ZA200203247B - Method for inspecting electrode surface quality. - Google Patents
Method for inspecting electrode surface quality. Download PDFInfo
- Publication number
- ZA200203247B ZA200203247B ZA200203247A ZA200203247A ZA200203247B ZA 200203247 B ZA200203247 B ZA 200203247B ZA 200203247 A ZA200203247 A ZA 200203247A ZA 200203247 A ZA200203247 A ZA 200203247A ZA 200203247 B ZA200203247 B ZA 200203247B
- Authority
- ZA
- South Africa
- Prior art keywords
- cathode
- light source
- camera
- image
- plane
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 27
- 238000007689 inspection Methods 0.000 claims description 28
- 238000011282 treatment Methods 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 230000002101 lytic effect Effects 0.000 claims 1
- 239000003792 electrolyte Substances 0.000 description 8
- 238000001556 precipitation Methods 0.000 description 5
- 239000012535 impurity Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 235000013382 Morus laevigata Nutrition 0.000 description 1
- 244000278455 Morus laevigata Species 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8829—Shadow projection or structured background, e.g. for deflectometry
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- General Health & Medical Sciences (AREA)
- Mathematical Physics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FI992406A FI107192B (sv) | 1999-11-09 | 1999-11-09 | Förfarande för kontrollering av ytkvaliteten av en elektrod |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ZA200203247B true ZA200203247B (en) | 2002-11-28 |
Family
ID=8555574
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ZA200203247A ZA200203247B (en) | 1999-11-09 | 2002-04-24 | Method for inspecting electrode surface quality. |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US6646733B1 (sv) |
| EP (1) | EP1228360A1 (sv) |
| JP (1) | JP2003514121A (sv) |
| KR (1) | KR100816703B1 (sv) |
| CN (1) | CN100409000C (sv) |
| AU (1) | AU778924B2 (sv) |
| BG (1) | BG64999B1 (sv) |
| BR (1) | BR0015345B1 (sv) |
| CA (1) | CA2390536C (sv) |
| EA (1) | EA008366B1 (sv) |
| FI (1) | FI107192B (sv) |
| MX (1) | MXPA02004567A (sv) |
| PE (1) | PE20010857A1 (sv) |
| PL (1) | PL356130A1 (sv) |
| WO (1) | WO2001035083A1 (sv) |
| ZA (1) | ZA200203247B (sv) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FI112383B (sv) * | 2001-06-25 | 2003-11-28 | Outokumpu Oy | Förfarande för att förbättra kavliteten av en katod vid elektrolys |
| US8594417B2 (en) | 2007-11-27 | 2013-11-26 | Alcoa Inc. | Systems and methods for inspecting anodes and smelting management relating to the same |
| KR101013612B1 (ko) * | 2008-11-21 | 2011-02-10 | 엘에스니꼬동제련 주식회사 | 전해 정련된 금속석출판 표면 검사장치 |
| FI20135688L (sv) * | 2013-06-24 | 2014-12-25 | Outotec Finland Oy | Förfarande och arrangemang för förberedning av anoder gjutna för en process för elektrolytisk raffinering av metall för ett elektrolytiskt raffineringssteg |
| CN109103118A (zh) * | 2017-06-21 | 2018-12-28 | 致茂电子(苏州)有限公司 | 太阳能电池的检测方法与检测系统 |
| TWI639829B (zh) * | 2017-06-21 | 2018-11-01 | 致茂電子股份有限公司 | 太陽能電池的檢測方法與檢測系統 |
| JP6876576B2 (ja) * | 2017-08-17 | 2021-05-26 | 日本電子株式会社 | 三次元像構築方法 |
| CN108335296B (zh) * | 2018-02-28 | 2021-10-01 | 中际山河科技有限责任公司 | 一种极板识别装置及方法 |
| CN110205653B (zh) * | 2019-06-14 | 2020-10-16 | 中国环境科学研究院 | 一种铅基阳极表面阳极泥智能识别及无损干除方法及系统 |
| CN112864034B (zh) * | 2019-11-27 | 2023-09-01 | 上海先进半导体制造有限公司 | 铝腐蚀的处理方法及系统 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU482658A1 (ru) * | 1972-05-03 | 1975-08-30 | Институт электрохимии АН СССР | Способ определени структурных параметров пористых электродов |
| US4498960A (en) * | 1982-11-01 | 1985-02-12 | General Electric Company | Electrochemical method for visual detection of nonmetallic surface inclusions in metallic substrates |
| DE3431148A1 (de) * | 1984-08-24 | 1986-03-06 | Klöckner-Humboldt-Deutz AG, 5000 Köln | Verfahren und vorrichtung zum entfernen von badmaterialresten an anodenresten |
| DE3837290A1 (de) * | 1988-11-03 | 1990-07-05 | Heraeus Elektroden | Pruefung von elektroden mit aktivierungsschichten |
| BE1003136A3 (nl) * | 1990-03-23 | 1991-12-03 | Icos Vision Systems Nv | Werkwijze en inrichting voor het bepalen van een positie van ten minste een aansluitpen van een elektronische component. |
| US5451308A (en) * | 1991-04-29 | 1995-09-19 | Novatech | Electric arc metal evaporator |
| JPH08313544A (ja) * | 1995-05-24 | 1996-11-29 | Hitachi Ltd | 電子顕微鏡及びこれを用いた試料観察方法 |
| US5614722A (en) * | 1995-11-01 | 1997-03-25 | University Of Louisville Research Foundation, Inc. | Radiation detector based on charge amplification in a gaseous medium |
| US5774224A (en) * | 1997-01-24 | 1998-06-30 | International Business Machines Corporation | Linear-scanning, oblique-viewing optical apparatus |
| JPH11148807A (ja) * | 1997-07-29 | 1999-06-02 | Toshiba Corp | バンプ高さ測定方法及びバンプ高さ測定装置 |
| JP3272998B2 (ja) * | 1997-09-30 | 2002-04-08 | イビデン株式会社 | バンプ高さ良否判定装置 |
| JPH11111174A (ja) * | 1997-10-03 | 1999-04-23 | Sony Corp | 電子銃の位置ずれ検出方法及び検出装置 |
| US5951372A (en) * | 1997-11-14 | 1999-09-14 | Lucent Technologies Inc. | Method of roughing a metallic surface of a semiconductor deposition tool |
| JP3724949B2 (ja) * | 1998-05-15 | 2005-12-07 | 株式会社東芝 | 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法 |
-
1999
- 1999-11-09 FI FI992406A patent/FI107192B/sv not_active IP Right Cessation
-
2000
- 2000-10-20 PE PE2000001130A patent/PE20010857A1/es not_active Application Discontinuation
- 2000-10-27 KR KR1020027005949A patent/KR100816703B1/ko not_active IP Right Cessation
- 2000-10-27 EA EA200200543A patent/EA008366B1/ru not_active IP Right Cessation
- 2000-10-27 WO PCT/FI2000/000932 patent/WO2001035083A1/en active IP Right Grant
- 2000-10-27 EP EP00972931A patent/EP1228360A1/en not_active Withdrawn
- 2000-10-27 CA CA002390536A patent/CA2390536C/en not_active Expired - Lifetime
- 2000-10-27 AU AU11489/01A patent/AU778924B2/en not_active Ceased
- 2000-10-27 BR BRPI0015345-1A patent/BR0015345B1/pt not_active IP Right Cessation
- 2000-10-27 MX MXPA02004567A patent/MXPA02004567A/es active IP Right Grant
- 2000-10-27 US US10/129,869 patent/US6646733B1/en not_active Expired - Fee Related
- 2000-10-27 JP JP2001536564A patent/JP2003514121A/ja not_active Abandoned
- 2000-10-27 PL PL00356130A patent/PL356130A1/xx not_active Application Discontinuation
- 2000-10-27 CN CNB008154767A patent/CN100409000C/zh not_active Expired - Lifetime
-
2002
- 2002-04-24 ZA ZA200203247A patent/ZA200203247B/en unknown
- 2002-04-24 BG BG106643A patent/BG64999B1/bg unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AU778924B2 (en) | 2004-12-23 |
| CA2390536C (en) | 2009-09-15 |
| CN100409000C (zh) | 2008-08-06 |
| AU1148901A (en) | 2001-06-06 |
| EP1228360A1 (en) | 2002-08-07 |
| MXPA02004567A (es) | 2002-09-02 |
| JP2003514121A (ja) | 2003-04-15 |
| BG64999B1 (bg) | 2006-11-30 |
| BR0015345B1 (pt) | 2011-01-25 |
| EA008366B1 (ru) | 2007-04-27 |
| BR0015345A (pt) | 2002-06-25 |
| KR100816703B1 (ko) | 2008-03-27 |
| CA2390536A1 (en) | 2001-05-17 |
| FI107192B (sv) | 2001-06-15 |
| WO2001035083A1 (en) | 2001-05-17 |
| KR20020053844A (ko) | 2002-07-05 |
| US6646733B1 (en) | 2003-11-11 |
| PL356130A1 (en) | 2004-06-14 |
| BG106643A (en) | 2003-04-30 |
| CN1531648A (zh) | 2004-09-22 |
| PE20010857A1 (es) | 2001-08-21 |
| EA200200543A1 (ru) | 2002-10-31 |
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