AT522945A3 - Verfahren und Testsystem zur Qualitätsbestimmung einer optischen Projektionseinheit - Google Patents
Verfahren und Testsystem zur Qualitätsbestimmung einer optischen Projektionseinheit Download PDFInfo
- Publication number
- AT522945A3 AT522945A3 ATA50724/2020A AT507242020A AT522945A3 AT 522945 A3 AT522945 A3 AT 522945A3 AT 507242020 A AT507242020 A AT 507242020A AT 522945 A3 AT522945 A3 AT 522945A3
- Authority
- AT
- Austria
- Prior art keywords
- projection unit
- quality
- optical projection
- test system
- parameter
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0221—Testing optical properties by determining the optical axis or position of lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0285—Testing optical properties by measuring material or chromatic transmission properties
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
- G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
- G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F18/00—Pattern recognition
- G06F18/20—Analysing
- G06F18/24—Classification techniques
- G06F18/243—Classification techniques relating to the number of classes
- G06F18/2431—Multiple classes
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/04—Architecture, e.g. interconnection topology
- G06N3/045—Combinations of networks
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
- G06N3/00—Computing arrangements based on biological models
- G06N3/02—Neural networks
- G06N3/08—Learning methods
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
- G01N2021/9583—Lenses
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20081—Training; Learning
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20084—Artificial neural networks [ANN]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30168—Image quality inspection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geometry (AREA)
- Theoretical Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Data Mining & Analysis (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Evolutionary Computation (AREA)
- General Engineering & Computer Science (AREA)
- Artificial Intelligence (AREA)
- Optics & Photonics (AREA)
- Biophysics (AREA)
- Molecular Biology (AREA)
- Computing Systems (AREA)
- Mathematical Physics (AREA)
- Software Systems (AREA)
- Biomedical Technology (AREA)
- Computational Linguistics (AREA)
- Textile Engineering (AREA)
- Signal Processing (AREA)
- Evolutionary Biology (AREA)
- Quality & Reliability (AREA)
- Bioinformatics & Cheminformatics (AREA)
- Bioinformatics & Computational Biology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Ein Verfahren zur Bewertung der Qualität einer mehrkanaligen mikro- und/oder subwellenlängenoptischen Projektionseinheit (28) ist offenbart. Das Verfahren umfasst die folgenden Schritte: Wenigstens ein vorgegebener Abschnitt der optischen Projektionseinheit (28) wird so beleuchtet, dass von wenigstens zwei Kanälen des vorgegebenen Abschnitts der mehrkanaligen optischen Projektionseinheit (28) ein Bild erzeugt wird. Anhand der Analyse des Bildes wird wenigstens eine Kenngröße bestimmt, wobei ein Wert der Kenngröße einem charakteristischen Merkmal der Projektionseinheit (28), einem Defekt der Projektionseinheit (28) und/oder einer Defektklasse der Projektionseinheit (28) zugeordnet wird. Die Qualität der Projektionseinheit (28) wird anhand der wenigstens einen Kenngröße bewertet. Des Weiteren sind ein Prüfsystem (10) zur Bewertung der Qualität einer mehrkanaligen mikro- und/oder subwellenlängenoptischen Projektionseinheit (28) sowie ein Computerprogramm offenbart.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL2023747A NL2023747B1 (en) | 2019-09-02 | 2019-09-02 | Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit |
Publications (3)
Publication Number | Publication Date |
---|---|
AT522945A2 AT522945A2 (de) | 2021-03-15 |
AT522945A3 true AT522945A3 (de) | 2021-06-15 |
AT522945B1 AT522945B1 (de) | 2021-08-15 |
Family
ID=68582293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ATA50724/2020A AT522945B1 (de) | 2019-09-02 | 2020-08-27 | Verfahren und Testsystem zur Qualitätsbestimmung einer optischen Projektionseinheit |
Country Status (11)
Country | Link |
---|---|
US (1) | US11630026B2 (de) |
JP (1) | JP2021047179A (de) |
KR (1) | KR20210028119A (de) |
CN (1) | CN112525490A (de) |
AT (1) | AT522945B1 (de) |
BE (1) | BE1027491B1 (de) |
DE (1) | DE102020122666A1 (de) |
FR (1) | FR3100331B1 (de) |
NL (1) | NL2023747B1 (de) |
SG (1) | SG10202008528YA (de) |
TW (1) | TW202122773A (de) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021139718A (ja) * | 2020-03-04 | 2021-09-16 | 日本発條株式会社 | 検査システムの点検方法、検査システム、およびコンピュータプログラム。 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10348509A1 (de) * | 2003-10-18 | 2005-05-19 | Carl Zeiss Jena Gmbh | Wellenfrontsensor |
US20090251689A1 (en) * | 2008-04-02 | 2009-10-08 | National Taiwan University | Lens measuring device and method applied therein |
DE102017118355A1 (de) * | 2017-08-11 | 2019-02-14 | Gom Gmbh | Vorrichtung und Verfahren für die flächenhafte optische 3D-Messtechnik |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59224537A (ja) * | 1983-06-03 | 1984-12-17 | Matsushita Electric Ind Co Ltd | 投影試験装置 |
US5286338A (en) * | 1993-03-01 | 1994-02-15 | At&T Bell Laboratories | Methods for making microlens arrays |
US7289655B2 (en) * | 2001-08-29 | 2007-10-30 | Seiko Epson Corporation | Device for inspecting illumination optical device and method for inspecting illumination optical device |
JP4882529B2 (ja) * | 2005-08-26 | 2012-02-22 | セイコーエプソン株式会社 | 欠陥検出方法および欠陥検出装置 |
JP4539650B2 (ja) * | 2006-12-26 | 2010-09-08 | セイコーエプソン株式会社 | 光学系の光学特性評価方法、プロジェクタの光学特性評価方法、光学特性評価装置、およびスクリーン |
JP2008171142A (ja) * | 2007-01-10 | 2008-07-24 | Seiko Epson Corp | シミ欠陥検出方法及び装置 |
JP2008170325A (ja) * | 2007-01-12 | 2008-07-24 | Seiko Epson Corp | シミ欠陥検出方法およびシミ欠陥検出装置 |
JP5256899B2 (ja) * | 2008-07-18 | 2013-08-07 | セイコーエプソン株式会社 | 画像補正装置、画像補正方法、プロジェクタおよびプロジェクションシステム |
TWI439788B (zh) * | 2010-01-04 | 2014-06-01 | Ind Tech Res Inst | 投影校正系統及方法 |
JP5338718B2 (ja) * | 2010-02-26 | 2013-11-13 | セイコーエプソン株式会社 | 補正情報算出装置、画像処理装置、画像表示システム、および画像補正方法 |
JP5604909B2 (ja) * | 2010-02-26 | 2014-10-15 | セイコーエプソン株式会社 | 補正情報算出装置、画像処理装置、画像表示システム、および画像補正方法 |
CN102494873B (zh) * | 2011-11-20 | 2014-05-07 | 中国科学院光电技术研究所 | 一种微透镜阵列焦距的测量方法 |
KR101396959B1 (ko) * | 2013-04-23 | 2014-05-19 | 아이리얼 주식회사 | 렌즈 어레이 검사시스템 및 그를 이용한 성능분석방법 |
KR101704859B1 (ko) * | 2013-06-18 | 2017-02-08 | 주식회사 엘지화학 | 마이크로렌즈의 초점 거리 측정 방법 및 초점 거리 측정 장치 |
JP6289003B2 (ja) * | 2013-09-26 | 2018-03-07 | キヤノン株式会社 | 情報処理装置及びその制御方法、プログラム |
KR20150099956A (ko) * | 2014-02-24 | 2015-09-02 | 라온피플 주식회사 | 렌즈 검사 장치 |
KR20160149883A (ko) * | 2015-06-19 | 2016-12-28 | 티클로버(주) | 렌즈 결함 검사 장치 |
WO2016207703A1 (en) * | 2015-06-23 | 2016-12-29 | Bosch Car Multimedia Portugal, S.A. | Apparatus and method for detection of pixel or sub-pixel functional defects of an image display |
KR20180030297A (ko) * | 2016-09-12 | 2018-03-22 | 삼성디스플레이 주식회사 | 마이크로 렌즈 어레이의 특성 측정 장치 및 그 장치를 이용한 마이크로 렌즈 어레이의 특성 측정 방법 |
TWI644098B (zh) * | 2017-01-05 | 2018-12-11 | 國立臺灣師範大學 | 透明基板之瑕疵檢測方法與裝置 |
JP2018124441A (ja) * | 2017-02-01 | 2018-08-09 | キヤノン株式会社 | システム、情報処理装置、情報処理方法及びプログラム |
JP2019120749A (ja) * | 2017-12-28 | 2019-07-22 | キヤノン株式会社 | 表示制御装置、画像投影システム、制御方法およびプログラム |
JP7228966B2 (ja) * | 2018-06-29 | 2023-02-27 | キヤノン株式会社 | 画像処理装置及びその制御方法及びプログラム |
CN111816103A (zh) * | 2019-04-10 | 2020-10-23 | 中强光电股份有限公司 | 投影装置及影像调整方法 |
-
2019
- 2019-09-02 NL NL2023747A patent/NL2023747B1/en active
-
2020
- 2020-08-27 AT ATA50724/2020A patent/AT522945B1/de active
- 2020-08-28 KR KR1020200109234A patent/KR20210028119A/ko active Search and Examination
- 2020-08-31 DE DE102020122666.7A patent/DE102020122666A1/de active Pending
- 2020-08-31 FR FR2008823A patent/FR3100331B1/fr active Active
- 2020-08-31 TW TW109129782A patent/TW202122773A/zh unknown
- 2020-09-01 JP JP2020147060A patent/JP2021047179A/ja active Pending
- 2020-09-01 BE BE20205601A patent/BE1027491B1/de active IP Right Grant
- 2020-09-02 SG SG10202008528YA patent/SG10202008528YA/en unknown
- 2020-09-02 CN CN202010909823.1A patent/CN112525490A/zh active Pending
- 2020-09-02 US US17/010,553 patent/US11630026B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10348509A1 (de) * | 2003-10-18 | 2005-05-19 | Carl Zeiss Jena Gmbh | Wellenfrontsensor |
US20090251689A1 (en) * | 2008-04-02 | 2009-10-08 | National Taiwan University | Lens measuring device and method applied therein |
DE102017118355A1 (de) * | 2017-08-11 | 2019-02-14 | Gom Gmbh | Vorrichtung und Verfahren für die flächenhafte optische 3D-Messtechnik |
Also Published As
Publication number | Publication date |
---|---|
CN112525490A (zh) | 2021-03-19 |
NL2023747B1 (en) | 2021-05-12 |
US20210063863A1 (en) | 2021-03-04 |
FR3100331B1 (fr) | 2023-04-21 |
JP2021047179A (ja) | 2021-03-25 |
KR20210028119A (ko) | 2021-03-11 |
BE1027491A1 (de) | 2021-03-05 |
AT522945A2 (de) | 2021-03-15 |
DE102020122666A1 (de) | 2021-03-04 |
AT522945B1 (de) | 2021-08-15 |
BE1027491B1 (de) | 2021-10-01 |
TW202122773A (zh) | 2021-06-16 |
FR3100331A1 (fr) | 2021-03-05 |
SG10202008528YA (en) | 2021-04-29 |
US11630026B2 (en) | 2023-04-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP2095238B1 (de) | Verfahren zum testen eines computerprogramms | |
US9582872B2 (en) | Optical film defect detection method and system thereof | |
EP2579601A3 (de) | Verfahren und Vorrichtung zum Ermitteln eines Kalibrierparameters einer Stereokamera | |
DE102021114967A1 (de) | Werkstückinspektions- und fehlererkennungssystem, das die anzahl der fehlerbilder für das training angibt | |
DE102014110559A1 (de) | Verfahren zur Steuerung eines Gargeräts | |
AT522945A3 (de) | Verfahren und Testsystem zur Qualitätsbestimmung einer optischen Projektionseinheit | |
EP3321668A3 (de) | Verfahren und vorrichtung zur beurteilung der qualität eines längsbewegten strangförmigen gutes | |
WO2018077745A1 (de) | Analyseverfahren für objektmarkierungen in bildern auf basis von modellen | |
JP2006305635A (ja) | X線解析のフレームワーク内での鋳造欠陥の分類方法 | |
DE102013108722B4 (de) | Verfahren und Vorrichtung zum Erfassen von Defekten einer ebenen Oberfläche | |
DE112013002024T5 (de) | Farbsichtinspektionssystem und Verfahren zum Inspizieren eines Fahrzeugs | |
KR101532694B1 (ko) | 인장에 의한 용접 결함 검출 장치 및 방법 | |
EP2406055B1 (de) | Verfahren zum automatisierten nachweis eines defektes an einer oberfläche eines formteils | |
DE102018108771A1 (de) | Vorrichtung und Verfahren zur optimierten Blechprüfung | |
DE19824304A1 (de) | Vorrichtung und Verfahren zur Klassifizierung von Lederstücken | |
DE102016212486A1 (de) | Verfahren und Einrichtung zur Kategorisierung einer Bruchfläche eines Bauteils | |
EP3819623A1 (de) | Verfahren zum konfigurieren eines bildaufnahmesystems einer reifenprüfeinrichtung | |
DE102021210393A1 (de) | Verfahren und Vorrichtung zum Betreiben eines technischen Systems | |
EP3923193A1 (de) | Messung der empfindlichkeit von bildklassifikatoren gegen veränderungen des eingabebildes | |
US20170150064A1 (en) | Full-body image capturing and image processing system and method for its operation | |
DE19737703A1 (de) | Verfahren zur Erkennung, Quantifizierung und Qualifizierung von Fehler und Fehlstellen bei Tierhäuten, sowie Vorrichtung zur Durchführung des Verfahrens | |
DE102016109027A1 (de) | Verfahren zur Lageüberprüfung charakteristischer Punkte in Lichtverteilungen | |
DE102020104959A1 (de) | Verfahren und Vorrichtung zur automatisierten Detektion einer Beeinträchtigung einer Lichtabstrahlung bei einer Beleuchtungsvorrichtung für ein Fahrzeug | |
DE102006048030A1 (de) | Vorrichtung und Verfahren zur Ermittlung von Spaltmaß und Bündigkeit angrenzender Bauteile | |
WO2021100243A1 (ja) | Ai外観検査方法、その装置及びそのコンピュータ用のプログラム |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Change of the owner |
Owner name: SUSS MICROOPTICS SA, CH Effective date: 20220427 |