ATE251766T1 - Dämpfende eingebettete blankophasenverschiebungsmasken - Google Patents
Dämpfende eingebettete blankophasenverschiebungsmaskenInfo
- Publication number
- ATE251766T1 ATE251766T1 AT97924667T AT97924667T ATE251766T1 AT E251766 T1 ATE251766 T1 AT E251766T1 AT 97924667 T AT97924667 T AT 97924667T AT 97924667 T AT97924667 T AT 97924667T AT E251766 T1 ATE251766 T1 AT E251766T1
- Authority
- AT
- Austria
- Prior art keywords
- phase shift
- shift masks
- blank phase
- damping
- optically
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Bakery Products And Manufacturing Methods Therefor (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1798996P | 1996-05-20 | 1996-05-20 | |
US08/797,443 US5897977A (en) | 1996-05-20 | 1997-02-10 | Attenuating embedded phase shift photomask blanks |
PCT/US1997/007956 WO1997044710A1 (en) | 1996-05-20 | 1997-05-09 | Attenuating embedded phase shift photomask blanks |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE251766T1 true ATE251766T1 (de) | 2003-10-15 |
Family
ID=26690596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT97924667T ATE251766T1 (de) | 1996-05-20 | 1997-05-09 | Dämpfende eingebettete blankophasenverschiebungsmasken |
Country Status (8)
Country | Link |
---|---|
US (1) | US5897977A (de) |
EP (1) | EP0900411B1 (de) |
JP (1) | JP3938940B2 (de) |
CN (1) | CN1311292C (de) |
AT (1) | ATE251766T1 (de) |
DE (1) | DE69725438T2 (de) |
TW (1) | TW334525B (de) |
WO (1) | WO1997044710A1 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2878143B2 (ja) * | 1994-02-22 | 1999-04-05 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 減衰位相シフト・マスク作成用の薄膜材料及びその作成方法 |
JPH11184067A (ja) * | 1997-12-19 | 1999-07-09 | Hoya Corp | 位相シフトマスク及び位相シフトマスクブランク |
JP3262529B2 (ja) * | 1997-12-19 | 2002-03-04 | ホーヤ株式会社 | 位相シフトマスク及び位相シフトマスクブランク |
JPH11258772A (ja) * | 1998-03-16 | 1999-09-24 | Toppan Printing Co Ltd | ハーフトーン型位相シフトマスク用ブランクス及びハーフトーン型位相シフトマスク |
US6355381B1 (en) | 1998-09-25 | 2002-03-12 | Intel Corporation | Method to fabricate extreme ultraviolet lithography masks |
US6835505B2 (en) * | 1998-10-08 | 2004-12-28 | Rochester Institute Of Technology | Mask for projection photolithography at or below about 160 nm and a method thereof |
WO2000020928A1 (en) * | 1998-10-08 | 2000-04-13 | Rochester Institute Of Technology | Photomask for projection lithography at or below about 160 nm and a method |
US6274280B1 (en) | 1999-01-14 | 2001-08-14 | E.I. Du Pont De Nemours And Company | Multilayer attenuating phase-shift masks |
US6401236B1 (en) * | 1999-04-05 | 2002-06-04 | Micron Technology Inc. | Method to eliminate side lobe printing of attenuated phase shift |
JP4163331B2 (ja) * | 1999-07-14 | 2008-10-08 | アルバック成膜株式会社 | 位相シフタ膜の製造方法、位相シフトマスク用ブランクスの製造方法、および、位相シフトマスクの製造方法 |
US6936066B2 (en) * | 1999-11-19 | 2005-08-30 | Advanced Bio Prosthetic Surfaces, Ltd. | Complaint implantable medical devices and methods of making same |
US6472123B1 (en) | 2000-05-15 | 2002-10-29 | Micron Technology, Inc. | Multiple pass write method and reticle |
JP2002090978A (ja) * | 2000-09-12 | 2002-03-27 | Hoya Corp | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
US6653027B2 (en) | 2001-02-26 | 2003-11-25 | International Business Machines Corporation | Attenuated embedded phase shift photomask blanks |
DE10214092B4 (de) * | 2001-03-30 | 2012-03-15 | Hoya Corp. | Halbton-Phasenverschiebungsmasken-Rohling und Halbton-Phasenverschiebungsmaske |
US20020197509A1 (en) * | 2001-04-19 | 2002-12-26 | Carcia Peter Francis | Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks |
US6756160B2 (en) * | 2001-04-19 | 2004-06-29 | E.I. Du Pont De Nemours. And Company | Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks |
US20040115343A1 (en) * | 2002-04-19 | 2004-06-17 | Carcia Peter Francis | Ion-beam deposition process for manufacturing multi-layered attenuated phase shift photomask blanks |
US20040115537A1 (en) * | 2002-04-19 | 2004-06-17 | Carcia Peter Francis | Ion-beam deposition process for manufacturing attenuated phase shift photomask blanks |
JP3802446B2 (ja) | 2002-05-15 | 2006-07-26 | 東邦化成株式会社 | 基板乾燥方法およびその装置 |
WO2003104896A2 (en) * | 2002-06-10 | 2003-12-18 | Dupont Photomasks, Inc. | Photomask and method for repairing defects |
US6844119B2 (en) | 2002-07-30 | 2005-01-18 | Hoya Corporation | Method for producing a halftone phase shift mask blank, a halftone phase shift mask blank and halftone phase shift mask |
US6855463B2 (en) * | 2002-08-27 | 2005-02-15 | Photronics, Inc. | Photomask having an intermediate inspection film layer |
CN100365510C (zh) * | 2003-01-15 | 2008-01-30 | 友达光电股份有限公司 | 制作一金属图案的方法 |
US7029803B2 (en) * | 2003-09-05 | 2006-04-18 | Schott Ag | Attenuating phase shift mask blank and photomask |
WO2005024518A2 (en) * | 2003-09-05 | 2005-03-17 | Schott Ag | Phase shift mask blank with increased uniformity |
TWI480675B (zh) * | 2004-03-31 | 2015-04-11 | Shinetsu Chemical Co | 半色調相移空白光罩,半色調相移光罩,以及圖案轉移方法 |
US20050260504A1 (en) * | 2004-04-08 | 2005-11-24 | Hans Becker | Mask blank having a protection layer |
US7455937B2 (en) * | 2004-12-03 | 2008-11-25 | Micron Technology, Inc. | Reticles and methods of forming reticles |
JP6005530B2 (ja) * | 2013-01-15 | 2016-10-12 | Hoya株式会社 | マスクブランク、位相シフトマスクおよびこれらの製造方法 |
KR102431557B1 (ko) * | 2016-09-26 | 2022-08-11 | 호야 가부시키가이샤 | 마스크 블랭크, 위상 시프트 마스크, 위상 시프트 마스크의 제조 방법 및 반도체 디바이스의 제조 방법 |
EP4145222A1 (de) * | 2020-04-30 | 2023-03-08 | Toppan Photomask Co., Ltd. | Reflektierender fotomaskenrohling und reflektierende fotomaske |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5106703A (en) * | 1989-11-27 | 1992-04-21 | Carcia Peter F | Platinum/cobalt multilayer film for magneto-optical recording |
JP3235115B2 (ja) * | 1991-05-30 | 2001-12-04 | ソニー株式会社 | 位相シフトマスクの製造方法 |
US5288569A (en) * | 1992-04-23 | 1994-02-22 | International Business Machines Corporation | Feature biassing and absorptive phase-shifting techniques to improve optical projection imaging |
TW505829B (en) * | 1992-11-16 | 2002-10-11 | Dupont Photomasks Inc | A transmissive embedded phase shifter-photomask blank |
AU5681194A (en) * | 1993-01-21 | 1994-08-15 | Sematech, Inc. | Phase shifting mask structure with multilayer optical coating for improved transmission |
JP3324005B2 (ja) * | 1993-03-29 | 2002-09-17 | 大日本印刷株式会社 | 位相シフトフォトマスク用基板及びその製造法 |
KR100295385B1 (ko) * | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
JP3262302B2 (ja) * | 1993-04-09 | 2002-03-04 | 大日本印刷株式会社 | 位相シフトフォトマスク、位相シフトフォトマスク用ブランクス及びそれらの製造方法 |
KR100311704B1 (ko) * | 1993-08-17 | 2001-12-15 | 기타오카 다카시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및그블랭크스의제조방법 |
GB2284070B (en) * | 1993-11-16 | 1997-08-27 | Compugraphics International Li | Phase shift masks |
JP2611734B2 (ja) * | 1993-12-21 | 1997-05-21 | 日本電気株式会社 | 位相シフトマスク |
JP2719493B2 (ja) * | 1993-12-22 | 1998-02-25 | ホーヤ株式会社 | 位相シフトマスクブランク及び位相シフトマスク |
JPH07199447A (ja) * | 1993-12-28 | 1995-08-04 | Sony Corp | 単層ハーフトーン方式位相シフトマスク及びその作製方法 |
JP3351892B2 (ja) * | 1994-01-19 | 2002-12-03 | 大日本印刷株式会社 | ハーフトーン位相シフトフォトマスク及びハーフトーン位相シフトフォトマスク用ブランクス |
US5415953A (en) * | 1994-02-14 | 1995-05-16 | E. I. Du Pont De Nemours And Company | Photomask blanks comprising transmissive embedded phase shifter |
JPH07253655A (ja) * | 1994-03-15 | 1995-10-03 | Fujitsu Ltd | 露光マスク |
TW270219B (de) * | 1994-05-31 | 1996-02-11 | Advanced Micro Devices Inc | |
JP2837807B2 (ja) * | 1994-06-27 | 1998-12-16 | ホーヤ株式会社 | 位相シフトマスク及び位相シフトマスクブランク |
JP2785757B2 (ja) * | 1995-08-30 | 1998-08-13 | 日本電気株式会社 | フォトマスク |
-
1997
- 1997-02-10 US US08/797,443 patent/US5897977A/en not_active Expired - Lifetime
- 1997-05-09 EP EP97924667A patent/EP0900411B1/de not_active Expired - Lifetime
- 1997-05-09 CN CNB971947988A patent/CN1311292C/zh not_active Expired - Fee Related
- 1997-05-09 JP JP54246697A patent/JP3938940B2/ja not_active Expired - Fee Related
- 1997-05-09 AT AT97924667T patent/ATE251766T1/de not_active IP Right Cessation
- 1997-05-09 DE DE69725438T patent/DE69725438T2/de not_active Expired - Fee Related
- 1997-05-09 WO PCT/US1997/007956 patent/WO1997044710A1/en active IP Right Grant
- 1997-06-02 TW TW086107546A patent/TW334525B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5897977A (en) | 1999-04-27 |
CN1220742A (zh) | 1999-06-23 |
JP2000511301A (ja) | 2000-08-29 |
EP0900411B1 (de) | 2003-10-08 |
WO1997044710A1 (en) | 1997-11-27 |
DE69725438D1 (de) | 2003-11-13 |
TW334525B (en) | 1998-06-21 |
CN1311292C (zh) | 2007-04-18 |
DE69725438T2 (de) | 2004-07-22 |
JP3938940B2 (ja) | 2007-06-27 |
EP0900411A1 (de) | 1999-03-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |