DE60119233D1 - Farbfilter und Verfahren zu seiner Herstellung - Google Patents

Farbfilter und Verfahren zu seiner Herstellung

Info

Publication number
DE60119233D1
DE60119233D1 DE60119233T DE60119233T DE60119233D1 DE 60119233 D1 DE60119233 D1 DE 60119233D1 DE 60119233 T DE60119233 T DE 60119233T DE 60119233 T DE60119233 T DE 60119233T DE 60119233 D1 DE60119233 D1 DE 60119233D1
Authority
DE
Germany
Prior art keywords
color filter
transparent substrate
production
pixel
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60119233T
Other languages
English (en)
Other versions
DE60119233T2 (de
Inventor
Junichiro Koike
Hisatomo Yonehara
Hiroyuki Tokuda
Yasunobu Hirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Publication of DE60119233D1 publication Critical patent/DE60119233D1/de
Application granted granted Critical
Publication of DE60119233T2 publication Critical patent/DE60119233T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/582—Recycling of unreacted starting or intermediate materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Color Television Image Signal Generators (AREA)
DE60119233T 2000-07-13 2001-07-12 Farbfilter und Verfahren zu seiner Herstellung Expired - Fee Related DE60119233T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000212674 2000-07-13
JP2000212674 2000-07-13

Publications (2)

Publication Number Publication Date
DE60119233D1 true DE60119233D1 (de) 2006-06-08
DE60119233T2 DE60119233T2 (de) 2007-02-22

Family

ID=18708559

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60119233T Expired - Fee Related DE60119233T2 (de) 2000-07-13 2001-07-12 Farbfilter und Verfahren zu seiner Herstellung

Country Status (7)

Country Link
US (1) US6524757B2 (de)
EP (1) EP1174765B1 (de)
KR (1) KR100716632B1 (de)
CN (1) CN1211672C (de)
AT (1) ATE325368T1 (de)
DE (1) DE60119233T2 (de)
TW (1) TW496970B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE416393T1 (de) * 2000-09-27 2008-12-15 Dainippon Ink & Chemicals Verfahren zur herstellung eines farbfilters
US20040242725A1 (en) * 2001-10-18 2004-12-02 Gordon Kotora Ionically cross-linked paste inks
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
US20070092726A1 (en) * 2003-06-13 2007-04-26 Dsm Ip Assets B.V. Encapsulated materials
US8334012B2 (en) * 2004-12-20 2012-12-18 Palo Alto Research Center Incorporated Method for preprinting and/or reliquifying subpixels to achieve color uniformity in color filters
US20060264873A1 (en) * 2005-05-23 2006-11-23 Carstens Jerry E System comprising thong-shaped holder and absorbent article
TWI475038B (zh) * 2005-11-30 2015-03-01 Dainippon Ink & Chemicals 苯酚樹脂組成物、其硬化物、覆銅積層板用樹脂組成物、覆銅積層板及新穎苯酚樹脂
JP5371449B2 (ja) 2008-01-31 2013-12-18 富士フイルム株式会社 樹脂、顔料分散液、着色硬化性組成物、これを用いたカラーフィルタ及びその製造方法
KR101018324B1 (ko) * 2008-11-27 2011-03-04 디아이씨 가부시끼가이샤 컬러 필터용 안료 조성물, 그 제조 방법 및 컬러 필터
JP5479163B2 (ja) * 2009-03-31 2014-04-23 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69418826T2 (de) 1993-11-22 1999-10-21 Ciba Sc Holding Ag Zusammensetzungen zur Herstellung strukturierter Farbbilder und deren Anwendung
JP3557680B2 (ja) 1994-12-26 2004-08-25 大日本インキ化学工業株式会社 新規なアルキルエーテル化アミノ樹脂およびその製造方法
JP3449664B2 (ja) 1995-04-19 2003-09-22 東京応化工業株式会社 ネガ型レジスト組成物
JP3101974B2 (ja) 1995-11-27 2000-10-23 大日本インキ化学工業株式会社 ４，６−ジアミノ−１，３，５−トリアジン−２−イル−安息香酸類の製法
JPH09203806A (ja) 1996-01-29 1997-08-05 Mitsubishi Chem Corp カラーフィルター用ネガ型感光性組成物
JP3760215B2 (ja) 1996-01-30 2006-03-29 大日本インキ化学工業株式会社 水性塗料用組成物
JPH1060214A (ja) * 1996-08-22 1998-03-03 Nippon Oil Co Ltd カラーフィルター用アクリル樹脂組成物
US6048924A (en) 1996-09-10 2000-04-11 Dainippon Ink And Chemicals, Inc. Aqueous resin composition and aqueous paint
JP3982021B2 (ja) 1996-09-10 2007-09-26 大日本インキ化学工業株式会社 水性樹脂組成物
EP0860473A1 (de) 1996-09-10 1998-08-26 Dainippon Ink And Chemicals, Inc. Wässrige harzzusammensetzung und anstrichfarbe
WO1999007800A1 (fr) 1997-08-11 1999-02-18 Dainippon Ink And Chemicals, Inc. Composition ou materiau de revetement a base d'eau
KR100256392B1 (ko) 1996-09-30 2000-05-15 겐지 아이다 칼라필터용 감광성 수지 착색 조성물 및 이로부터 형성된 칼라필터 및 그 제조방법
JPH10273525A (ja) * 1997-03-31 1998-10-13 Jsr Corp アルカリ可溶性重合体

Also Published As

Publication number Publication date
US6524757B2 (en) 2003-02-25
TW496970B (en) 2002-08-01
EP1174765A1 (de) 2002-01-23
CN1338643A (zh) 2002-03-06
EP1174765B1 (de) 2006-05-03
DE60119233T2 (de) 2007-02-22
KR100716632B1 (ko) 2007-05-09
KR20020007216A (ko) 2002-01-26
US20020025481A1 (en) 2002-02-28
CN1211672C (zh) 2005-07-20
ATE325368T1 (de) 2006-06-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee