ATE140041T1 - Ätzlösung - Google Patents

Ätzlösung

Info

Publication number
ATE140041T1
ATE140041T1 AT92908839T AT92908839T ATE140041T1 AT E140041 T1 ATE140041 T1 AT E140041T1 AT 92908839 T AT92908839 T AT 92908839T AT 92908839 T AT92908839 T AT 92908839T AT E140041 T1 ATE140041 T1 AT E140041T1
Authority
AT
Austria
Prior art keywords
metal layer
hydrogen
pct
etching solution
etching
Prior art date
Application number
AT92908839T
Other languages
English (en)
Inventor
Walter Dr Stark
Robert Dr Ruprecht
Original Assignee
Karlsruhe Forschzent
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Karlsruhe Forschzent filed Critical Karlsruhe Forschzent
Application granted granted Critical
Publication of ATE140041T1 publication Critical patent/ATE140041T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/20—Acidic compositions for etching aluminium or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/26—Acidic compositions for etching refractory metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
AT92908839T 1991-04-24 1992-04-21 Ätzlösung ATE140041T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4113283A DE4113283C2 (de) 1991-04-24 1991-04-24 Verwendung einer Ätzlösung zum selektiven Abätzen einer metallischen Opferschicht bei der Herstellung von Mikrostrukturen

Publications (1)

Publication Number Publication Date
ATE140041T1 true ATE140041T1 (de) 1996-07-15

Family

ID=6430205

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92908839T ATE140041T1 (de) 1991-04-24 1992-04-21 Ätzlösung

Country Status (6)

Country Link
US (1) US5462640A (de)
EP (1) EP0536362B1 (de)
JP (1) JPH06500363A (de)
AT (1) ATE140041T1 (de)
DE (2) DE4113283C2 (de)
WO (1) WO1992019792A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100661945B1 (ko) * 1999-06-14 2006-12-28 후-쿠 후앙 광 입사에 의해 활성화되는 에너지 레벨 전이에 기초하는 전자기파 방사 장치 및 방법
DE10313887A1 (de) * 2003-03-27 2004-10-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum selektiven Gewinnen von Gold aus goldhaltigen Materialien
WO2008098593A1 (en) * 2007-02-15 2008-08-21 Basf Se Titanium etchant composition
CN114350366B (zh) * 2021-12-09 2023-04-18 湖北兴福电子材料股份有限公司 一种氮化硅与p型多晶硅等速蚀刻液

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2698781A (en) * 1953-04-27 1955-01-04 Enthone Accelerating action of acids on metals
US3163524A (en) * 1957-09-27 1964-12-29 Eltex Chemical Corp Selective stripping of electroplated metals
US3666580A (en) * 1969-03-20 1972-05-30 Armco Steel Corp Chemical milling method and bath
US3677949A (en) * 1970-09-04 1972-07-18 Enthone Selectively stripping tin and/or lead from copper substrates
US4004956A (en) * 1974-08-14 1977-01-25 Enthone, Incorporated Selectively stripping tin or tin-lead alloys from copper substrates
US4042451A (en) * 1975-08-05 1977-08-16 M&T Chemicals Inc. Selected stripping of nickel-iron alloys from ferrous substrates
JPS5610396A (en) * 1979-07-07 1981-02-02 Nobuo Miyazawa Additive for acid bath for descaling of stainless steel
CA1185152A (en) * 1982-01-22 1985-04-09 Thomas W. Bleeks Selective chemical removal of hard surface coatings from superalloy substrates
US4548903A (en) * 1984-03-30 1985-10-22 The United States Of America As Represented By The Secretary Of The Air Force Method to reveal microstructures in single phase alloys
DE3414383C2 (de) * 1984-04-16 1986-09-04 MTU Motoren- und Turbinen-Union München GmbH, 8000 München Verfahren zum chemischen Abtragen von Aluminiumdiffusionsschichten
US4687545A (en) * 1986-06-18 1987-08-18 Macdermid, Incorporated Process for stripping tin or tin-lead alloy from copper
JPH0375386A (ja) * 1989-08-18 1991-03-29 Metsuku Kk 錫又は錫‐鉛合金の剥離方法

Also Published As

Publication number Publication date
EP0536362A1 (de) 1993-04-14
JPH06500363A (ja) 1994-01-13
US5462640A (en) 1995-10-31
WO1992019792A1 (de) 1992-11-12
DE4113283C2 (de) 1994-05-05
EP0536362B1 (de) 1996-07-03
DE59206696D1 (de) 1996-08-08
DE4113283A1 (de) 1992-10-29

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee