SG10202008528YA - Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit - Google Patents

Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Info

Publication number
SG10202008528YA
SG10202008528YA SG10202008528YA SG10202008528YA SG10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA SG 10202008528Y A SG10202008528Y A SG 10202008528YA
Authority
SG
Singapore
Prior art keywords
subwavelength
assessing
quality
test system
projection unit
Prior art date
Application number
SG10202008528YA
Inventor
Isabel Agireen
Katrin Schindler
Wilfried Noell
Sophiane Tournois
Susanne Westenhöfer
Original Assignee
Suss Microtec Lithography Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suss Microtec Lithography Gmbh filed Critical Suss Microtec Lithography Gmbh
Publication of SG10202008528YA publication Critical patent/SG10202008528YA/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/14Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0221Testing optical properties by determining the optical axis or position of lenses
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0242Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0278Detecting defects of the object to be tested, e.g. scratches or dust
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02Testing optical properties
    • G01M11/0285Testing optical properties by measuring material or chromatic transmission properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95692Patterns showing hole parts, e.g. honeycomb filtering structures
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • G02B3/0056Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00Pattern recognition
    • G06F18/20Analysing
    • G06F18/24Classification techniques
    • G06F18/243Classification techniques relating to the number of classes
    • G06F18/2431Multiple classes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06NCOMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00Computing arrangements based on biological models
    • G06N3/02Neural networks
    • G06N3/04Architecture, e.g. interconnection topology
    • G06N3/045Combinations of networks
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06NCOMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N3/00Computing arrangements based on biological models
    • G06N3/02Neural networks
    • G06N3/08Learning methods
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
    • G06T7/0004Industrial image inspection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens
    • G01N2021/9583Lenses
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20081Training; Learning
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/20Special algorithmic details
    • G06T2207/20084Artificial neural networks [ANN]
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30168Image quality inspection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geometry (AREA)
  • Theoretical Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Data Mining & Analysis (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Artificial Intelligence (AREA)
  • Mathematical Physics (AREA)
  • Biophysics (AREA)
  • Computational Linguistics (AREA)
  • Software Systems (AREA)
  • Biomedical Technology (AREA)
  • Molecular Biology (AREA)
  • Computing Systems (AREA)
  • Optics & Photonics (AREA)
  • Textile Engineering (AREA)
  • Signal Processing (AREA)
  • Quality & Reliability (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Evolutionary Biology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG10202008528YA 2019-09-02 2020-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit SG10202008528YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2023747A NL2023747B1 (en) 2019-09-02 2019-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Publications (1)

Publication Number Publication Date
SG10202008528YA true SG10202008528YA (en) 2021-04-29

Family

ID=68582293

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202008528YA SG10202008528YA (en) 2019-09-02 2020-09-02 Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit

Country Status (11)

Country Link
US (1) US11630026B2 (en)
JP (1) JP2021047179A (en)
KR (1) KR20210028119A (en)
CN (1) CN112525490A (en)
AT (1) AT522945B1 (en)
BE (1) BE1027491B1 (en)
DE (1) DE102020122666A1 (en)
FR (1) FR3100331B1 (en)
NL (1) NL2023747B1 (en)
SG (1) SG10202008528YA (en)
TW (1) TW202122773A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021139718A (en) * 2020-03-04 2021-09-16 日本発條株式会社 Method for checking inspection system, inspection system, and computer program

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59224537A (en) * 1983-06-03 1984-12-17 Matsushita Electric Ind Co Ltd Projection testing device
US5286338A (en) * 1993-03-01 1994-02-15 At&T Bell Laboratories Methods for making microlens arrays
US7289655B2 (en) * 2001-08-29 2007-10-30 Seiko Epson Corporation Device for inspecting illumination optical device and method for inspecting illumination optical device
DE10348509A1 (en) * 2003-10-18 2005-05-19 Carl Zeiss Jena Gmbh Determining image errors by computing test object Zernike coefficients involves detecting pupil edge according to position, size in computer system in addition to wavefront measurement by evaluating light from object recorded by CCD camera
JP4882529B2 (en) * 2005-08-26 2012-02-22 セイコーエプソン株式会社 Defect detection method and defect detection apparatus
JP4539650B2 (en) * 2006-12-26 2010-09-08 セイコーエプソン株式会社 Optical characteristic evaluation method for optical system, optical characteristic evaluation method for projector, optical characteristic evaluation apparatus, and screen
JP2008171142A (en) * 2007-01-10 2008-07-24 Seiko Epson Corp Spot defect detection method and device
JP2008170325A (en) * 2007-01-12 2008-07-24 Seiko Epson Corp Stain flaw detection method and stain flaw detection device
TWI361269B (en) * 2008-04-02 2012-04-01 Univ Nat Taiwan Lens measurement device and method for measuring lens
JP5256899B2 (en) * 2008-07-18 2013-08-07 セイコーエプソン株式会社 Image correction apparatus, image correction method, projector and projection system
TWI439788B (en) * 2010-01-04 2014-06-01 Ind Tech Res Inst System and method for projection correction
JP5604909B2 (en) * 2010-02-26 2014-10-15 セイコーエプソン株式会社 Correction information calculation apparatus, image processing apparatus, image display system, and image correction method
JP5338718B2 (en) * 2010-02-26 2013-11-13 セイコーエプソン株式会社 Correction information calculation apparatus, image processing apparatus, image display system, and image correction method
CN102494873B (en) * 2011-11-20 2014-05-07 中国科学院光电技术研究所 Method for measuring focal length of micro-lens array
KR101396959B1 (en) * 2013-04-23 2014-05-19 아이리얼 주식회사 Lens array test system and performance analysis method thereof
KR101704859B1 (en) * 2013-06-18 2017-02-08 주식회사 엘지화학 Focus distance measurement method and apparatus of microlens
JP6289003B2 (en) * 2013-09-26 2018-03-07 キヤノン株式会社 Information processing apparatus, control method therefor, and program
KR20150099956A (en) * 2014-02-24 2015-09-02 라온피플 주식회사 Lens inspection apparatus
KR20160149883A (en) * 2015-06-19 2016-12-28 티클로버(주) An apparatus for inspecting a lens defect
WO2016207703A1 (en) * 2015-06-23 2016-12-29 Bosch Car Multimedia Portugal, S.A. Apparatus and method for detection of pixel or sub-pixel functional defects of an image display
KR20180030297A (en) * 2016-09-12 2018-03-22 삼성디스플레이 주식회사 Characteristics measurement device of micro lens array and characteristics measurement method using the device
TWI644098B (en) * 2017-01-05 2018-12-11 國立臺灣師範大學 Method and apparatus for defect inspection of transparent substrate
JP2018124441A (en) * 2017-02-01 2018-08-09 キヤノン株式会社 System, information processing apparatus, information processing method, and program
DE102017118355A1 (en) * 2017-08-11 2019-02-14 Gom Gmbh Device and method for the planar 3D optical metrology
JP2019120749A (en) * 2017-12-28 2019-07-22 キヤノン株式会社 Display controller, image projection system, control method and program
JP7228966B2 (en) * 2018-06-29 2023-02-27 キヤノン株式会社 Image processing device and its control method and program
CN111816103A (en) * 2019-04-10 2020-10-23 中强光电股份有限公司 Projection device and image adjusting method

Also Published As

Publication number Publication date
BE1027491B1 (en) 2021-10-01
FR3100331A1 (en) 2021-03-05
DE102020122666A1 (en) 2021-03-04
AT522945B1 (en) 2021-08-15
JP2021047179A (en) 2021-03-25
NL2023747B1 (en) 2021-05-12
BE1027491A1 (en) 2021-03-05
KR20210028119A (en) 2021-03-11
AT522945A3 (en) 2021-06-15
TW202122773A (en) 2021-06-16
CN112525490A (en) 2021-03-19
US11630026B2 (en) 2023-04-18
US20210063863A1 (en) 2021-03-04
FR3100331B1 (en) 2023-04-21
AT522945A2 (en) 2021-03-15

Similar Documents

Publication Publication Date Title
IL281673A (en) Methods, apparatus, and systems for ophthalmic testing and measurement
EP3909286A4 (en) Method and apparatus for early measurement configuration
GB2587042B (en) Method for optical measurement
EP3769442A4 (en) Method and apparatus for reference signal for measurements
GB2595390B (en) System for assessing vocal presentation
EP3883313A4 (en) Method and apparatus for determining quasi-co-location reference signal
EP4027532A4 (en) Beam indication method and apparatus
EP3764882A4 (en) Predictive quality control apparatus and methods in diagnostic testing systems
EP4013177A4 (en) Reference signal indication method and apparatus
PL4072808T3 (en) Computer-assisted method and device for testing the quality of exposed concrete
GB202014261D0 (en) Measurement method and apparatus
GB201914091D0 (en) Test Apparatus
IL287898A (en) Workpiece testing method and system
SG10202008528YA (en) Method and test system for assessing the quality of a multi-channel micro- and/or subwavelength-optical projection unit
GB201901644D0 (en) Testing system and method
KR102236826B9 (en) The Method and System for Evaluating the Quality of Medical Image dataset for Machine Learning
GB201914724D0 (en) Method and apparatus for clinical testing
PT3966646T (en) Method for analysing quality defects
EP4068892A4 (en) Method and apparatus for determining reference signal
GB2586883B (en) Shearography inspection apparatus
GB201900835D0 (en) Test apparatus
SG11202011333WA (en) Method and apparatus for calculating downmixed signal and residual signal
EP3776927A4 (en) Apparatus and method for providing measurement information
GB201900789D0 (en) Method for testing time distribution
SG11202007487UA (en) Testing method for determining oral indicator