ATE313095T1 - Objektiv mit pupillenverdeckung - Google Patents
Objektiv mit pupillenverdeckungInfo
- Publication number
- ATE313095T1 ATE313095T1 AT02794710T AT02794710T ATE313095T1 AT E313095 T1 ATE313095 T1 AT E313095T1 AT 02794710 T AT02794710 T AT 02794710T AT 02794710 T AT02794710 T AT 02794710T AT E313095 T1 ATE313095 T1 AT E313095T1
- Authority
- AT
- Austria
- Prior art keywords
- mrow
- mirror
- msub
- sub
- objective
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0652—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Non-Portable Lighting Devices Or Systems Thereof (AREA)
- Pens And Brushes (AREA)
- Saccharide Compounds (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10139177A DE10139177A1 (de) | 2001-08-16 | 2001-08-16 | Objektiv mit Pupillenobskuration |
PCT/EP2002/009153 WO2003016977A2 (en) | 2001-08-16 | 2002-08-16 | Objective with pupil obscuration |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE313095T1 true ATE313095T1 (de) | 2005-12-15 |
Family
ID=7694931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02794710T ATE313095T1 (de) | 2001-08-16 | 2002-08-16 | Objektiv mit pupillenverdeckung |
Country Status (9)
Country | Link |
---|---|
US (2) | US6894834B2 (de) |
EP (1) | EP1417525B1 (de) |
JP (1) | JP2005500566A (de) |
CN (2) | CN1262863C (de) |
AT (1) | ATE313095T1 (de) |
AU (1) | AU2002333436A1 (de) |
DE (2) | DE10139177A1 (de) |
TW (1) | TW594044B (de) |
WO (1) | WO2003016977A2 (de) |
Families Citing this family (72)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10139177A1 (de) * | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR101101493B1 (ko) * | 2004-03-30 | 2012-01-03 | 칼 짜이스 에스엠티 게엠베하 | 투영 대물렌즈, 투영 노광 장치 및 마이크로리소그래피용반사형 레티클 |
DE602005003665T2 (de) | 2004-05-17 | 2008-11-20 | Carl Zeiss Smt Ag | Katadioptrisches projektionsobjektiv mit zwischenbildern |
US7619807B2 (en) * | 2004-11-08 | 2009-11-17 | Angstrom, Inc. | Micromirror array lens with optical surface profiles |
US7489434B2 (en) | 2007-05-02 | 2009-02-10 | Angstrom, Inc. | Hybrid micromirror array lens for reducing chromatic aberration |
DE102005042005A1 (de) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
WO2006069725A1 (de) * | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges objektiv mit obskurierter pupille |
US20060138349A1 (en) * | 2004-12-27 | 2006-06-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006133800A1 (en) | 2005-06-14 | 2006-12-21 | Carl Zeiss Smt Ag | Lithography projection objective, and a method for correcting image defects of the same |
KR101149267B1 (ko) | 2005-09-13 | 2012-05-25 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법 |
WO2007093433A1 (de) * | 2006-02-17 | 2007-08-23 | Carl Zeiss Smt Ag | Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem |
DE102006014380A1 (de) | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
US8120996B2 (en) * | 2006-04-04 | 2012-02-21 | Tesa Scribos Gmbh | Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
FR2899698A1 (fr) * | 2006-04-07 | 2007-10-12 | Sagem Defense Securite | Dispositif de collecte de flux de rayonnement electromagnetique dans l'extreme ultraviolet |
DE102006047387A1 (de) * | 2006-10-06 | 2008-04-10 | Carl Zeiss Smt Ag | Kompaktes 3-Spiegel-Objektiv |
DE102007023411A1 (de) * | 2006-12-28 | 2008-07-03 | Carl Zeiss Smt Ag | Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik |
EP1950594A1 (de) | 2007-01-17 | 2008-07-30 | Carl Zeiss SMT AG | Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik |
JP5165700B2 (ja) * | 2007-02-28 | 2013-03-21 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 瞳補正を有する反射屈折投影対物系 |
DE102008001216A1 (de) * | 2007-04-18 | 2008-10-23 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Mikrolithographie |
US7463342B2 (en) * | 2007-05-02 | 2008-12-09 | Angstrom, Inc. | Optical tracking device using micromirror array lenses |
US9505606B2 (en) * | 2007-06-13 | 2016-11-29 | Angstrom, Inc. | MEMS actuator with discretely controlled multiple motions |
DE102007029148B4 (de) | 2007-06-25 | 2021-09-30 | Abb Ag | Verfahren zur Prüfung der Funktionsfähigkeit von Armaturen |
US7605988B2 (en) * | 2007-07-23 | 2009-10-20 | Angstrom, Inc. | Compact image taking lens system with a lens-surfaced prism |
US7589916B2 (en) * | 2007-08-10 | 2009-09-15 | Angstrom, Inc. | Micromirror array with iris function |
WO2009046137A1 (en) * | 2007-10-02 | 2009-04-09 | Kla-Tencor Corporation | Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths |
US9052494B2 (en) | 2007-10-02 | 2015-06-09 | Kla-Tencor Technologies Corporation | Optical imaging system with catoptric objective; broadband objective with mirror; and refractive lenses and broadband optical imaging system having two or more imaging paths |
JP5337159B2 (ja) * | 2007-10-26 | 2013-11-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結像光学系及びこれを有する投影露光装置 |
KR101645142B1 (ko) | 2007-10-26 | 2016-08-02 | 칼 짜이스 에스엠티 게엠베하 | 결상 광학 시스템 및 이러한 유형의 결상 광학 시스템을 구비하는 마이크로리소그래피용 투영 노광 장치 |
DE102007051671A1 (de) | 2007-10-26 | 2009-05-07 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik |
JP5223868B2 (ja) * | 2007-11-28 | 2013-06-26 | 日本電気株式会社 | 光走査装置および画像出力装置 |
US20090185067A1 (en) * | 2007-12-21 | 2009-07-23 | Stereo Display, Inc. | Compact automatic focusing camera |
US8810908B2 (en) | 2008-03-18 | 2014-08-19 | Stereo Display, Inc. | Binoculars with micromirror array lenses |
DE102008017645A1 (de) * | 2008-04-04 | 2009-10-08 | Carl Zeiss Smt Ag | Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats |
US20090303569A1 (en) * | 2008-05-20 | 2009-12-10 | Stereo Didplay, Inc. | Self-tilted micromirror device |
US8622557B2 (en) * | 2008-05-20 | 2014-01-07 | Stereo Display, Inc. | Micromirror array lens with self-tilted micromirrors |
JP5489034B2 (ja) * | 2008-08-28 | 2014-05-14 | 国立大学法人東北大学 | 反射型投影光学装置 |
DE102008046699B4 (de) * | 2008-09-10 | 2014-03-13 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102008049588B4 (de) | 2008-09-30 | 2018-04-05 | Carl Zeiss Smt Gmbh | Optische Abbildungseinrichtung, Mikroskop und Abbildungsverfahren für die Mikroskopie |
DE102008049589A1 (de) | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung und Abbildungsverfahren für die Mikroskopie |
DE102009008644A1 (de) * | 2009-02-12 | 2010-11-18 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik |
US8553217B2 (en) * | 2009-06-19 | 2013-10-08 | Kla-Tencor Corporation | EUV high throughput inspection system for defect detection on patterned EUV masks, mask blanks, and wafers |
DE102009035583A1 (de) | 2009-07-29 | 2011-02-03 | Carl Zeiss Sms Gmbh | Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik |
CN102725673B (zh) * | 2009-08-07 | 2016-03-09 | 卡尔蔡司Smt有限责任公司 | 具有至少两镜面的反射镜的制造方法、用于微光刻的投射曝光装置的反射镜及投射曝光装置 |
US20110143287A1 (en) * | 2009-09-14 | 2011-06-16 | Nikon Corporation | Catadioptric system, aberration measuring apparatus, method of adjusting optical system, exposure apparatus, and device manufacturing method |
JP5756121B2 (ja) | 2009-12-14 | 2015-07-29 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結像光学系 |
KR101383479B1 (ko) | 2010-04-22 | 2014-04-08 | 칼 짜이스 에스엠티 게엠베하 | 이미징 옵틱스 및 이러한 이미징 옵틱스를 가지는 마이크로리소그래피를 위한 투영 노광 장치 |
DE102010039745A1 (de) * | 2010-08-25 | 2012-03-01 | Carl Zeiss Smt Gmbh | Abbildende Optik |
DE102010041623A1 (de) | 2010-09-29 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel |
US8837041B2 (en) | 2010-11-23 | 2014-09-16 | Carl Zeiss Smt Gmbh | Magnifying imaging optical system and metrology system with an imaging optical system of this type |
DE102011084255A1 (de) | 2010-11-24 | 2012-05-24 | Carl Zeiss Smt Gmbh | Vergrößernde abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik |
DE102011003302A1 (de) | 2011-01-28 | 2012-08-02 | Carl Zeiss Smt Gmbh | Vergrößerte abbildende Optik sowie Metrologiesystem mit einer derartigen abbildenden Optik |
US9703207B1 (en) | 2011-07-08 | 2017-07-11 | Kla-Tencor Corporation | System and method for reducing dynamic range in images of patterned regions of semiconductor wafers |
DE102012216478A1 (de) | 2012-09-14 | 2013-09-05 | Carl Zeiss Smt Gmbh | Reflektierende Obskurationsblende |
TWI676083B (zh) * | 2013-09-25 | 2019-11-01 | 荷蘭商Asml荷蘭公司 | 光束傳遞裝置及方法 |
DE102015201253A1 (de) | 2015-01-26 | 2015-03-19 | Carl Zeiss Smt Gmbh | Thermisch optimierte obskurationsblenden und projektionsbelichtungsanlage mit derartigen blenden |
JP2015132843A (ja) * | 2015-03-02 | 2015-07-23 | 株式会社ニコン | 投影光学系、露光装置、露光方法、およびデバイス製造方法 |
US10309907B2 (en) * | 2015-03-04 | 2019-06-04 | Kla-Tencor Corporation | All reflective wafer defect inspection and review systems and methods |
DE102016217737A1 (de) | 2015-11-12 | 2016-11-10 | Carl Zeiss Smt Gmbh | Optisches System für die Mikrolithographie |
WO2017136286A1 (en) * | 2016-02-03 | 2017-08-10 | Kla-Tencor Corporation | Wafer defect inspection and review systems |
US10656098B2 (en) | 2016-02-03 | 2020-05-19 | Kla-Tencor Corporation | Wafer defect inspection and review systems |
JP2016136273A (ja) * | 2016-03-07 | 2016-07-28 | 株式会社ニコン | 投影光学系、露光装置、露光方法、およびデバイス製造方法 |
US10845720B2 (en) | 2016-05-31 | 2020-11-24 | Nikon Corporation | Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method |
CN107991765A (zh) * | 2016-10-27 | 2018-05-04 | 北京遥感设备研究所 | 一种小f数大视场全反光学系统 |
DE102016221824A1 (de) * | 2016-11-08 | 2017-09-28 | Carl Zeiss Smt Gmbh | Optisches System sowie Lithographieanlage |
JP2018010303A (ja) * | 2017-08-03 | 2018-01-18 | 株式会社ニコン | 露光装置およびデバイス製造方法 |
DE102018207384B4 (de) * | 2018-05-14 | 2019-07-04 | Carl Zeiss Smt Gmbh | Verfahren zum Vermessen eines Beleuchtungssystems einer Projektionsbelichtungsanlage für die Mikrolithographie sowie Projektionsbelichtungsanlage |
JP2019082711A (ja) * | 2019-01-15 | 2019-05-30 | 株式会社ニコン | 投影光学系、露光装置、露光方法、及びデバイス製造方法 |
JP2019091057A (ja) * | 2019-01-15 | 2019-06-13 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
US11162897B2 (en) | 2019-05-15 | 2021-11-02 | Onto Innovation Inc. | Optical metrology device using numerical aperture reduction |
US11561476B1 (en) * | 2021-07-10 | 2023-01-24 | Kenneth Carlisle Johnson | UV lithography system |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2995973A (en) * | 1959-10-23 | 1961-08-15 | Barnes Eng Co | In-line spectrometer |
EP0237041B1 (de) * | 1986-03-12 | 1993-08-18 | Matsushita Electric Industrial Co., Ltd. | Optisches Projektionssystem für Präzisionskopien |
GB2197962A (en) * | 1986-11-10 | 1988-06-02 | Compact Spindle Bearing Corp | Catoptric reduction imaging apparatus |
US4863253A (en) * | 1987-09-25 | 1989-09-05 | Spectra-Tech, Inc. | High magnification reflecting microscope objective having a dual magnification mode and zoom magnification capability |
US5523193A (en) | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
US5003567A (en) | 1989-02-09 | 1991-03-26 | Hawryluk Andrew M | Soft x-ray reduction camera for submicron lithography |
JPH02210299A (ja) * | 1989-02-10 | 1990-08-21 | Olympus Optical Co Ltd | X線用光学系及びそれに用いる多層膜反射鏡 |
US5212588A (en) | 1991-04-09 | 1993-05-18 | The United States Of America As Represented By The United States Department Of Energy | Reflective optical imaging system for extreme ultraviolet wavelengths |
US5309541A (en) * | 1993-04-16 | 1994-05-03 | Laser Power Corporation | Flexible light conduit |
JP3175515B2 (ja) * | 1994-12-26 | 2001-06-11 | キヤノン株式会社 | 露光装置及びそれを用いたデバイスの製造方法 |
US5815310A (en) * | 1995-12-12 | 1998-09-29 | Svg Lithography Systems, Inc. | High numerical aperture ring field optical reduction system |
US5691541A (en) | 1996-05-14 | 1997-11-25 | The Regents Of The University Of California | Maskless, reticle-free, lithography |
US5870176A (en) | 1996-06-19 | 1999-02-09 | Sandia Corporation | Maskless lithography |
US5717518A (en) | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
US6312134B1 (en) * | 1996-07-25 | 2001-11-06 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
US6213610B1 (en) * | 1998-09-21 | 2001-04-10 | Nikon Corporation | Catoptric reduction projection optical system and exposure apparatus and method using same |
US6238852B1 (en) * | 1999-01-04 | 2001-05-29 | Anvik Corporation | Maskless lithography system and method with doubled throughput |
EP1772775B1 (de) * | 1999-02-15 | 2008-11-05 | Carl Zeiss SMT AG | Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
EP1093021A3 (de) * | 1999-10-15 | 2004-06-30 | Nikon Corporation | Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren |
DE10139177A1 (de) * | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
US6700644B2 (en) * | 2002-06-05 | 2004-03-02 | Euv Llc | Condenser for photolithography system |
-
2001
- 2001-08-16 DE DE10139177A patent/DE10139177A1/de not_active Withdrawn
-
2002
- 2002-08-13 TW TW091118226A patent/TW594044B/zh not_active IP Right Cessation
- 2002-08-16 CN CNB028121007A patent/CN1262863C/zh not_active Expired - Fee Related
- 2002-08-16 AU AU2002333436A patent/AU2002333436A1/en not_active Abandoned
- 2002-08-16 CN CNB2006100798534A patent/CN100478787C/zh not_active Expired - Fee Related
- 2002-08-16 EP EP02794710A patent/EP1417525B1/de not_active Expired - Lifetime
- 2002-08-16 JP JP2003521424A patent/JP2005500566A/ja active Pending
- 2002-08-16 AT AT02794710T patent/ATE313095T1/de not_active IP Right Cessation
- 2002-08-16 DE DE60208045T patent/DE60208045T2/de not_active Expired - Lifetime
- 2002-08-16 WO PCT/EP2002/009153 patent/WO2003016977A2/en active IP Right Grant
-
2003
- 2003-11-21 US US10/723,600 patent/US6894834B2/en not_active Expired - Fee Related
-
2005
- 2005-04-08 US US11/102,524 patent/US7209286B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20050180011A1 (en) | 2005-08-18 |
JP2005500566A (ja) | 2005-01-06 |
EP1417525A2 (de) | 2004-05-12 |
WO2003016977A2 (en) | 2003-02-27 |
AU2002333436A1 (en) | 2003-03-03 |
DE10139177A1 (de) | 2003-02-27 |
US20040114217A1 (en) | 2004-06-17 |
EP1417525B1 (de) | 2005-12-14 |
CN100478787C (zh) | 2009-04-15 |
US7209286B2 (en) | 2007-04-24 |
CN1262863C (zh) | 2006-07-05 |
WO2003016977A3 (en) | 2003-12-04 |
DE60208045D1 (de) | 2006-01-19 |
DE60208045T2 (de) | 2006-07-27 |
CN1516819A (zh) | 2004-07-28 |
CN1873539A (zh) | 2006-12-06 |
US6894834B2 (en) | 2005-05-17 |
TW594044B (en) | 2004-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE313095T1 (de) | Objektiv mit pupillenverdeckung | |
ES2102309B1 (es) | Optica compleja ultracompacta. | |
EP0869382A3 (de) | Optisches System für Projektion | |
Maksutov | Astronomical optics | |
US5030158A (en) | Optical construction toy | |
ATE333660T1 (de) | Spiegelteleskop | |
ATE78934T1 (de) | Kompakt-weitwinkel-objektiv. | |
EP0929834B1 (de) | Weitwinkeliges katoptrisches system mit speigeln | |
US4726669A (en) | High relative aperture objective lens system with compound focusing | |
AU560025B2 (en) | Binocular construction | |
Shafer | Optical design with only two surfaces | |
Busch et al. | A little-known 3-lens catadioptric camera by Bernard Schmidt | |
AU2003212604A1 (en) | Compound objective lens with fold mirror | |
JPS60107612A (ja) | 絞り後置のトリプレツト型写真用レンズ | |
SU1374168A1 (ru) | Зеркально-линзовый объектив | |
RU2104573C1 (ru) | Зеркально-линзовый объектив зрительной трубы | |
RU1811625C (ru) | Телескопическа оптическа система | |
ATE297559T1 (de) | Grob- und feintrieb mit riemenantrieb für ein monokular, insbesondere für ein fernrohr | |
SU1278772A1 (ru) | Репродукционный объектив | |
SU1296985A1 (ru) | Зеркально-линзовый объектив зрительной трубы | |
SU1737396A1 (ru) | Лупа | |
SU1658113A1 (ru) | Зеркально-линзовый объектив | |
SU720396A1 (ru) | Зеркальный объектив | |
SU1405012A1 (ru) | Репродукционный объектив | |
SU1247812A1 (ru) | Проекционный объектив с увеличением-1/30 @ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |