ATE300558T1 - Photopolymerisationsinitiator für farbfilter, farbzusammensetzung und farbfilter - Google Patents

Photopolymerisationsinitiator für farbfilter, farbzusammensetzung und farbfilter

Info

Publication number
ATE300558T1
ATE300558T1 AT00103990T AT00103990T ATE300558T1 AT E300558 T1 ATE300558 T1 AT E300558T1 AT 00103990 T AT00103990 T AT 00103990T AT 00103990 T AT00103990 T AT 00103990T AT E300558 T1 ATE300558 T1 AT E300558T1
Authority
AT
Austria
Prior art keywords
color filter
photopolymerization initiator
color
composition
producing
Prior art date
Application number
AT00103990T
Other languages
English (en)
Inventor
Tsuyoshi Katoh
Tomonari Ogata
Original Assignee
Showa Denko Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP4974299A external-priority patent/JP2000249822A/ja
Application filed by Showa Denko Kk filed Critical Showa Denko Kk
Application granted granted Critical
Publication of ATE300558T1 publication Critical patent/ATE300558T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
AT00103990T 1999-02-26 2000-02-25 Photopolymerisationsinitiator für farbfilter, farbzusammensetzung und farbfilter ATE300558T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP4974299A JP2000249822A (ja) 1999-02-26 1999-02-26 カラーフィルタ用光重合開始剤、感光性着色組成物およびカラーフィルタ
US13244999P 1999-05-04 1999-05-04

Publications (1)

Publication Number Publication Date
ATE300558T1 true ATE300558T1 (de) 2005-08-15

Family

ID=26390193

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00103990T ATE300558T1 (de) 1999-02-26 2000-02-25 Photopolymerisationsinitiator für farbfilter, farbzusammensetzung und farbfilter

Country Status (5)

Country Link
US (1) US6455207B1 (de)
EP (1) EP1031579B1 (de)
KR (1) KR100644847B1 (de)
AT (1) ATE300558T1 (de)
DE (1) DE60021449T2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
KR100804873B1 (ko) 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 포토리소그래피용 ｓｏｇ 반사방지 코팅
CN1606713B (zh) 2001-11-15 2011-07-06 霍尼韦尔国际公司 用于照相平版印刷术的旋涂抗反射涂料
AU2003224454A1 (en) * 2002-02-28 2003-09-09 Showa Denko K.K. Thiol compound, photopolymerization initiator composition and photosensitive composition
US20060079593A1 (en) * 2002-10-15 2006-04-13 Hirotoshi Kamata Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same
JP4393051B2 (ja) * 2002-10-15 2010-01-06 昭和電工株式会社 ヘキサアリールビイミダゾール化合物およびそれを含む光重合開始剤組成物
JP2004198542A (ja) * 2002-12-16 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いる感光性組成物
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP4378163B2 (ja) * 2003-12-16 2009-12-02 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
WO2005103823A1 (en) * 2004-04-23 2005-11-03 Showa Denko K.K. Photosensitive composition for black matrix
JP4315892B2 (ja) * 2004-11-25 2009-08-19 東京応化工業株式会社 感光性樹脂組成物、およびこれを用いた感光性ドライフィルム
TW200736834A (en) * 2005-12-27 2007-10-01 Kansai Paint Co Ltd Active energy ray-curable resin composition and method for forming resist pattern
WO2008023603A1 (fr) * 2006-08-23 2008-02-28 Showa Denko K.K. Composé de thiouréthane et composition de résine photosensible
KR101175834B1 (ko) * 2006-11-21 2012-08-24 쇼와 덴코 가부시키가이샤 히드록실기 함유 티올 화합물을 포함하는 경화성 조성물 및 그의 경화물
KR20090122184A (ko) * 2007-01-12 2009-11-26 도판 인사츠 가부시키가이샤 착색 조성물, 컬러 필터, 및 그의 제조 방법
US8298452B2 (en) * 2007-02-26 2012-10-30 Dai Nippon Printing Co., Ltd. Negative type resist composition for color filter, color filter using same, and liquid crystal display
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
KR101374056B1 (ko) * 2008-01-10 2014-03-12 동우 화인켐 주식회사 컬러필터 인쇄용 잉크 조성물, 컬러필터 및 컬러필터를구비한 액정표시장치
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
KR101290249B1 (ko) 2010-09-06 2013-07-30 삼성디스플레이 주식회사 잉크 조성물, 이를 이용한 패턴 형성방법, 컬러필터 및 이의 제조방법
US8575234B2 (en) 2010-09-06 2013-11-05 Samsung Display Co., Ltd. Ink composition, and method of forming pattern, color filter and method of preparing color filter using the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
CN103987754B (zh) * 2011-12-16 2016-06-15 三键精密化学有限公司 固化性树脂组合物
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN108779191B (zh) 2016-03-07 2021-06-22 昭和电工株式会社 活性能量射线固化性组合物及其固化物
KR102071023B1 (ko) * 2017-09-27 2020-01-29 동우 화인켐 주식회사 터치 센서 및 이의 제조방법
KR102475680B1 (ko) * 2018-01-19 2022-12-07 쇼와 덴코 가부시키가이샤 컬러 필터용 감광성 수지 조성물, 컬러 필터, 화상 표시 소자 및 컬러 필터의 제조 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4917977A (en) * 1988-12-23 1990-04-17 E. I. Du Pont De Nemours And Company Visible sensitizers for photopolymerizable compositions
US5176984A (en) * 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
JP3195480B2 (ja) * 1993-12-09 2001-08-06 富士写真フイルム株式会社 遮光性感光性樹脂組成物、遮光性感光性転写材料及び遮光膜の形成方法
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JPH10316708A (ja) * 1997-05-22 1998-12-02 Showa Denko Kk 光硬化性組成物及び色戻り防止方法
DE69817471T2 (de) * 1997-06-30 2004-07-01 Showa Denko K.K. Fotopolymerisierbare Zusammensetzung und trockener Filmresist
ATE255585T1 (de) * 1997-08-26 2003-12-15 Showa Denko Kk Stabilisator für organoboratsalze und diese enthaltende photoempfindliche zusammensetzung
US6207726B1 (en) * 1998-02-13 2001-03-27 Showa Denko Kabushiki Kaisha Photocurable prepreg composition and production method thereof
KR100563923B1 (ko) * 1998-07-14 2006-08-14 쇼와 덴코 가부시키가이샤 유기 붕산염의 안정화제 및 이를 함유하는 감광성 조성물

Also Published As

Publication number Publication date
EP1031579A2 (de) 2000-08-30
US6455207B1 (en) 2002-09-24
EP1031579A3 (de) 2000-12-06
DE60021449T2 (de) 2006-05-24
KR100644847B1 (ko) 2006-11-13
KR20010006704A (ko) 2001-01-26
DE60021449D1 (de) 2005-09-01
EP1031579B1 (de) 2005-07-27

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