ATE188749T1 - Delaminierungsbeständiges metall-film laminat - Google Patents

Delaminierungsbeständiges metall-film laminat

Info

Publication number
ATE188749T1
ATE188749T1 AT91114058T AT91114058T ATE188749T1 AT E188749 T1 ATE188749 T1 AT E188749T1 AT 91114058 T AT91114058 T AT 91114058T AT 91114058 T AT91114058 T AT 91114058T AT E188749 T1 ATE188749 T1 AT E188749T1
Authority
AT
Austria
Prior art keywords
metal
film
laminate
metal film
film laminate
Prior art date
Application number
AT91114058T
Other languages
English (en)
Inventor
Richard L Swisher
Original Assignee
Sheldahl Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sheldahl Inc filed Critical Sheldahl Inc
Application granted granted Critical
Publication of ATE188749T1 publication Critical patent/ATE188749T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/123Treatment by wave energy or particle radiation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • C23C14/022Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/20Metallic material, boron or silicon on organic substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/09Treatments involving charged particles
    • H05K2203/095Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/924Electrolytic coating substrate predominantly comprised of specified synthetic resin
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S205/00Electrolysis: processes, compositions used therein, and methods of preparing the compositions
    • Y10S205/924Electrolytic coating substrate predominantly comprised of specified synthetic resin
    • Y10S205/926Polyamide or polyimide, e.g. nylon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12451Macroscopically anomalous interface between layers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12472Microscopic interfacial wave or roughness
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12542More than one such component
    • Y10T428/12549Adjacent to each other
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12556Organic component
    • Y10T428/12569Synthetic resin
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12903Cu-base component
    • Y10T428/1291Next to Co-, Cu-, or Ni-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Physical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
AT91114058T 1990-09-13 1991-08-22 Delaminierungsbeständiges metall-film laminat ATE188749T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/580,505 US5112462A (en) 1990-09-13 1990-09-13 Method of making metal-film laminate resistant to delamination

Publications (1)

Publication Number Publication Date
ATE188749T1 true ATE188749T1 (de) 2000-01-15

Family

ID=24321370

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91114058T ATE188749T1 (de) 1990-09-13 1991-08-22 Delaminierungsbeständiges metall-film laminat

Country Status (7)

Country Link
US (3) US5112462A (de)
EP (1) EP0475145B1 (de)
JP (1) JP2595151B2 (de)
KR (1) KR960011748B1 (de)
AT (1) ATE188749T1 (de)
CA (1) CA2051266C (de)
DE (1) DE69131900T2 (de)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6060175A (en) * 1990-09-13 2000-05-09 Sheldahl, Inc. Metal-film laminate resistant to delamination
US5112462A (en) * 1990-09-13 1992-05-12 Sheldahl Inc. Method of making metal-film laminate resistant to delamination
US5461203A (en) * 1991-05-06 1995-10-24 International Business Machines Corporation Electronic package including lower water content polyimide film
US5376209A (en) * 1991-07-26 1994-12-27 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Process for preparing an assembly of an article and a polymide which resists dimensional change, delamination and debonding when exposed to changes in temperature
ITRM910687A1 (it) * 1991-09-13 1993-03-15 Consorzio Centro Delle Tecnolo Struttura multistrato a film sottile per trattamenti di barriera su film plastico.
US5261593A (en) * 1992-08-19 1993-11-16 Sheldahl, Inc. Direct application of unpackaged integrated circuit to flexible printed circuit
US6165610A (en) * 1993-01-14 2000-12-26 Printpack Illinois, Inc. Metallized film comprising blend of polyester and ethylene copolymers
US5716410A (en) * 1993-04-30 1998-02-10 Scimed Life Systems, Inc. Temporary stent and method of use
US20040241454A1 (en) * 1993-10-04 2004-12-02 Shaw David G. Barrier sheet and method of making same
SK283289B6 (sk) 1993-10-04 2003-05-02 Presstek, Inc. (A Delaware Corporation) Spôsob prípravy obaleného substrátu bariérovým filmom
US5527998A (en) * 1993-10-22 1996-06-18 Sheldahl, Inc. Flexible multilayer printed circuit boards and methods of manufacture
US5382447A (en) * 1993-12-02 1995-01-17 International Business Machines Corporation Process for fabricating improved multilayer interconnect systems
US5840402A (en) * 1994-06-24 1998-11-24 Sheldahl, Inc. Metallized laminate material having ordered distribution of conductive through holes
KR0156602B1 (ko) * 1994-07-08 1998-12-01 황해웅 이온이동도 분석기
DE4426754A1 (de) * 1994-07-28 1996-02-01 Wolff Walsrode Ag Verfahren zur Plasmavorbehandlung von Polyolefinfolien
AU3415095A (en) * 1994-09-06 1996-03-27 Sheldahl, Inc. Printed circuit substrate having unpackaged integrated circuit chips directly mounted thereto and method of manufacture
US5721007A (en) * 1994-09-08 1998-02-24 The Whitaker Corporation Process for low density additive flexible circuits and harnesses
US5719749A (en) * 1994-09-26 1998-02-17 Sheldahl, Inc. Printed circuit assembly with fine pitch flexible printed circuit overlay mounted to printed circuit board
US5709979A (en) * 1994-10-21 1998-01-20 Sheldahl, Inc. Printed wiring board with photoimageable dielectric base substrate and method of manufacture therefor
JP3356568B2 (ja) * 1994-11-30 2002-12-16 鐘淵化学工業株式会社 新規なフレキシブル銅張積層板
US5543183A (en) * 1995-02-17 1996-08-06 General Atomics Chromium surface treatment of nickel-based substrates
US5588202A (en) * 1995-03-17 1996-12-31 Honeywell Inc. Method for manufacturing an overmolded sensor
US5670262A (en) * 1995-05-09 1997-09-23 The Dow Chemical Company Printing wiring board(s) having polyimidebenzoxazole dielectric layer(s) and the manufacture thereof
US6147870A (en) * 1996-01-05 2000-11-14 Honeywell International Inc. Printed circuit assembly having locally enhanced wiring density
US5839188A (en) 1996-01-05 1998-11-24 Alliedsignal Inc. Method of manufacturing a printed circuit assembly
DE19602659A1 (de) * 1996-01-26 1997-07-31 Hoechst Ag Metallisierung von thermoplastischen Kunststoffen
US6171714B1 (en) * 1996-04-18 2001-01-09 Gould Electronics Inc. Adhesiveless flexible laminate and process for making adhesiveless flexible laminate
KR19980033213A (ko) * 1996-10-31 1998-07-25 조셉제이.스위니 스퍼터링 챔버내의 미립자 물질 발생 감소 방법
US5900316A (en) * 1996-12-06 1999-05-04 International Business Machines Corporation Flexible conductive sheet
US6342307B1 (en) * 1997-11-24 2002-01-29 The Board Of Trustees Of The University Of Illinois Embedded cluster metal-polymeric micro interface and process for producing the same
JP2000174399A (ja) * 1998-12-01 2000-06-23 Nhk Spring Co Ltd 立体配線基板とその製造方法および基板用絶縁材料
US6221176B1 (en) 1999-03-17 2001-04-24 Gould Electronics, Inc. Surface treatment of copper to prevent microcracking in flexible circuits
US20030018243A1 (en) * 1999-07-07 2003-01-23 Gerhardt Thomas J. Selectively plated sensor
MXPA02001588A (es) 1999-08-16 2002-07-02 Univ Johns Hopkins Reflectron de iones, que comprende unt ablero flexible de circuito impreso.
US6790476B1 (en) 2000-05-23 2004-09-14 Sandia Corporation Method of adhesion between an oxide layer and a metal layer
TW539614B (en) * 2000-06-06 2003-07-01 Matsushita Electric Works Ltd Laminate
US6632343B1 (en) * 2000-08-30 2003-10-14 Micron Technology, Inc. Method and apparatus for electrolytic plating of surface metals
WO2002031214A1 (de) 2000-10-09 2002-04-18 Hueck Folien Metallisierte folie und verfahren zu deren herstellung sowie deren anwendung
US6916527B2 (en) * 2001-01-18 2005-07-12 Matsushita Electric Works, Ltd. Resin moldings
US6987162B2 (en) 2001-10-23 2006-01-17 Tien Tsai Lin Method and apparatus of producing high-density polyimide (HPI) film
US6709714B2 (en) * 2001-10-23 2004-03-23 Tien Tsai Lin Method and apparatus of producing high-density polyidimide (HPI) film
DE10205914A1 (de) * 2002-02-13 2003-08-21 Giesecke & Devrient Gmbh Verfahren zur Herstellung von Polyesterfolien mit Transponderantennenspule
JP4931033B2 (ja) * 2002-07-19 2012-05-16 日本テトラパック株式会社 積層材料、積層材料の製造方法および包装容器
US7361391B2 (en) 2002-10-02 2008-04-22 Milprint, Inc. Metalized film laminates with anticorrosion agents
US6964936B1 (en) 2003-03-06 2005-11-15 Sandia Corporation Method of making maximally dispersed heterogeneous catalysts
EP1631857B1 (de) * 2003-06-06 2007-03-07 Sipix Imaging, Inc. In-form-herstellung eines objekts mit eingebetteter anzeigetafel
CN100484755C (zh) * 2003-06-27 2009-05-06 日本瑞翁株式会社 叠层体及其制造方法
KR20080019308A (ko) * 2004-01-13 2008-03-03 우베 고산 가부시키가이샤 폴리이미드-금속 적층체 및 폴리이미드 회로 기판
DE102004006127A1 (de) 2004-02-07 2005-08-25 Dr.Ing.H.C. F. Porsche Ag Verfahren zur Herstellung von korrosionsbeständigen und dekorativen Beschichtungen und Schichtsystemen für Substrate aus Metallen
CN101023202A (zh) * 2004-09-16 2007-08-22 利莱克特集团公司 改善由聚合物-基体复合物制造的产品表面电连接性能的方法
WO2006114901A1 (ja) * 2005-04-18 2006-11-02 Toyo Boseki Kabushiki Kaisha 薄膜積層ポリイミドフィルム及びフレキシブルプリント配線板
US20090056995A1 (en) * 2005-04-20 2009-03-05 Toyo Boseki Kabushiki Kasiha Adhesive sheet, metal-laminated sheet and printed wiring board
EP1980644B1 (de) * 2007-04-04 2009-09-02 Applied Materials, Inc. Vorrichtung und Verfahren zur Beschichtung eines Kunststoffsubstrates
DE102007021896A1 (de) * 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Flexibles Leiterplattenmaterial und Verfahren zum Herstellen desselben
US20100215982A1 (en) * 2007-10-18 2010-08-26 Nippon Mining And Metals Co., Ltd. Metal Covered Polyimide Composite, Process for Producing the Composite, and Apparatus for Producing the Composite
US8821679B2 (en) * 2008-04-25 2014-09-02 Material Sciences Corporation Bimetal laminate structure and method of making the same
US10252503B2 (en) * 2009-06-12 2019-04-09 Hazen Paper Company Method and apparatus for transfer lamination
US9938111B2 (en) * 2010-03-02 2018-04-10 Hazen Paper Company Method and apparatus for transfer lamination
JP5514897B2 (ja) * 2010-04-30 2014-06-04 Jx日鉱日石金属株式会社 フレキシブル配線用積層体
US8632860B2 (en) * 2011-11-02 2014-01-21 Sheila Shahidi Method of preparation of multifunctional technical textile by plasma-treatment
US9765251B2 (en) * 2012-12-18 2017-09-19 University Of South Florida Encapsulation of thermal energy storage media
JP6288774B2 (ja) * 2014-06-30 2018-03-07 トーカロ株式会社 防汚性に優れた高分子エラストマー部材およびそれを用いたロール部材
US10787303B2 (en) 2016-05-29 2020-09-29 Cellulose Material Solutions, LLC Packaging insulation products and methods of making and using same
US11078007B2 (en) 2016-06-27 2021-08-03 Cellulose Material Solutions, LLC Thermoplastic packaging insulation products and methods of making and using same
EP3851553A4 (de) * 2018-09-11 2021-11-03 Mitsubishi Engineering-Plastics Corporation Metallbeschichtete formartikel aus harz und verfahren zu ihrer herstellung
CN110862567A (zh) * 2019-10-30 2020-03-06 深圳丹邦科技股份有限公司 一种超柔韧高导电导热性柔性基材及其制备方法

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE221204C (de) *
AT215159B (de) * 1959-06-23 1961-05-25 Balzers Hochvakuum Verfahren zur Herstellung einer haftfesten Verbindung zwischen Werkstücken aus Polyhalogenolefinen u. a. Werkstoffen
BE621838A (de) * 1959-08-10 1900-01-01
NL135706C (de) * 1966-07-29 1900-01-01
US3700538A (en) * 1970-09-10 1972-10-24 Nasa Polyimide resin-fiberglass cloth laminates for printed circuit boards
US4081578A (en) * 1974-06-27 1978-03-28 The General Tire & Rubber Company In-mold coating composition and method of applying same
US3981691A (en) * 1974-07-01 1976-09-21 Minnesota Mining And Manufacturing Company Metal-clad dielectric sheeting having an improved bond between the metal and dielectric layers
US4093768A (en) * 1976-02-19 1978-06-06 Freeman Chemical Corporation Copper foil electrical laminate with reinforced plastics
JPS53115069A (en) * 1977-03-18 1978-10-07 Nippon Mining Co Method of producing printed circuit board
US4153518A (en) * 1977-11-18 1979-05-08 Tektronix, Inc. Method of making a metalized substrate having a thin film barrier layer
US4189517A (en) * 1978-11-08 1980-02-19 The General Tire & Rubber Company Low-shrink in-mold coating
DE3017713A1 (de) * 1980-05-08 1981-11-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur fortlaufenden beschichtung von kunststoffolien mit metallschichten
DE3172124D1 (en) * 1980-06-10 1985-10-10 Matsushita Electric Ind Co Ltd A method of vacuum depositing a layer on a plastics film substrate
JPS5783427A (en) * 1980-11-14 1982-05-25 Daicel Chem Ind Ltd Bonding method of metal foil and thermoplastic resin
US4420509A (en) * 1981-08-11 1983-12-13 Glasteel Tennessee, Inc. Copper-clad polyester-glass fiber laminates
US4414173A (en) * 1981-11-02 1983-11-08 The General Tire & Rubber Company In-mold coating
US4582564A (en) * 1982-01-04 1986-04-15 At&T Technologies, Inc. Method of providing an adherent metal coating on an epoxy surface
US4402998A (en) * 1982-01-04 1983-09-06 Western Electric Co., Inc. Method for providing an adherent electroless metal coating on an epoxy surface
US4444848A (en) * 1982-01-04 1984-04-24 Western Electric Co., Inc. Adherent metal coatings on rubber-modified epoxy resin surfaces
US4482998A (en) * 1982-05-27 1984-11-13 At&T Bell Laboratories Method and apparatus for improving the quality of communication in a digital conference arrangement
US4395313A (en) * 1982-07-29 1983-07-26 General Motors Corporation Vacuum pretreatment process for durable electroplated coatings on ABS and PPO plastics
US4568413A (en) * 1983-07-25 1986-02-04 James J. Toth Metallized and plated laminates
DD221204A1 (de) * 1983-10-31 1985-04-17 Ardenne Manfred Verfahren zur vorbehandlung von substraten
US4524089A (en) * 1983-11-22 1985-06-18 Olin Corporation Three-step plasma treatment of copper foils to enhance their laminate adhesion
DE3590588T1 (de) * 1984-11-09 1986-10-30 Konica Corp., Tokio/Tokyo Leitendes Verbundgebilde
US4720401A (en) * 1985-01-11 1988-01-19 International Business Machines Corporation Enhanced adhesion between metals and polymers
US4597828A (en) * 1985-03-25 1986-07-01 Firan Corporation Method of manufacturing printed circuit boards
US4863808A (en) * 1985-09-13 1989-09-05 Gould Inc. Copper-chromium-polyimide composite
US4916016A (en) * 1986-01-23 1990-04-10 Ici Americas Inc. Metal or plastic-clad polyvinyl resin laminates
US4886681A (en) * 1987-01-20 1989-12-12 International Business Machines Corporation Metal-polymer adhesion by low energy bombardment
US4772488A (en) * 1987-03-23 1988-09-20 General Electric Company Organic binder removal using CO2 plasma
US4724401A (en) * 1987-04-23 1988-02-09 Rockwell International Corporation Adaptive oscillator apparatus for use in a phase-lock loop
WO1989004880A1 (en) * 1987-11-16 1989-06-01 Motorola, Inc. High temperature thermoplastic substrate having a vacuum deposited solderable electrical circuit pattern and method of manufacture
DE3879441T2 (de) * 1987-12-24 1993-09-09 Mitsubishi Gas Chemical Co Verfahren zur herstellung von koerpern mit einem kupferueberzug.
JPH01305595A (ja) * 1988-06-03 1989-12-08 Hitachi Ltd 銅配線付ポリイミドフイルム
US5015538A (en) * 1989-09-22 1991-05-14 Minnesota Mining And Manufacturing Company Process for pulse electroplating electroactive polymers and articles derived therefrom
US5112462A (en) * 1990-09-13 1992-05-12 Sheldahl Inc. Method of making metal-film laminate resistant to delamination
US5137791A (en) * 1990-09-13 1992-08-11 Sheldahl Inc. Metal-film laminate resistant to delamination

Also Published As

Publication number Publication date
KR960011748B1 (ko) 1996-08-30
US5112462A (en) 1992-05-12
CA2051266C (en) 2002-02-19
CA2051266A1 (en) 1992-03-14
JPH04290742A (ja) 1992-10-15
KR920006106A (ko) 1992-04-27
DE69131900D1 (de) 2000-02-17
DE69131900T2 (de) 2000-08-17
EP0475145B1 (de) 2000-01-12
JP2595151B2 (ja) 1997-03-26
US5480730A (en) 1996-01-02
EP0475145A1 (de) 1992-03-18
US5364707A (en) 1994-11-15

Similar Documents

Publication Publication Date Title
DE69131900T2 (de) Delaminierungsbeständiges Metall-film laminat
MY117809A (en) Films with uv blocking characteristics.
ATE57652T1 (de) Flexible polyimid-mehrschichtlaminate.
ZA873509B (en) Multilayer film with better layer adhesion
DE3867414D1 (de) Beschichtetes feinblech.
HU9402344D0 (en) Method of double-sideo printing and product obtained thereby
GB2211137B (en) Laminated metal sheet
ATE302684T1 (de) Verbundplatte
DK0963290T3 (da) Højtemperatur slipfilm
DE69406390D1 (de) Laminat und mehrschichtige leiterplatte
Swisher Metal--Film Laminate Resistant to Delamination
JPS6482928A (en) Flexible laminated plate of metal and plastic
TH6282EX (th) แผ่นโลหะที่ได้ลามิเนทแล้ว
TH6282A (th) แผ่นโลหะที่ได้ลามิเนทแล้ว
IT1313932B1 (it) Struttura differrenziata a sandwich.
JPS63110064U (de)
JPH01117668U (de)
TH6283EX (th) แผ่นโลหะที่ได้ลามิเนทแล้ว

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties