ATE214845T1 - Hochgeschwidigkeitsbewegung für arbeitsstücke in vakuum-behandlung - Google Patents

Hochgeschwidigkeitsbewegung für arbeitsstücke in vakuum-behandlung

Info

Publication number
ATE214845T1
ATE214845T1 AT95304550T AT95304550T ATE214845T1 AT E214845 T1 ATE214845 T1 AT E214845T1 AT 95304550 T AT95304550 T AT 95304550T AT 95304550 T AT95304550 T AT 95304550T AT E214845 T1 ATE214845 T1 AT E214845T1
Authority
AT
Austria
Prior art keywords
wafer
robots
cassette
pumpdown
wafers
Prior art date
Application number
AT95304550T
Other languages
English (en)
Inventor
Manny Sieradzki
Original Assignee
Diamond Semiconductor Group
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23026049&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE214845(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Diamond Semiconductor Group filed Critical Diamond Semiconductor Group
Application granted granted Critical
Publication of ATE214845T1 publication Critical patent/ATE214845T1/de

Links

Classifications

    • H10P72/0452
    • H10P72/0462
    • H10P72/0464
    • H10P72/3304
    • H10P72/7602
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/137Associated with semiconductor wafer handling including means for charging or discharging wafer cassette

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Furnace Details (AREA)
AT95304550T 1994-06-30 1995-06-28 Hochgeschwidigkeitsbewegung für arbeitsstücke in vakuum-behandlung ATE214845T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/269,159 US5486080A (en) 1994-06-30 1994-06-30 High speed movement of workpieces in vacuum processing

Publications (1)

Publication Number Publication Date
ATE214845T1 true ATE214845T1 (de) 2002-04-15

Family

ID=23026049

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95304550T ATE214845T1 (de) 1994-06-30 1995-06-28 Hochgeschwidigkeitsbewegung für arbeitsstücke in vakuum-behandlung

Country Status (5)

Country Link
US (1) US5486080A (de)
EP (1) EP0690480B1 (de)
JP (1) JPH08181189A (de)
AT (1) ATE214845T1 (de)
DE (1) DE69525881T2 (de)

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US7112808B2 (en) * 2004-02-25 2006-09-26 Axcelis Technologies, Inc. Wafer 2D scan mechanism
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JP2007242648A (ja) * 2006-03-04 2007-09-20 Masato Toshima 基板の処理装置
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TWI417984B (zh) 2009-12-10 2013-12-01 沃博提克Lt太陽公司 自動排序之多方向性直線型處理裝置
CN102310999B (zh) * 2010-07-09 2013-07-17 上海凯世通半导体有限公司 真空传输制程设备及方法
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US11335578B2 (en) * 2020-02-13 2022-05-17 Kawasaki Jukogyo Kabushiki Kaisha Substrate transfer apparatus and method of measuring positional deviation of substrate
CN113380680A (zh) * 2020-03-10 2021-09-10 上海临港凯世通半导体有限公司 硅片输运装置
CN211788912U (zh) * 2020-04-01 2020-10-27 上海临港凯世通半导体有限公司 离子注入机的作业平台
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Also Published As

Publication number Publication date
DE69525881T2 (de) 2002-11-28
EP0690480B1 (de) 2002-03-20
EP0690480A1 (de) 1996-01-03
JPH08181189A (ja) 1996-07-12
DE69525881D1 (de) 2002-04-25
US5486080A (en) 1996-01-23

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