AR089044A1 - Proceso de pulverizacion reactiva - Google Patents
Proceso de pulverizacion reactivaInfo
- Publication number
- AR089044A1 AR089044A1 ARP120104504A ARP120104504A AR089044A1 AR 089044 A1 AR089044 A1 AR 089044A1 AR P120104504 A ARP120104504 A AR P120104504A AR P120104504 A ARP120104504 A AR P120104504A AR 089044 A1 AR089044 A1 AR 089044A1
- Authority
- AR
- Argentina
- Prior art keywords
- targeted target
- target
- tension
- targeted
- reactive
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000005507 spraying Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 abstract 5
- 230000010349 pulsation Effects 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000010849 ion bombardment Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0094—Reactive sputtering in transition mode
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3492—Variation of parameters during sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3476—Testing and control
- H01J37/3485—Means for avoiding target poisoning
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161566836P | 2011-12-05 | 2011-12-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AR089044A1 true AR089044A1 (es) | 2014-07-23 |
Family
ID=47504785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ARP120104504A AR089044A1 (es) | 2011-12-05 | 2012-11-30 | Proceso de pulverizacion reactiva |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US10458015B2 (enExample) |
| EP (1) | EP2789006B1 (enExample) |
| JP (1) | JP6113743B2 (enExample) |
| KR (1) | KR101990658B1 (enExample) |
| CN (1) | CN104272429B (enExample) |
| AR (1) | AR089044A1 (enExample) |
| BR (1) | BR112014013533B1 (enExample) |
| CA (1) | CA2858251C (enExample) |
| ES (1) | ES2704121T3 (enExample) |
| MX (1) | MX368733B (enExample) |
| MY (1) | MY181526A (enExample) |
| PH (1) | PH12014501269B1 (enExample) |
| PL (1) | PL2789006T3 (enExample) |
| RU (1) | RU2632210C2 (enExample) |
| SG (1) | SG11201402945YA (enExample) |
| SI (1) | SI2789006T1 (enExample) |
| TW (1) | TWI565816B (enExample) |
| WO (1) | WO2013083238A1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014196352A1 (ja) * | 2013-06-04 | 2014-12-11 | 株式会社村田製作所 | 薄膜形成方法 |
| MY187100A (en) | 2013-07-03 | 2021-08-31 | Oerlikon Surface Solutions Ag Pfaeffikon | Tixsi1-xn layers and their production |
| DE102016012460A1 (de) | 2016-10-19 | 2018-04-19 | Grenzebach Maschinenbau Gmbh | Vorrichtung und Verfahren zur Herstellung definierter Eigenschaften von Gradientenschichten in einem System mehrlagiger Beschichtungen bei Sputter - Anlagen |
| EP3406761A1 (en) | 2017-05-24 | 2018-11-28 | Walter Ag | A method for producing a coated cutting tool and a coated cutting tool |
| CN110184571A (zh) * | 2019-05-07 | 2019-08-30 | 天津君盛天成科技发展有限公司 | 高功率脉冲涂装方法 |
| WO2021160337A1 (en) * | 2020-02-11 | 2021-08-19 | Oerlikon Surface Solutions Ag, Pfäffikon | Method of surface smoothening of additive manufactured metal components |
| CN111621756B (zh) * | 2020-03-27 | 2021-12-24 | 中国科学院力学研究所 | 一种室温溅射制备晶态透明氧化铝薄膜的方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
| DE19610012B4 (de) * | 1996-03-14 | 2005-02-10 | Unaxis Deutschland Holding Gmbh | Verfahren zur Stabilisierung eines Arbeitspunkts beim reaktiven Zerstäuben in einer Sauerstoff enthaltenden Atmosphäre |
| SE521095C2 (sv) | 2001-06-08 | 2003-09-30 | Cardinal Cg Co | Förfarande för reaktiv sputtring |
| US8025775B2 (en) * | 2002-03-15 | 2011-09-27 | Oerlikon Trading Ag, Truebbach | Vacuum plasma generator |
| JP3866615B2 (ja) * | 2002-05-29 | 2007-01-10 | 株式会社神戸製鋼所 | 反応性スパッタリング方法及び装置 |
| US20050103620A1 (en) * | 2003-11-19 | 2005-05-19 | Zond, Inc. | Plasma source with segmented magnetron cathode |
| US8500965B2 (en) * | 2004-05-06 | 2013-08-06 | Ppg Industries Ohio, Inc. | MSVD coating process |
| DE102006017382A1 (de) | 2005-11-14 | 2007-05-16 | Itg Induktionsanlagen Gmbh | Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen |
| GB0608582D0 (en) * | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
| DE102006061324B4 (de) * | 2006-06-20 | 2008-07-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Regelung eines reaktiven Hochleistungs-Puls-Magnetronsputterprozesses und Vorrichtung hierzu |
| SE533395C2 (sv) * | 2007-06-08 | 2010-09-14 | Sandvik Intellectual Property | Sätt att göra PVD-beläggningar |
| US7685852B2 (en) | 2007-06-28 | 2010-03-30 | Rahamim Komemi | Tool for pin tumbler locks |
| US9039871B2 (en) * | 2007-11-16 | 2015-05-26 | Advanced Energy Industries, Inc. | Methods and apparatus for applying periodic voltage using direct current |
| KR101923221B1 (ko) * | 2007-12-07 | 2018-11-28 | 에바텍 아크티엔게젤샤프트 | Ｈｉｐｉｍｓ를 이용한 반응성 스퍼터링 |
| JP2010065240A (ja) * | 2008-09-08 | 2010-03-25 | Kobe Steel Ltd | スパッタ装置 |
| DE202010001497U1 (de) * | 2010-01-29 | 2010-04-22 | Hauzer Techno-Coating B.V. | Beschichtungsvorrichtung mit einer HIPIMS-Leistungsquelle |
| EP2700083B1 (de) | 2011-04-20 | 2015-04-22 | Oerlikon Surface Solutions AG, Trübbach | Verfahren zur bereistellung sequenzieller leistungspulse |
-
2012
- 2012-11-23 BR BR112014013533-9A patent/BR112014013533B1/pt active IP Right Grant
- 2012-11-23 JP JP2014545125A patent/JP6113743B2/ja not_active Expired - Fee Related
- 2012-11-23 SI SI201231461T patent/SI2789006T1/sl unknown
- 2012-11-23 ES ES12810067T patent/ES2704121T3/es active Active
- 2012-11-23 PL PL12810067T patent/PL2789006T3/pl unknown
- 2012-11-23 RU RU2014127520A patent/RU2632210C2/ru active
- 2012-11-23 WO PCT/EP2012/004848 patent/WO2013083238A1/de not_active Ceased
- 2012-11-23 KR KR1020147018427A patent/KR101990658B1/ko active Active
- 2012-11-23 MY MYPI2014001644A patent/MY181526A/en unknown
- 2012-11-23 SG SG11201402945YA patent/SG11201402945YA/en unknown
- 2012-11-23 CA CA2858251A patent/CA2858251C/en not_active Expired - Fee Related
- 2012-11-23 CN CN201280069085.8A patent/CN104272429B/zh active Active
- 2012-11-23 EP EP12810067.4A patent/EP2789006B1/de active Active
- 2012-11-23 US US14/362,758 patent/US10458015B2/en active Active
- 2012-11-23 MX MX2014006729A patent/MX368733B/es active IP Right Grant
- 2012-11-30 AR ARP120104504A patent/AR089044A1/es active IP Right Grant
- 2012-11-30 TW TW101144896A patent/TWI565816B/zh not_active IP Right Cessation
-
2014
- 2014-06-05 PH PH12014501269A patent/PH12014501269B1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20140108672A (ko) | 2014-09-12 |
| MY181526A (en) | 2020-12-25 |
| SG11201402945YA (en) | 2014-10-30 |
| KR101990658B1 (ko) | 2019-06-18 |
| BR112014013533A2 (pt) | 2017-06-13 |
| BR112014013533B1 (pt) | 2021-09-08 |
| MX2014006729A (es) | 2015-02-24 |
| JP2015504970A (ja) | 2015-02-16 |
| CN104272429B (zh) | 2016-08-24 |
| CA2858251A1 (en) | 2013-06-13 |
| PL2789006T3 (pl) | 2019-04-30 |
| ES2704121T3 (es) | 2019-03-14 |
| US10458015B2 (en) | 2019-10-29 |
| TWI565816B (zh) | 2017-01-11 |
| RU2632210C2 (ru) | 2017-10-03 |
| BR112014013533A8 (pt) | 2017-06-13 |
| PH12014501269B1 (en) | 2019-03-08 |
| EP2789006B1 (de) | 2018-10-31 |
| RU2014127520A (ru) | 2016-01-27 |
| JP6113743B2 (ja) | 2017-04-12 |
| EP2789006A1 (de) | 2014-10-15 |
| TW201331401A (zh) | 2013-08-01 |
| WO2013083238A1 (de) | 2013-06-13 |
| PH12014501269A1 (en) | 2014-09-08 |
| MX368733B (es) | 2019-10-14 |
| CN104272429A (zh) | 2015-01-07 |
| SI2789006T1 (sl) | 2019-02-28 |
| US20140311892A1 (en) | 2014-10-23 |
| CA2858251C (en) | 2019-12-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AR089044A1 (es) | Proceso de pulverizacion reactiva | |
| PH12012502307A1 (en) | Aerosol generator | |
| EP4406573A3 (en) | Aerosol delivery device including a bubble jet head and related method | |
| FR2985292B1 (fr) | Propulseur plasmique et procede de generation d'une poussee propulsive plasmique | |
| CL2017003408A1 (es) | Sistemas electrónicos de suministro de aerosol | |
| GB2499681B (en) | Atmospheric pressure ion source by interacting high velocity spray with a target | |
| AR109316A1 (es) | Dispositivo electrónico de provisión de vapor con elemento absorbente | |
| EA033222B1 (ru) | Ингалятор ароматизирующего вещества без горения и комплект | |
| GB201815839D0 (en) | Fuel spray nozzle | |
| WO2013009426A3 (en) | Shut-off system for a dispenser | |
| EP2529843A3 (en) | Reverse-flow nozzle for generating cavitating or pulsed jets | |
| IN2014CN02493A (enExample) | ||
| CL2014000037A1 (es) | Dispositivo atomizador porque es la punta de la boquilla, una boquilla para liquidos, es un alojamiento que contiene un multiple de aire convergente, con un cono a de transicion de aire que rodea de una manera circular la boquilla para liquidos que esta conectada a una lanza central, siendo alimentada dicha lanza por una entrada; uso del dispositivo; procedimiento. | |
| SG11201402447TA (en) | Plasma processing chamber with flexible symmetric rf return strap | |
| EP3680403A3 (en) | Cartridge and dispenser device of a jet of water incorporating such cartridge | |
| PL2778254T3 (pl) | Osadzanie z fazy gazowej powłoki w plazmie niskociśnieniowego wyładowania łukowego i obróbka jonowa | |
| IN2014DN03425A (enExample) | ||
| AR088318A1 (es) | Procedimiento para la puesta a disposicion de pulsaciones de potencia secuenciales | |
| AR088700A1 (es) | Procedimiento para la deposicion de sistemas de capas de pvd a partir de la fase de gas mediante pulverizacion sobre sustratos | |
| UA116356C2 (uk) | Вузол розпилювального наконечника для електростатичного розпилювача | |
| MX2016012983A (es) | Sistema y metodo de fabricacion de un recubrimiento de junta de campo. | |
| WO2013045636A3 (en) | Plasma generator | |
| IN2014DN06497A (enExample) | ||
| JP2015504970A5 (enExample) | ||
| DK2570027T3 (da) | Flerdyselegeme til en landbrugsmarksprøjteanordning |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG | Grant, registration |