GB9323595D0 - Photomask - Google Patents

Photomask

Info

Publication number
GB9323595D0
GB9323595D0 GB939323595A GB9323595A GB9323595D0 GB 9323595 D0 GB9323595 D0 GB 9323595D0 GB 939323595 A GB939323595 A GB 939323595A GB 9323595 A GB9323595 A GB 9323595A GB 9323595 D0 GB9323595 D0 GB 9323595D0
Authority
GB
United Kingdom
Prior art keywords
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB939323595A
Other versions
GB2284070B (en
GB2284070A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
COMPURGRAPHICS INTERNATIONAL L
Original Assignee
COMPURGRAPHICS INTERNATIONAL L
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by COMPURGRAPHICS INTERNATIONAL L filed Critical COMPURGRAPHICS INTERNATIONAL L
Priority to GB9323595A priority Critical patent/GB2284070B/en
Publication of GB9323595D0 publication Critical patent/GB9323595D0/en
Publication of GB2284070A publication Critical patent/GB2284070A/en
Application granted granted Critical
Publication of GB2284070B publication Critical patent/GB2284070B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB9323595A 1993-11-16 1993-11-16 Phase shift masks Expired - Fee Related GB2284070B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9323595A GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB9323595A GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Publications (3)

Publication Number Publication Date
GB9323595D0 true GB9323595D0 (en) 1994-01-05
GB2284070A GB2284070A (en) 1995-05-24
GB2284070B GB2284070B (en) 1997-08-27

Family

ID=10745236

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9323595A Expired - Fee Related GB2284070B (en) 1993-11-16 1993-11-16 Phase shift masks

Country Status (1)

Country Link
GB (1) GB2284070B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5897977A (en) * 1996-05-20 1999-04-27 E. I. Du Pont De Nemours And Company Attenuating embedded phase shift photomask blanks
DE69836216T2 (en) * 1997-12-09 2007-08-30 Seiko Epson Corp. Manufacturing method of an electro-optical device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049461A (en) * 1989-06-19 1991-09-17 International Business Machines Corporation Method of making and using a high resolution lithographic mask
JP2502192B2 (en) * 1990-11-29 1996-05-29 旭硝子株式会社 Phase shift mask and manufacturing method thereof

Also Published As

Publication number Publication date
GB2284070B (en) 1997-08-27
GB2284070A (en) 1995-05-24

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GB9323595D0 (en) Photomask

Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19981116