ATE208544T1 - Kombinationstechnik für rf- stromversorgerungsgerät mit erhöhter stabilität - Google Patents

Kombinationstechnik für rf- stromversorgerungsgerät mit erhöhter stabilität

Info

Publication number
ATE208544T1
ATE208544T1 AT96103467T AT96103467T ATE208544T1 AT E208544 T1 ATE208544 T1 AT E208544T1 AT 96103467 T AT96103467 T AT 96103467T AT 96103467 T AT96103467 T AT 96103467T AT E208544 T1 ATE208544 T1 AT E208544T1
Authority
AT
Austria
Prior art keywords
signal
derived
power amplifier
combiner
output
Prior art date
Application number
AT96103467T
Other languages
English (en)
Inventor
Bradley O Stimson
Paul W Rummel
Original Assignee
Applied Materials Inc
Comdel Rf Power Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc, Comdel Rf Power Systems filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE208544T1 publication Critical patent/ATE208544T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H11/00—Networks using active elements
    • H03H11/02—Multiple-port networks
    • H03H11/28—Impedance matching networks
    • H03H11/30—Automatic matching of source impedance to load impedance
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H11/00—Networks using active elements
    • H03H11/02—Multiple-port networks
    • H03H11/36—Networks for connecting several sources or loads, working on the same frequency band, to a common load or source

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Amplifiers (AREA)
  • Plasma Technology (AREA)
  • Ac-Ac Conversion (AREA)
AT96103467T 1995-03-06 1996-03-06 Kombinationstechnik für rf- stromversorgerungsgerät mit erhöhter stabilität ATE208544T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/398,426 US5712592A (en) 1995-03-06 1995-03-06 RF plasma power supply combining technique for increased stability

Publications (1)

Publication Number Publication Date
ATE208544T1 true ATE208544T1 (de) 2001-11-15

Family

ID=23575338

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96103467T ATE208544T1 (de) 1995-03-06 1996-03-06 Kombinationstechnik für rf- stromversorgerungsgerät mit erhöhter stabilität

Country Status (6)

Country Link
US (1) US5712592A (de)
EP (1) EP0731559B1 (de)
JP (1) JP4124836B2 (de)
KR (1) KR100318788B1 (de)
AT (1) ATE208544T1 (de)
DE (1) DE69616620T2 (de)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5770922A (en) 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
US6815633B1 (en) 1997-06-26 2004-11-09 Applied Science & Technology, Inc. Inductively-coupled toroidal plasma source
US8779322B2 (en) 1997-06-26 2014-07-15 Mks Instruments Inc. Method and apparatus for processing metal bearing gases
US6924455B1 (en) 1997-06-26 2005-08-02 Applied Science & Technology, Inc. Integrated plasma chamber and inductively-coupled toroidal plasma source
US7569790B2 (en) * 1997-06-26 2009-08-04 Mks Instruments, Inc. Method and apparatus for processing metal bearing gases
US7166816B1 (en) * 1997-06-26 2007-01-23 Mks Instruments, Inc. Inductively-coupled torodial plasma source
US6043607A (en) * 1997-12-16 2000-03-28 Applied Materials, Inc. Apparatus for exciting a plasma in a semiconductor wafer processing system using a complex RF waveform
US6091441A (en) * 1998-02-10 2000-07-18 Scientific-Atlanta, Inc. Radio frequency detector for cable television distribution systems
US6449568B1 (en) 1998-02-27 2002-09-10 Eni Technology, Inc. Voltage-current sensor with high matching directivity
JP4166318B2 (ja) * 1998-03-25 2008-10-15 松下電器産業株式会社 電力増幅器
US6118343A (en) * 1999-05-10 2000-09-12 Tyco Electronics Logistics Ag Power Amplifier incorporating single drain switch and single negative voltage generator
US6587013B1 (en) 2000-02-16 2003-07-01 Signal Technology Corporation RF power combiner circuit with spaced capacitive stub
US6242979B1 (en) * 2000-02-23 2001-06-05 Motorola, Inc. Linearization using parallel cancellation in linear power amplifier
WO2002054835A2 (en) * 2001-01-08 2002-07-11 Tokyo Electron Limited Addition of power at selected harmonics of plasma processor drive frequency
US7100532B2 (en) * 2001-10-09 2006-09-05 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
US7132996B2 (en) * 2001-10-09 2006-11-07 Plasma Control Systems Llc Plasma production device and method and RF driver circuit
US7084832B2 (en) * 2001-10-09 2006-08-01 Plasma Control Systems, Llc Plasma production device and method and RF driver circuit with adjustable duty cycle
CN1305353C (zh) * 2001-12-10 2007-03-14 东京毅力科创株式会社 高频电源及其控制方法、和等离子体处理装置
US7480571B2 (en) * 2002-03-08 2009-01-20 Lam Research Corporation Apparatus and methods for improving the stability of RF power delivery to a plasma load
US7184146B2 (en) * 2003-06-24 2007-02-27 Cardinal Ig Company Methods and apparatus for evaluating insulating glass units
US7728250B2 (en) * 2004-02-02 2010-06-01 Inficon, Inc. RF sensor clamp assembly
US7148746B2 (en) * 2004-10-26 2006-12-12 Andrew Corporation High efficiency amplifier
EP1701376B1 (de) 2005-03-10 2006-11-08 HÜTTINGER Elektronik GmbH + Co. KG Vakuumplasmagenerator
EP1783904B1 (de) * 2005-10-17 2008-04-16 HÜTTINGER Elektronik GmbH + Co. KG HF-Plasmaversorgungseinrichtung
US7353771B2 (en) * 2005-11-07 2008-04-08 Mks Instruments, Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
US7755452B2 (en) * 2007-02-27 2010-07-13 Coherent, Inc. Power combiner
JP2008236105A (ja) * 2007-03-19 2008-10-02 Nec Corp 電力分配合成システム
US8692466B2 (en) * 2009-02-27 2014-04-08 Mks Instruments Inc. Method and apparatus of providing power to ignite and sustain a plasma in a reactive gas generator
US8674606B2 (en) * 2009-04-27 2014-03-18 Advanced Energy Industries, Inc. Detecting and preventing instabilities in plasma processes
US7970037B2 (en) * 2009-06-10 2011-06-28 Coherent, Inc. Arrangement for RF power delivery to a gas discharge laser with cascaded transmission line sections
US8330432B2 (en) * 2009-12-22 2012-12-11 Advanced Energy Industries, Inc Efficient active source impedance modification of a power amplifier
US20110285473A1 (en) 2010-05-24 2011-11-24 Coherent, Inc. Impedance-matching transformers for rf driven co2 gas discharge lasers
US8648665B2 (en) 2010-10-06 2014-02-11 Coherent, Inc. Impedance-matching circuits for multi-output power supplies driving CO2 gas-discharge lasers
KR102023624B1 (ko) 2013-01-25 2019-09-20 삼성전자 주식회사 Rf 전송 회로와 이를 포함하는 장치들
JP6078419B2 (ja) 2013-02-12 2017-02-08 株式会社日立ハイテクノロジーズ プラズマ処理装置の制御方法、プラズマ処理方法及びプラズマ処理装置
JP6126905B2 (ja) * 2013-05-14 2017-05-10 東京エレクトロン株式会社 プラズマ処理装置
US9093984B1 (en) * 2013-09-18 2015-07-28 Rockwell Collins, Inc. Phase shifter with true time delay
DE102013226537B4 (de) 2013-12-18 2022-12-29 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem mit mehreren Verstärkerpfaden sowie Verfahren zur Anregung eines Plasmas
DE102013226511B4 (de) 2013-12-18 2016-12-15 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem und Verfahren zur Erzeugung einer Leistung
US10224184B2 (en) 2014-03-24 2019-03-05 Aes Global Holdings, Pte. Ltd System and method for control of high efficiency generator source impedance
WO2015148490A1 (en) * 2014-03-24 2015-10-01 Advanced Energy Industries, Inc. System and method for control of high efficiency generator source impedance
EP3145080B1 (de) * 2014-06-17 2018-08-08 Huawei Technologies Co., Ltd. Radiofrequenz-leistungsverstärkungssystem, radiofrequenz-leistungsverstärkungsverfahren, sender und basisstation
US9954508B2 (en) * 2015-10-26 2018-04-24 Lam Research Corporation Multiple-output radiofrequency matching module and associated methods
US9831833B1 (en) 2016-01-28 2017-11-28 Rockwell Collins, Inc. Power amplifier
US10637460B2 (en) 2016-06-14 2020-04-28 Macom Technology Solutions Holdings, Inc. Circuits and operating methods thereof for monitoring and protecting a device
JPWO2018021464A1 (ja) * 2016-07-27 2019-12-12 イマジニアリング株式会社 昇圧回路を含む電磁波発振装置
US20180109228A1 (en) 2016-10-14 2018-04-19 MACOM Technology Solution Holdings, Inc. Phase shifters for gallium nitride amplifiers and related methods
US20190028066A1 (en) 2017-07-24 2019-01-24 Macom Technology Solutions Holdings, Inc. Fet operational temperature determination by field plate resistance thermometry
US20190028065A1 (en) 2017-07-24 2019-01-24 Macom Technology Solutions Holdings, Inc. Fet operational temperature determination by gate structure resistance thermometry
JP6772117B2 (ja) 2017-08-23 2020-10-21 株式会社日立ハイテク エッチング方法およびエッチング装置
US10777386B2 (en) 2017-10-17 2020-09-15 Lam Research Corporation Methods for controlling plasma glow discharge in a plasma chamber
WO2019204640A1 (en) * 2018-04-20 2019-10-24 Advanced Energy Industries, Inc. System and method for control of high efficiency generator source impedance
US10972055B2 (en) 2018-06-15 2021-04-06 Skyworks Solutions, Inc. Integrated doherty power amplifier
JP6963097B2 (ja) 2019-04-22 2021-11-05 株式会社日立ハイテク プラズマ処理方法
CN113394067A (zh) * 2020-03-13 2021-09-14 Asm Ip私人控股有限公司 基板处理设备
CN114080662A (zh) 2020-06-16 2022-02-22 株式会社日立高新技术 等离子处理装置以及等离子处理方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1160904B (de) * 1962-02-19 1964-01-09 Deutsche Post Rundfunk Verfahren zur Unterdrueckung des Rueckflusses in einer Wellenleitung
DE2519845C3 (de) * 1975-05-03 1978-06-08 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Schaltungsanordnung zur Zusammenführung von Hochfrequenzleistungsanteilen
JPS57194611A (en) * 1981-05-26 1982-11-30 Nippon Dengiyou Kosaku Kk Branching and coupling circuit
US4629940A (en) * 1984-03-02 1986-12-16 The Perkin-Elmer Corporation Plasma emission source
US4701716A (en) * 1986-05-07 1987-10-20 Rca Corporation Parallel distributed signal amplifiers
SU1497718A1 (ru) * 1987-10-12 1989-07-30 Предприятие П/Я А-7866 Усилитель
US4965527A (en) * 1989-09-20 1990-10-23 Hughes Aircraft Company Gain equalizer for microwave balanced amplifier configuration
JPH0457406A (ja) * 1990-06-27 1992-02-25 Shindengen Electric Mfg Co Ltd Ｒｆ発生装置のフェーズシフト回路
JPH04104603A (ja) * 1990-08-24 1992-04-07 Fujitsu Ltd 平衡形増幅器
US5101171A (en) * 1990-11-23 1992-03-31 Advanced Systems Research, Inc. Extended bandwidth RF amplifier
JPH0732078B2 (ja) * 1993-01-14 1995-04-10 株式会社アドテック 高周波プラズマ用電源及びインピーダンス整合装置

Also Published As

Publication number Publication date
JPH09289100A (ja) 1997-11-04
KR19990027399A (ko) 1999-04-15
EP0731559A1 (de) 1996-09-11
JP4124836B2 (ja) 2008-07-23
KR100318788B1 (ko) 2002-04-22
EP0731559B1 (de) 2001-11-07
DE69616620T2 (de) 2002-08-14
DE69616620D1 (de) 2001-12-13
US5712592A (en) 1998-01-27

Similar Documents

Publication Publication Date Title
DE69616620D1 (de) Kombinationstechnik für RF-Stromversorgerungsgerät mit erhöhter Stabilität
NO20006602L (no) Forsterkerkrets
ATE208543T1 (de) Rf-anpassung detektorschaltung mit doppeltem richtkoppler
MY116300A (en) Monolithic high frequency antenna switch
WO1999053620A3 (en) Optical-transmission system having a split-gain amplifier and a signal-modifying device
SE9600168D0 (sv) Method and device for measuring the return loss of a radiofrequent signal
ATE487274T1 (de) Leistungsverstärker mit bypass-pfad
EP0213037A3 (de) Halbleiterspeichergerät mit Prüfmustergeberschaltung
CA2402704A1 (en) System and method of producing direct audio from a power supply
DE69414822D1 (de) Verstärkersystem
JPS58224333A (ja) コヒ−レント光受信装置
JPH07147547A (ja) フィードフォワード型歪補償回路
GB2262672A (en) Power amplifier
DE69220523T2 (de) Sender-Empfänger für gleichzeitige, bidirektionelle Datenübertragung im Basisband
CA2108213A1 (en) Optical Semiconductor Amplifier
FR2411507A1 (fr) Amplificateur comportant des premier et deuxieme elements d'amplification
JPS6025310A (ja) Ｓｓｂ多重無線装置用ｆｅｔ直線電力増幅装置
JPS6422103A (en) Power synthesizing type power amplifier
KR970024552A (ko) 튜너 및 스플리터-변조기를 포함하는 회로 장치
ATE172587T1 (de) Gegentaktendstufe mit einer einstellung des querstroms der gegentaktendstufe
FR2413833A1 (fr) Circuit pour augmenter la pente d'un signal periodique, principalement aux environs d'un niveau de reference
WO1997033366A3 (en) Circuit arrangement comprising a logarithmic transfer function
ATE357064T1 (de) Hochfrequenzschaltung mit variabler phasenverschiebung
DE69327067T2 (de) Multipliziererschaltung und Betriebsverfahren dafür
NO903869L (no) Anordning og fremgangsmaate for reduksjon av forvrengning ved et analogt, optisk transmisjonssystem.

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties