WO2023207904A9 - 显示面板和显示装置 - Google Patents

显示面板和显示装置 Download PDF

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Publication number
WO2023207904A9
WO2023207904A9 PCT/CN2023/090301 CN2023090301W WO2023207904A9 WO 2023207904 A9 WO2023207904 A9 WO 2023207904A9 CN 2023090301 W CN2023090301 W CN 2023090301W WO 2023207904 A9 WO2023207904 A9 WO 2023207904A9
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WO
WIPO (PCT)
Prior art keywords
substrate
layer
photoresist
spacer
shielding
Prior art date
Application number
PCT/CN2023/090301
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English (en)
French (fr)
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WO2023207904A1 (zh
Inventor
魏雄周
黎敏
庞家齐
彭元鸿
万彬
Original Assignee
京东方科技集团股份有限公司
重庆京东方光电科技有限公司
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Application filed by 京东方科技集团股份有限公司, 重庆京东方光电科技有限公司 filed Critical 京东方科技集团股份有限公司
Publication of WO2023207904A1 publication Critical patent/WO2023207904A1/zh
Publication of WO2023207904A9 publication Critical patent/WO2023207904A9/zh

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars

Definitions

  • the present disclosure relates to a display panel and a display device.
  • the display panel includes an array substrate, a color filter substrate, and a liquid crystal layer located between the array substrate and the color filter substrate.
  • the thickness of the liquid crystal layer i.e. cell thickness
  • the spacer can be formed on the array substrate or on the color filter. on the substrate.
  • embodiments of the present disclosure provide a display panel, including a box-shaped array substrate and a color filter substrate;
  • the color filter substrate includes a first substrate and a plurality of first main spacers and a plurality of auxiliary spacers located on a side of the first substrate close to the array substrate.
  • the array substrate includes a second spacer. The bottom and a plurality of second main spacers located on the side of the second substrate close to the color filter substrate, the first main spacers and the second main spacers corresponding to each other in the box-facing direction set up;
  • the first substrate includes a plurality of sub-pixel areas and multiple rows of light shielding areas distributed in an array, adjacent At least one row of said sub-pixel areas is distributed between two rows of said light shielding areas;
  • the orthographic projections of the first main spacer and the auxiliary spacer on the first substrate both fall within the light-shielding area, and the auxiliary spacer is close to the first substrate.
  • the distance between one end and the first substrate is less than or equal to the distance between one end of the first main spacer and close to the first substrate and the first substrate.
  • a black light-shielding layer, a color photoresist layer and a covering layer are laminated in sequence on a side of the first substrate close to the array substrate, the black light-shielding layer is located in the light-shielding area, and the color photoresist layer
  • the layer has a plurality of openings exposing the black light-shielding layer
  • the surface of the covering layer away from the first substrate is provided with a plurality of first grooves, and the plurality of first grooves and the plurality of openings are arranged correspondingly in a direction perpendicular to the first substrate. , and the orthographic projection of the first groove and the opening on the first substrate at least partially overlaps;
  • the orthographic projection of the auxiliary spacer on the first substrate at least partially overlaps the orthographic projection of the first groove on the first substrate.
  • the orthographic projection of the first groove on the first substrate falls within the orthographic projection range of the opening on the first substrate; and/or,
  • the orthographic projection of the auxiliary spacer on the first substrate falls within the orthographic projection range of the first groove on the first substrate.
  • a black light-shielding layer, a color photoresist layer and a covering layer are laminated in sequence on a side of the first substrate close to the array substrate, the black light-shielding layer is located in the light-shielding area, and the color photoresist layer layer covers the black light-shielding layer;
  • the surface of the covering layer away from the first substrate is provided with a plurality of second grooves, and the orthographic projection of the second grooves on the first substrate falls within the light shielding area;
  • the orthographic projection of the auxiliary spacer on the first substrate at least partially overlaps the orthographic projection of the second groove on the first substrate.
  • the orthographic projection of the auxiliary spacer on the first substrate falls within the orthographic projection range of the second groove on the first substrate.
  • the color photoresist layer includes red photoresist, green photoresist and blue photoresist, and the red photoresist, the blue photoresist and the green photoresist are respectively arranged in a row; and/or ,
  • the color photoresist layer includes red photoresist, green photoresist and blue photoresist, and any one of the red photoresist, the green photoresist or the blue photoresist covers the light shielding area.
  • a color photoresist layer and a black light-shielding layer are provided on a side of the first substrate close to the array substrate.
  • the color photoresist layer is located in the sub-pixel area, and the black light-shielding layer is located in the sub-pixel area.
  • a covering layer is provided on the side of the color photoresist layer away from the first substrate, and the covering layer covers the black light-shielding layer;
  • a plurality of third grooves are provided on the surface of the black light-shielding layer away from the first substrate, and a plurality of fourth grooves are provided on a surface of the covering layer away from the first substrate.
  • Four grooves and a plurality of third grooves are arranged correspondingly in a direction perpendicular to the first substrate, and the fourth groove and the third groove are located in front of the first substrate.
  • the projections overlap at least partially;
  • the orthographic projection of the auxiliary spacer on the first substrate at least partially overlaps the orthographic projection of the fourth groove on the first substrate.
  • the orthographic projection of the fourth groove on the first substrate falls within the orthographic projection range of the opening on the third groove; and/or,
  • the orthographic projection of the auxiliary spacer on the first substrate falls within the orthographic projection range of the fourth groove on the first substrate.
  • a color photoresist layer and a black light-shielding layer are provided on a side of the first substrate close to the array substrate.
  • the color photoresist layer is located in the sub-pixel area, and the black light-shielding layer is located in the sub-pixel area.
  • a covering layer is provided on the side of the color photoresist layer away from the first substrate, and the covering layer covers the black light-shielding layer;
  • the surface of the covering layer away from the first substrate is provided with a plurality of fifth grooves, and the orthographic projection of the auxiliary spacer on the first substrate is consistent with the position of the fifth grooves on the first substrate.
  • the orthographic projections of the substrates at least partially overlap.
  • the front projection of the auxiliary spacer on the first substrate falls within the range of the front projection of the fifth groove on the first substrate.
  • a color photoresist layer and a black light-shielding layer are provided on a side of the first substrate close to the array substrate.
  • the color photoresist layer is located in the sub-pixel area, and the black light-shielding layer is located in the sub-pixel area.
  • a covering layer is provided on the side of the color photoresist layer away from the first substrate, and the covering layer layer covers the black light-shielding layer;
  • the end of the black light-shielding layer away from the first substrate is closer to the first substrate than the end of the color photoresist layer away from the first substrate, and the auxiliary spacer and the third A main spacer is provided on the side of the covering layer away from the first substrate; or,
  • the thickness of the black light-shielding layer is greater than the thickness of the color photoresist, and the portion of the covering layer facing the black light-shielding layer is higher than the thickness of the covering layer facing the black light-shielding layer.
  • the part of the sub-pixel area and the part of the covering layer facing the black light-shielding layer are multiplexed as the auxiliary spacers.
  • the present disclosure provides a display panel, including a box-shaped array substrate and a color filter substrate;
  • the color filter substrate includes a first substrate and a plurality of first main spacers located on a side of the first substrate close to the array substrate;
  • the array substrate includes a second substrate, a thin film transistor layer, a pixel electrode layer and a flat layer that are stacked in sequence.
  • the flat layer is provided with a plurality of second main spacers and a plurality of second main spacers on one side close to the color filter substrate. Auxiliary spacers, the first main spacer and the second main spacer are arranged correspondingly in the box-facing direction;
  • the first substrate includes a plurality of sub-pixel areas distributed in an array and a light-shielding area located between two adjacent rows of the sub-pixel areas; wherein,
  • the orthographic projections of the first main spacer and the auxiliary spacer on the first substrate both fall within the light shielding area.
  • a passivation layer is provided on a side of the flat layer away from the second substrate, and a plurality of sixth grooves are provided on a surface of the passivation layer away from the second substrate.
  • the orthographic projection of the auxiliary spacer on the second substrate at least partially overlaps the orthographic projection of the sixth groove on the second substrate.
  • the orthographic projection of the auxiliary spacer on the second substrate falls within the orthographic projection range of the sixth groove on the second substrate.
  • an embodiment of the present disclosure provides a display device, including the display panel as described above.
  • Figure 1 is a schematic structural diagram of the missing auxiliary spacer in the related art
  • Figure 2 is a schematic structural diagram of a color filter substrate provided by an embodiment of the present disclosure
  • Figure 3 is a schematic cross-sectional view along line A-A in Figure 2;
  • Figure 4 is a schematic cross-sectional view along line B-B in Figure 2;
  • Figure 5 is another cross-sectional schematic diagram along line B-B in Figure 2;
  • Figure 6 is another structural schematic diagram of a color filter substrate provided by an embodiment of the present disclosure.
  • Figure 7 is a schematic cross-sectional view along line C-C in Figure 6;
  • Figure 8 is a schematic cross-sectional view along line D-D in Figure 6;
  • Figure 9 is another cross-sectional schematic diagram along line D-D in Figure 6;
  • Figure 10 is another structural schematic diagram of a color filter substrate provided by an embodiment of the present disclosure.
  • Figure 11 is a schematic cross-sectional view along line E-E in Figure 10;
  • Figure 12 is another schematic cross-sectional view along line E-E in Figure 10;
  • Figure 13 is another schematic cross-sectional view along line E-E in Figure 10;
  • Figure 14 is a schematic structural diagram of an array substrate provided by an embodiment of the present disclosure.
  • FIG. 15 is another structural schematic diagram of an array substrate provided by an embodiment of the present disclosure.
  • first, second, etc. to describe various information, but the information should not be limited to these terms. These terms are only used to distinguish information of the same type from each other.
  • first information may also be called second information, and similarly, the second information may also be called first information.
  • connection should be understood in a broad sense.
  • connection or integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary; it can also be an internal connection between two components; it can be a wireless connection or a wired connection connect.
  • connection or integral connection
  • connection or integral connection
  • connection can be a mechanical connection or an electrical connection
  • it can be a direct connection or an indirect connection through an intermediary
  • it can also be an internal connection between two components
  • it can be a wireless connection or a wired connection connect.
  • high refresh rate display products are becoming more and more popular. With the launch of many 240Hz and 360Hz high refresh products, even 480Hz high refresh products are about to be launched, which can bring a smoother and smoother visual experience.
  • the box thickness of high-brush products is related to the gray-scale response time. When the amount of liquid crystal is constant, the faster the gray-scale response time, the higher the refresh rate, the lower the box thickness, and the smaller the height of the auxiliary spacer 30 .
  • the refresh rate is 240Hz, the box thickness is 2.4 ⁇ m, and the height of Sub PS is 2.67 ⁇ m; the refresh rate is 340Hz, the box thickness is 2.2 ⁇ m, and the height of Sub PS is 0.84 ⁇ m; the refresh rate is 480Hz, the box thickness is 1.6 ⁇ m, and the height of Sub PS is 0.39 ⁇ m. It can be seen that the higher the refresh rate, the smaller the box thickness when the amount of liquid crystal is constant.
  • the auxiliary spacer (Sub PS) is usually designed on the side of the color filter substrate, and the auxiliary spacer (Sub PS) and the main spacer (Main PS) are designed on the same plane .
  • an embodiment of the present disclosure provides a display panel, including a box The formed color filter substrate 10 and the array substrate;
  • the color filter substrate 10 includes a first substrate 100 and a plurality of first main spacers 101 and a plurality of auxiliary spacers 30 located on the side of the first substrate 100 close to the array substrate.
  • the array substrate includes a second substrate and a plurality of auxiliary spacers located on the side of the first substrate 100 close to the array substrate.
  • the first main spacers 101 and the second main spacers are arranged correspondingly in the box-facing direction;
  • the first substrate 100 includes a plurality of sub-pixel areas distributed in an array and a light-shielding area located between two adjacent rows of sub-pixel areas; wherein,
  • One end of the pad 101 close to the first substrate is close to the first substrate 100 .
  • the array substrate has multiple gate lines and multiple data lines, the multiple gate lines are distributed in the transverse direction, and the multiple data lines are distributed in the longitudinal direction; in the box alignment direction, the color filter substrate 10
  • the light-shielding area on the display panel is arranged opposite to the gate lines on the array substrate; multiple sub-pixel areas distributed in the array constitute the display area.
  • the first main spacers are arranged along the direction in which the gate lines extend, and the second main spacers are distributed in the direction in which the data lines extend; In a direction parallel to the first substrate (or second substrate), a plurality of first main spacers and a plurality of second main spacers are in contact with each other in a one-to-one correspondence.
  • the main spacers are perpendicular to each other, and this design can ensure the reliability of contact between the first main spacer and the second main spacer.
  • the auxiliary spacer 30 is designed on the side of the color filter substrate 10.
  • the auxiliary spacer 30 and the first main spacer 101 are arranged facing the light-shielding area, and the auxiliary spacer 30 and the first main spacer 101 are arranged facing the light-shielding area.
  • 101 is designed in two different planes. Specifically, relative to the first substrate 100, the auxiliary spacer 30 is closer to the first substrate 100 than the first main spacer 101, thereby ensuring that the auxiliary spacer 30 is in a direction perpendicular to the first substrate 100.
  • the forming height of 30 ensures that the auxiliary spacer 30 can be formed when the thickness of the liquid crystal cell of high-brush products is relatively small.
  • a black light-shielding layer 104, a color photoresist layer 103 and a covering layer 102 are laminated on the side of the first substrate 100 close to the array substrate in sequence.
  • the black light-shielding layer 104 is located in the light-shielding area, and the color photoresist layer 103 has a portion exposing the black light-shielding layer 104. to open one's mouth;
  • the surface of the covering layer 102 away from the first substrate 100 is provided with a plurality of first grooves 105 .
  • the plurality of first grooves 105 and the plurality of openings are correspondingly arranged in a direction perpendicular to the first substrate 100
  • the first grooves 105 are arranged correspondingly in a direction perpendicular to the first substrate 100 .
  • the orthographic projection of the groove 105 and the opening on the first substrate at least partially overlaps; the orthographic projection of the auxiliary spacer 30 on the first substrate 100 at least partially overlaps the orthographic projection of the first groove 105 on the first substrate.
  • the orthographic projection of the first groove 105 on the first substrate 100 falls within the orthographic projection range of the opening on the first substrate; and/or,
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 falls within the orthographic projection range of the first groove 105 on the first substrate 100, and is provided in the area of the cover layer 102 except the first groove 105.
  • the color photoresist layer 103 covers the black light-shielding layer 104 and has an opening exposing the black light-shielding layer 104.
  • a first groove 105 is formed facing the opening, so The portion of the covering layer 103 facing the first groove 105 and the portion of the covering layer 103 facing the pixel area form a step difference.
  • This step difference is used to form auxiliary spacers in the first groove 105, thereby facilitating the formation of the auxiliary spacers 30.
  • the first main spacer 101 is formed in the area of the covering layer 102 except the first groove 105, so that the auxiliary spacer 30 has a certain step relative to the first main spacer. This design ensures that the auxiliary spacer The formation of objects is not affected by the box thickness of high-brush products.
  • the thickness of the black light-shielding layer 104 is 0.99 ⁇ m-2.43 ⁇ m, and the thickness of the cover layer 102 is 1.1 ⁇ m-1.5 ⁇ m;
  • the depth of the first groove 105 is 0.5 ⁇ m-0.7 ⁇ m, and the height of the auxiliary spacer 30 is 0.9 ⁇ m-1.2 ⁇ m;
  • the step difference between the end of the auxiliary spacer 30 away from the first substrate 100 and the end of the first main spacer 101 away from the first substrate 100 is 0.25 ⁇ m-0.45 ⁇ m;
  • the height of the second main spacer is the same as the height of the first main spacer.
  • Such a design can not only ensure the reliability of the contact between the first main spacer and the second main spacer, but also ensure the effective formation of the auxiliary spacer in high-brush products.
  • a black matrix is provided on the side of the first substrate 100 of the color filter substrate 10 facing the array substrate.
  • the black matrix includes parts between adjacent rows of sub-pixels, and between adjacent rows of sub-pixels. The part between adjacent sub-pixels and located around the pixel area side part;
  • the sub-pixel areas in adjacent columns are designed to be adjacent to each other and not separated by a black matrix.
  • the black matrix includes sub-pixels located in adjacent rows. black opaque layer in between.
  • a black light-shielding layer 104 As an optional implementation manner, with reference to Figures 2, 3 and 5, or with reference to Figures 6, 7 and 9, a black light-shielding layer 104, The color photoresist layer 103 and the covering layer 102, the black light-shielding layer 104 is located in the light-shielding area, and the color photoresist layer 103 covers the black light-shielding layer;
  • the surface of the cover layer 102 away from the first substrate 100 is provided with a plurality of second grooves 106, and the orthographic projection of the second grooves 106 on the first substrate 100 falls within the light-shielding area;
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 and the orthographic projection of the second groove 106 on the first substrate at least partially overlap.
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 falls within the orthographic projection range of the second groove 106 on the first substrate, and is within the area of the cover layer 102 except for the second groove 106 A first main spacer 101 is provided.
  • This embodiment utilizes the second groove 106 on the cover layer to form an auxiliary spacer, ensuring that the formation of the auxiliary spacer is not affected by the thickness of the liquid crystal cell of high-brush products.
  • the thickness of the black light-shielding layer is 0.99 ⁇ m-2.43 ⁇ m, and the thickness of the cover layer is 1.1 ⁇ m-1.5 ⁇ m;
  • the depth of the second groove is 0.5 ⁇ m-0.7 ⁇ m, and the height of the auxiliary spacer is 0.9-1.2um;
  • the step difference between the end of the auxiliary spacer away from the first substrate and the end of the first main spacer away from the first substrate is 0.25 ⁇ m-0.45 ⁇ m;
  • the height of the second main spacer is the same as the height of the first main spacer.
  • Such a design can not only ensure the reliability of the contact between the first main spacer and the second main spacer, but also ensure the effective formation of the auxiliary spacer in high-brush products.
  • the color photoresist layer 103 includes red (Red) photoresist, green (Green) photoresist and blue (Blue) photoresist.
  • the red photoresist, the blue photoresist and the green photoresist are arranged in rows respectively. arrangement.
  • the color photoresist layer 103 not only covers each sub-pixel area, but also covers the black light-shielding layer 104.
  • the color photoresist has a black light-shielding layer exposed The opening is formed simultaneously using the patterning process of red photoresist, green photoresist and blue photoresist.
  • each row of color photoresists from left to right is blue photoresist, green photoresist, red photoresist, blue photoresist, green photoresist, red photoresist and blue photoresist. That is, blue photoresist, green photoresist, and red photoresist are designed in rows. Taking a row of red photoresist as an example, a row of red photoresist covers a row of sub-pixel areas and covers between two adjacent sub-pixel areas in a row. shading area.
  • the color photoresist layer 103 includes red photoresist, green photoresist and blue photoresist.
  • the red photoresist, green photoresist or blue photoresist is Either covers the blackout area.
  • the red photoresist is designed as an entire surface, the green photoresist, and the blue photoresist are both island-shaped.
  • the red photoresist is designed as an entire surface. In addition to covering the red sub-pixel area, the red photoresist also covers the shading area; or, The blue photoresist has an entire surface design, the green photoresist and the red photoresist are both island-shaped.
  • the blue photoresist has an entire surface design. In addition to covering the blue sub-pixel area, the blue photoresist also covers the light-shielding area; or, green The whole surface of the photoresist is covered.
  • the red photoresist and the blue photoresist are both in an island shape.
  • the green photoresist is a whole surface design. In addition to covering the green sub-pixel area, the green photoresist also covers the light-shielding area. In Figure 6, it is preferred that the entire surface of the blue photoresist is designed; or, referring to Figure 5 or Figure 9, the color photoresist entirely covers the black light-shielding layer, for example, the blue photoresist covers the black light-shielding layer.
  • an embodiment of the present disclosure also provides a display panel, including a box-formed color filter substrate and an array substrate;
  • the color filter substrate includes a first substrate and a plurality of first main spacers 101 and a plurality of auxiliary spacers 30 located on the side of the first substrate close to the array substrate.
  • the array substrate includes a second substrate and a plurality of auxiliary spacers located on the side of the second substrate. There are a plurality of second main spacers with the bottom close to the side of the color filter substrate 10. The first main spacers 101 and the second main spacers are in contact with each other one by one in the box-facing direction;
  • the first substrate 100 includes a plurality of sub-pixel areas distributed in an array and a light-shielding area located between two adjacent rows of sub-pixel areas; wherein,
  • the orthographic projections of the first main spacer and the auxiliary spacer on the first substrate both fall within the light-shielding area, and the distance between the end of the auxiliary spacer close to the first substrate and the first substrate is less than or equal to The distance between an end of the first main spacer close to the first substrate and the first substrate.
  • a color photoresist layer 103 and a black light-shielding layer 104 are provided on the side of the first substrate 100 close to the array substrate.
  • the color photoresist layer 103 is located in the sub-pixel area, and the black light-shielding layer 104 is located in the light-shielding area. ;
  • a covering layer 102 is provided on the side of the color photoresist layer 103 away from the first substrate, and the covering layer 102 also covers the black light-shielding layer 103;
  • a plurality of third grooves are provided on the surface of the black light-shielding layer 104 away from the first substrate 100, and a plurality of fourth grooves 107 are provided on the surface of the cover layer 102 away from the first substrate.
  • the fourth groove 107 and the plurality of third grooves are arranged correspondingly in a direction perpendicular to the first substrate, and the orthographic projections of the fourth groove and the third groove on the first substrate at least partially overlap;
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 and the orthographic projection of the fourth groove 107 on the first substrate at least partially overlap.
  • the orthographic projection of the fourth groove 107 on the first substrate falls within the orthographic projection range of the opening in the third groove; and/or,
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 falls within the orthographic projection range of the fourth groove 107 on the first substrate.
  • the covering layer 102 is provided with a first main body in the area other than the fourth groove. Spacers 101.
  • the surface of the cover layer 102 away from the first substrate 100 is provided with a plurality of fifth grooves 108 , and the auxiliary spacer 30 is aligned with the fifth grooves 108 in the orthographic projection of the first substrate. Orthographic projections on the first substrate at least partially overlap.
  • the orthographic projection of the auxiliary spacer 30 on the first substrate 100 falls within the orthographic projection range of the fifth groove 108 on the first substrate 100 , and the area of the covering layer 102 excluding the fifth groove 108 A first main spacer 101 is provided.
  • the end of the black light-shielding layer 104 away from the first substrate 100 is closer to the first substrate 100 than the end of the color photoresist away from the first substrate 100 , and the corresponding cover layer faces the light-shielding layer.
  • the auxiliary spacers and the first main spacers are both arranged on the cover layer away from the first substrate. On one side, the auxiliary spacer and the first main spacer are arranged facing the light-shielding area.
  • the step difference between the light-shielding area and the sub-pixel area can be used to form an auxiliary spacer of a certain height, which is beneficial to the formation of the auxiliary spacer.
  • color photoresist includes red photoresist, blue photoresist and green photoresist.
  • the medium red photoresist, blue photoresist and green photoresist are each designed in an island shape, forming a third groove on the black light-shielding layer, and the covering layer forms a fourth groove corresponding to the third groove. In this way, the fourth groove is used.
  • the step difference between the part and the part of the cover layer facing the sub-pixel area directly forms an auxiliary spacer on the cover layer, ensuring that the formation of the auxiliary spacer is not affected by the thickness of the liquid crystal cell of high-brush products.
  • a color photoresist layer and a cover layer are laminated on the side of the first substrate close to the array substrate, and the cover layer is located on the side of the color photoresist layer away from the first substrate;
  • the color photoresist layer includes a color photoresist and a black light-shielding layer located in the light-shielding area, and the color photoresist is located in the sub-pixel area;
  • the thickness of the black light-shielding layer is greater than the thickness of the color photoresist, the part of the covering layer facing the black light-shielding layer is higher than the part of the covering layer facing the sub-pixel area, and the covering layer facing the black light-shielding layer Parts of the layer are reused as auxiliary spacers.
  • this step difference can be used as an auxiliary spacer, and the first main spacer can be formed on the color filter substrate side and the second main spacer can be formed on the array substrate side.
  • An embodiment of the present disclosure also provides a display panel, including a box-shaped color filter substrate and an array substrate 20;
  • the color filter substrate includes a first substrate and a plurality of first main spacers located on the side of the first substrate close to the array substrate 20;
  • the array substrate 20 includes a second substrate 200, a thin film transistor layer 201, a pixel electrode layer 202 and a flat layer 203 which are stacked in sequence.
  • the flat layer 203 is provided with a plurality of second main spacers 204 and a plurality of second main spacers 204 on one side close to the color filter substrate.
  • An auxiliary spacer 30, the first main spacer and the second main spacer 204 are arranged correspondingly in the box-facing direction;
  • the first substrate includes a plurality of sub-pixel areas distributed in an array and a light-shielding area located between two adjacent rows of sub-pixel areas; wherein,
  • the orthographic projections of the first main spacer and the auxiliary spacer 30 on the first substrate both fall in the light-shielding area. Inside.
  • the auxiliary spacers 30 are designed on the array substrate side.
  • the first main spacers on the color filter substrate side and the second main spacers on the array substrate side are in one-to-one contact in the direction of facing the box.
  • the first main spacer and the second main spacer are perpendicular to each other.
  • a passivation layer can be formed on the flat layer, and multiple protrusions can be formed as auxiliary spacers 30 through deposition and dry etching, with a thickness of 0.25 ⁇ m-0.45 ⁇ m, ensuring that the formation of auxiliary spacers is not affected by the box thickness of high-brush products. Impact.
  • a passivation layer 205 is provided on the side of the flat layer away from the second substrate 200.
  • a plurality of sixth grooves 206 are provided on the surface of the passivation layer 205 away from the second substrate 200.
  • the auxiliary spacers 30 are on The orthographic projection of the second substrate 200 at least partially overlaps the orthographic projection of the sixth groove 206 on the second substrate.
  • the orthographic projection of the auxiliary spacer 30 on the second substrate 200 falls within the orthographic projection range of the sixth groove 206 on the second substrate 200 , and the area of the passivation layer 205 except the sixth groove 206 A second main spacer 204 is provided inside.
  • a passivation layer 205 is formed on the flat layer, and a sixth groove 206 is formed by etching.
  • the depth of the sixth groove 206 is preferably 0.25 ⁇ m-0.45 ⁇ m; an auxiliary spacer is formed in the sixth groove 206.
  • the corresponding auxiliary spacer includes a portion located within the sixth groove 206 and a portion located outside the sixth groove 206 , and a second main spacer is provided in the area outside the sixth groove 206 at the passivation layer 205 material, so that the auxiliary spacer has a certain step relative to the second main spacer, thereby ensuring that the formation of the auxiliary spacer is not affected by the box thickness of high-brush products.
  • An embodiment of the present disclosure also provides a display device, including the above-mentioned display panel.
  • An embodiment of the present disclosure also provides a method for manufacturing a display panel, including:
  • the color filter substrate includes a first substrate and a first main spacer and a plurality of auxiliary spacers formed on one side of the first substrate.
  • the first substrate includes a plurality of sub-pixel regions distributed in an array and located on The light-shielding area between two adjacent rows of sub-pixel areas;
  • the array substrate includes a second substrate and a second main spacer formed on one side of the second substrate.
  • the first main spacer and the second main spacer are in one-to-one correspondence in the box-facing direction. touch;
  • the color filter substrate and the array substrate are arranged oppositely; wherein,
  • the orthographic projections of the first main spacer and the auxiliary spacer on the first substrate both fall within the light-shielding area,
  • the distance between an end of the auxiliary spacer close to the first substrate and the first substrate is less than or equal to the distance between the bottom end of the first main spacer and the first substrate.
  • a black light-shielding layer, a color filter layer and a color filter layer are formed on the side of the first substrate close to the array substrate.
  • Photoresist layer red photoresist, blue photoresist and green photoresist
  • cover layer the color photoresist layer has an opening exposing the black light-shielding layer, and is formed simultaneously using the patterning process of forming red photoresist, blue photoresist and green photoresist Expose the opening of the black light-shielding layer, which does not increase the process flow and the number of masks;
  • a patterning process is performed to form an auxiliary spacer in the first groove, and a first main spacer in the area of the cover layer other than the first groove.
  • the first substrate is sequentially placed on the side close to the array substrate.
  • a black light-shielding layer, a color photoresist layer (red photoresist, blue photoresist and green photoresist) and a covering layer are formed, and the color photoresist layer covers the black light-shielding layer.
  • a patterning process is performed to form an auxiliary spacer in the second groove, and a first main spacer is formed in the area of the cover layer except the first groove.
  • a black light-shielding layer and a color photoresist layer are formed on the first substrate.
  • the black light-shielding layer is located in the light-shielding area, and the color photoresist layer is located in the sub-pixel. area; then, a covering coating is formed on the color photoresist layer, and a covering layer with a fourth groove is formed using a patterning process (glue coating, masking, exposure, development and etching);
  • a patterning process is performed to form an auxiliary spacer in the fourth groove, and a first main spacer is formed in the area of the cover layer except for the fourth groove.
  • a black light-shielding layer and a color photoresist layer are formed on the first substrate.
  • the black light-shielding layer is located in the light-shielding area, and the color photoresist layer is located in the sub-pixel area. ;
  • a covering layer is formed on the side of the color photoresist layer close to the array substrate, and a covering layer with a fifth groove is formed using a patterning process (glue coating, masking, exposure, development and etching).
  • the covering layer also covers black shading layer;
  • a patterning process is performed to form an auxiliary spacer in the fifth groove, and the covering layer A first main spacer is formed in the area except the fifth groove.
  • a black light-shielding layer and a color photoresist layer are formed on the first substrate.
  • the black light-shielding layer is located in the light-shielding area, and the color photoresist layer is located in the sub-pixel area. , the thickness of the black light-shielding layer is lower than the thickness of the color photoresist layer;
  • a covering layer is formed on the side of the color photoresist layer close to the array substrate.
  • the covering layer also covers the black light-shielding layer. Since the thickness of the black light-shielding layer is lower than the thickness of the color photoresist layer, correspondingly, the part of the covering layer facing the light-shielding area A step difference is formed with the part of the covering layer facing the sub-pixel area;
  • An auxiliary spacer and a first main spacer are formed on the part of the covering layer facing the light-shielding area.
  • An embodiment of the present disclosure also provides a method for manufacturing a display panel, including:
  • the color filter substrate includes a first substrate and a first main spacer formed on one side of the first substrate.
  • the first substrate includes a plurality of sub-pixel regions distributed in an array and sub-pixels located in two adjacent rows. shading area between areas;
  • the array substrate includes a second main spacer and a plurality of auxiliary spacers formed on one side of the second substrate box.
  • the first main spacer and the second main spacer are on opposite sides of the second substrate.
  • the boxes are in one-to-one contact;
  • the color filter substrate and the array substrate are arranged oppositely; wherein,
  • the orthographic projections of the first main spacer and the auxiliary spacer on the first substrate both fall within the light-shielding area.
  • the array substrate includes a second substrate, a thin film transistor layer, a pixel electrode layer and a flat layer that are stacked in sequence, and one step is performed on the side of the flat layer away from the second substrate.
  • the passivation process by depositing a passivation film layer and etching, a protrusion with a thickness of 0.25 ⁇ m-0.45 ⁇ m is formed at the location where the auxiliary spacer needs to be formed, which is used as an auxiliary spacer.
  • the array substrate includes a second substrate, a thin film transistor layer, a pixel electrode layer and a flat layer that are stacked in sequence, and one step is performed on the side of the flat layer facing away from the second substrate.
  • Passivation process forming a passivation layer with a sixth groove by depositing a passivation film layer and etching, forming an auxiliary spacer in the sixth groove, and forming an auxiliary spacer in the area of the passivation layer except for the sixth groove.
  • a second main spacer is formed inside.
  • the distance between the end of the auxiliary spacer close to the second substrate and the second substrate is less than or equal to the distance between the end of the second main spacer close to the second substrate and the distance between the end of the second main spacer and the second substrate. spacing between substrates.
  • the first main spacer provided on the color filter substrate side The extension direction of the object is the same as the extension direction of the gate line, the extension direction of the second main spacer arranged on the array substrate side is the same as the extension direction of the data line, and the extension direction of the auxiliary spacer arranged on the color filter substrate side or the array substrate side
  • the direction is the same as the extending direction of the gate line, that is, in the direction parallel to the first substrate or the second substrate, the auxiliary spacers provided on the color filter substrate side or the array substrate side, and the auxiliary spacers provided on the color filter substrate side.
  • the first main spacer and the second main spacer provided on the side of the array substrate are both in the shape of strips;
  • the auxiliary spacer is provided on the color filter substrate side or the array substrate side, the first main spacer is provided on the color filter substrate side, and the first main spacer is provided on the array substrate side.
  • the second main spacers are all flat and thin, that is, non-column structure.
  • the auxiliary spacer is arranged in the light-shielding area of the color filter substrate, and the auxiliary spacer and the first main spacer on the color filter substrate are not in the same plane.
  • the auxiliary spacer can be well formed, which is conducive to the formation of the auxiliary spacer in high-brush display products; or, the auxiliary spacer and the first main spacer are arranged in the same plane, and the auxiliary spacer is close to the One end of the first substrate is closer to the first substrate than the top of the pixel area, and the step difference allows the auxiliary spacer to be well formed, which is beneficial to the formation of the auxiliary spacer in high-brush display products; or, the auxiliary spacer is Being arranged on the side of the array substrate is also beneficial to the formation of auxiliary spacers in high-brush display products.

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Abstract

一种显示面板和显示装置，显示面板包括对盒成形的阵列基板（20）和彩膜基板（10）；彩膜基板（10）包括第一衬底（100）和位于第一衬底（100）靠近阵列基板（20）一侧的多个第一主隔垫物（101），阵列基板（20）包括第二衬底（200）和多个第二主隔垫物（204），第一主隔垫物（101）和第二主隔垫物（204）在对盒方向上对应设置；第一衬底（100）包括阵列分布的多个子像素区和多行遮光区，在第一衬底（100）靠近阵列基板的一侧设有辅隔垫物（30），第一主隔垫物（101）和辅隔垫物（30）在第一衬底（100）上的正投影均落在遮光区内，辅隔垫物（30）的靠近第一衬底（100）的一端距第一衬底（100）的间距小于等于第一主隔垫物（101）的靠近第一衬底（100）的一端距第一衬底（100）的间距；或者，在第二衬底（200）靠近彩膜基板（10）的一侧设有辅隔垫物（30），辅隔垫物（30）的靠近第二衬底（200）的一端距第二衬底（200）的间距小于等于第二主隔垫物（204）的靠近第二衬底（200）的一端距第二衬底（200）的间距，利用段差使得辅隔垫物（30）能够良好成形，有利于高刷显示产品中辅隔垫物（30）的成形。

Description

显示面板和显示装置
本公开要求于2022年04月27日提交的申请号为202210451994.3、发明名称为“显示面板和显示装置”的中国专利申请的优先权，其全部内容通过引用结合在本公开中。
技术领域
本公开涉及一种显示面板和显示装置。
背景技术
薄膜晶体管液晶显示装置(Thin Film TransistorLiduid Crystal Display，简称TFT-LCD)以其体积小、功耗低、无辐射、制造成本相对较低等优点占据了显示面板的市场。显示面板包括对盒设置的阵列基板、彩膜基板以及位于阵列基板和彩膜基板之间的液晶层。液晶层厚度(即盒厚)主要通过形成在阵列基板和彩膜基板之间的隔垫物(Photo Spacer，简称PS)来控制，隔垫物可以形成在阵列基板上，也可以形成在彩膜基板上。
发明内容
鉴于相关技术中的上述缺陷或不足，期望提供一种显示面板和显示装置。
第一方面，本公开实施例提供一种显示面板，包括对盒成形的阵列基板和彩膜基板；
所述彩膜基板包括第一衬底和位于所述第一衬底靠近所述阵列基板一侧的多个第一主隔垫物和多个辅隔垫物，所述阵列基板包括第二衬底和位于所述第二衬底靠近所述彩膜基板一侧的多个第二主隔垫物，所述第一主隔垫物和所述第二主隔垫物在对盒方向上对应设置；
所述第一衬底包括阵列分布的多个子像素区和多行遮光区，相邻 两行所述遮光区之间分布有至少一行所述子像素区；其中，
所述第一主隔垫物和所述辅隔垫物在所述第一衬底上的正投影均落在所述遮光区内，所述辅隔垫物的靠近所述第一衬底的一端距所述第一衬底的间距小于等于所述第一主隔垫物的靠近所述第一衬底的一端距所述第一衬底的间距。
可选地，所述第一衬底靠近所述阵列基板的一侧依次层叠设有黑色遮光层、彩色光阻层和覆盖层，所述黑色遮光层位于所述遮光区，所述彩色光阻层具有多个露出所述黑色遮光层的开口；
所述覆盖层远离所述第一衬底的表面设有多个第一凹槽，多个所述第一凹槽与多个所述开口在垂直于所述第一衬底的方向上对应设置，且所述第一凹槽与所述开口在所述第一衬底的正投影至少部分重叠；
所述辅隔垫物在所述第一衬底的正投影与所述第一凹槽在所述第一衬底的正投影至少部分重叠。
可选地，所述第一凹槽在所述第一衬底的正投影落在所述开口在所述第一衬底的正投影范围内；和/或，
所述辅隔垫物在所述第一衬底的正投影落在所述第一凹槽在所述第一衬底的正投影范围内。
可选地，所述第一衬底靠近所述阵列基板的一侧依次层叠设有黑色遮光层、彩色光阻层和覆盖层，所述黑色遮光层位于所述遮光区，所述彩色光阻层覆盖所述黑色遮光层；
所述覆盖层远离所述第一衬底的表面设有多个第二凹槽，所述第二凹槽在所述第一衬底上的正投影落在所述遮光区内；
所述辅隔垫物在所述第一衬底的正投影与所述第二凹槽在所述第一衬底的正投影至少部分重叠。
可选地，所述辅隔垫物在所述第一衬底的正投影落在所述第二凹槽在所述第一衬底的正投影范围内。
可选地，所述彩色光阻层包括红色光阻、绿色光阻和蓝色光阻，所述红色光阻、所述蓝色光阻和所述绿色光阻分别呈列状排布；和/或，
所述彩色光阻层包括红色光阻、绿色光阻和蓝色光阻，所述红色光阻、所述绿色光阻或所述蓝色光阻中的任一覆盖所述遮光区。
可选地，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色光阻层位于所述子像素区，所述黑色遮光层位于所述遮光区；
所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖层覆盖所述黑色遮光层；
所述黑色遮光层远离所述第一衬底的表面设有多个第三凹槽，所述覆盖层远离所述第一衬底的表面设有多个第四凹槽，多个所述第四凹槽与多个所述第三凹槽在垂直于所述第一衬底的方向上对应设置，且所述第四凹槽与所述第三凹槽在所述第一衬底的正投影至少部分重叠；
所述辅隔垫物在所述第一衬底的正投影与所述第四凹槽在所述第一衬底的正投影至少部分重叠。
可选地，所述第四凹槽在所述第一衬底的正投影落在所述开口在所述第三凹槽的正投影范围内；和/或，
所述辅隔垫物在所述第一衬底的正投影落在所述第四凹槽在所述第一衬底的正投影范围内。
可选地，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色光阻层位于所述子像素区，所述黑色遮光层位于所述遮光区；
所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖层覆盖所述黑色遮光层；
所述覆盖层远离所述第一衬底的表面设有多个第五凹槽，所述辅隔垫物在所述第一衬底的正投影与所述第五凹槽在所述第一衬底的正投影至少部分重叠。
可选地，所述辅隔垫物在所述第一衬底的正投影落在所述第五凹槽在所述第一衬底的正投影范围内。
可选地，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色光阻层位于所述子像素区，所述黑色遮光层位于所述遮光区；
所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖 层覆盖所述黑色遮光层；其中，
所述黑色遮光层远离所述第一衬底的端部较所述彩色光阻层远离所述第一衬底的端部靠近所述第一衬底，所述辅隔垫物和所述第一主隔垫物均设置在所述覆盖层远离第一衬底的一侧；或者，
在垂直于所述第一衬底的方向上，所述黑色遮光层的厚度大于所述彩色光阻的厚度，所述覆盖层正对所述黑色遮光层的部分高于所述覆盖层正对所述子像素区的部分，所述覆盖层正对所述黑色遮光层的部分复用为所述辅隔垫物。
第二方面，本公开提供一种显示面板，包括对盒成形的阵列基板和彩膜基板；
所述彩膜基板包括第一衬底和位于所述第一衬底靠近所述阵列基板一侧的多个第一主隔垫物；
所述阵列基板包括依次层叠设置的第二衬底、薄膜晶体管层、像素电极层和平坦层，所述平坦层靠近所述彩膜基板一侧设有多个第二主隔垫物和多个辅隔垫物，所述第一主隔垫物和所述第二主隔垫物在对盒方向上对应设置；
所述第一衬底包括阵列分布的多个子像素区和位于相邻两行所述子像素区之间的遮光区；其中，
所述第一主隔垫物和所述辅隔垫物在所述第一衬底上的正投影均落在所述遮光区内。
可选地，所述平坦层远离所述第二衬底的一侧还设有钝化层，所述钝化层远离所述第二衬底的表面设有多个第六凹槽，所述辅隔垫物在所述第二衬底的正投影与所述第六凹槽在所述第二衬底的正投影至少部分重叠。
可选地，所述辅隔垫物在所述第二衬底的正投影落在所述第六凹槽在所述第二衬底的正投影范围内。
第三方面，本公开实施例提供一种显示装置，包括如上所述的显示面板。
附图说明
图1为相关技术中辅隔垫物形貌缺失的结构示意图；
图2为本公开实施例提供的彩膜基板的一种结构示意图；
图3为沿图2中A-A线的截面示意图；
图4为沿图2中B-B线的一种截面示意图；
图5为沿图2中B-B线的另一种截面示意图；
图6为本公开实施例提供的彩膜基板的另一种结构示意图；
图7为沿图6中C-C线的截面示意图；
图8为沿图6中D-D线的一种截面示意图；
图9为沿图6中D-D线的另一种截面示意图；
图10为本公开实施例提供的彩膜基板的又一种结构示意图；
图11为沿图10中E-E线的一种截面示意图；
图12为沿图10中E-E线的另一种截面示意图；
图13为沿图10中E-E线的又一种截面示意图；
图14为本公开实施例提供的阵列基板的一种结构示意图；
图15为本公开实施例提供的阵列基板的另一种结构示意图。
具体实施方式
下面结合附图和实施例对本公开作进一步的详细说明。可以理解的是，此处所描述的具体实施例仅仅用于解释相关公开，而非对该公开的限定。另外还需要说明的是，为了便于描述，附图中仅示出了与公开相关的部分。
需要说明的是，在不冲突的情况下，本公开中的实施例及实施例中的特征可以相互组合。下面将参考附图并结合实施例来详细说明本公开。
在本公开的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“高度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本公开和简化描述，而不是指示或暗 示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本公开的限制。
本公开采用第一、第二等来描述各种信息，但这些信息不应局限于这些术语。这些术语仅用来将同一类型的信息彼此区分开。例如在不脱离本公开范围的情况下，第一信息也可以被称为第二信息，类似地，第二信息也可以被称为第一信息。
在本公开的描述中，需要说明的是，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，还可以是两个元件内部的连通，可以是无线连接，也可以是有线连接。对于本领域的普通技术人员而言，可以具体情况理解上述术语在本公开中的具体含义。
目前高刷新率显示产品逐渐普及，随着众多240Hz、360Hz高刷产品的上市，甚至480Hz高刷产品也即将推出，可带来更丝滑流畅的视觉体验。而高刷产品的盒厚与灰阶响应时间有关系，液晶量一定时，灰阶响应时间越快，刷新率越高，盒厚越低，辅隔垫物30的高度越小。例如刷新率240Hz，盒厚2.4μm，Sub PS的高度为2.67μm；刷新率340Hz，盒厚2.2μm，Sub PS的高度为0.84μm；刷新率480Hz，盒厚1.6μm，Sub PS的高度为0.39μm。可见，刷新率越高，液晶量一定时，盒厚越小。
相关技术中，在XPS设计的基础上，通常将辅隔垫物(Sub PS)设计在彩膜基板侧，辅隔垫物(Sub PS)和主隔垫物(Main PS)设计在同一平面上。而刷新率越高，盒厚越小，会导致Sub PS的高度越小，容易出现Sub PS形貌变形或者缺失的问题，甚至出现Sub PS无法实现的问题。
参照图1，ab线所涉范围内的主隔垫物、辅隔垫物的结构可详见图1中的曲线图，图1的曲线图中存在辅隔垫物(Sub PS)形貌缺失的问题，即图1中“Sub PS变形”所指代的部位。
请参考图2或图6，本公开实施例提供一种显示面板，包括对盒 成形的彩膜基板10和阵列基板；
彩膜基板10包括第一衬底100和位于第一衬底100靠近阵列基板一侧的多个第一主隔垫物101和多个辅隔垫物30，阵列基板包括第二衬底和位于第二衬底靠近彩膜基板10一侧的多个第二主隔垫物，第一主隔垫物101和第二主隔垫物在对盒方向上对应设置；
第一衬底100包括阵列分布的多个子像素区和位于相邻两行子像素区之间的遮光区；其中，
第一主隔垫物101和辅隔垫物30在第一衬底100上的正投影均落在遮光区内，辅隔垫物30的靠近所述第一衬底的一端较第一主隔垫物101的靠近所述第一衬底的一端靠近第一衬底100。
可以理解的是，本公开实施例中，阵列基板具有多条栅线和多条数据线，多条栅线沿横向分布，多条数据线沿纵向分布；在对盒方向上，彩膜基板10上的遮光区与阵列基板上的栅线正对设置；阵列分布的多个子像素区构成显示区。
为了优化隔垫物造成亮度不均匀和LCD的强度，采用XPS设计方法，优选第一主隔垫物沿着栅线延伸的方向布置，第二主隔垫物沿着数据线延伸的方向分布；在平行于第一衬底(或第二衬底)的方向上，多个第一主隔垫物和多个第二主隔垫物一一对应相接触，第一主隔垫物和第二主隔垫物之间相互垂直，如此设计能够保证第一主隔垫物和第二主隔垫物之间接触的可靠性。
本实施例中辅隔垫物30设计在彩膜基板10侧，将辅隔垫物30和第一主隔垫物101正对遮光区设置，且辅隔垫物30和第一主隔垫物101设计在两个不同的平面内。具体的，相对于第一衬底100而言，辅隔垫物30较第一主隔垫物101靠近第一衬底100，从而在垂直于第一衬底100的方向上确保辅隔垫物30的成形高度，确保高刷产品的液晶盒厚比较小的情况下，辅隔垫物30能够成形。
作为一种可选的实施方式，参照图2至图4，或者参照图6至图8，
第一衬底100靠近阵列基板的一侧依次层叠设有黑色遮光层104、彩色光阻层103和覆盖层102，黑色遮光层104位于遮光区，彩色光阻层103具有露出黑色遮光层104的开口；
覆盖层102远离第一衬底100的表面设有多个第一凹槽105，多个第一凹槽105与多个开口在垂直于第一衬底100的方向上对应设置，且第一凹槽105与开口在第一衬底的正投影至少部分重叠；辅隔垫物30在第一衬底100的正投影与第一凹槽105在第一衬底的正投影至少部分重叠。
具体的，第一凹槽105在第一衬底100的正投影落在开口在第一衬底的正投影范围内；和/或，
辅隔垫物30在第一衬底100的正投影落在第一凹槽105在第一衬底100的正投影范围内，在覆盖层102除第一凹槽105之外的区域内设有第一主隔垫物101。
该实施例中，彩色光阻层103覆盖黑色遮光层104且具有露出黑色遮光层104的开口，覆盖层102覆盖彩色光阻层103和开口后，形成正对开口的第一凹槽105，如此覆盖层103正对第一凹槽105的部分与覆盖层103正对像素区的部分形成段差，利用该段差在第一凹槽105内形成辅隔垫物，从而利于辅隔垫物30的成形，第一主隔垫物101形成在覆盖层102除第一凹槽105之外的区域内，使得辅隔垫物30相对于第一主隔垫物具有一定的段差，如此设计确保辅隔垫物的成形不受高刷产品的盒厚的影响。
若高刷产品的刷新率为480Hz，可选的，黑色遮光层104的厚度为0.99μm-2.43μm，覆盖层102的厚度为1.1μm-1.5μm；
第一凹槽105的深度为0.5μm-0.7μm，辅隔垫物30的高度为0.9μm-1.2μm；
辅隔垫物30远离第一衬底100的端部与第一主隔垫物101远离第一衬底100的端部之间的段差为0.25μm-0.45μm；
第二主隔垫物的高度与第一主隔垫物的高度相同。
如此设计，既能够确保第一主隔垫物和第二主隔垫物之间的接触的可靠性，又能确保高刷产品中辅隔垫物的有效成形。
需要说明的是，彩膜基板10的第一衬底100朝向阵列基板的一侧设有黑矩阵(Black Matrix，简称BM)，一般黑矩阵包括位于相邻行子像素之间的部分、位于相邻列子像素之间的部分以及位于像素区周 边的部分；
在本公开实施例中，考虑子像素区的大小、发光显示的效果，参照图2，优选相邻列子像素区之间紧邻设计，不通过黑矩阵隔开，黑矩阵包括位于相邻行子像素之间的黑色遮光层。
作为一种可选的实施方式，参照图2、图3和图5，或者参照图6、图7和图9，第一衬底100靠近阵列基板的一侧依次层叠设有黑色遮光层104、彩色光阻层103和覆盖层102，黑色遮光层104位于遮光区，彩色光阻层103覆盖黑色遮光层；
覆盖层102远离第一衬底100的表面设有多个第二凹槽106，第二凹槽106在第一衬底100上的正投影落在遮光区内；
辅隔垫物30在第一衬底100的正投影与第二凹槽106在第一衬底的正投影至少部分重叠。
具体的，辅隔垫物30在第一衬底100的正投影落在第二凹槽106在第一衬底的正投影范围内，在覆盖层102除第二凹槽106之外的区域内设有第一主隔垫物101。
该实施例利用覆盖层上的第二凹槽106来形成辅隔垫物，确保辅隔垫物的成形不受高刷产品的液晶盒厚的影响。
若高刷产品的刷新率为480Hz，可选的，黑色遮光层的厚度为0.99μm-2.43μm，覆盖层的厚度为1.1μm-1.5μm；
第二凹槽的深度为0.5μm-0.7μm，辅隔垫物的高度为0.9-1.2um；
辅隔垫物远离第一衬底的端部与第一主隔垫物远离第一衬底的端部之间的段差为0.25μm-0.45μm；
第二主隔垫物的高度与第一主隔垫物的高度相同。
如此设计，既能够确保第一主隔垫物和第二主隔垫物之间的接触的可靠性，又能确保高刷产品中辅隔垫物的有效成形。
进一步地，彩色光阻层103包括红色(Red)光阻、绿色(Green)光阻和蓝色(Blue)光阻，红色光阻、所述蓝色光阻和所述绿色光阻分别呈列状排布。
本实施例中，彩色光阻层103除了覆盖各个子像素区，还覆盖黑色遮光层104。例如：参照图4或图8，彩色光阻具有露出黑色遮光层 的开口，利用红色光阻、绿色光阻和蓝色光阻的构图工艺同时形成开口。
参照图2所示的彩膜基板，每一行自左至右彩色光阻均依次为蓝色光阻、绿色光阻、红色光阻、蓝色光阻、绿色光阻、红色光阻和蓝色光阻，即蓝色光阻、绿色光阻、红色光阻分别呈列状设计，以一列红色光阻为例，一列红色光阻覆盖一列子像素区，且覆盖位于一列中的相邻两个子像素区之间的遮光区。
作为一种可选的实施方式，参照图6所示的彩膜基板，彩色光阻层103包括红色光阻、绿色光阻和蓝色光阻，红色光阻、绿色光阻或蓝色光阻中的任一覆盖遮光区。
例如，红色光阻整面设计，绿色光阻、蓝色光阻均呈岛状设计，红色光阻整面设计是指红色光阻除了覆盖红色子像素区，红色光阻还覆盖遮光区；或者，蓝色光阻整面设计，绿色光阻、红色光阻均呈岛状设计，蓝色光阻整面设计是指蓝色光阻除了覆盖蓝色子像素区，蓝色光阻还覆盖遮光区；或者，绿色光阻整面覆盖，红色光阻、蓝色光阻均呈岛状设计，绿色光阻整面设计是指绿色光阻除了覆盖绿色子像素区，绿色光阻还覆盖遮光区。图6中优选蓝色光阻整面设计的结构；或者，参照图5或图9，彩色光阻整体覆盖黑色遮光层，例如蓝色光阻覆盖黑色遮光层。
请参照图10，本公开实施例还提供一种显示面板，包括对盒成形的彩膜基板和阵列基板；
彩膜基板包括第一衬底和位于第一衬底靠近阵列基板一侧的多个第一主隔垫物101和多个辅隔垫物30，阵列基板包括第二衬底和位于第二衬底靠近彩膜基板10一侧的多个第二主隔垫物，第一主隔垫物101和第二主隔垫物在对盒方向上一一对应相接触；
第一衬底100包括阵列分布的多个子像素区和位于相邻两行子像素区之间的遮光区；其中，
第一主隔垫物和辅隔垫物在第一衬底上的正投影均落在遮光区内，辅隔垫物的靠近所述第一衬底的一端距第一衬底的间距小于等于第一主隔垫物的靠近所述第一衬底的一端距第一衬底的间距。
作为一种可选的实施方式，第一衬底100靠近阵列基板的一侧设有彩色光阻层103和黑色遮光层104，彩色光阻层103位于子像素区，黑色遮光层104位于遮光区；
彩色光阻层103远离第一衬底的一侧设有覆盖层102，覆盖层102还覆盖黑色遮光层103；
参照图10和图11，黑色遮光层104远离第一衬底100的表面设有多个第三凹槽，覆盖层102远离第一衬底的表面设有多个第四凹槽107，多个第四凹槽107与多个第三凹槽在垂直于第一衬底的方向上对应设置，且第四凹槽与第三凹槽在第一衬底的正投影至少部分重叠；
辅隔垫物30在第一衬底100的正投影与第四凹槽107在第一衬底的正投影至少部分重叠。
具体的，第四凹槽107在第一衬底的正投影落在开口在第三凹槽的正投影范围内；和/或，
辅隔垫物30在第一衬底100的正投影落在第四凹槽107在第一衬底的正投影范围内，覆盖层102除第四凹槽之外的区域内设有第一主隔垫物101。
又或者，参照图10和图12，覆盖层102远离第一衬底100的表面设有多个第五凹槽108，辅隔垫物30在第一衬底的正投影与第五凹槽108在第一衬底的正投影至少部分重叠。
具体的，辅隔垫物30在第一衬底100的正投影落在第五凹槽108在第一衬底100的正投影范围内，覆盖层102除第五凹槽108之外的区域内设有第一主隔垫物101。
又或者，参照图10和图13，黑色遮光层104远离第一衬底100的端部较彩色光阻远离第一衬底100的端部靠近第一衬底100，相应的覆盖层正对遮光区的部分与覆盖层正对显示区(显示区为各个子像素区)的部分之间形成一定的段差，辅隔垫物和第一主隔垫物均设置在覆盖层远离第一衬底的一侧，且辅隔垫物和第一主隔垫物正对遮光区设置，利用遮光区和子像素区之间的段差可以形成一定高度的辅隔垫物，有利于辅隔垫物的成形。
其中，彩色光阻包括红色光阻、蓝色光阻和绿色光阻。本实施例 中红色光阻、蓝色光阻和绿色光阻分别呈岛状设计，在黑色遮光层上形成第三凹槽，覆盖层在对应第三凹槽的部位形成第四凹槽，如此利用第四凹槽来设计辅隔垫物；或者，直接在覆盖层上形成第五凹槽，确保辅隔垫物的成形不受高刷产品的液晶盒厚的影响；或者，利用覆盖层正对遮光区的部分与覆盖层正对子像素区的部分之间的段差，直接在覆盖层上形成辅隔垫物，确保辅隔垫物的成形不受高刷产品的液晶盒厚的影响。
作为一种可选的实施方式，在第一衬底靠近阵列基板的一侧还层叠设有彩色光阻层和覆盖层，覆盖层位于彩色光阻层远离第一衬底的一侧；
彩色光阻层包括彩色光阻和位于遮光区内的黑色遮光层，彩色光阻位于子像素区内；其中，
在垂直于第一衬底的方向上，黑色遮光层的厚度大于彩色光阻的厚度，覆盖层正对黑色遮光层的部分高于覆盖层正对子像素区的部分，覆盖层正对黑色遮光层的部分复用为辅隔垫物。
在覆盖层完成之后，由于栅线上的黑色遮光层(Gate BM)与像素区内的段差有0.25μm，相应的，覆盖层正对遮光区的部分高于覆盖层正对子像素区的部分，可利用此段差当做辅隔垫物，分别在彩膜基板侧形成第一主隔垫物和在阵列基板侧形成第二主隔垫物即可。
本公开实施例还提供一种显示面板，包括对盒成形的彩膜基板和阵列基板20；
彩膜基板包括第一衬底和位于第一衬底靠近阵列基板20一侧的多个第一主隔垫物；
阵列基板20包括依次层叠设置的第二衬底200、薄膜晶体管层201、像素电极层202和平坦层203，平坦层203靠近彩膜基板一侧设有多个第二主隔垫物204和多个辅隔垫物30，第一主隔垫物和第二主隔垫物204在对盒方向上对应设置；
第一衬底包括阵列分布的多个子像素区和位于相邻两行子像素区之间的遮光区；其中，
第一主隔垫物和辅隔垫物30在第一衬底上的正投影均落在遮光区 内。
该实施例中，辅隔垫物30设计在阵列基板侧，彩膜基板侧的第一主隔垫物和阵列基板侧的第二主隔垫物在对盒方向上一一对应相接触，第一主隔垫物和第二主隔垫物之间相互垂直，如此设计能够保证第一主隔垫物和第二主隔垫物之间接触的可靠性。可在平坦层上形成钝化层，通过沉积、干刻形成多个凸起来作为辅隔垫物30，厚度为0.25μm-0.45μm，确保辅隔垫物的成形不受高刷产品的盒厚的影响。
进一步地，平坦层远离第二衬底200的一侧还设有钝化层205，钝化层205远离第二衬底200的表面设有多个第六凹槽206，辅隔垫物30在第二衬底200的正投影与第六凹槽206在第二衬底的正投影至少部分重叠。
具体的，辅隔垫物30在第二衬底200的正投影落在第六凹槽206在第二衬底200的正投影范围内，钝化层205除第六凹槽206之外的区域内设有第二主隔垫物204。
具体的，在平坦层上形成钝化层205，通过刻蚀形成第六凹槽206，第六凹槽206的深度优选为0.25μm-0.45μm；在第六凹槽206内形成辅隔垫物，相应的辅隔垫物包括位于第六凹槽206内的部分和位于第六凹槽206外的部分，在钝化层205处第六凹槽206之外的区域内设置第二主隔垫物，使得辅隔垫物相对于第二主隔垫物具有一定的段差，从而确保辅隔垫物的成形不受高刷产品的盒厚的影响。
本公开的实施例还提供一种显示装置，包括上述显示面板。
本公开实施例还提供一种显示面板的制备方法，包括：
制作彩膜基板，彩膜基板包括第一衬底和形成在第一衬底一侧的第一主隔垫物多个辅隔垫物，第一衬底包括阵列分布的多个子像素区和位于相邻两行子像素区之间的遮光区；
制作阵列基板，阵列基板包括第二衬底和形成在第二衬底一侧的第二主隔垫物，第一主隔垫物和第二主隔垫物在对盒方向上一一对应相接触；
将彩膜基板与阵列基板相对设置；其中，
第一主隔垫物和辅隔垫物在第一衬底上的正投影均落在遮光区内， 辅隔垫物的靠近所述第一衬底的一端距第一衬底的间距小于等于第一主隔垫物的底端距第一衬底的间距。
例如，针对图2至图4所示的显示面板，或者图6至图8所示的显示面板，制备彩膜基板时，在第一衬底靠近阵列基板的一侧依次形成黑色遮光层、彩色光阻层(红色光阻、蓝色光阻和绿色光阻)和覆盖层，彩色光阻层具有露出黑色遮光层的开口，利用形成红色光阻、蓝色光阻和绿色光阻的构图工艺同时形成露出黑色遮光层的开口，如此不会增加工艺流程和掩膜数量；
接着进行一次构图工艺，在第一凹槽内形成辅隔垫物，在覆盖层除第一凹槽之外的区域内形成第一主隔垫物。
例如，针对图2、图3和图5所示的显示面板，或者图6、图7和图9所示的显示面板，制备彩膜基板时，在第一衬底靠近阵列基板的一侧依次形成黑色遮光层、彩色光阻层(红色光阻、蓝色光阻和绿色光阻)和覆盖层，彩色光阻层覆盖黑色遮光层。
接着进行一次构图工艺，在第二凹槽内形成辅隔垫物，在覆盖层除第一凹槽之外的区域内形成第一主隔垫物。
例如，针对图10和图11所示的显示面板，制备彩膜基板时，在第一衬底上形成黑色遮光层和彩色光阻层，黑色遮光层位于遮光区，彩色光阻层位于子像素区；然后在彩色光阻层上形成覆盖涂层，利用一次构图工艺(涂胶、掩膜、曝光、显影及刻蚀)形成具有第四凹槽的覆盖层；
接着进行一次构图工艺，在第四凹槽内形成辅隔垫物，在覆盖层除第四凹槽之外的区域内形成第一主隔垫物。
例如，针对图10和图12所示的显示面板，制备彩膜基板时，第一衬底上形成黑色遮光层和彩色光阻层，黑色遮光层位于遮光区，彩色光阻层位于子像素区；
然后在彩色光阻层靠近阵列基板的一侧形成覆盖涂层，利用一次构图工艺(涂胶、掩膜、曝光、显影及刻蚀)形成具有第五凹槽的覆盖层，覆盖层还覆盖黑色遮光层；
接着进行一次构图工艺，在第五凹槽内形成辅隔垫物，在覆盖层 除第五凹槽之外的区域内形成第一主隔垫物。
例如，针对图10和图13所示的显示面板，制备彩膜基板时，第一衬底上形成黑色遮光层和彩色光阻层，黑色遮光层位于遮光区，彩色光阻层位于子像素区，黑色遮光层的厚度低于彩色光阻层的厚度；
然后在彩色光阻层靠近阵列基板的一侧形成覆盖层，覆盖层还覆盖黑色遮光层，由于黑色遮光层的厚度低于彩色光阻层的厚度，相应的，覆盖层正对遮光区的部分与覆盖层正对子像素区的部分形成段差；
在覆盖层正对遮光区的部分形成辅隔垫物和第一主隔垫物。
本公开实施例还提供一种显示面板的制备方法，包括：
制作彩膜基板，彩膜基板包括第一衬底和形成在第一衬底一侧的第一主隔垫物，第一衬底包括阵列分布的多个子像素区和位于相邻两行子像素区之间的遮光区；
制作阵列基板，阵列基板包括第二衬底盒形成在第二衬底一侧的第二主隔垫物和多个辅隔垫物，第一主隔垫物和第二主隔垫物在对盒方向上一一对应相接触；
将彩膜基板与阵列基板相对设置；其中，
第一主隔垫物和辅隔垫物在第一衬底上的正投影均落在遮光区内。
例如，针对包含图14所示阵列基板的显示面板，阵列基板包括依次层叠设置的第二衬底、薄膜晶体管层、像素电极层和平坦层，在平坦层背离第二衬底的一侧进行一次钝化工艺，通过沉积钝化膜层、刻蚀处理，在需要形成辅隔垫物的位置形成厚度为0.25μm-0.45μm厚度的凸起，用作辅隔垫物。
例如，针对包含图15所示阵列基板的显示面板，阵列基板包括依次层叠设置的第二衬底、薄膜晶体管层、像素电极层和平坦层，在平坦层背离第二衬底的一侧进行一次钝化工艺，通过沉积钝化膜层、刻蚀处理形成具有第六凹槽的钝化层，在第六凹槽内形成辅隔垫物，在钝化层除第六凹槽之外的区域内形成第二主隔垫物。所述辅隔垫物的靠近所述第二衬底的一端距所述第二衬底的间距小于等于所述第二主隔垫物的靠近所述第二衬底的一端距所述第二衬底的间距。
在本公开的上述任一实施例中，设置在彩膜基板侧的第一主隔垫 物的延伸方向同栅线的延伸方向，设置在阵列基板侧的第二主隔垫物的延伸方向同数据线的延伸方向，设置在彩膜基板侧或阵列基板侧的辅隔垫物的延伸方向同栅线的延伸方向，也即，在平行于第一衬底或第二衬底的方向上，设置在彩膜基板侧或阵列基板侧的辅隔垫物、设置在彩膜基板侧的第一主隔垫物以及设置在阵列基板侧的第二主隔垫物均呈长条状；
基于彩膜基板的厚度方向或阵列基板的厚度方向，设置在彩膜基板侧或阵列基板侧的辅隔垫物、设置在彩膜基板侧的第一主隔垫物以及设置在阵列基板侧的第二主隔垫物均呈扁薄状，即非柱状结构。
本公开实施例提供的显示面板和显示装置，将辅隔垫物设置在彩膜基板的遮光区内，辅隔垫物和彩膜基板上的第一主隔垫物不在同一平面内，利用段差使得辅隔垫物能够良好成形，有利于高刷显示产品中辅隔垫物的成形；或者，将辅隔垫物和第一主隔垫物设置在同一平面内，辅隔垫物的靠近所述第一衬底的一端较像素区的顶部靠近第一衬底，利用段差使得辅隔垫物能够良好成形，有利于高刷显示产品中辅隔垫物的成形；或者，将辅隔垫物设置在阵列基板侧，也有利于高刷显示产品中辅隔垫物的成形。
以上描述仅为本公开的较佳实施例以及对所运用技术原理的说明。本领域技术人员应当理解，本公开中所涉及的公开范围，并不限于上述技术特征的特定组合而成的技术方案，同时也应涵盖在不脱离发明构思的情况下，由上述技术特征或其等同特征进行任意组合而形成的其它技术方案。例如上述特征与本公开中公开的(但不限于)具有类似功能的技术特征进行互相替换而形成的技术方案。

Claims (20)

  1. 一种显示面板，其中，包括对盒成形的阵列基板和彩膜基板；
    所述彩膜基板包括第一衬底和位于所述第一衬底靠近所述阵列基板一侧的多个第一主隔垫物和多个辅隔垫物，所述阵列基板包括第二衬底和位于所述第二衬底靠近所述彩膜基板一侧的多个第二主隔垫物，所述第一主隔垫物和所述第二主隔垫物在对盒方向上对应设置；
    所述第一衬底包括阵列分布的多个子像素区和多行遮光区，相邻两行所述遮光区之间分布有至少一行所述子像素区；其中，
    所述第一主隔垫物和所述辅隔垫物在所述第一衬底上的正投影均落在所述遮光区内，所述辅隔垫物靠近所述第一衬底的一端距所述第一衬底的间距小于等于所述第一主隔垫物靠近所述第一衬底的一端距所述第一衬底的间距。
  2. 根据权利要求1所述的显示面板，其中，所述第一衬底靠近所述阵列基板的一侧依次层叠设有黑色遮光层、彩色光阻层和覆盖层，所述黑色遮光层位于所述遮光区，所述彩色光阻层具有多个露出所述黑色遮光层的开口；
    所述覆盖层远离所述第一衬底的表面设有多个第一凹槽，多个所述第一凹槽与多个所述开口在垂直于所述第一衬底的方向上对应设置，且所述第一凹槽与所述开口在所述第一衬底的正投影至少部分重叠；
    所述辅隔垫物在所述第一衬底的正投影与所述第一凹槽在所述第一衬底的正投影至少部分重叠。
  3. 根据权利要求2所述的显示面板，其中，所述第一凹槽在所述第一衬底的正投影落在所述开口在所述第一衬底的正投影范围内；和/或，
    所述辅隔垫物在所述第一衬底的正投影落在所述第一凹槽在所述第一衬底的正投影范围内。
  4. 根据权利要求3所述的显示面板，其中，所述第一主隔垫物被设置在所述覆盖层中除所述第一凹槽之外的区域内，所述第一主隔垫物和所述辅隔垫物利用一次构图工艺形成。
  5. 根据权利要求1所述的显示面板，其中，所述第一衬底靠近所述阵列基板的一侧依次层叠设有黑色遮光层、彩色光阻层和覆盖层，所述黑色遮光层位于所述遮光区，所述彩色光阻层覆盖所述黑色遮光层；
    所述覆盖层远离所述第一衬底的表面设有多个第二凹槽，所述第二凹槽在所述第一衬底上的正投影落在所述遮光区内；
    所述辅隔垫物在所述第一衬底的正投影与所述第二凹槽在所述第一衬底的正投影至少部分重叠。
  6. 根据权利要求5所述的显示面板，其中，所述辅隔垫物在所述第一衬底的正投影落在所述第二凹槽在所述第一衬底的正投影范围内。
  7. 根据权利要求6所述的显示面板，其中，所述第一主隔垫物被设置在所述覆盖层中除所述第二凹槽之外的区域内，所述第一主隔垫物和所述辅隔垫物利用一次构图工艺形成。
  8. 根据权利要求2-7任一项所述的显示面板，其中，所述彩色光阻层包括红色光阻、绿色光阻和蓝色光阻，所述红色光阻、所述蓝色光阻和所述绿色光阻分别呈列状排布；和/或，
    所述彩色光阻层包括红色光阻、绿色光阻和蓝色光阻，所述红色光阻、所述绿色光阻或所述蓝色光阻中的任一覆盖所述遮光区。
  9. 根据权利要求7所述的显示面板，其中，所述红色光阻呈整面设计，覆盖所述遮光区，所述绿色光阻和所述蓝色光阻均呈岛状设计，或，
    所述蓝色光阻呈整面设计，覆盖所述遮光区，所述绿色光阻和所 述红色光阻均呈岛状设计，或，
    所述绿色光阻呈整面设计，覆盖所述遮光区，所述红色光阻和所述蓝色光阻均呈岛状设计。
  10. 根据权利要求1所述的显示面板，其中，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色光阻层位于所述子像素区，所述黑色遮光层位于所述遮光区；
    所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖层覆盖所述黑色遮光层；
    所述黑色遮光层远离所述第一衬底的表面设有多个第三凹槽，所述覆盖层远离所述第一衬底的表面设有多个第四凹槽，多个所述第四凹槽与多个所述第三凹槽在垂直于所述第一衬底的方向上对应设置，且所述第四凹槽与所述第三凹槽在所述第一衬底的正投影至少部分重叠；
    所述辅隔垫物在所述第一衬底的正投影与所述第四凹槽在所述第一衬底的正投影至少部分重叠。
  11. 根据权利要求10所述的显示面板，其中，所述第四凹槽在所述第一衬底的正投影落在所述开口在所述第三凹槽的正投影范围内；和/或，
    所述辅隔垫物在所述第一衬底的正投影落在所述第四凹槽在所述第一衬底的正投影范围内。
  12. 根据权利要求11所述的显示面板，其中，所述第一主隔垫物被设置在所述覆盖层中除所述第四凹槽之外的区域内，所述第一主隔垫物和所述辅隔垫物利用一次构图工艺形成。
  13. 根据权利要求1所述的显示面板，其中，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色光阻层位于所述子像素区，所述黑色遮光层位于所述遮光区；
    所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖层覆盖所述黑色遮光层；
    所述覆盖层远离所述第一衬底的表面设有多个第五凹槽，所述辅隔垫物在所述第一衬底的正投影与所述第五凹槽在所述第一衬底的正投影至少部分重叠。
  14. 根据权利要求13所述的显示面板，其中，所述辅隔垫物在所述第一衬底的正投影落在所述第五凹槽在所述第一衬底的正投影范围内。
  15. 根据权利要求14所述的显示面板，其中，所述第一主隔垫物被设置在所述覆盖层中除所述第五凹槽之外的区域内，所述第一主隔垫物和所述辅隔垫物利用一次构图工艺形成。
  16. 根据权利要求1所述的显示面板，其中，所述第一衬底靠近所述阵列基板的一侧设有彩色光阻层和所述黑色遮光层，所述彩色遮光层位于所述子像素区，所述黑色遮光层位于所述遮光区；
    所述彩色光阻层远离所述第一衬底的一侧设有覆盖层，所述覆盖层覆盖所述黑色遮光层；其中，
    所述黑色遮光层远离所述第一衬底的端部较所述彩色光阻层远离所述第一衬底的端部靠近所述第一衬底，所述辅隔垫物和所述第一主隔垫物均设置在所述覆盖层远离第一衬底的一侧；或者，
    在垂直于所述第一衬底的方向上，所述黑色遮光层的厚度大于所述彩色光阻的厚度，所述覆盖层正对所述黑色遮光层的部分高于所述覆盖层正对所述子像素区的部分，所述覆盖层正对所述黑色遮光层的部分复用为所述辅隔垫物。
  17. 一种显示面板，其中，包括对盒成形的阵列基板和彩膜基板；
    所述彩膜基板包括第一衬底和位于所述第一衬底靠近所述阵列基板一侧的多个第一主隔垫物；
    所述阵列基板包括依次层叠设置的第二衬底、薄膜晶体管层、像素电极层和平坦层，所述平坦层靠近所述彩膜基板一侧设有多个第二主隔垫物和多个辅隔垫物，所述第一主隔垫物和所述第二主隔垫物在对盒方向上对应设置；
    所述第一衬底包括阵列分布的多个子像素区和位于相邻两行所述子像素区之间的遮光区；其中，
    所述第一主隔垫物和所述辅隔垫物在所述第一衬底上的正投影均落在所述遮光区内，所述辅隔垫物的靠近所述第二衬底的一端距所述第二衬底的间距小于等于所述第二主隔垫物的靠近所述第二衬底的一端距所述第二衬底的间距。
  18. 根据权利要求17所述的显示面板，其中，所述平坦层远离所述第二衬底的一侧还设有钝化层，所述钝化层远离所述第二衬底的表面设有多个第六凹槽，所述辅隔垫物在所述第二衬底的正投影与所述第六凹槽在所述第二衬底的正投影至少部分重叠。
  19. 根据权利要求18所述的显示面板，其中，所述辅隔垫物在所述第二衬底的正投影落在所述第六凹槽在所述第二衬底的正投影范围内。
  20. 一种显示装置，包括如权利要求1-19任一项所述的显示面板。
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