SG10202008528YA - Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit - Google Patents

Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Info

Publication number
SG10202008528YA
SG10202008528YA SG10202008528YA SG10202008528YA SG10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA
Authority
SG
Singapore
Prior art keywords
subwavelength
assessing
quality
test system
projection unit
Prior art date
Application number
SG10202008528YA
Other languages
English (en)
Inventor
Isabel Agireen
Katrin Schindler
Wilfried Noell
Sophiane Tournois
Susanne Westenhöfer
Original Assignee
Suss Microtec Lithography Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suss Microtec Lithography Gmbh filed Critical Suss Microtec Lithography Gmbh
Publication of SG10202008528YA publication Critical patent/SG10202008528YA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0221—Testing optical properties by determining the optical axis or position of lenses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0285—Testing optical properties by measuring material or chromatic transmission properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G06F18/24—Classification techniques
    • G06F18/243—Classification techniques relating to the number of classes
    • G06F18/2431—Multiple classes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/04—Architecture, e.g. interconnection topology
    • G06N3/045—Combinations of networks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00—Computing arrangements based on biological models
    • G06N3/02—Neural networks
    • G06N3/08—Learning methods
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G01N2021/9583—Lenses
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20081—Training; Learning
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20084—Artificial neural networks [ANN]
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30168—Image quality inspection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geometry (AREA)
  • Theoretical Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Data Mining & Analysis (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Artificial Intelligence (AREA)
  • Mathematical Physics (AREA)
  • Computing Systems (AREA)
  • Computational Linguistics (AREA)
  • Software Systems (AREA)
  • Biomedical Technology (AREA)
  • Molecular Biology (AREA)
  • Optics & Photonics (AREA)
  • Biophysics (AREA)
  • Signal Processing (AREA)
  • Textile Engineering (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Quality & Reliability (AREA)
  • Evolutionary Biology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG10202008528YA 2019-09-02 2020-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit SG10202008528YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2023747A NL2023747B1 (en) 2019-09-02 2019-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Publications (1)

Publication Number Publication Date
SG10202008528YA true SG10202008528YA (en) 2021-04-29

Family

ID=68582293

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202008528YA SG10202008528YA (en) 2019-09-02 2020-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Country Status (11)

Country Link
US (1) US11630026B2 (de)
JP (1) JP2021047179A (de)
KR (1) KR20210028119A (de)
CN (1) CN112525490A (de)
AT (1) AT522945B1 (de)
BE (1) BE1027491B1 (de)
DE (1) DE102020122666A1 (de)
FR (1) FR3100331B1 (de)
NL (1) NL2023747B1 (de)
SG (1) SG10202008528YA (de)
TW (1) TW202122773A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021139718A (ja) * 2020-03-04 2021-09-16 日本発條株式会社 検査システムの点検方法、検査システム、およびコンピュータプログラム。

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59224537A (ja) * 1983-06-03 1984-12-17 Matsushita Electric Ind Co Ltd 投影試験装置
US5286338A (en) * 1993-03-01 1994-02-15 At&T Bell Laboratories Methods for making microlens arrays
US7289655B2 (en) * 2001-08-29 2007-10-30 Seiko Epson Corporation Device for inspecting illumination optical device and method for inspecting illumination optical device
DE10348509A1 (de) * 2003-10-18 2005-05-19 Carl Zeiss Jena Gmbh Wellenfrontsensor
JP4882529B2 (ja) * 2005-08-26 2012-02-22 セイコーエプソン株式会社 欠陥検出方法および欠陥検出装置
JP4539650B2 (ja) * 2006-12-26 2010-09-08 セイコーエプソン株式会社 光学系の光学特性評価方法、プロジェクタの光学特性評価方法、光学特性評価装置、およびスクリーン
JP2008171142A (ja) * 2007-01-10 2008-07-24 Seiko Epson Corp シミ欠陥検出方法及び装置
JP2008170325A (ja) * 2007-01-12 2008-07-24 Seiko Epson Corp シミ欠陥検出方法およびシミ欠陥検出装置
TWI361269B (en) * 2008-04-02 2012-04-01 Univ Nat Taiwan Lens measurement device and method for measuring lens
JP5256899B2 (ja) * 2008-07-18 2013-08-07 セイコーエプソン株式会社 画像補正装置、画像補正方法、プロジェクタおよびプロジェクションシステム
TWI439788B (zh) * 2010-01-04 2014-06-01 Ind Tech Res Inst 投影校正系統及方法
JP5338718B2 (ja) * 2010-02-26 2013-11-13 セイコーエプソン株式会社 補正情報算出装置、画像処理装置、画像表示システム、および画像補正方法
JP5604909B2 (ja) * 2010-02-26 2014-10-15 セイコーエプソン株式会社 補正情報算出装置、画像処理装置、画像表示システム、および画像補正方法
CN102494873B (zh) * 2011-11-20 2014-05-07 中国科学院光电技术研究所 一种微透镜阵列焦距的测量方法
KR101396959B1 (ko) * 2013-04-23 2014-05-19 아이리얼 주식회사 렌즈 어레이 검사시스템 및 그를 이용한 성능분석방법
KR101704859B1 (ko) * 2013-06-18 2017-02-08 주식회사 엘지화학 마이크로렌즈의 초점 거리 측정 방법 및 초점 거리 측정 장치
JP6289003B2 (ja) * 2013-09-26 2018-03-07 キヤノン株式会社 情報処理装置及びその制御方法、プログラム
KR20150099956A (ko) * 2014-02-24 2015-09-02 라온피플 주식회사 렌즈 검사 장치
KR20160149883A (ko) * 2015-06-19 2016-12-28 티클로버(주) 렌즈 결함 검사 장치
WO2016207703A1 (en) * 2015-06-23 2016-12-29 Bosch Car Multimedia Portugal, S.A. Apparatus and method for detection of pixel or sub-pixel functional defects of an image display
KR20180030297A (ko) * 2016-09-12 2018-03-22 삼성디스플레이 주식회사 마이크로 렌즈 어레이의 특성 측정 장치 및 그 장치를 이용한 마이크로 렌즈 어레이의 특성 측정 방법
TWI644098B (zh) * 2017-01-05 2018-12-11 國立臺灣師範大學 透明基板之瑕疵檢測方法與裝置
JP2018124441A (ja) * 2017-02-01 2018-08-09 キヤノン株式会社 システム、情報処理装置、情報処理方法及びプログラム
DE102017118355A1 (de) * 2017-08-11 2019-02-14 Gom Gmbh Vorrichtung und Verfahren für die flächenhafte optische 3D-Messtechnik
JP2019120749A (ja) * 2017-12-28 2019-07-22 キヤノン株式会社 表示制御装置、画像投影システム、制御方法およびプログラム
JP7228966B2 (ja) * 2018-06-29 2023-02-27 キヤノン株式会社 画像処理装置及びその制御方法及びプログラム
CN111816103A (zh) * 2019-04-10 2020-10-23 中强光电股份有限公司 投影装置及影像调整方法

Also Published As

Publication number Publication date
KR20210028119A (ko) 2021-03-11
CN112525490A (zh) 2021-03-19
AT522945A3 (de) 2021-06-15
DE102020122666A1 (de) 2021-03-04
AT522945B1 (de) 2021-08-15
BE1027491B1 (de) 2021-10-01
TW202122773A (zh) 2021-06-16
BE1027491A1 (de) 2021-03-05
NL2023747B1 (en) 2021-05-12
US20210063863A1 (en) 2021-03-04
FR3100331A1 (fr) 2021-03-05
JP2021047179A (ja) 2021-03-25
FR3100331B1 (fr) 2023-04-21
US11630026B2 (en) 2023-04-18
AT522945A2 (de) 2021-03-15

Similar Documents

Publication Publication Date Title
IL281673A (en) Methods, devices and systems for testing and measuring eyes
EP3909286A4 (de) Verfahren und vorrichtung zur frühzeitigen messkonfiguration
GB2587042B (en) Method for optical measurement
GB2595390B (en) System for assessing vocal presentation
EP3883313A4 (de) Verfahren und vorrichtung zur bestimmung eines quasi-kollokationsreferenzsignals
EP3769442A4 (de) Verfahren und vorrichtung für referenzsignal für messungen
EP4027716A4 (de) Verfahren und vorrichtungen zur bestimmung der referenzsignalkonfiguration
EP4027532A4 (de) Strahlanzeigeverfahren und -vorrichtung
EP3764882A4 (de) Geräte und verfahren zur prädiktiven qualitätskontrolle in diagnostischen testsystemen
EP4013177A4 (de) Verfahren und vorrichtung zur anzeige eines referenzsignals
KR102067412B9 (ko) 치매 평가 방법 및 이를 이용한 장치
PL4072808T3 (pl) Wspomagany komputerowo sposób i układ do badania jakości betonu licowego
HUE065613T2 (hu) Eljárás minõségi hibák elemzésére
GB201914091D0 (en) Test Apparatus
EP4068892A4 (de) Verfahren und vorrichtung zur festlegung eines referenzsignals
IL290326A (en) Method and systems for diagnosing infertility
IL287898A (en) A method and system for inspecting work pieces
SG10202008528YA (en) Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit
GB201901644D0 (en) Testing system and method
GB201900789D0 (en) Method for testing time distribution
KR102236826B9 (ko) 기계학습용 의료 영상 데이터셋의 품질을 평가하는 방법 및 시스템
GB201914724D0 (en) Method and apparatus for clinical testing
GB2586883B (en) Shearography inspection apparatus
GB201900835D0 (en) Test apparatus
EP4038573A4 (de) Inspektionsverfahren und -vorrichtung