 2007-01-15

Family

ID=34435747

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04027072T ATE350335T1 (de) 2003-11-19 2004-11-15 Entfernung von verunreinigungen enthaltend schwefel von flüchtigen metallhydride

Country Status (8)

Country Link
US (1) US7250072B2 (de)
EP (1) EP1533272B1 (de)
JP (1) JP4173854B2 (de)
KR (1) KR100613678B1 (de)
CN (1) CN1308226C (de)
AT (1) ATE350335T1 (de)
DE (1) DE602004004042T2 (de)
TW (1) TWI297324B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7087102B2 (en) * 2004-02-26 2006-08-08 Air Products And Chemicals, Inc. Process for purification of germane
US20090220399A1 (en) * 2005-08-09 2009-09-03 Frank Cheng-Yu Wang Tetraorganoammonium and tetraorganophosphonium salts for acid gas scrubbing process
CN104918679B (zh) * 2012-07-17 2017-03-08 西门子公司 用于吸收二氧化碳的洗涤液和用于通过二氧化锗加速该吸收的方法
CN106215629A (zh) * 2016-08-31 2016-12-14 贵州开磷集团股份有限公司 一种磷酸萃取尾气的洗涤方法和装置
CN107697886B (zh) * 2017-11-10 2020-02-18 中国工程物理研究院材料研究所 一种金属氢化物薄片制备方法
CN115814565B (zh) * 2022-11-30 2024-05-31 攀钢集团攀枝花钢铁研究院有限公司 一种推板窑煅烧制备钒氮合金的钾钠吸收方法及吸收剂

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CS192658B1 (en) 1976-01-22 1979-09-17 Dusan Sichrovsky Method of preparing high pure arsenic
US4107099A (en) * 1977-02-10 1978-08-15 Ventron Corporation Borohydride exchange resins and their uses as reducing agents and in preparation of volatile metal hydrides
US4564509A (en) * 1983-06-30 1986-01-14 Northeast Semiconductor Inc. Method and apparatus for improved gettering for reactant gases
JPS6016802A (ja) * 1983-07-01 1985-01-28 Olympus Optical Co Ltd 半導体用原料ガスの純化剤およびその使用方法
NZ223528A (en) * 1987-02-19 1991-08-27 Dow Chemical Co Process and scrubbing solution for removal of h 2 s and/or co 2 from gas streams
US4983363A (en) * 1987-03-24 1991-01-08 Advanced Technology Materials, Inc. Apparatus for purifying arsine, phosphine, ammonia, and inert gases to remove Lewis acid and oxidant impurities therefrom
JP3105529B2 (ja) 1990-09-17 2000-11-06 日本酸素株式会社 アルシンの精製方法
JP3537484B2 (ja) 1994-03-31 2004-06-14 日本酸素株式会社 ホスフィンの精製方法及びその装置
JPH10130285A (ja) 1996-10-31 1998-05-19 Furukawa Co Ltd 有機金属化合物の精製法
US6461411B1 (en) 2000-12-04 2002-10-08 Matheson Tri-Gas Method and materials for purifying hydride gases, inert gases, and non-reactive gases

Also Published As

Publication number Publication date
EP1533272A1 (de) 2005-05-25
CN1636863A (zh) 2005-07-13
CN1308226C (zh) 2007-04-04
DE602004004042T2 (de) 2007-06-28
DE602004004042D1 (de) 2007-02-15
KR20050048477A (ko) 2005-05-24
EP1533272B1 (de) 2007-01-03
US20050106090A1 (en) 2005-05-19
KR100613678B1 (ko) 2006-08-21
TWI297324B (en) 2008-06-01
JP4173854B2 (ja) 2008-10-29
JP2005145816A (ja) 2005-06-09
US7250072B2 (en) 2007-07-31
TW200520826A (en) 2005-07-01

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Legal Events

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