ZA200501294B - Single crystal diamond - Google Patents
Single crystal diamond Download PDFInfo
- Publication number
- ZA200501294B ZA200501294B ZA200501294A ZA200501294A ZA200501294B ZA 200501294 B ZA200501294 B ZA 200501294B ZA 200501294 A ZA200501294 A ZA 200501294A ZA 200501294 A ZA200501294 A ZA 200501294A ZA 200501294 B ZA200501294 B ZA 200501294B
- Authority
- ZA
- South Africa
- Prior art keywords
- diamond
- diamond plate
- plate according
- dislocations
- major surfaces
- Prior art date
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 176
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 175
- 239000013078 crystal Substances 0.000 title claims abstract description 47
- 230000012010 growth Effects 0.000 claims abstract description 118
- 239000000758 substrate Substances 0.000 claims abstract description 85
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 63
- 238000000034 method Methods 0.000 claims abstract description 50
- 230000007547 defect Effects 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 description 15
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 208000012868 Overgrowth Diseases 0.000 description 3
- 238000004854 X-ray topography Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000009966 trimming Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0221949.1A GB0221949D0 (en) | 2002-09-20 | 2002-09-20 | Single crystal diamond |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200501294B true ZA200501294B (en) | 2006-11-29 |
Family
ID=9944519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200501294A ZA200501294B (en) | 2002-09-20 | 2003-09-19 | Single crystal diamond |
Country Status (17)
| Country | Link |
|---|---|
| US (3) | US20040177803A1 (ko) |
| EP (1) | EP1543181B1 (ko) |
| JP (3) | JP4949627B2 (ko) |
| KR (1) | KR101078970B1 (ko) |
| CN (5) | CN101319359B (ko) |
| AT (1) | ATE365818T1 (ko) |
| AU (1) | AU2003263447A1 (ko) |
| CA (1) | CA2496710C (ko) |
| DE (1) | DE60314648T2 (ko) |
| ES (1) | ES2287565T3 (ko) |
| GB (6) | GB0221949D0 (ko) |
| HK (5) | HK1078906A1 (ko) |
| IL (1) | IL166897A (ko) |
| RU (1) | RU2332532C2 (ko) |
| TW (1) | TWI323299B (ko) |
| WO (1) | WO2004027123A1 (ko) |
| ZA (1) | ZA200501294B (ko) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CZ302228B6 (cs) * | 2000-06-15 | 2011-01-05 | Element Six (Pty) Ltd | Monokrystalická diamantová vrstva pripravená chemickým vylucováním z plynné fáze |
| CZ302229B6 (cs) * | 2000-06-15 | 2011-01-05 | Element Six (Pty) Ltd | Silná monokrystalová diamantová vrstva, zpusob jejího zhotovení a drahokamy vyrábené z této vrstvy |
| GB0130005D0 (en) * | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Boron doped diamond |
| GB0130004D0 (en) * | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Coloured diamond |
| JP4711677B2 (ja) * | 2002-09-06 | 2011-06-29 | エレメント シックス リミテッド | 着色されたダイヤモンド |
| GB0221949D0 (en) | 2002-09-20 | 2002-10-30 | Diamanx Products Ltd | Single crystal diamond |
| GB0227261D0 (en) * | 2002-11-21 | 2002-12-31 | Element Six Ltd | Optical quality diamond material |
| KR100683574B1 (ko) * | 2004-10-19 | 2007-02-16 | 한국과학기술연구원 | 기하학적 형태의 다이아몬드 쉘 및 그 제조방법 |
| JP5163920B2 (ja) * | 2005-03-28 | 2013-03-13 | 住友電気工業株式会社 | ダイヤモンド単結晶基板の製造方法及びダイヤモンド単結晶基板 |
| US7399358B2 (en) * | 2005-09-05 | 2008-07-15 | Rajneesh Bhandari | Synthesis of large homoepitaxial monocrystalline diamond |
| US9133566B2 (en) * | 2005-12-09 | 2015-09-15 | Element Six Technologies Limited | High crystalline quality synthetic diamond |
| WO2008090514A2 (en) * | 2007-01-22 | 2008-07-31 | Element Six Limited | Diamond electronic devices and methods for their manufacture |
| US8342164B2 (en) * | 2008-05-09 | 2013-01-01 | SCIO Diamond Technology Corporation | Gemstone production from CVD diamond plate |
| JP4803464B2 (ja) * | 2008-07-04 | 2011-10-26 | 独立行政法人産業技術総合研究所 | 単結晶ダイヤモンドの表面損傷の除去方法 |
| GB0813490D0 (en) * | 2008-07-23 | 2008-08-27 | Element Six Ltd | Solid state material |
| GB0813491D0 (en) | 2008-07-23 | 2008-08-27 | Element Six Ltd | Diamond Material |
| US9157170B2 (en) | 2009-12-21 | 2015-10-13 | Element Six Technologies Limited | Single crystal diamond material |
| GB2476306B (en) * | 2009-12-21 | 2012-07-11 | Element Six Ltd | Single crystal diamond material |
| GB201000768D0 (en) * | 2010-01-18 | 2010-03-03 | Element Six Ltd | CVD single crystal diamond material |
| US9017633B2 (en) * | 2010-01-18 | 2015-04-28 | Element Six Technologies Limited | CVD single crystal diamond material |
| GB201021985D0 (en) * | 2010-12-24 | 2011-02-02 | Element Six Ltd | Dislocation engineering in single crystal synthetic diamond material |
| WO2014168053A1 (ja) * | 2013-04-09 | 2014-10-16 | 住友電気工業株式会社 | 単結晶ダイヤモンドおよびダイヤモンド工具 |
| GB201310212D0 (en) * | 2013-06-07 | 2013-07-24 | Element Six Ltd | Post-synthesis processing of diamond and related super-hard materials |
| WO2016013588A1 (ja) * | 2014-07-22 | 2016-01-28 | 住友電気工業株式会社 | 単結晶ダイヤモンドおよびその製造方法、単結晶ダイヤモンドを含む工具、ならびに単結晶ダイヤモンドを含む部品 |
| JP6041229B2 (ja) * | 2015-10-29 | 2016-12-07 | 住友電気工業株式会社 | ダイヤモンド複合体、ダイヤモンド複合体の製造方法、及び単結晶ダイヤモンドの製造方法 |
| JP6217949B2 (ja) * | 2016-11-10 | 2017-10-25 | 住友電気工業株式会社 | 単結晶ダイヤモンド |
| EP3538689A1 (en) * | 2016-11-10 | 2019-09-18 | Element Six Technologies Limited | Synthesis of thick single crystal diamond material via chemical vapour deposition |
| TWI706061B (zh) * | 2017-04-26 | 2020-10-01 | 新加坡商二A 科技有限公司 | 大單晶鑽石及其生產方法 |
| CN107675249B (zh) * | 2017-09-08 | 2020-07-07 | 西安电子科技大学 | 单晶金刚石的扩径生长方法 |
| ES2724214B2 (es) | 2018-03-01 | 2020-01-15 | Business Res And Diamonds S L | Procedimiento para la obtencion de diamantes sinteticos a partir de la sacarosa y equipo para llevar a cabo dicho procedimiento |
| CN108360065A (zh) * | 2018-04-12 | 2018-08-03 | 西安交通大学 | 一种生长单晶金刚石的方法及生长结构 |
| CN108908762A (zh) * | 2018-06-15 | 2018-11-30 | 西安碳星半导体科技有限公司 | Cvd生长宝石级厚单晶金刚石切割方法 |
| CN108754600A (zh) * | 2018-06-26 | 2018-11-06 | 西安交通大学 | 一种拼接生长大面积单晶金刚石的方法 |
| CN108677246A (zh) * | 2018-06-26 | 2018-10-19 | 西安交通大学 | 一种横向搭桥拼接生长大面积单晶金刚石的方法 |
| GB201811162D0 (en) | 2018-07-06 | 2018-08-29 | Element Six Tech Ltd | Method of manufacture of single crystal synthetic diamond material |
| CN108977880A (zh) * | 2018-08-29 | 2018-12-11 | 西安交通大学 | 一种交叉拼接生长大面积单晶金刚石的方法 |
| GB201918883D0 (en) * | 2019-12-19 | 2020-02-05 | Element Six Tech Ltd | Method for producing chemical vapour deposition diamond |
| CN115605637A (zh) * | 2020-01-20 | 2023-01-13 | M7D公司（Us） | 生长较大金刚石的方法 |
| GB2614522B (en) | 2021-10-19 | 2024-04-03 | Element Six Tech Ltd | CVD single crystal diamond |
| GB2614521A (en) | 2021-10-19 | 2023-07-12 | Element Six Tech Ltd | CVD single crystal diamond |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01103994A (ja) * | 1987-10-16 | 1989-04-21 | Sumitomo Electric Ind Ltd | ダイヤモンドの単結晶成長方法 |
| JP2571795B2 (ja) | 1987-11-17 | 1997-01-16 | 住友電気工業株式会社 | 紫色ダイヤモンドおよびその製造方法 |
| US5127983A (en) * | 1989-05-22 | 1992-07-07 | Sumitomo Electric Industries, Ltd. | Method of producing single crystal of high-pressure phase material |
| US5360479A (en) * | 1990-07-02 | 1994-11-01 | General Electric Company | Isotopically pure single crystal epitaxial diamond films and their preparation |
| US5614019A (en) * | 1992-06-08 | 1997-03-25 | Air Products And Chemicals, Inc. | Method for the growth of industrial crystals |
| JPH0687691A (ja) * | 1992-09-04 | 1994-03-29 | Sumitomo Electric Ind Ltd | ダイヤモンドの製造方法およびダイヤモンドの製造方法に使用するダイヤモンド単結晶基材 |
| JPH06107494A (ja) | 1992-09-24 | 1994-04-19 | Sumitomo Electric Ind Ltd | ダイヤモンドの気相成長法 |
| US5474021A (en) * | 1992-09-24 | 1995-12-12 | Sumitomo Electric Industries, Ltd. | Epitaxial growth of diamond from vapor phase |
| JPH06227895A (ja) * | 1993-02-04 | 1994-08-16 | Sumitomo Electric Ind Ltd | ダイヤモンドの合成法 |
| JP3314444B2 (ja) | 1993-03-15 | 2002-08-12 | 住友電気工業株式会社 | 赤色ダイヤモンドおよび桃色ダイヤモンド |
| JP3484749B2 (ja) | 1994-04-04 | 2004-01-06 | 住友電気工業株式会社 | ダイヤモンドの合成法 |
| JP4291886B2 (ja) | 1994-12-05 | 2009-07-08 | 住友電気工業株式会社 | 低欠陥ダイヤモンド単結晶及びその合成方法 |
| JP4032482B2 (ja) * | 1997-04-18 | 2008-01-16 | 住友電気工業株式会社 | 単結晶ダイヤモンドの製造方法 |
| JPH113994A (ja) | 1997-06-11 | 1999-01-06 | Miyazaki Oki Electric Co Ltd | 突起構造の形成方法、ｌｄｄ構造の形成方法、配線形成方法、およびトレンチ形成方法 |
| JPH1131014A (ja) | 1997-07-14 | 1999-02-02 | Sumitomo Heavy Ind Ltd | 位置制御方式及び速度制御方式 |
| JPH11300194A (ja) * | 1998-04-23 | 1999-11-02 | Sumitomo Electric Ind Ltd | 超高圧発生用ダイヤモンドアンビル |
| CZ302229B6 (cs) * | 2000-06-15 | 2011-01-05 | Element Six (Pty) Ltd | Silná monokrystalová diamantová vrstva, zpusob jejího zhotovení a drahokamy vyrábené z této vrstvy |
| CZ302228B6 (cs) * | 2000-06-15 | 2011-01-05 | Element Six (Pty) Ltd | Monokrystalická diamantová vrstva pripravená chemickým vylucováním z plynné fáze |
| JP3968968B2 (ja) | 2000-07-10 | 2007-08-29 | 住友電気工業株式会社 | 単結晶ＧａＮ基板の製造方法 |
| JP2002265296A (ja) * | 2001-03-09 | 2002-09-18 | Kobe Steel Ltd | ダイヤモンド薄膜及びその製造方法 |
| GB0130005D0 (en) * | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Boron doped diamond |
| GB0130004D0 (en) * | 2001-12-14 | 2002-02-06 | Diamanx Products Ltd | Coloured diamond |
| JP4711677B2 (ja) * | 2002-09-06 | 2011-06-29 | エレメント シックス リミテッド | 着色されたダイヤモンド |
| GB0221949D0 (en) | 2002-09-20 | 2002-10-30 | Diamanx Products Ltd | Single crystal diamond |
| GB0227261D0 (en) * | 2002-11-21 | 2002-12-31 | Element Six Ltd | Optical quality diamond material |
-
2002
- 2002-09-20 GB GBGB0221949.1A patent/GB0221949D0/en not_active Ceased
-
2003
- 2003-09-19 GB GB0623783A patent/GB2429214A/en not_active Withdrawn
- 2003-09-19 ZA ZA200501294A patent/ZA200501294B/en unknown
- 2003-09-19 GB GB0623784A patent/GB2429215A/en not_active Withdrawn
- 2003-09-19 KR KR1020057004836A patent/KR101078970B1/ko active IP Right Grant
- 2003-09-19 CN CN2008101274376A patent/CN101319359B/zh not_active Expired - Lifetime
- 2003-09-19 JP JP2004537433A patent/JP4949627B2/ja not_active Expired - Lifetime
- 2003-09-19 RU RU2005111972/15A patent/RU2332532C2/ru active
- 2003-09-19 GB GB0623781A patent/GB2429212B/en not_active Expired - Lifetime
- 2003-09-19 CN CN038222647A patent/CN1681976B/zh not_active Expired - Lifetime
- 2003-09-19 CA CA2496710A patent/CA2496710C/en not_active Expired - Lifetime
- 2003-09-19 AT AT03797475T patent/ATE365818T1/de not_active IP Right Cessation
- 2003-09-19 ES ES03797475T patent/ES2287565T3/es not_active Expired - Lifetime
- 2003-09-19 CN CN2008101274380A patent/CN101319360B/zh not_active Expired - Lifetime
- 2003-09-19 AU AU2003263447A patent/AU2003263447A1/en not_active Abandoned
- 2003-09-19 GB GB0623782A patent/GB2429213B/en not_active Expired - Lifetime
- 2003-09-19 CN CN2008101274361A patent/CN101319358B/zh not_active Expired - Lifetime
- 2003-09-19 EP EP03797475A patent/EP1543181B1/en not_active Expired - Lifetime
- 2003-09-19 GB GB0508004A patent/GB2409468B/en not_active Expired - Lifetime
- 2003-09-19 CN CN2008101274395A patent/CN101319361B/zh not_active Expired - Lifetime
- 2003-09-19 WO PCT/IB2003/004057 patent/WO2004027123A1/en active IP Right Grant
- 2003-09-19 DE DE60314648T patent/DE60314648T2/de not_active Expired - Lifetime
- 2003-09-22 US US10/665,550 patent/US20040177803A1/en not_active Abandoned
- 2003-09-22 TW TW092126090A patent/TWI323299B/zh not_active IP Right Cessation
-
2005
- 2005-02-14 IL IL166897A patent/IL166897A/en active IP Right Grant
- 2005-11-25 HK HK05110696.1A patent/HK1078906A1/xx not_active IP Right Cessation
-
2007
- 2007-05-03 US US11/743,680 patent/US9518338B2/en active Active
-
2009
- 2009-06-09 HK HK09105139.2A patent/HK1127792A1/xx not_active IP Right Cessation
- 2009-06-09 HK HK09105138.3A patent/HK1127791A1/xx not_active IP Right Cessation
- 2009-06-09 HK HK09105136.5A patent/HK1127789A1/xx not_active IP Right Cessation
- 2009-06-09 HK HK09105137.4A patent/HK1127790A1/xx not_active IP Right Cessation
- 2009-10-07 JP JP2009233475A patent/JP5312281B2/ja not_active Expired - Lifetime
-
2011
- 2011-04-13 JP JP2011089248A patent/JP5717518B2/ja not_active Expired - Lifetime
-
2016
- 2016-10-20 US US15/298,380 patent/US9816202B2/en not_active Expired - Lifetime
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