AT216539B - Kopiermaterial, insbesondere für Druckformen - Google Patents
Kopiermaterial, insbesondere für DruckformenInfo
- Publication number
- AT216539B AT216539B AT22060A AT22060A AT216539B AT 216539 B AT216539 B AT 216539B AT 22060 A AT22060 A AT 22060A AT 22060 A AT22060 A AT 22060A AT 216539 B AT216539 B AT 216539B
- Authority
- AT
- Austria
- Prior art keywords
- parts
- solution
- naphthoquinone
- copying
- glycol monomethyl
- Prior art date
Links
- 238000007639 printing Methods 0.000 title claims description 14
- 239000000463 material Substances 0.000 title claims description 4
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims description 13
- 150000002148 esters Chemical class 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 229920005989 resin Polymers 0.000 claims description 9
- 239000011347 resin Substances 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 2
- 235000010290 biphenyl Nutrition 0.000 claims 1
- 239000004305 biphenyl Substances 0.000 claims 1
- 125000006267 biphenyl group Chemical group 0.000 claims 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000001488 sodium phosphate Substances 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 239000011888 foil Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- -1 sulfonic acid chlorides Chemical class 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 240000001624 Espostoa lanata Species 0.000 description 4
- 235000009161 Espostoa lanata Nutrition 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 4
- 229910000397 disodium phosphate Inorganic materials 0.000 description 4
- 235000019800 disodium phosphate Nutrition 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 235000019198 oils Nutrition 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical class OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 3
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 3
- 239000005457 ice water Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000155 melt Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 3
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 3
- 235000019801 trisodium phosphate Nutrition 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 239000002285 corn oil Substances 0.000 description 1
- 235000005687 corn oil Nutrition 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 159000000011 group IA salts Chemical class 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical class OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229940052224 rosaniline hydrochloride Drugs 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052572 stoneware Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N sulfurochloridic acid Chemical compound OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK36733A DE1109521B (de) | 1959-01-15 | 1959-01-15 | Lichtempfindliche Schichten fuer die Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT216539B true AT216539B (de) | 1961-08-10 |
Family
ID=7220781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT22060A AT216539B (de) | 1959-01-15 | 1960-01-13 | Kopiermaterial, insbesondere für Druckformen |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3130047A (en, 2012) |
| AT (1) | AT216539B (en, 2012) |
| BE (1) | BE586560A (en, 2012) |
| CH (1) | CH383774A (en, 2012) |
| DE (1) | DE1109521B (en, 2012) |
| FR (1) | FR1245318A (en, 2012) |
| GB (1) | GB937123A (en, 2012) |
| NL (2) | NL247405A (en, 2012) |
| SE (1) | SE302886B (en, 2012) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL130926C (en, 2012) * | 1959-09-04 | |||
| NL138044C (en, 2012) * | 1961-07-28 | |||
| GB1052699A (en, 2012) * | 1963-12-03 | |||
| GB1143679A (en, 2012) * | 1965-05-22 | 1900-01-01 | ||
| US3635709A (en) * | 1966-12-15 | 1972-01-18 | Polychrome Corp | Light-sensitive lithographic plate |
| US3920455A (en) * | 1971-05-28 | 1975-11-18 | Polychrome Corp | Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters |
| BE795755A (fr) * | 1972-02-24 | 1973-08-21 | Kalle Ag | Procede de fabrication de formes d'impression offset |
| US4174222A (en) * | 1975-05-24 | 1979-11-13 | Tokyo Ohka Kogyo Kabushiki Kaisha | Positive-type O-quinone diazide containing photoresist compositions |
| DE2742631A1 (de) * | 1977-09-22 | 1979-04-05 | Hoechst Ag | Lichtempfindliche kopiermasse |
| DE3040157A1 (de) * | 1980-10-24 | 1982-06-03 | Hoechst Ag, 6000 Frankfurt | Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial |
| IT1169682B (it) * | 1983-11-08 | 1987-06-03 | I M G Ind Materiali Grafici Sp | Composizione per fotoriproduzioni |
| US4684597A (en) * | 1985-10-25 | 1987-08-04 | Eastman Kodak Company | Non-precipitating quinone diazide polymer containing photoresist composition with o-quinone diazide trisester as dissolution inhibitor |
| DE3686032T2 (de) * | 1985-12-27 | 1993-02-18 | Japan Synthetic Rubber Co Ltd | Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung. |
| DE3635303A1 (de) | 1986-10-17 | 1988-04-28 | Hoechst Ag | Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten |
| JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
| DE3718416A1 (de) * | 1987-06-02 | 1988-12-15 | Hoechst Ag | Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung |
| US4797345A (en) * | 1987-07-01 | 1989-01-10 | Olin Hunt Specialty Products, Inc. | Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures |
| DE3729035A1 (de) * | 1987-08-31 | 1989-03-09 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial |
| US5219701A (en) * | 1988-03-31 | 1993-06-15 | Ciba-Geigy Corporation | Positive photoresist containing 1,2-naphthoquinone-diazide-5-sulfonyl tris ester of 1,3,5-trihydroxybenzene and aromatic hydroxy compound sensitizer |
| DE3811040A1 (de) * | 1988-03-31 | 1989-10-19 | Ciba Geigy Ag | Im nahen uv hochaufloesende positiv-fotoresists |
| DE4134526A1 (de) * | 1990-10-18 | 1992-05-14 | Toyo Gosei Kogyo Kk | Positive photoresist-zusammensetzung und mustererzeugungsverfahren unter verwendung dieser zusammensetzung |
| JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
| GB9326150D0 (en) * | 1993-12-22 | 1994-02-23 | Alcan Int Ltd | Electrochemical roughening method |
| US5552256A (en) * | 1994-09-29 | 1996-09-03 | International Business Machines Corporation | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring |
| JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| US5853947A (en) * | 1995-12-21 | 1998-12-29 | Clariant Finance (Bvi) Limited | Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate |
| US6852465B2 (en) * | 2003-03-21 | 2005-02-08 | Clariant International Ltd. | Photoresist composition for imaging thick films |
| US7255970B2 (en) * | 2005-07-12 | 2007-08-14 | Az Electronic Materials Usa Corp. | Photoresist composition for imaging thick films |
| US20070105040A1 (en) * | 2005-11-10 | 2007-05-10 | Toukhy Medhat A | Developable undercoating composition for thick photoresist layers |
| US20130108956A1 (en) | 2011-11-01 | 2013-05-02 | Az Electronic Materials Usa Corp. | Nanocomposite positive photosensitive composition and use thereof |
| WO2024223739A1 (en) | 2023-04-27 | 2024-10-31 | Merck Patent Gmbh | Photoactive compounds |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2138809A (en) * | 1936-03-12 | 1938-11-29 | Socony Vacuum Oil Co Inc | Acylated condensation products and method of making them |
| BE510151A (en, 2012) * | 1949-07-23 | |||
| NL77540C (en, 2012) * | 1950-12-23 | |||
| NL185407B (nl) * | 1953-03-11 | Mitsui Petrochemical Ind | Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze. |
-
0
- NL NL130027D patent/NL130027C/xx active
- NL NL247405D patent/NL247405A/xx unknown
-
1959
- 1959-01-15 DE DEK36733A patent/DE1109521B/de active Pending
-
1960
- 1960-01-08 GB GB793/60A patent/GB937123A/en not_active Expired
- 1960-01-11 US US1420A patent/US3130047A/en not_active Expired - Lifetime
- 1960-01-12 CH CH27860A patent/CH383774A/de unknown
- 1960-01-13 AT AT22060A patent/AT216539B/de active
- 1960-01-13 SE SE298/60A patent/SE302886B/xx unknown
- 1960-01-14 BE BE586560A patent/BE586560A/fr unknown
- 1960-01-15 FR FR815734A patent/FR1245318A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| SE302886B (en, 2012) | 1968-08-05 |
| CH383774A (de) | 1964-10-31 |
| NL130027C (en, 2012) | |
| BE586560A (fr) | 1960-07-14 |
| US3130047A (en) | 1964-04-21 |
| NL247405A (en, 2012) | |
| DE1109521B (de) | 1961-06-22 |
| FR1245318A (fr) | 1960-11-04 |
| GB937123A (en) | 1963-09-18 |
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| AT216539B (de) | Kopiermaterial, insbesondere für Druckformen | |
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| DE903529C (de) | Lichtempfindliche Schichten | |
| US3046118A (en) | Process of making printing plates and light sensitive material suitable for use therein | |
| DE2147947C2 (de) | Lichtempfindliches Gemisch | |
| DE1124817B (de) | Kopierschichten fuer Druckformen aus Naphthochinon-(1, 2)-diazidsulfonsaeureestern | |
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| DE1422474B2 (de) | Lichtempfindliches Gemisch | |
| DE1114705C2 (de) | Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen | |
| EP0001254A1 (de) | Positiv arbeitende lichtempfindliche Kopiermasse enthaltend ein halogeniertes Naphthochinondiazid | |
| US3595656A (en) | Reprographic materials containing a water-insoluble azidochalcone | |
| EP0078981B1 (de) | Lichtempfindliches Gemisch und daraus hergestelltes lichtempfindliches Kopiermaterial | |
| DE2124047A1 (de) | Photosensitive Polymere, Verfahren zur Herstellung derselben und diese Polymeren enthaltende Zusammensetzungen | |
| EP0056092B1 (de) | Lichtempfindliches Gemisch auf Basis von o-Naphthochinondiaziden und daraus hergestelltes lichtempfindliches Kopiermaterial | |
| EP0051185B1 (de) | Lichtempfindliches Gemisch und damit hergestelltes lichtempfindliches Kopiermaterial | |
| DE1572070C3 (de) | Lichtempfindliches Kopiermaterial | |
| EP0050806A2 (de) | Lichtempfindliches Gemisch und damit hergestelltes lichtempfindliches Kopiermaterial | |
| DE2251828C2 (de) | Lichtempfindliche polymere Ester und ihre Verwendung | |
| AT220168B (de) | Kopiermaterial, insbesondere für Druckformen | |
| DE1134887B (de) | Kopierschichten zur Herstellung von Druckformen auf photomechanischem Wege | |
| AT217055B (en, 2012) | ||
| AT217056B (de) | Kopiermaterial, insbesondere für Druckformen | |
| DE1422473C (de) | Vorsensibilisierte Druckplatte |