GB2284070B - Phase shift masks - Google Patents
Phase shift masksInfo
- Publication number
- GB2284070B GB2284070B GB9323595A GB9323595A GB2284070B GB 2284070 B GB2284070 B GB 2284070B GB 9323595 A GB9323595 A GB 9323595A GB 9323595 A GB9323595 A GB 9323595A GB 2284070 B GB2284070 B GB 2284070B
- Authority
- GB
- United Kingdom
- Prior art keywords
- phase shift
- shift masks
- masks
- phase
- shift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9323595A GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9323595A GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9323595D0 GB9323595D0 (en) | 1994-01-05 |
GB2284070A GB2284070A (en) | 1995-05-24 |
GB2284070B true GB2284070B (en) | 1997-08-27 |
Family
ID=10745236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9323595A Expired - Fee Related GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2284070B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5897977A (en) * | 1996-05-20 | 1999-04-27 | E. I. Du Pont De Nemours And Company | Attenuating embedded phase shift photomask blanks |
EP0991126B1 (en) * | 1997-12-09 | 2006-10-18 | Seiko Epson Corporation | Method of manufacturing an electrooptic device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0404742A2 (en) * | 1989-06-19 | 1990-12-27 | International Business Machines Corporation | Method of making and using a high resolution lithographic mask |
EP0488245A1 (en) * | 1990-11-29 | 1992-06-03 | Asahi Glass Company Ltd. | Phase-shifting mask and process for its production |
-
1993
- 1993-11-16 GB GB9323595A patent/GB2284070B/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0404742A2 (en) * | 1989-06-19 | 1990-12-27 | International Business Machines Corporation | Method of making and using a high resolution lithographic mask |
EP0488245A1 (en) * | 1990-11-29 | 1992-06-03 | Asahi Glass Company Ltd. | Phase-shifting mask and process for its production |
Also Published As
Publication number | Publication date |
---|---|
GB9323595D0 (en) | 1994-01-05 |
GB2284070A (en) | 1995-05-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB9304620D0 (en) | Compounds | |
GB9310978D0 (en) | Compounds | |
EP0492630A3 (en) | Phase shifting mask | |
GB9302016D0 (en) | Compounds | |
GB2291218B (en) | Phase shift mask | |
EP0582308A3 (en) | Photomask blank and phase shift photomask | |
GB2293026B (en) | Phase shift mask | |
GB2284070B (en) | Phase shift masks | |
GB9317644D0 (en) | Gearshift lock | |
GB9313144D0 (en) | Compounds | |
GB9307400D0 (en) | Compounds | |
EP0733044A4 (en) | Compounds | |
KR0111337Y1 (en) | Shift lever | |
GB9306446D0 (en) | Photomask | |
GB9317750D0 (en) | Photomask | |
LTIP1755A (en) | Complex leave-in-place form | |
PL54604Y1 (en) | Overlay | |
GB9224654D0 (en) | Quick shift leg | |
GB9310425D0 (en) | Compounds | |
GB9302621D0 (en) | Organiz compounds | |
GB9310459D0 (en) | Compounds | |
GB9310461D0 (en) | Compounds | |
GB9310317D0 (en) | Compounds | |
GB9309620D0 (en) | Compounds | |
GB9309618D0 (en) | Compounds |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19981116 |