DE60102717D1 - Rohling für Phasenschiebermaske, Phasenschiebermaske, und Herstellungsverfahren - Google Patents

Rohling für Phasenschiebermaske, Phasenschiebermaske, und Herstellungsverfahren

Info

Publication number
DE60102717D1
DE60102717D1 DE60102717T DE60102717T DE60102717D1 DE 60102717 D1 DE60102717 D1 DE 60102717D1 DE 60102717 T DE60102717 T DE 60102717T DE 60102717 T DE60102717 T DE 60102717T DE 60102717 D1 DE60102717 D1 DE 60102717D1
Authority
DE
Germany
Prior art keywords
phase shift
shift mask
film
blank
manufacturing process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60102717T
Other languages
English (en)
Other versions
DE60102717T2 (de
Inventor
Yukio Inazuki
Hideo Kaneko
Tamotsu Maruyama
Satoshi Okazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE60102717D1 publication Critical patent/DE60102717D1/de
Application granted granted Critical
Publication of DE60102717T2 publication Critical patent/DE60102717T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE60102717T 2000-01-12 2001-01-11 Rohling für Phasenschiebermaske, Phasenschiebermaske, und Herstellungsverfahren Expired - Lifetime DE60102717T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2000003344 2000-01-12
JP2000003344 2000-01-12
JP2000309407 2000-10-10
JP2000309407 2000-10-10

Publications (2)

Publication Number Publication Date
DE60102717D1 true DE60102717D1 (de) 2004-05-19
DE60102717T2 DE60102717T2 (de) 2005-02-24

Family

ID=26583361

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60102717T Expired - Lifetime DE60102717T2 (de) 2000-01-12 2001-01-11 Rohling für Phasenschiebermaske, Phasenschiebermaske, und Herstellungsverfahren

Country Status (6)

Country Link
US (1) US6503668B2 (de)
EP (1) EP1117000B1 (de)
KR (1) KR100526737B1 (de)
AT (1) ATE257251T1 (de)
DE (1) DE60102717T2 (de)
TW (1) TW486605B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001305713A (ja) 2000-04-25 2001-11-02 Shin Etsu Chem Co Ltd フォトマスク用ブランクス及びフォトマスク
JP2002023342A (ja) 2000-07-13 2002-01-23 Shin Etsu Chem Co Ltd 位相シフトマスクブランク、位相シフトマスク及びこれらの製造方法
JP4600629B2 (ja) 2001-06-26 2010-12-15 信越化学工業株式会社 位相シフトマスクブランク及びその製造方法
AU2003257547A1 (en) * 2002-08-19 2004-03-03 Hoya Corporation Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank
KR100486676B1 (ko) * 2002-10-04 2005-05-03 엘지.필립스 엘시디 주식회사 위상변이 레이저 마스크 및 이를 이용한 순차측면고상결정화 방법
JP4049372B2 (ja) * 2002-10-23 2008-02-20 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランクスの製造方法
US7314690B2 (en) * 2003-04-09 2008-01-01 Hoya Corporation Photomask producing method and photomask blank
KR101034540B1 (ko) 2003-12-22 2011-05-12 주식회사 하이닉스반도체 위상 반전 마스크 제조 방법
JP5105407B2 (ja) * 2007-03-30 2012-12-26 Ｈｏｙａ株式会社 フォトマスクブランク、フォトマスク及びフォトマスクの製造方法
JP5319193B2 (ja) * 2008-07-28 2013-10-16 Ｈｏｙａ株式会社 液晶表示装置製造用多階調フォトマスク、液晶表示装置製造用多階調フォトマスクの製造方法及びパターン転写方法
JP6229466B2 (ja) * 2013-12-06 2017-11-15 信越化学工業株式会社 フォトマスクブランク
KR102307499B1 (ko) 2014-10-06 2021-10-01 삼성디스플레이 주식회사 위상변이 마스크 및 이를 이용한 디스플레이 장치 제조방법
JP6287932B2 (ja) * 2015-03-31 2018-03-07 信越化学工業株式会社 ハーフトーン位相シフト型フォトマスクブランクの製造方法
EP3086174B1 (de) * 2015-03-31 2017-11-15 Shin-Etsu Chemical Co., Ltd. Verfahren zur herstellung von halbtonphasenverschieber-fotomaskenrohlingen
JP6352224B2 (ja) * 2015-07-17 2018-07-04 Hoya株式会社 位相シフトマスクブランク及びこれを用いた位相シフトマスクの製造方法、並びに表示装置の製造方法
JP6998181B2 (ja) * 2017-11-14 2022-02-04 アルバック成膜株式会社 マスクブランク、位相シフトマスクおよびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0463349A (ja) * 1990-07-03 1992-02-28 Toppan Printing Co Ltd フォトマスクブランクおよびフォトマスク
JPH06123961A (ja) * 1992-10-12 1994-05-06 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク並びに位相シフトマスクの製造方法
US5674647A (en) 1992-11-21 1997-10-07 Ulvac Coating Corporation Phase shift mask and manufacturing method thereof and exposure method using phase shift mask
JP3064769B2 (ja) 1992-11-21 2000-07-12 アルバック成膜株式会社 位相シフトマスクおよびその製造方法ならびにその位相シフトマスクを用いた露光方法
US5952128A (en) 1995-08-15 1999-09-14 Ulvac Coating Corporation Phase-shifting photomask blank and method of manufacturing the same as well as phase-shifting photomask
JPH08123010A (ja) * 1994-10-28 1996-05-17 Toppan Printing Co Ltd 位相シフトマスクおよびそれに用いるマスクブランク
JP3397933B2 (ja) * 1995-03-24 2003-04-21 アルバック成膜株式会社 位相シフトフォトマスクブランクス、位相シフトフォトマスク、及びそれらの製造方法。
US5635315A (en) * 1995-06-21 1997-06-03 Hoya Corporation Phase shift mask and phase shift mask blank
JPH11184063A (ja) * 1997-12-25 1999-07-09 Ulvac Seimaku Kk 位相シフトフォトマスクブランクス及び位相シフトフォトマスクの製造方法並びにサイドエッチング量の制御方法

Also Published As

Publication number Publication date
KR20010088312A (ko) 2001-09-26
US6503668B2 (en) 2003-01-07
EP1117000B1 (de) 2004-01-02
EP1117000A2 (de) 2001-07-18
TW486605B (en) 2002-05-11
EP1117000A3 (de) 2001-09-05
ATE257251T1 (de) 2004-01-15
DE60102717T2 (de) 2005-02-24
US20010007731A1 (en) 2001-07-12
KR100526737B1 (ko) 2005-11-08

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition