GB9323595D0 - Photomask - Google Patents
PhotomaskInfo
- Publication number
- GB9323595D0 GB9323595D0 GB939323595A GB9323595A GB9323595D0 GB 9323595 D0 GB9323595 D0 GB 9323595D0 GB 939323595 A GB939323595 A GB 939323595A GB 9323595 A GB9323595 A GB 9323595A GB 9323595 D0 GB9323595 D0 GB 9323595D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9323595A GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9323595A GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9323595D0 true GB9323595D0 (en) | 1994-01-05 |
GB2284070A GB2284070A (en) | 1995-05-24 |
GB2284070B GB2284070B (en) | 1997-08-27 |
Family
ID=10745236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9323595A Expired - Fee Related GB2284070B (en) | 1993-11-16 | 1993-11-16 | Phase shift masks |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2284070B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5897977A (en) * | 1996-05-20 | 1999-04-27 | E. I. Du Pont De Nemours And Company | Attenuating embedded phase shift photomask blanks |
DE69836216T2 (en) * | 1997-12-09 | 2007-08-30 | Seiko Epson Corp. | Manufacturing method of an electro-optical device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5049461A (en) * | 1989-06-19 | 1991-09-17 | International Business Machines Corporation | Method of making and using a high resolution lithographic mask |
JP2502192B2 (en) * | 1990-11-29 | 1996-05-29 | 旭硝子株式会社 | Phase shift mask and manufacturing method thereof |
-
1993
- 1993-11-16 GB GB9323595A patent/GB2284070B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB2284070B (en) | 1997-08-27 |
GB2284070A (en) | 1995-05-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19981116 |