ZA200505303B - Method for reducing degradation of reactive compounds during transport - Google Patents
Method for reducing degradation of reactive compounds during transport Download PDFInfo
- Publication number
- ZA200505303B ZA200505303B ZA200505303A ZA200505303A ZA200505303B ZA 200505303 B ZA200505303 B ZA 200505303B ZA 200505303 A ZA200505303 A ZA 200505303A ZA 200505303 A ZA200505303 A ZA 200505303A ZA 200505303 B ZA200505303 B ZA 200505303B
- Authority
- ZA
- South Africa
- Prior art keywords
- transport
- nitrogen trifluoride
- location
- electropolished
- transport equipment
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 34
- 230000015556 catabolic process Effects 0.000 title claims description 24
- 238000006731 degradation reaction Methods 0.000 title claims description 24
- 150000001875 compounds Chemical class 0.000 title description 71
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 238000004458 analytical method Methods 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 5
- 229910052804 chromium Inorganic materials 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910000619 316 stainless steel Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- GFADZIUESKAXAK-UHFFFAOYSA-N tetrafluorohydrazine Chemical compound FN(F)N(F)F GFADZIUESKAXAK-UHFFFAOYSA-N 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 claims description 3
- 229910000975 Carbon steel Inorganic materials 0.000 claims description 2
- 229910000792 Monel Inorganic materials 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- DUQAODNTUBJRGF-UHFFFAOYSA-N difluorodiazene Chemical compound FN=NF DUQAODNTUBJRGF-UHFFFAOYSA-N 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910000856 hastalloy Inorganic materials 0.000 claims description 2
- 229910001026 inconel Inorganic materials 0.000 claims description 2
- 229910000833 kovar Inorganic materials 0.000 claims description 2
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 2
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 claims description 2
- 239000010956 nickel silver Substances 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- 239000011135 tin Substances 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000011701 zinc Substances 0.000 claims description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000008246 gaseous mixture Substances 0.000 claims 1
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims 1
- 239000012535 impurity Substances 0.000 description 24
- 239000000047 product Substances 0.000 description 19
- 238000004519 manufacturing process Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910015900 BF3 Inorganic materials 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- DUQAODNTUBJRGF-ONEGZZNKSA-N dinitrogen difluoride Chemical compound F\N=N\F DUQAODNTUBJRGF-ONEGZZNKSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- -1 moisture Chemical class 0.000 description 2
- 210000002381 plasma Anatomy 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- UJMWVICAENGCRF-UHFFFAOYSA-N oxygen difluoride Chemical compound FOF UJMWVICAENGCRF-UHFFFAOYSA-N 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- JOHWNGGYGAVMGU-UHFFFAOYSA-N trifluorochlorine Chemical compound FCl(F)F JOHWNGGYGAVMGU-UHFFFAOYSA-N 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Sampling And Sample Adjustment (AREA)
- Manufacture And Refinement Of Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/396,795 US20040188272A1 (en) | 2003-03-25 | 2003-03-25 | Method for reducing degradation of reactive compounds during transport |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200505303B true ZA200505303B (en) | 2006-09-27 |
Family
ID=32988852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200505303A ZA200505303B (en) | 2003-03-25 | 2004-03-25 | Method for reducing degradation of reactive compounds during transport |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20040188272A1 (enExample) |
| EP (1) | EP1606437A1 (enExample) |
| JP (1) | JP2006522226A (enExample) |
| KR (1) | KR20050114680A (enExample) |
| CN (1) | CN1761774A (enExample) |
| CA (1) | CA2514527A1 (enExample) |
| RU (1) | RU2005132824A (enExample) |
| TW (1) | TW200500166A (enExample) |
| WO (1) | WO2004088004A1 (enExample) |
| ZA (1) | ZA200505303B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110002017A (ko) * | 2008-03-31 | 2011-01-06 | 제온 코포레이션 | 플라즈마 에칭 방법 |
| US8590705B2 (en) * | 2010-06-11 | 2013-11-26 | Air Products And Chemicals, Inc. | Cylinder surface treated container for monochlorosilane |
| CN104388938A (zh) * | 2014-11-05 | 2015-03-04 | 辽宁石油化工大学 | 一种铝合金焊丝的电化学抛光液及电化学抛光方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2138539B1 (enExample) * | 1971-05-27 | 1973-05-25 | Alsthom | |
| US3998180A (en) * | 1975-04-07 | 1976-12-21 | Union Carbide Corporation | Vapor deposition apparatus including fluid transfer means |
| DE3614290A1 (de) * | 1986-04-26 | 1987-10-29 | Messer Griesheim Gmbh | Druckgasbehaelter aus einer austenitischen stahllegierung |
| DE3617092A1 (de) * | 1986-05-21 | 1987-11-26 | Poligrat Gmbh | Innenoberflaeche einer gasflasche und verfahren zu deren herstellung |
| JPH01261208A (ja) * | 1988-04-11 | 1989-10-18 | Mitsui Toatsu Chem Inc | 三弗化窒素ガスの精製方法 |
| US5009963A (en) * | 1988-07-20 | 1991-04-23 | Tadahiro Ohmi | Metal material with film passivated by fluorination and apparatus composed of the metal material |
| EP1069610A2 (en) * | 1990-01-08 | 2001-01-17 | Lsi Logic Corporation | Refractory metal deposition process for low contact resistivity to silicon and corresponding apparatus |
| US5085745A (en) * | 1990-11-07 | 1992-02-04 | Liquid Carbonic Corporation | Method for treating carbon steel cylinder |
| JPH0666400A (ja) * | 1992-08-21 | 1994-03-08 | Mitsui Toatsu Chem Inc | フルオロシランガスの充填容器 |
| US6557593B2 (en) * | 1993-04-28 | 2003-05-06 | Advanced Technology Materials, Inc. | Refillable ampule and method re same |
| JPH07197158A (ja) * | 1993-12-28 | 1995-08-01 | Mitsubishi Materials Corp | Ｎｉ基合金とそれを用いた半導体製造装置用部材及び液晶製造装置用部材 |
| JP2893081B2 (ja) * | 1994-09-20 | 1999-05-17 | 岩谷産業株式会社 | オゾンガス貯蔵容器 |
| JP3010138U (ja) * | 1994-10-13 | 1995-04-25 | 有限会社字多精密工業 | ステンレス製ボンベ |
| GB9724168D0 (en) * | 1997-11-14 | 1998-01-14 | Air Prod & Chem | Gas control device and method of supplying gas |
| US6514346B1 (en) * | 1998-03-25 | 2003-02-04 | Neuco, Inc. | Method and apparatus for inserting and propelling a coating device into and through live gas pipeline |
| US6343476B1 (en) * | 1998-04-28 | 2002-02-05 | Advanced Technology Materials, Inc. | Gas storage and dispensing system comprising regulator interiorly disposed in fluid containment vessel and adjustable in situ therein |
| JP2000070705A (ja) * | 1998-08-28 | 2000-03-07 | Iwatani Internatl Corp | フッ素含有ガスの供給ラインでの腐食生成物低減方法 |
| US6374860B2 (en) * | 1998-10-16 | 2002-04-23 | Daniel Industries, Inc. | Integrated valve design for gas chromatograph |
| US6523615B2 (en) * | 2000-03-31 | 2003-02-25 | John Gandy Corporation | Electropolishing method for oil field tubular goods and drill pipe |
-
2003
- 2003-03-25 US US10/396,795 patent/US20040188272A1/en not_active Abandoned
-
2004
- 2004-03-25 WO PCT/US2004/009186 patent/WO2004088004A1/en not_active Ceased
- 2004-03-25 CN CNA2004800077050A patent/CN1761774A/zh active Pending
- 2004-03-25 KR KR1020057017843A patent/KR20050114680A/ko not_active Withdrawn
- 2004-03-25 CA CA002514527A patent/CA2514527A1/en not_active Abandoned
- 2004-03-25 EP EP04758353A patent/EP1606437A1/en not_active Withdrawn
- 2004-03-25 TW TW093108133A patent/TW200500166A/zh unknown
- 2004-03-25 RU RU2005132824/02A patent/RU2005132824A/ru not_active Application Discontinuation
- 2004-03-25 JP JP2006509300A patent/JP2006522226A/ja active Pending
- 2004-03-25 ZA ZA200505303A patent/ZA200505303B/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006522226A (ja) | 2006-09-28 |
| CN1761774A (zh) | 2006-04-19 |
| CA2514527A1 (en) | 2004-10-14 |
| TW200500166A (en) | 2005-01-01 |
| WO2004088004A1 (en) | 2004-10-14 |
| US20040188272A1 (en) | 2004-09-30 |
| EP1606437A1 (en) | 2005-12-21 |
| KR20050114680A (ko) | 2005-12-06 |
| RU2005132824A (ru) | 2006-02-20 |
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